TW201325737A - Spray device - Google Patents

Abstract

A spray device is provided. Even when a substrate is transported inclinedly, the spray device can spray a treating liquid only on a back surface of the substrate and then separate and recycle the treating liquid and an attachment-proof liquid respectively. A spray out pipe (30) for the treating liquid is disposed under the substrate (100) and sprays the treating liquid from an upstream side of a transportation direction of a transporting roller (10) which transports the substrate (100) towards a surface of a spray roller (20). A guide member (70) for the treating liquid is attached to a recycle part (45) for the treating liquid to guide the treating liquid sprayed out from the spray out pipe (30) towards the recycle part (45).

Description

Coating device

The present invention relates to a coating apparatus which is applied to a glass substrate for an organic electroluminescence (EL) display device, a glass substrate for a liquid crystal display device, a panel substrate for a solar cell, and a plasma display panel (Plasma) The display panel (PDP) is a back surface of a rectangular substrate such as a photomask substrate for a glass substrate or a semiconductor manufacturing device.

In the substrate processing apparatus which performs the cleaning process on the rectangular-shaped substrate, in order to quickly wash off the contaminants and improve the cleaning effect, the substrate is placed in a state where the surface of the substrate is inclined with respect to the horizontal direction. The cleaning liquid is supplied to the surface or the back surface to perform the cleaning treatment (see Patent Document 1).

However, it is sometimes necessary to apply a specific purpose treatment liquid only to the back surface of the substrate after the cleaning process. For example, there is a case where a treatment liquid for protecting a substrate is applied only to the back surface of the substrate.

In the substrate processing apparatus described in Patent Document 1, the processing liquid is applied to the back surface of the substrate by a spray nozzle disposed on the back side of the substrate, whereby the processing liquid is applied to the back surface of the substrate.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-25144

In the substrate processing apparatus described in Patent Document 1, when the processing liquid is ejected from the atomizing nozzle, the processing liquid ejected from the atomizing nozzle is caused to flow around the surface of the substrate to adhere to the surface of the substrate. Further, even if the discharge time of the treatment liquid is controlled to prevent the flow of the treatment liquid, the mist-like treatment liquid suspended in the treatment chamber may adhere to the surface of the substrate.

Therefore, for example, it is conceivable to transport the substrate at a height position near the surface of the processing liquid stored in the storage tank, and to apply the treatment liquid to the back surface of the substrate only by bringing the back surface of the substrate into contact with the processing liquid in the storage tank. However, in this case, the control of the liquid level is extremely difficult and thus not practical. Further, when the substrate is transferred in a state in which the substrate is tilted in conjunction with the front and rear processes, it is impossible to apply such a processing method.

The present invention has been made to solve the above problems, and an object of the invention is to provide a coating apparatus capable of appropriately applying a processing liquid only on the back surface of a substrate even when the substrate is conveyed obliquely.

Further, when a specific purpose treatment liquid is applied only to the back surface of the substrate as described above, and it is necessary to prevent the treatment liquid from adhering to the surface of the substrate, it is preferable to apply the treatment liquid to the back surface of the substrate before the substrate The surface is supplied with an anti-adhesion liquid such as pure water for preventing the treatment liquid from adhering to the surface of the substrate. In this case, the treatment liquid applied to the back surface of the substrate can be recovered and reused because of the high price, and the anti-adhesion liquid such as pure water can be directly discarded. Therefore, it is necessary to separately recover the treatment liquid and the anti-adhesion liquid.

The present invention has been made to solve the above problems, and another object thereof is to provide a coating apparatus capable of reliably separating a treatment liquid and an anti-adhesion liquid and recovering them individually.

The invention according to claim 1 is a coating apparatus which applies a processing liquid to a back surface of a rectangular substrate, and includes a conveying mechanism that conveys a surface of the substrate in a state of being inclined with respect to a horizontal direction. The coating roller abuts against the back surface of the substrate conveyed by the conveying mechanism, and the processing liquid discharge pipe is in a direction intersecting the substrate conveying direction of the conveying mechanism in the longitudinal direction, and the conveying mechanism The back surface of the substrate to be transported is disposed in parallel, and a plurality of discharge ports of the processing liquid are arranged in the longitudinal direction, and are disposed on the lower side of the substrate conveyed by the transport mechanism and upstream from the substrate transport direction of the transport mechanism. On the side, the treatment liquid is ejected onto the surface of the application roller; the anti-adhesion liquid ejecting unit supplies an anti-adhesion liquid that prevents the treatment liquid from adhering to the surface of the substrate to the surface of the substrate conveyed by the transfer mechanism; and the treatment liquid is recovered. The portion is collected from the processing liquid flowing down from the back surface of the substrate conveyed by the conveying mechanism; the anti-adhesive liquid collecting portion is recovered from the base conveyed by the conveying mechanism An anti-adhesion liquid flowing down the surface of the plate; and a treatment liquid guiding member for guiding the treatment liquid ejected from the treatment liquid discharge pipe to the treatment liquid recovery portion.

According to the invention of claim 1, the invention includes the treatment liquid circulation mechanism, and the treatment liquid recovered in the treatment liquid recovery unit is again supplied to the treatment liquid discharge pipe.

According to the invention of the second aspect of the invention, the processing liquid guiding member includes: a first guiding surface, wherein the processing liquid discharge pipe is upstream of a substrate conveying direction of the conveying mechanism, And extending along the processing liquid discharge pipe; and the second guiding surface at a position facing the lower end portion of the processing liquid discharge pipe along the first lead The direction in which the guide faces intersect extends.

According to the invention of claim 3, the invention further includes an anti-adhesion liquid guiding member for guiding the anti-adhesion liquid discharged from the anti-adhesion liquid ejecting unit to the anti-adhesion liquid collecting portion.

According to the invention of the fourth aspect of the invention, the anti-adhesion liquid guiding member is guided to the processing liquid in the upstream side of the substrate conveying direction of the conveying mechanism with respect to the processing liquid guiding member. The components are arranged close to each other.

According to the invention of claim 1 or 2, the processing liquid discharge pipe includes a plurality of reservoirs that are divided in a longitudinal direction of the processing liquid discharge pipe, and the coating The cloth device includes a processing liquid supply mechanism that supplies the processing liquid to each of the plurality of storage portions.

The invention according to claim 1 or 2, further comprising: a substrate position recognizing unit that recognizes a position of a front end of the substrate conveyed by the transfer mechanism and a position of a rear end; and a coating control unit The operation of ejecting the processing liquid from the processing liquid discharge pipe to the surface of the coating roller according to the position of the front end of the substrate and the position of the rear end recognized by the substrate position recognizing means, and the conveying mechanism The leading end of the conveyed substrate starts before the application of the coating roller, and stops before the rear end of the substrate conveyed by the substrate transfer mechanism reaches the coating roller.

According to the invention of the first aspect of the invention, the processing liquid discharge pipe is used to discharge the processing liquid onto the surface of the application roller from the upstream side of the substrate in the downstream direction of the substrate, so that the substrate is conveyed obliquely. Alternatively, the treatment liquid may be appropriately applied only to the back surface of the substrate. In addition, the treatment liquid guided from the treatment liquid discharge pipe is guided to the treatment liquid guiding member of the treatment liquid recovery unit, whereby the treatment liquid can be separated from the adhesion prevention liquid supplied to the surface of the substrate, and can be separately collected.

According to the invention of claim 2, the treatment liquid separated from the anti-adhesion liquid can be recycled and reused.

According to the invention of the third aspect, the action of the first guide surface and the second guide surface prevents the treatment liquid from penetrating into the adhesion prevention liquid recovery portion, and can reliably separate the treatment liquid from the adhesion prevention liquid. Recycling.

According to the inventions of the fourth aspect and the fifth aspect of the invention, the anti-adhesion liquid can be prevented from infiltrating into the treatment liquid recovery portion by the action of the anti-adhesion liquid guiding member, and the anti-adhesion liquid and the treatment liquid can be reliably separated and individually Recycling.

According to the invention of the sixth aspect of the invention, even when the processing liquid discharge pipe is disposed obliquely to the horizontal direction so as to be parallel to the back surface of the substrate conveyed by the conveyance mechanism, the processing liquid discharged from each of the discharge ports can be made. The amount is substantially uniform over the entire length of the treatment liquid discharge pipe. Therefore, the amount of the treatment liquid applied to the back surface of the substrate can be uniformly distributed throughout the entire area of the substrate.

According to the invention of claim 7, the discharge operation of the treatment liquid is started before the leading end of the substrate reaches the coating roller, and is stopped before the rear end of the substrate reaches the coating roller, so that the treatment liquid can be prevented from flowing to the substrate. The side of the surface.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a front schematic view showing a coating apparatus of the present invention. 2 is a schematic plan view of a coating apparatus of the present invention. 3 is a side cross-sectional schematic view of the vicinity of the application roller 20 of the coating device of the present invention.

The coating device includes a coating chamber 53 disposed between a cleaning device 61 that cleans the rectangular substrate 100 with pure water and a drying device 62 that dries the substrate 100, and is formed with The inlet 54 and the outlet 55 of the substrate 100 to be conveyed. A plurality of transport rollers 10 are disposed in the chamber 53 for transporting the substrate 100 in a state where the surface of the substrate 100 is inclined with respect to the horizontal direction. Further, the coating device includes a coating roller 20 that abuts against the entire back surface of the substrate 100 conveyed by the plurality of conveying rollers 10 and rotates.

FIG. 4 is a schematic view showing a state in which the substrate 100 is transported by the transport roller 10 .

The conveying roller 10 includes a guide roller 11 including a flange portion abutting against the inclined lower end edge of the substrate 100, a plurality of supporting rollers 12 abutting against the back surface of the substrate 100 to support the substrate 100, and a coupling shaft 13 The guide roller 11 and the support roller 12 are coupled. The substrate 100 is transported by the transport roller 10 having the above configuration, in a state where the surface of the substrate 100 is inclined with respect to the horizontal direction. Then, the application roller 20 rotates in synchronization with the moving speed of the substrate 100 while abutting on the entire area of the back surface of the substrate 100 conveyed by the conveyance roller 10.

FIG. 5 shows a substrate 100 and a coating roller 20 that are conveyed by the conveying roller 10. A schematic diagram of the configuration.

The application roller 20 is disposed in a direction intersecting the conveyance direction of the substrate 100 of the conveyance roller 10 in the longitudinal direction, and is disposed in parallel with the back surface of the substrate 100 conveyed by the conveyance roller 10 . As a result, the application roller 20 is rotated by the entire back surface of the substrate 100 conveyed by the conveyance roller 10 as described below, and the treatment liquid is applied to the back surface of the substrate 100. Further, if the coating roller 20 is a necessary region in which the processing liquid can be applied to the back surface of the substrate 100, the coating roller 20 may not be in contact with a partial region of the back surface of the substrate 100.

Referring again to FIGS. 1 to 3, the coating apparatus includes: a treatment liquid discharge pipe 30 for discharging a treatment liquid onto a surface of the application roller 20; and a treatment liquid supply mechanism for ejecting the treatment liquid 30 Supply the treatment liquid. The processing liquid supply mechanism includes a processing liquid tank 41 for storing a processing liquid, a pump 42 for pumping the processing liquid in the processing liquid tank 41, and being disposed in the line 46, and a solenoid valve 43 for conveying the processing liquid The treatment liquid discharge pipe 30 is disposed in the line 48; the electromagnetic valve 44 is used to circulate the treatment liquid, and is disposed in the line 47; and the treatment liquid recovery unit 45 recovers the treatment from the application roller 20 In the line 49, the treatment liquid recovered by the treatment liquid recovery unit 45 is sent to the treatment liquid tank 41 through the discharge port 40 of the treatment liquid. A treatment liquid guiding member 70 is attached to the treatment liquid recovery unit 45 for guiding the treatment liquid discharged from the treatment liquid discharge pipe 30 to the treatment liquid recovery unit 45.

Further, the coating device includes a pair of pure water discharge pipes 58 for supplying pure water to the surface of the substrate 100 conveyed by the conveyance roller 10 as an anti-adhesion liquid for preventing the treatment liquid from adhering to the surface of the substrate 100. The pure water discharge pipe 58 is disposed in the transfer inlet 54 and the transfer port 55 of the substrate 100 of the coating chamber 53. nearby. The pure water discharge pipe 58 is connected to a supply source of pure water (not shown), and is disposed in a direction in which the longitudinal direction intersects with the conveyance direction of the substrate 100 of the conveyance roller 10 . The pure water discharge pipe 58 has a cylindrical shape in which both ends are closed, and a reservoir of pure water is formed inside the pure water discharge pipe 58 and arranged along the longitudinal direction of the pure water discharge pipe 58. A plurality of discharge ports of pure water that communicate with the reservoir of pure water.

The pure water supplied from the pure water supply pipe 58 to the substrate 100 flows down to the bottom of the coating chamber 53, and is discharged to the unillustrated water through the discharge port 56 and the line 57 of pure water formed at the bottom of the coating chamber 53. Drain. Therefore, the bottom of the coating chamber 53 functions as a pure water collecting portion for recovering the pure water sprayed from the pure water discharge pipe 58. Further, a liquid obtained by dissolving carbon dioxide in pure water may be used instead of pure water as an anti-adhesion liquid.

Further, the coating device includes an air ejection nozzle 51 for cleaning the substrate 100 in the cleaning device 61 in the front stage for removing pure water attached to the back surface of the substrate 100, and a sensor 52 for identifying the conveyed object The front end and the rear end of the substrate 100 conveyed by the roller 10 include a micro switch or the like.

FIG. 6 is a schematic view of the treatment liquid discharge pipe 30.

The processing liquid discharge pipe 30 is in a direction parallel to the coating roller 20, that is, in a direction in which the longitudinal direction intersects with the conveying direction of the substrate 100 of the conveying roller 10, and on the back surface of the substrate 100 conveyed by the conveying roller 10. Arranged in parallel. The treatment liquid discharge pipe 30 has a cylindrical shape in which both ends are closed, and a storage portion of the treatment liquid is formed inside the treatment liquid discharge pipe 30.

The reservoir of the treatment liquid passes through the tubular treatment liquid discharge pipe 30 The three partitions 33 spaced apart from each other are divided into four regions with respect to the longitudinal direction of the treatment liquid discharge pipe 30. Further, a supply port 32 for the treatment liquid is disposed in each of the regions. The treatment liquid supplied from the line 48 shown in FIG. 1 is supplied from each supply port 32 to the storage portion of the divided four processing liquids.

Further, in the processing liquid discharge pipe 30, a plurality of discharge ports 31 for processing liquid that communicates with the respective storage portions are arranged in the longitudinal direction. The processing liquid supplied from the respective supply ports 32 to the storage portion of the divided four processing liquids is ejected from the ejection port 31 of the processing liquid.

(a) and (b) of FIG. 7 are explanatory views showing the substrate 100, the application roller 20, and the treatment liquid discharge pipe 30 conveyed by the conveyance roller 10.

As shown in Fig. 7 (a), the processing liquid discharge pipe 30 is on the lower side of the substrate 100 conveyed by the conveyance roller 10 and upstream of the conveyance direction of the substrate 100 of the conveyance roller 10 (the left side in Fig. 7 (a)) The treatment liquid is sprayed onto the surface of the coating roller 20.

FIG. 8 is a cross-sectional view showing the pure water guiding member 71 and the processing liquid guiding member 70 attached to the processing liquid recovery unit 45 from the front side. In addition, FIG. 9(a) and FIG. 9(b) are explanatory views showing the arrangement relationship between the application roller 20 and the treatment liquid guiding member 70. 9(a) is a plan view of the application roller 20 and the treatment liquid guiding member 70, and FIG. 9(b) is a side view of the coating roller 20 and the treatment liquid guiding member 70.

The treatment liquid guiding member 70 is for guiding the treatment liquid discharged from the treatment liquid discharge pipe 30 to the treatment liquid recovery unit 45. The processing liquid guiding member 70 includes a first guiding surface 70a, and a processing liquid discharge pipe 30 on the upstream side in the conveying direction of the substrate 100 of the conveying roller 10 with respect to the processing liquid discharge pipe 30. The second guide surface 70b extends in a direction orthogonal to the first guide surface 70a at a position facing the lower end portion of the treatment liquid discharge pipe 30. The first guide surface 70a is disposed over the entire lengthwise direction of the processing liquid discharge pipe 30 on the upstream side in the conveyance direction of the substrate 100 of the conveyance roller 10 with respect to the processing liquid discharge pipe 30, and the lower end of the first guide surface 70a The part intrudes into the treatment liquid recovery unit 45.

The treatment liquid guiding member 70 is fixed to the support member 72 through a pair of screws 73 together with the treatment liquid discharge pipe 30 and the pure water guiding member 71. Further, the support member 72 is fixed to the treatment liquid recovery unit 45 through a pair of screws 74. Here, the pure water guiding member 71 is for guiding the pure water discharged from the pure water discharge pipe 58 to the bottom of the coating chamber 53 functioning as the pure water collecting portion. The pure water guiding member 71 is disposed close to the processing liquid guiding member 70 on the upstream side in the conveying direction of the substrate 100 of the conveying roller 10 with respect to the processing liquid guiding member 70.

Figure 10 is a block diagram of a control system of the coating apparatus of the present invention.

The coating device includes a control unit 90, the control unit 90 includes a read-only memory (ROM) 91, and stores an operation program necessary for control of the device; a random access memory (RAM) 92, temporarily storing data and the like during control; and a central processing unit (CPU) 93, performing logical operations. The control unit 90 is connected to a motor 59 for rotationally driving each of the transport rollers 10 via an interface 94. Further, the control unit 90 is connected to the sensor 52, the pump 42, and the electromagnetic valves 43, 44 via the interface 94. Furthermore, the control unit 90 is as described below as a coating control unit The operation of discharging the processing liquid from the surface of the coating roller 20 from the processing liquid discharge pipe 30 is performed, and the leading end of the substrate 100 conveyed by the conveying roller 10 starts before the coating roller 20 is reached, and is transported by the conveying roller 10 The rear end of the substrate 100 is stopped before reaching the coating roller 20.

In the coating apparatus having the above configuration, when the processing liquid is applied onto the substrate 100, the motor 59 is driven by the control of the control unit 90 shown in FIG. 10 to rotate the conveying roller 10. Then, the sensor 52 detects the leading end of the substrate 100 immediately before the substrate 100 enters the carry-in port 54 of the coating chamber 53 by the cleaning device 61. When the sensor 52 detects the position of the leading end of the substrate 100, the control unit 90 thereafter monitors the position of the leading end of the substrate 100 based on the detection signal from the leading end of the substrate 100 of the sensor 52 and the rotational speed of the motor 59.

On the other hand, in the processing liquid supply mechanism for supplying the processing liquid to the processing liquid discharge pipe 30, the electromagnetic valve 43 is closed and the electromagnetic valve 44 is opened. Therefore, the processing liquid in the processing liquid tank 41 is circulated through the circulation path including the line 46, the pump 42, the line 47, and the electromagnetic valve 44 by the driving of the pump 42.

When the substrate 100 conveyed by the conveyance roller 10 is conveyed into the coating chamber 53, pure water is supplied from the pure water discharge pipe 58 to the surface of the substrate 100. On the other hand, the pure water that has flowed from the surface of the substrate 100 to the back surface and the pure water adhering to the back surface of the substrate 100 during the cleaning process of the cleaning device 61 are removed by the action of the compressed air ejected from the air ejection nozzle 51. Thereby, it is possible to prevent the pure water remaining on the back surface of the substrate 100 from becoming an obstacle to the back surface coating treatment liquid of the substrate 100. Furthermore, the pure water flowing down from the substrate 100 is returned as pure water. The bottom of the coating chamber 53 in which the receiving portion functions is discharged to the sewer via the discharge port 56 and the line 57 formed at the bottom of the coating chamber 53.

Then, before the leading end of the substrate 100 conveyed by the conveying roller 10 reaches the coating roller 20, the electromagnetic valve 43 is opened by the control of the control unit 90, and the electromagnetic valve 44 is closed. Thereby, the processing liquid in the processing liquid tank 41 is sent to the processing liquid discharge pipe 30 via the line 46, the pump 42, the electromagnetic valve 43, and the line 48 by the driving of the pump 42. Then, the processing liquid is temporarily stored in the four storage portions from the respective supply ports 32 of the processing liquid discharge pipe 30, and then discharged from the respective discharge ports 31 to the surface of the coating roller 20. The treatment liquid which is ejected to the surface of the application roller 20 and dripped is recovered by the treatment liquid recovery unit 45, and returned to the treatment liquid tank 41 via the line 49.

On the other hand, as described above, the reservoir of the treatment liquid in the treatment liquid discharge pipe 30 is divided into four regions through the longitudinal direction of the treatment liquid discharge pipe 30 through the three separators 33, and is supplied from the pipe 48. The treatment liquid is stored in the reservoir of the divided processing liquids from the respective supply ports 32, and then discharged from the discharge port 31 of the processing liquid. Therefore, even when the processing liquid discharge pipe 30 is inclined, the discharge amount of the processing liquid discharged from each of the discharge ports 31 can be maintained substantially uniform.

When the front end of the substrate 100 is conveyed to a position in contact with the application roller 20, the processing liquid is applied to the back surface of the substrate 100 by the action of the application roller 20 that is in contact with the entire back surface of the substrate 100. At this time, as shown in FIG. 7( a ), the processing liquid discharge pipe 30 is formed on the lower side of the substrate 100 conveyed by the conveyance roller 10 and on the upstream side in the conveyance direction of the substrate 100 of the conveyance roller 10 to the coating roller. The surface of the 20 is sprayed out of the treatment liquid, so The flow of the treatment liquid to the surface of the substrate 100 is effectively prevented.

By continuing to transport the substrate 100 in the above state, the processing liquid is applied to the entire area of the back surface of the substrate 100. Then, the sensor 52 detects the rear end of the substrate 100 conveyed by the conveyance roller 10. When the sensor 52 detects the position of the rear end of the substrate 100, the control unit 90 thereafter monitors the position of the rear end of the substrate 100 based on the detection signal of the rear end of the substrate 100 of the sensor 52 and the rotational speed of the motor 59.

Then, before the rear end of the substrate 100 conveyed by the conveyance roller 10 reaches the application roller 20, the electromagnetic valve 43 is closed by the command of the control unit 90, and the electromagnetic valve 44 is opened. Thereby, the discharge of the treatment liquid from the treatment liquid discharge pipe 30 is stopped, and the treatment liquid in the treatment liquid tank 41 circulates in the circulation path including the line 46, the pump 42, the line 47, and the electromagnetic valve 44. As a result, as shown in FIG. 7(b), before the end of the substrate 100 reaches the conveyance roller 10, the discharge of the treatment liquid from the treatment liquid discharge pipe 30 is stopped. Therefore, the treatment for discharging the liquid from the treatment liquid discharge pipe 30 can be effectively prevented. The liquid is supplied to the upper surface of the substrate 100 conveyed by the conveyance roller 10 .

Then, when pure water is supplied to the surface of the substrate 100 and the processing liquid is supplied to the back surface of the substrate 100 as described above, in order to reuse the processing liquid, it is necessary to reliably separate the processing liquid from the pure water and collect it. In the coating apparatus of the present embodiment, by the action of the treatment liquid guiding member 70 and the pure water guiding member 71, the treatment liquid can be reliably separated from the pure water and recovered.

In other words, the processing liquid is ejected in parallel with the processing liquid discharge pipe 30 on the upstream side in the conveying direction of the substrate 100 of the conveying roller 10 with respect to the processing liquid discharge pipe 30. The first guiding surface 70a of the processing liquid guiding member 70 can guide the processing liquid discharged from the processing liquid discharge pipe 30 to the inside of the processing liquid collecting portion 45. Therefore, it is possible to prevent the processing liquid discharged from the processing liquid discharge pipe 30 from flowing down through the support member 72 or the like to the bottom of the coating chamber 53 on the upstream side in the conveying direction of the substrate 100 than the processing liquid recovery portion 45.

Further, the second guide surface 70b of the treatment liquid guiding member 70 that extends in a direction orthogonal to the first guide surface 70a at a position facing the lower end portion of the treatment liquid discharge pipe 30 that is disposed obliquely can be used. The treatment liquid discharged from the treatment liquid discharge pipe 30 is guided to the inside of the treatment liquid recovery unit 45. Therefore, it is possible to prevent the processing liquid discharged from the processing liquid discharge pipe 30 from flowing over the inclined lower end portion of the processing liquid collecting portion 45 which is disposed obliquely, and from the processing liquid collecting portion 45 to the bottom portion of the coating chamber 53 on the inclined lower end side.

In addition, the pure water guiding member 71 can prevent the pure water adhering to the substrate 100 conveyed by the conveying roller 10 from penetrating into the processing liquid collecting portion 45 in association with the conveyance of the substrate 100. Therefore, the treatment liquid can be surely separated from the pure water.

As described above, according to the coating apparatus of the present embodiment, the processing liquid discharge pipe 30 has the lower side of the substrate 100 conveyed by the conveyance roller 10 and the upstream side in the conveyance direction of the substrate 100 of the conveyance roller 10, and is applied to the coating side. The surface of the roller 20 is configured to eject the processing liquid, and before the end of the substrate 100 conveyed by the conveying roller 10 reaches the coating roller 20, the processing liquid is discharged from the processing liquid discharge pipe 30, so that the processing liquid can be prevented from flowing around. To the surface of the substrate 100, the treatment liquid is accurately applied only on the back surface of the substrate 100.

Further, the reservoir of the treatment liquid in the treatment liquid discharge pipe 30 passes through three The separator 33 is divided into four regions with respect to the longitudinal direction of the processing liquid discharge pipe 30, and the processing liquid is stored in the storage portion of the divided four processing liquids, and then discharged from the discharge port 31 of the processing liquid. Even when the processing liquid discharge pipe 30 is disposed obliquely, the discharge amount of the processing liquid discharged from each of the discharge ports 31 can be maintained substantially uniform.

Further, by the action of the treatment liquid guiding member 70 and the pure water guiding member 71, the treatment liquid can be reliably separated from the pure water and recovered. Therefore, the treatment liquid can be effectively reused.

10‧‧‧Transport roller

11‧‧‧guide roller

12‧‧‧Support roller

13‧‧‧Connected shaft

20‧‧‧Application roller

30‧‧‧Processing liquid discharge pipe

31‧‧‧Spray outlet

32‧‧‧ supply port

33‧‧‧Baffle

40‧‧‧Drainage of treatment fluid

41‧‧‧Processing tank

42‧‧‧ pump

43, 44‧‧‧ solenoid valve

45‧‧‧Processing liquid recovery department

46, 47, 48, 49, 57‧‧‧ pipeline

51‧‧‧Air spout

52‧‧‧ Sensor

53‧‧‧ Coating chamber

54‧‧‧ Move in

55‧‧‧Moving out

56‧‧‧Discharge of pure water

58‧‧‧ pure water spout pipe

59‧‧‧Motor

61‧‧‧cleaning device

62‧‧‧Drying device

70‧‧‧Processing fluid guiding member

70a‧‧‧1st guiding surface

70b‧‧‧2nd guiding surface

71‧‧‧pure water guiding member

72‧‧‧Support members

73, 74‧‧‧ screws

90‧‧‧Control Department

91‧‧‧ROM

92‧‧‧RAM

93‧‧‧CPU

94‧‧‧ interface

100‧‧‧Substrate

Fig. 1 is a front schematic view showing a coating apparatus of the present invention.

Fig. 2 is a schematic plan view of a coating apparatus of the present invention.

Fig. 3 is a side cross-sectional schematic view showing the vicinity of a coating roll 20 of the coating device of the present invention.

FIG. 4 is a schematic view showing a state in which the substrate 100 is transported by the transport roller 10 .

FIG. 5 is a schematic view showing the arrangement of the substrate 100 and the application roller 20 conveyed by the conveyance roller 10.

FIG. 6 is a schematic view of the treatment liquid discharge pipe 30.

(a) and (b) of FIG. 7 are explanatory views showing the substrate 100, the application roller 20, and the treatment liquid discharge pipe 30 that are conveyed by the conveyance roller 10.

FIG. 8 is a cross-sectional view showing the pure water guiding member 71 and the processing liquid guiding member 70 attached to the processing liquid recovery unit 45 from the front side.

(a) and (b) of FIG. 9 are explanatory views showing an arrangement relationship between the application roller 20 and the treatment liquid guiding member 70.

Fig. 10 is a block diagram showing a control system of the coating apparatus of the present invention.

10‧‧‧Transport roller

20‧‧‧Application roller

30‧‧‧Processing liquid discharge pipe

40‧‧‧Drainage of treatment fluid

41‧‧‧Processing tank

42‧‧‧ pump

43, 44‧‧‧ solenoid valve

45‧‧‧Processing liquid recovery department

46, 47, 48, 49, 57‧‧‧ pipeline

51‧‧‧Air spout

52‧‧‧ Sensor

53‧‧‧ Coating chamber

54‧‧‧ Move in

55‧‧‧Moving out

56‧‧‧Discharge of pure water

58‧‧‧ pure water spout pipe

61‧‧‧cleaning device

62‧‧‧Drying device

70‧‧‧Processing fluid guiding member

100‧‧‧Substrate

Claims (7)

A coating apparatus that applies a treatment liquid to a back surface of a rectangular substrate, and includes a conveying mechanism that conveys a surface of the substrate in a state of being inclined with respect to a horizontal direction; and a coating roller that abuts Rotating the back surface of the substrate conveyed by the transport mechanism; the processing liquid discharge pipe is in a direction intersecting the substrate transport direction of the transport mechanism in the longitudinal direction, and the substrate transported by the transport mechanism The back surface is disposed in parallel, and a plurality of discharge ports of the processing liquid are arranged in the longitudinal direction, and are located on the lower side of the substrate conveyed by the transfer mechanism and upstream from the substrate transfer direction of the transfer mechanism. On the side, the processing liquid is ejected onto the surface of the application roller; the anti-adhesion liquid ejecting unit supplies the surface of the substrate conveyed by the transport mechanism to prevent adhesion of the processing liquid to the surface of the substrate. The treatment liquid recovery unit recovers the treatment liquid flowing down from the back surface of the substrate conveyed by the transfer mechanism; the anti-adhesion liquid recovery unit recovers from the movement The flow of the transport mechanism of the substrate surface of the adhesion-preventing liquid; and the treatment liquid guide means for the treatment liquid discharged from the liquid discharge pipe processing directed to the treatment liquid recovery unit. The coating device according to claim 1, further comprising: a treatment liquid circulation mechanism that recovers the recovery to the treatment liquid recovery unit The treatment liquid is again supplied to the treatment liquid discharge pipe. The coating apparatus according to the second aspect of the invention, wherein the processing liquid guiding member includes: a first guiding surface, and the processing liquid discharge pipe is upstream of the substrate conveying direction of the conveying mechanism And extending in parallel with the processing liquid discharge pipe; and the second guiding surface extends in a direction intersecting the first guiding surface at a position facing the lower end portion of the processing liquid discharge pipe. The coating device according to claim 3, further comprising: an anti-adhesion liquid guiding member for guiding the anti-adhesion liquid ejected from the anti-adhesion liquid ejecting unit to the anti-adhesion liquid recovery unit . The coating device according to claim 4, wherein the anti-adhesion liquid guiding member is upstream of the substrate conveying direction of the conveying mechanism with respect to the processing liquid guiding member, and the processing liquid The guiding members are arranged close to each other. The coating apparatus according to the first or second aspect of the invention, wherein the processing liquid discharge pipe includes a plurality of reservoirs divided in a longitudinal direction of the processing liquid discharge pipe, the coating The apparatus includes a processing liquid supply mechanism that supplies the processing liquid to each of the plurality of reservoirs. The coating apparatus according to claim 1 or 2, further comprising: a substrate position identifying unit that recognizes a position of the front end of the substrate conveyed by the conveying mechanism and a position of the rear end; a coating control unit that ejects the processing liquid from the processing liquid discharge pipe toward a surface of the coating roller according to a position of a front end of the substrate and a position of a rear end recognized by the substrate position recognizing unit The operation starts before the leading end of the substrate conveyed by the transport mechanism reaches the coating roller, and stops before the rear end of the substrate conveyed by the substrate transport mechanism reaches the coating roller.