TW201306953A - Coating apparatus - Google Patents

Abstract

The object of the present invention is to perform an efficient cleaning operation of a nozzle. The solution of the present invention is a coating apparatus that comprises a coating section comprising a nozzle having a slit opening formed in a front end portion thereof for discharging liquids onto a substrate, a driving section for driving at least one of the substrate and the nozzle in order to make the substrate move and the nozzle moving relative to each other, a cleaning member formed to be inserted into the slit opening, and a cleaning member driving unit for moving the cleaning member in a longitudinal direction of the slit opening, a management unit having a nozzle cleaning section for cleaning the front end portion of the nozzle, and the cleaning member being arranged in the nozzle cleaning unit, so as to clean the slit opening when performing the cleaning operation for the front end portion of the nozzle. In this way, the cleaning operation of the nozzle front end portion can be efficiently carried out. The aforementioned coating apparatus is characterized in that the management unit is provided with a nozzle cleaning unit driving mechanism for driving the aforementioned nozzle cleaning unit, the nozzle cleaning unit driving mechanism also serves as the driving unit for the cleaning member.

Description

Coating device

The present invention relates to a coating apparatus.

A fine pattern such as a wiring pattern or an electrode pattern is formed on a glass substrate constituting a display panel such as a liquid crystal display. Generally, such a pattern is formed by, for example, photolithography. In the photolithography method, a step of forming a photoresist film on a glass substrate, a step of patterning the photoresist film, and a step of developing the photoresist film are performed.

As a device for applying a photoresist film on the surface of a substrate, a slit nozzle is known, and a photoresist is applied to a position where a discharge region of the slit nozzle overlaps with the glass substrate by moving relative to the glass substrate. A coating device for coating a photoresist on a glass substrate.

In such a coating apparatus, since a photoresist is discharged to a plurality of glass substrates, there is a droplet or the like in which a photoresist is attached to the slit nozzle, which affects the film thickness of the discharged photoresist. Therefore, it is necessary to wash the slit nozzle. As a washing operation of the slit nozzle, for example, a configuration in which the tip end portion of the nozzle is automatically washed by using a washing device is known.

[Previous Technical Literature] [Patent Document]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-270841

However, in the cleaning of the slit opening, the operation of inserting the plate-shaped cleaning member into the slit opening to scan the slit in the longitudinal direction is performed manually. Therefore, it is necessary to stop the apparatus during the cleaning operation of the nozzle, and seek improvement in efficiency.

In view of the above circumstances, an object of the present invention is to provide a coating apparatus which can efficiently perform a cleaning operation of a nozzle.

A coating apparatus according to a first aspect of the present invention includes: a coating portion having a slit opening for discharging a liquid to a substrate, wherein the slit is formed in a tip end portion, and the substrate is driven to move relative to the nozzle The driving portion of at least one of the substrate and the nozzle is formed as a cleaning member that can be inserted into the slit opening, and a cleaning member driving portion that moves the cleaning member in the longitudinal direction of the slit opening.

In this case, the slit member can be cleaned by moving the cleaning member formed to be inserted into the slit opening in the longitudinal direction of the slit opening. Thereby, the slit opening can be automatically cleaned without manual work, so that the nozzle cleaning operation can be performed efficiently.

Further, the coating device further includes a management unit that manages a state of the tip end portion of the nozzle, and the cleaning member is provided in the management portion.

In this case, since the cleaning member is provided in the management unit that manages the tip end portion of the nozzle, the state of the tip end portion of the nozzle can be cleaned. Sew the opening. Thereby, the management of the state of the tip end portion can be performed efficiently.

In the above coating apparatus, the management unit includes a nozzle cleaning unit that washes the tip end portion of the nozzle, and the cleaning member is provided in the nozzle cleaning unit.

In this case, the management unit has the nozzle cleaning unit that cleans the tip end portion of the nozzle, and the cleaning member is provided in the nozzle cleaning unit. Therefore, when the cleaning operation of the tip end portion of the nozzle is performed, the slit opening can be cleaned. Thereby, the cleaning operation of the tip end portion of the nozzle can be efficiently performed.

In the above-described coating apparatus, the management unit includes a nozzle cleaning unit drive mechanism that drives the nozzle cleaning unit, and the nozzle cleaning unit drive unit also serves as the cleaning member drive unit.

In this case, the management unit has the nozzle cleaning unit drive mechanism that drives the nozzle cleaning unit, and the nozzle cleaning unit drive unit also serves as the cleaning member drive unit. Therefore, the nozzle cleaning unit and the cleaning member can be integrally moved. Thereby, the cleaning of the tip end portion of the nozzle and the cleaning of the slit opening can be performed at the same timing, so that the work efficiency can be improved.

Further, the coating apparatus further includes: an accommodating portion that can accommodate the cleaning member; and an inlet and outlet mechanism that allows the cleaning member to enter and exit the accommodating portion.

In this case, the accommodating portion that can accommodate the cleaning member and the access mechanism that allows the cleaning member to enter and exit the accommodating portion are further provided, so that foreign matter such as dust can be prevented from adhering to the cleaning member. Thereby, the cleaning member can be maintained in a clean state.

In the above coating device, the cleaning member is set to be as described above The accommodating portion moves integrally.

In this case, since the cleaning member can move integrally with the accommodating portion, the cleaning member can be efficiently taken in and out in a short time.

In the above coating apparatus, the cleaning member is formed into a film shape.

In this case, since the cleaning member is formed in a film shape, the slit opening can be surely inserted.

In the above coating apparatus, the cleaning member is formed to be thinner toward the front end.

In this case, since the cleaning member is formed to be thinner toward the front end, the slit opening can be smoothly inserted.

The coating device further includes an elevating mechanism that elevates and lowers the cleaning member to the nozzle.

In this case, since the lifting mechanism for raising and lowering the cleaning member to the nozzle is further provided, the cleaning member can be brought close to the nozzle. Thereby, the slit opening can be cleaned without moving the nozzle, so that work can be performed efficiently.

The coating device further includes a position adjusting mechanism that adjusts a position of the cleaning member to the slit opening.

In this case, since the position adjustment mechanism for adjusting the position of the cleaning member to the slit opening is further provided, the positioning of the cleaning member and the slit opening can be performed with high precision.

The coating device further includes a cleaning mechanism that cleans the cleaning member.

In this case, since the cleaning mechanism for cleaning the cleaning member is further provided, Therefore, the cleaning member can be maintained in a clean state.

According to the present invention, the cleaning operation of the nozzle can be performed efficiently.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

Fig. 1 is a perspective view of a coating apparatus 1 relating to the present embodiment.

As shown in FIG. 1 , the coating device 1 according to the present embodiment is, for example, a coating device that applies a photoresist to a glass substrate such as a liquid crystal panel, and the substrate transfer unit 2, the application unit 3, and the management unit 4 The control unit CONT is the main component.

In the coating apparatus 1, the substrate is transported by the substrate transfer unit (substrate transfer system) 2, and the substrate is continuously transported. The photoresist is applied onto the substrate by the application unit (application system) 3, and the application unit 4 manages the application unit 3. status. The control unit CONT integrally controls each unit of the coating device 1. Further, in Fig. 1, the cleaning device 50, which is one of the components of the present embodiment, is provided in the first waiting portion 48 of the management unit 4.

2 is a front view of the coating device 1, FIG. 3 is a plan view of the coating device 1, and FIG. 4 is a side view of the coating device 1. The detailed configuration of the coating device 1 will be described with reference to these figures.

(substrate transfer unit)

First, the configuration of the substrate transfer unit 2 will be described.

The substrate transport unit 2 includes a substrate loading area 20, a coating processing area 21, a substrate carrying-out area 22, a transport mechanism 23, and a frame portion 24 that supports these. In the substrate transfer unit 2, the substrate S is sequentially transported to the substrate loading mechanism 20, the coating processing region 21, and the substrate carry-out region 22 by the transport mechanism 23. The substrate loading area 20, the coating processing area 21, and the substrate carrying-out area 20 are arranged in this order from the upstream side to the downstream side in the substrate transfer direction. The conveying mechanism 23 is provided on one side of each of the portions so as to straddle the respective portions of the substrate loading region 20, the coating processing region 21, and the substrate carrying-out region 22.

Hereinafter, in explaining the configuration of the coating apparatus 1, the direction in the drawing will be described using the XYZ coordinate system for simplification of the labeling. In the longitudinal direction of the substrate transport unit 2, the transport direction of the substrate is indicated as the X direction. The direction that is orthogonal to the X direction (substrate transport direction) is indicated as the Y direction. The direction perpendicular to the plane including the X-axis and the Y-axis is indicated as the Z direction. Further, the X direction, the direction, and the Z direction are the positive (+) direction in the direction of the arrow in the figure, and the negative (-) direction in the opposite direction to the arrow.

The substrate loading area 20 is a portion where the substrate S conveyed from the outside of the apparatus is carried, and has a loading side pedestal 25 and a lifting mechanism 26.

The loading-side pedestal 25 is provided on the upper portion of the frame portion 24, and is formed of, for example, SUS or the like, and has a rectangular plate-like member in plan view. The loading side pedestal 25 has a longitudinal direction in the X direction. The loading side pedestal 25 is provided with a plurality of air ejection ports 25a and lifting bolt insertion holes 25b. These air ejection ports 25a and the elevating pin cutout holes 25b are provided so as to penetrate the loading side pedestal 25.

The air ejection port 25a is the surface of the pedestal of the loading side pedestal 25 The hole in which the gas is ejected from the transport surface 25c is, for example, arranged in a matrix shape in a plan view in a region where the substrate S is placed in the carry-in side pedestal 25. An air supply source (not shown) is connected to the air ejection port 25a. Here, the loading side pedestal 25 can float the substrate S in the +Z direction by the air ejected from the air ejection port 25a.

The lift pin exit hole 25b is provided in a region where the substrate S is carried in the carry-in side pedestal 25. The elevating pin insertion hole 25b is configured such that air supplied to the pedestal surface 25c does not leak.

One of the alignment devices 25d is provided at each of the two sides of the loading-side pedestal 25 in the Y direction. The alignment device 25d is a device that is aligned with the position of the substrate S that is carried into the loading-side pedestal 25. Each of the alignment devices 25d has a long hole and a positioning member provided in the long hole, and mechanically holds the substrate carried into the loading-side pedestal 25 from both sides.

The lifting mechanism 26 is provided on the inner surface side of the substrate loading position of the loading-side pedestal 25. The lifting mechanism 26 has a lifting member 26a and a plurality of lifting bolts 26b. The elevating member 26a is connected to a drive mechanism (not shown), and the elevating member 26a is moved in the Z direction by the drive of the drive mechanism. The plurality of lifting bolts 26b are provided by the upper surface of the lifting and lowering member 26a to the loading side pedestal 25. Each of the lift pins 26b is disposed at a position overlapping the lift pin exit hole 25b in a plan view. The elevating member 26a is moved in the Z direction so that the elevating bolts 26b are ejected from the elevating hole 25b on the pedestal surface 25c. The positions of the end portions of the lift pins 26b in the +Z direction are aligned in the Z direction, so that the substrate S conveyed from the outside of the apparatus can be maintained in a horizontal state.

The coating treatment region 21 is a portion where the photoresist is applied, and a processing pedestal 27 for supporting the substrate S is provided. The pedestal 27, the pedestal surface (transport surface) 27c is, for example, a rectangular plate-shaped member which is covered with a light-absorbing material containing a hard alumite as a main component, and is provided on the side of the loading side pedestal 25 on the +X direction side.

The portion of the processing pedestal 27 covered with the light absorbing material suppresses reflection of light such as laser light. In this processing pedestal 27, the Y direction is the long side direction. The size of the processing pedestal 27 in the Y direction is almost the same as the size of the loading side pedestal 25 in the Y direction. The processing pedestal 27 is provided with a plurality of air ejection ports 27a for ejecting air to the pedestal surface 27c, and a plurality of air suction ports 27b for air on the suction pedestal surface 27c. These air ejection ports 27a and suction ports 27b are provided so as to penetrate the processing pedestal 27. Further, inside the processing pedestal 27, a plurality of grooves (not shown) for imparting resistance to the pressure of the gas passing through the air ejection port 27a and the air suction port 27b are provided. The plurality of grooves are connected to the air ejection port 27a and the air suction port 27b inside the pedestal.

In the processing pedestal 27, the distance between the air ejection ports 27a is narrower than the distance between the air ejection ports 25a provided in the loading-side pedestal 25, and the air ejection port 27a is made denser than the loading-side pedestal 25. Further, at the processing station 27, the air ejection port 27a and the suction port 27b are densely arranged together. Thereby, the processing pedestal 27 can adjust the amount of floating of the substrate with higher precision than the other pedestals, and the amount of floating of the substrate is controlled to, for example, 100 μm or less, preferably 50 μm or less. The processing pedestal 27 is provided with a detecting portion MS that can detect the distance between the pedestal surface 27c and the substrate S.

The substrate carry-out area 22 has a carry-out side pedestal 28 and a lift mechanism 29 at a portion where the substrate S on which the photoresist is applied is carried out to the outside of the apparatus. The carry-out pedestal 28 is provided on the +X direction side of the process pedestal 27, and is composed of almost the same material and size as the carry-in pedestal 25 provided in the substrate carry-in area 20. Similarly to the carry-in side pedestal 25, the carry-out side pedestal 28 is provided with an air ejection port 28a and a lift pin exit hole 28b. The elevating mechanism 29 is provided on the surface side of the substrate carrying-out position of the carry-out side pedestal 28, and is supported by the frame portion 24, for example. The elevating member 29a and the elevating pin 29b of the elevating mechanism 29 have the same configuration as the respective portions of the lifting mechanism 26 provided in the substrate loading area 20. When the substrate S on the carry-out pedestal 28 is carried out to the external device, the lift mechanism 29 can lift the substrate S by the lift pin 29b for the purpose of receiving and receiving the substrate S.

As shown in FIG. 4, the conveyance mechanism 23 is provided with the 1st conveyance mechanism 60 and the 2nd conveyance mechanism 61. Moreover, in FIG. 3, the state in which the 1st conveyance mechanism 60 hold|maintains the board|substrate S is shown, and the 2nd conveyance mechanism 61 arrange|positioned below the 1st conveyance mechanism 60 is ab

The first transport mechanism 60 includes a transporter (holding unit) 60a, a vacuum pad (adsorption unit) 60b, a rail 60c, and a moving mechanism (advance and retract mechanism) that can move the transporter 60a on a surface parallel to the transport surface of the substrate S. 63. Further, the second transport mechanism 61 includes a transporter (holding portion) 61a, a vacuum pad (adsorption portion) 61b, a rail 61c, and a lifting mechanism (advance and retract mechanism) 62 that can move the transporter 61 up and down (up and down). The rails 60c and 61c extend across the pedestals on the side of the loading side pedestal 25, the processing pedestal 27, and the carry-out side pedestal 28.

The conveyors 60a and 61a have a configuration in which, for example, a linear motor is provided, and the linear motors are driven to move the conveyors 60a and 61a on the rails 60c and 61c to move along the pedestals. In other words, the conveyors 60a and 61a have a function of holding the holding portion of the substrate S and a function as a driving unit for driving the holding portion. The conveyors 60a and 61a are overlapped with the specific portions 60d and 61d in the -Y direction end portion of the substrate S in plan view. The portions 60d and 61d superimposed on the substrate S are disposed at positions lower than the height position of the inner surface of the substrate when the substrate S is floated.

As shown in FIG. 4, the second transfer mechanism 61 is disposed in the lower stage of the stepped step portion 24a of the frame portion 24 as compared with the first transfer mechanism 60. Further, in a plan view, the second conveying mechanism 61 is disposed on the pedestal side with respect to the first conveying mechanism 60.

As shown in FIG. 4, the second transport mechanism 61 raises the transporter 61a by the elevating mechanism 62, and can operate the substrate (can advance and retreat). On the other hand, in the first transport mechanism 60, the transport mechanism 63 horizontally moves the transporter 60a on a surface parallel to the transport surface of the substrate S, and the substrate S can be operated (can advance and retreat). The conveyor 60a of the first conveying mechanism 60 and the conveyor 61a of the second conveying mechanism 61 are independently movable.

Further, for example, when the first transport mechanism 60 holds the substrate S, the transporter 61a of the second transport mechanism 61 that does not hold the substrate S waits downward by the elevating mechanism 62, and avoids the first transport mechanism 60 (transport) The transport path of the machine 60a). Further, when the second transport mechanism 61 holds the substrate S, the transporter 60a of the first transport mechanism 60 that does not hold the substrate S is not held. The moving mechanism 63 moves to the -Y direction to avoid the transport path of the second transport mechanism 61 (the transporter 61a).

As shown in FIG. 3, in the vacuum pad 60b, a part 60d which is superposed on the substrate S in the conveyor 60a is arranged in plural in the conveying direction of the substrate S (three in the present embodiment). The vacuum pad 60b has an adsorption surface of the vacuum adsorption substrate S, and is disposed such that the adsorption surface faces upward. The vacuum pad 60b can hold the substrate S by adsorbing the inner surface end portion of the substrate S by the adsorption surface. The vacuum pad 60b is preferably held within 250 mm from the end on the front side in the conveying direction of the substrate S, and more preferably 80 mm or less. Specifically, in the present embodiment, the conveyor 60a holds the substrate S such that the distance W from the end portion in the conveyance direction of the substrate S to the vacuum pad 60b is within 80 mm. Thereby, the substrate S is uniformly held by the conveyor 60a, and the end portion of the substrate is prevented from hanging down, and the substrate S can be transported while being uniformly floated. That is, the film which is dried and solidified by the photoresist applied on the substrate S is prevented from being uneven.

Further, the structure of the conveyor 61a of the second conveying mechanism 61 is the same as that of the above-described conveyor 60a, not shown in FIG. In other words, the vacuum pad 61b of the conveyor 61a is disposed in three in a direction in which the substrate S is superimposed on the substrate S.

Here, the configuration of important parts of the conveyors 60a and 61 will be described. Further, since the conveyors 60a and 61a have the same configuration as described above, the conveyor 60a of the present invention is taken as an example, and the configuration thereof will be described with reference to Fig. 5 . Further, Fig. 5(a) shows the planar configuration of the important portion of the conveyor 60a, and Fig. 5(b) shows the cross-sectional configuration of the important portion of the conveyor 60a.

As shown in Fig. 5 (a), the vacuum pad 60b provided in the conveyor 60a has a contact portion with the substrate S which has a substantially oblong shape in plan view. Next, a vent hole 65 connected to a vacuum pump or the like (not shown) is provided inside the vacuum pad 60b. The vacuum pad 60b can vacuum-adsorb the substrate S by venting the sealed space generated between the vacuum pad 60b and the substrate S through the vent hole 65.

In addition, as shown in FIG. 5(b), a stopper member (position restricting member) 66 that restricts the position of the substrate S during transport is provided on the side of the vacuum pad 60b provided on the conveyor 60a. The stopper member 66 is provided with a side surface S1 facing the substrate S and a convex portion 66a facing the lower surface side of the substrate S. The convex portion 66a functions as a stopper that restricts the downward deflection of the substrate. As shown in FIG. 5( a ), the convex portion 66 a is in a state of surrounding the outer peripheral portion of the vacuum pad 60 b in a frame shape. The upper surface of the convex portion 66a is preferably set in the range of -30 to +30 μm on the upper surface of the loading-side pedestal 25, and more preferably in the vicinity of -20 μm. Further, it is preferable that the position of the convex portion 66a and the vacuum pad 60b is set such that the vacuum pad 60b is set to a level of about 0 to 1 mm.

Further, the convex portion 66a may be disposed between the adjacent vacuum pads 60b, and the four sides of the vacuum pad 60b may be surrounded by the convex portions 66a.

With respect to the vacuum pad 60b of this embodiment, the substrate S can be displaced. In a specific embodiment, the vacuum pad 60b has an expansion and contraction portion 67 composed of a bellows (expansion) structure. Thereby, for example, when the end portion of the substrate S is deflected and the height of the substrate S fluctuates, the vacuum pad 60b follows the movement of the substrate S, and the adsorption of the substrate S can be surely maintained. Further, when the vacuum pad 60b changes the amount of floating of the substrate S on the pedestal, the substrate S can be satisfactorily adsorbed by the displacement of the elasticized portion 67.

(coating section)

Next, the configuration of the coating unit 3 will be described.

The coating unit 3 is a department in which a photoresist is applied onto the substrate S, and has a gate frame 31 and a nozzle 32.

The gantry frame 31 has a pillar member 31a and a bridge member 31b, and the processing pedestal 27 is disposed to extend in the Y direction. The pillar members 31a are provided one by one on the Y-direction side of the processing pedestal 27, and each pillar member 31a is supported on both side surfaces of the frame portion 24 on the Y-direction side. The height positions of the upper end portions of the respective strut members 31a are arranged in a neat manner. The bridge member 31b is bridged between the upper end portions of the respective strut members 31a, and can be moved up and down.

The door frame 31 is coupled to the moving mechanism 31c to be movable in the X direction. The gate frame 31 can be moved between the management unit 4 by the moving mechanism 31c. That is, the nozzle 32 provided in the gate frame 31 is movable between the management unit 4. Further, the gate frame 31 can be moved in the Z direction by a moving mechanism (not shown).

The nozzle 32 is formed in a long shape of a long side in one direction, and is provided on the surface on the -Z direction side of the bridge member 31b of the portal frame 31. In the tip end of the nozzle 32 in the -Z direction, a slit-shaped opening (slit opening) 32a is provided along the longitudinal direction of the nozzle 32, and a photoresist is discharged from the opening 32a. The nozzle 32 is arranged such that the longitudinal direction of the opening 32a is parallel to the Y direction, and the opening 32a is opposed to the processing pedestal 27. The dimension of the opening 32a in the longitudinal direction is larger than the dimension of the substrate S to be transported in the Y direction. Small, no photoresist is applied to the peripheral region of the substrate S. A flow path (not shown) through which the photoresist flows in the opening 32a is provided inside the nozzle 32, and a photoresist supply source (not shown) is connected to the flow path. The photoresist recording source has, for example, a pump (not shown), and the photoresist is pressed out of the opening 32a by the pump to discharge the photoresist from the opening 32a. A movement mechanism (not shown) is provided in the pillar member 31a, and the nozzle 32 held by the bridge member 31b can be moved in the Z direction by the movement mechanism. The nozzle 32 is provided with a moving mechanism (not shown), and the moving mechanism allows the nozzle 32 to move in the Z direction to the bridging member 31b. The opening 32a of the measuring nozzle 32 is attached to the lower surface of the bridge member 31b of the portal frame 31, that is, the distance between the tip end of the nozzle 32 and the opposite direction between the opposing faces of the nozzle tip in the Z direction. Detector 33.

(Management)

Hereinafter, the configuration of the management unit 4 will be described.

The management unit 4 manages the portion of the nozzle 32 so that the amount of discharge of the photoresist (liquid) discharged onto the substrate S is constant, and the application portion is provided on the -X direction side of the substrate transfer unit 2 ( The upstream side of the substrate transport direction). The management unit 4 includes a preliminary discharge mechanism 41, a soaking tank 42, a nozzle cleaning device 43, an accommodating portion 44 for accommodating these, and a holding member 45 for holding the accommodating portion. The holding member 45 is connected to the moving mechanism 45a. The accommodating portion 44 is movable in the X direction by the moving mechanism 45a.

The preliminary discharge mechanism 41, the immersion tank 42, and the nozzle cleaning device 43 are arranged in this order in the -X direction side. These pre-discharge mechanisms 41, dip The size of the bubble groove 42 and the nozzle cleaning device 43 in the Y direction is smaller than the distance between the pillar members 31a of the gate frame 31, and the gate frame 31 can be accessed and operated across the respective portions.

The preliminary discharge mechanism 41 is a portion that prepares to discharge the photoresist. The preliminary discharge mechanism 41 is disposed closest to the nozzle 32. The immersion tank 42 is a liquid tank in which a solvent such as a diluent or a coating liquid is stored therein. The nozzle cleaning device 43 is a device that wets the vicinity of the opening 32a of the cleaning nozzle 32, and has a cleaning mechanism (not shown) that moves in the Y direction, and a moving mechanism (not shown) that moves the cleaning mechanism. This moving mechanism is disposed closer to the -X direction side than the cleaning mechanism. Since the nozzle cleaning device 43 is provided with a moving mechanism, it has a larger size in the X direction than the preliminary discharge mechanism 41 and the immersion tank 42. Further, the arrangement of the preliminary discharge mechanism 41, the immersion tank 42, and the nozzle cleaning device 43 is not limited to the configuration of the present embodiment, and may be any other arrangement.

Fig. 6 is a view showing the configuration of the spray cleaning device 43. Fig. 6(a) is a front view showing the spray cleaning device, and Fig. 6(b) is a plan view showing the nozzle cleaning device 43.

As shown in Fig. 6 (a) and Fig. 6 (b), the nozzle cleaning device 43 has a base 43a, a pad supporting member 43b, a pad 43c, an air knife discharge port 43d, a suction hole 43e, a cleaning liquid discharge hole 43g, and a gas. The blade discharge port 43h, the support member 43i, and the nozzle cleaning unit drive mechanism AC.

The pad supporting member 43b is provided on the upper surface of the base 43a, and the center portion of the base 43a in the X direction is disposed in pairs on the +X direction side and the -X direction side, respectively. The pair of pad supporting members 43b have the support of the support pad 43c Face 43s.

The support surface 43s is formed along the shape of the tip end of the nozzle 32. For example, in the figure, among the pad supporting members 43b, a portion where the height of the upper surface of the base 43a is gradually lowered is formed by the end portion side of the base 43a in the ±X direction toward the center portion in the X direction, and the portion where the height is gradually lowered becomes the supporting surface 43s. .

The pad 43c is a member that abuts against the nozzle tip end 32c and its peripheral region 32d, and is made of, for example, a resin material or the like. The pads 43c are arranged in a line in the Y direction, for example, on each of the support faces 43s. The upper surface 43f of the pad 43c has a shape corresponding to the nozzle tip end 32c and its peripheral region 32d, and is abutted without a gap when the upper surface 43f of the pad 43c abuts against the nozzle tip end 32c and the peripheral region 32d. This pad 43 is disposed at a position close to the air knife discharge port 43h in the X direction.

The air knife discharge port 43d is disposed at the end of the support surface 43s, and a pair is provided between the suction holes 43e. The air knife discharge port 43d is provided so as to face the peripheral region 32d so as to eject an air knife to the peripheral region 32d of the nozzle tip end 32c.

The suction hole 43e is a rectangular hole provided between the two pad supporting members 43b. The suction hole 43e is provided so as to penetrate the central region of the base 43a in the X direction, and is connected, for example, to a suction mechanism such as the pump 43p. The suction hole 43e has a longitudinal direction in the Y direction and overlaps with a portion of the pad 43c in plan view.

The cleaning liquid discharge hole 43g is a hole for discharging the cleaning liquid of the cleaning nozzle 32, and is formed in a slit shape along the X direction. The cleaning liquid discharge hole 43g is a pad corresponding to the end portion on the +Y direction side among the support faces 43s of the pad support member 43b. The end portions of the 43c and +Y directions are provided as the second pad 43c, and are provided on the +Y direction side of the pad 43c provided in the respective pad supporting members 43b. Each of the cleaning liquid discharge holes 43 is connected to a cleaning liquid supply source (not shown).

Similarly to the air knife discharge port 43d, the air knife discharge port 43h is a portion that ejects the air knife toward the nozzle 32, and is provided in a slit shape in the Y direction on the support surface 43s of the pad support member 43b. The air knife discharge port 43h is disposed on the side of the pad 43c in the sliding direction (Y direction) of the pad 43c in each of the support faces 43s.

The nozzle cleaning device 43 is not limited to the above configuration. For example, it may be a configuration in which only a pad having a shape along the tip end 32c of the nozzle is provided. Further, the liquid material to be attached to the tip end 32c of the nozzle may be removed, and the configuration is not limited to the above-described configuration, and may be another configuration.

The support member 43i is provided in the following manner in the drawing supporting the base 43a. The nozzle cleaning unit drive mechanism AC is a drive unit that is connected to the support member 43i to move the support member 43i in the Y direction. The nozzle cleaning mechanism AC moves in the Y direction, and the base 43a is moved in the Y direction by the support member 43i. The nozzle cleaning device 43 is larger in size in the X direction than the preliminary discharge mechanism 41 and the immersion tank 42 because the nozzle cleaning unit drive mechanism AC is provided. Of course, the arrangement of the preliminary discharge mechanism 41, the immersion tank 42, and the nozzle cleaning device 43 is not limited to the configuration of the present embodiment, and may be any other configuration.

FIG. 7 is a perspective view showing a configuration of a part of the nozzle 32 and the management unit 4.

As shown in FIG. 7, the management unit 4 is provided with a first waiting unit 48 and a Two waiting parts 49. The first waiting portion 48 is a portion located at the -Y side end portion of the accommodating portion 44. The second waiting portion 49 is a portion located at the +Y side end portion of the accommodating portion 44. The first waiting portion 48 and the second waiting portion 49 are provided outside the moving path of the nozzle cleaning device 43, respectively. The first waiting portion 48 is a position at which the base 43a of the nozzle cleaning device 43 waits before the washing operation. The second waiting portion 49 is a position at which the substrate 43a waits after the cleaning operation. A cleaning device 50 is provided at the first waiting position 48. The cleaning device 50 cleans the opening 32a of the nozzle 32. The cleaning device 50 is disposed at a position on the -Y side of the base 43a of the nozzle cleaning device 43.

8 and 9 are perspective views showing the configuration of the cleaning device 50. FIG. 10 is a side view showing the configuration of the cleaning device 50.

As shown in FIGS. 8 to 10 , the cleaning device 50 includes a cleaning member 51 , a container 52 , and a cleaning member driving unit 53 .

The cleaning member 51 is inserted into the opening 32a of the nozzle 32 and used. The cleaning member 51 is formed in a film shape. The cleaning member 51 is formed by coating a surface of a metal thin plate with a resin. Further, as the material of the thin plate of the cleaning member 51, for example, SUS, a resin, or a rubber may be used in addition to the above metal. The dimension of the cleaning member 51 in the longitudinal direction is, for example, about 40 mm, and the dimension of the cleaning member 51 in the short-side direction is, for example, about 10 mm.

As shown in FIG. 10, the cleaning member 51 is formed such that the thickness of the end portion on the -Z side toward the +Z side is gradually reduced in thickness (the dimension in the X direction). Moreover, the thickness t1 of the -Z side end portion of the cleaning member 51 is smaller than the size of the cut portion 32s and the opening portion 32a in the X direction. Moreover, the cleaning member 51 is both The uniform thickness (the thickness t1 and the thickness t2 may be the same) may be configured such that the end portion on the -Z side faces the end portion on the +Z side in a stepwise manner (for example, thinned).

The container 52 has a recess 52a and a shaft portion 52b. The recess 52a is formed on the surface of the container 52 on the +Z axis. The recessed portion 52a is formed to have a larger size than the outer shape of the cleaning member 51, and can accommodate the cleaning member 51. The shaft portion 52b is provided inside the recess 52a and rotatably supports the cleaning member 51. By rotating the cleaning member 51 in the θ X direction around the shaft portion 52b from the state shown in Fig. 8, the cleaning member 51 is housed in the concave portion 52a as shown in Fig. 9 .

In addition, FIG. 8 shows a state in which the longitudinal direction of the cleaning member 51 is arranged in parallel with the Z direction. In this state, the length of the cleaning member 51 exposed by the container 52 is the longest. In addition, in order to keep the longitudinal direction of the cleaning member 51 in a state parallel to the Z direction, a stopper mechanism or the like (not shown) may be provided in the container 52, and the posture of the cleaning member 51 may be fixed. Further, the shaft portion 52b may be configured to be rotatable by a motor mechanism or the like (not shown). In this case, the shaft portion 52b is rotated by the control of the control unit CONT, whereby the cleaning member 51 can be moved in and out.

The cleaning member driving unit 53 moves the cleaning member 51 with each container 52. The container 52 is attached to the guiding member 53a. The guiding member 53a is a rod-shaped member that extends in parallel in the Y direction. The guide member 53a has one end disposed in the first waiting portion 48 and the other end disposed in the second waiting portion 49. The cleaning member driving unit 53 moves the cleaning member 51 between the first waiting portion 48 and the second waiting portion 49 along the guiding member 53a. Driven as a cleaning member For the portion 53, for example, an actuator such as a cylinder mechanism or a motor mechanism or the like can be used.

Next, the operation of the coating apparatus 1 configured as described above will be described.

11 to 13 are plan views showing the operation of the coating device 1. The operation of applying a photoresist to the substrate S will be described with reference to the respective drawings. In this operation, the substrate S is carried into the substrate loading region 20, the substrate S is floated, and the photoresist is applied to the coating processing region 21, and the substrate S to which the photoresist is applied is carried out from the substrate carrying-out region 22. 11 to 13 show the outline of only the gate frame 31 and the management unit 4 in a broken line, and it is easy to determine the configuration of the nozzle 32 and the processing pedestal 27. The detailed operation of each part will be described below.

The coating device 1 is placed in standby before the substrate is carried into the substrate loading area 20. Specifically, the conveyor 60a of the first conveying mechanism 60 is disposed on the Y-direction side of the substrate loading position of the loading-side pedestal 25, and the height position of the vacuum pad 60b is matched with the floating height position of the substrate, and the loading-side pedestal 25 is simultaneously provided. The air ejection port 25a, the air ejection port 27a of the processing pedestal 27, the air suction port 27b, and the air ejection port 28a of the carry-out pedestal 28 respectively eject or suck air so as to float the substrate to the surface of each pedestal. The state of supply of air.

In this state. For example, after the substrate S is transported from the outside to the substrate loading position by a transfer arm or the like (not shown), the elevating member 26a is moved in the +Z direction so that the elevating pin 26b protrudes from the pedestal surface 25c by the elevating pin exit hole 25b. Next, the substrate S is lifted by the lift pin 26b to perform the reception of the substrate S. Further, the positioning member is first projected to the pedestal surface 25c by the long hole of the aligning device 25d.

After the substrate S is collected, the elevating member 26a is lowered to accommodate the elevating pin 26b in the elevating pin exit hole 25b. At this time, since the pedestal surface 25c is formed with a layer of air, the substrate S is held by the air on the pedestal surface 25c. When the substrate S reaches the surface of the air layer, the alignment of the substrate S by the alignment member of the alignment device 25d causes the movement of the first transport mechanism 60 disposed on the -Y direction side of the substrate loading position. The mechanism 63 allows the vacuum gasket 60b of the conveyor 60a to be vacuum-adsorbed to the end portion of the substrate S on the -Y direction side (Fig. 3). After the end portion in the -Y direction of the substrate S is sucked by the vacuum pad 60b, the conveyor 60a is moved along the rail 60c. Since the substrate S is in a floating state, the substrate is smoothly moved along the rail 60c even when the driving force of the conveyor 23a is made relatively small.

When the leading end of the transport direction of the substrate S approaches the processing pedestal 27, the control unit CONT detects the distance (floating amount) between the surface on the -Z side of the base S and the pedestal surface 27c using the detecting unit MS. Further, after the tip end of the substrate S in the transport direction reaches the position of the opening 32a of the nozzle 32, as shown in FIG. 11, the photoresist is discharged from the opening 32a of the nozzle 32 toward the substrate S. The discharge of the photoresist is performed while the substrate S is transported by the conveyor 60a while fixing the position of the nozzle 32.

The control unit CONT may adjust the amount of floating of the substrate S based on the detection result of the detecting unit MS. In this case, for example, the control unit CONT can adjust the amount of floating of the substrate S by adjusting the amount of air ejection from the air ejection port 27a or the amount of suction of the air suction port 27b.

Control unit CONT, for the substrate transported by the first conveyor 60 In the middle of the photoresist coating, the other substrate S' is transferred from the outside to the substrate loading position by, for example, a transfer arm (not shown). After receiving the substrate S', the control unit CONT lowers the elevating member 26a, and the elevating pin 26b is housed in the elevating pin cutout hole 25b, so that the substrate S' is held by the air to the pedestal surface 25c.

When the substrate S' reaches the surface of the air layer, the control portion CONT performs alignment of the substrate S by the alignment member of the alignment device 25d. Then, the control unit CONT raises the conveyor 61a by the elevating mechanism 62 of the second transport mechanism 61 disposed on the substrate loading position-Z direction side, and vacuum-adsorbs the vacuum pad 61b to the −Y direction side end of the substrate S. unit. The control unit CONT also detects the amount of floating as appropriate for the substrate S' as well as the substrate S.

As described above, in the present embodiment, since the conveyor 60a of the first conveying mechanism 60 and the conveyor 61a of the second conveying mechanism 61 can move independently, the photoresist coating of the substrate S conveyed by the first conveying mechanism 60 is applied. Before the end of the process, the other substrate S' can be transferred to the pedestal by the second transfer mechanism 61. Therefore, the photoresist can be satisfactorily applied to the sequentially transferred substrates S and S' in a separately held state, and high productivity can be obtained by the photoresist coating process.

On the other hand, with the movement of the substrate S, the photoresist film R is applied onto the substrate S as shown in FIG. The photoresist film R is formed on a specific region of the substrate S by the substrate S passing under the opening 32a of the photoresist. Further, the control unit CONT controls the conveyor 61a of the second transport mechanism 61 to move the substrate S' below the opening 32a.

The substrate S on which the photoresist film R is formed is transported to the carry-out side pedestal 28 by the transporter 60a. In the carry-out side pedestal 28, the substrate is transported to the substrate carry-out position shown in FIG. 13 while the pedestal 28c is floating. Further, the other substrate S' conveyed by the conveyor 61a passes under the opening 32a, and the resist film R is formed in a specific region of the other substrate S'.

After the substrate S reaches the substrate carrying-out position, the control unit CONT releases the suction of the vacuum pad 60b, and moves the elevating member 29a of the lifting mechanism 29 in the +Z direction. By this action, the lift pin 29b protrudes from the lift pin exit hole 28b toward the inner surface of the substrate S, and the substrate S is lifted by the lift pin 29b. In this state, the control unit CONT, for example, is transported to the outside of the transport side of the carry-out pedestal 28 on the +X direction side, and is received by the transport side pedestal 28 to receive the substrate S. After the substrate S is delivered to the transfer arm, the control unit CONT controls the first transport mechanism 60 to retract the transporter 60a (vacuum pad 60b) from below the substrate S, and avoids the transport of the second transport mechanism 61 that transports the other substrate S'. Path (moving path).

In this state, the control unit CONT returns the first transport mechanism 60 to the substrate loading position of the loading-side pedestal 25, and waits for the next substrate to be transported. At this time, as shown in FIG. 13, the substrate S' transported by the second transport mechanism 61 is subjected to photoresist coating. However, the first transport mechanism 60 avoids the transport path of the second transport mechanism 61 as described above, so The second transfer mechanism 61 is contacted. Therefore, the first conveying mechanism 60 can return to the substrate loading position of the loading-side pedestal 25 without hindering the conveyance of the other substrate S'.

Further, after the substrate S' transported by the second transport mechanism 61 reaches the substrate carry-out position, the control unit CONT is similar to the case of the substrate S. The external transfer arm receives the substrate S'. After the substrate S' is carried out by the external transfer arm, the control unit CONT returns the second transfer mechanism 61 to the substrate loading position of the loading-side pedestal 25, and waits for the next substrate to be transported.

As described above, the substrate of the coating unit 3 is transported at intervals in time. Therefore, the control unit CONT performs a management operation of maintaining or improving the discharge state of the nozzle 32 while the substrate is not being conveyed to the application unit 3. The management unit 4 is used for this management operation.

As shown in FIG. 14, the control unit CONT moves the door frame 31 in the -X direction to the position of the management unit 4 by the moving mechanism 31c. After moving the door frame 31 to the position of the management unit 4, first, the position of the door frame 31 is adjusted so that the tip end access of the nozzle 32 is operated to the nozzle cleaning device 43, and the nozzle tip is cleaned by the nozzle cleaning device 43. 32c.

In accordance with the cleaning operation of the nozzle cleaning device 43, the cleaning liquid is ejected toward the peripheral region 32d of the opening 32a of the tip end of the nozzle 32, and the nozzle cleaning device 43 is simultaneously scanned in the +Y direction as needed. At this time, as shown in FIG. 15, the control unit CONT brings the upper surface 43f of the pad 43c into contact with the nozzle tip 32c and the peripheral region 32d. Since the upper surface 43f corresponds to the shape of the nozzle tip end 32c and the peripheral region 32d, the upper surface 43f and the nozzle 32 abut against each other without a gap. Moreover, as shown in FIG. 15, the control part CONT sucks the surrounding atmosphere in the suction hole 43e.

In this state, as shown in Fig. 16, the cleaning liquid discharge hole 43g of the nozzle cleaning device 43 discharges the cleaning liquid while the air knife discharge port 43d and the air knife discharge port 43h eject the air knife while the nozzle cleaning device 43 is being used. scanning. By this scanning, the pad 43c slides together with the cleaning liquid at the nozzle tip in the nozzle 32. The 32c and the peripheral area 32d are washed, and the cleaning liquid is swept out while drying the nozzle tip 32c and the peripheral region 32d.

Further, the air knife ejected from the air knife discharge port 43d and the air knife discharge port 43h is blown to the peripheral region 32d of the nozzle 32, and the peripheral region 32d is dried. Since the air knife discharge port 43d is provided at the rearmost end in the sliding direction, it is dried after sliding according to the pad 43c. Further, the washing liquid and the removed deposit are sucked into the suction hole 43e by the discharge of the air and the suction of the suction hole 43e. In this manner, the nozzle tip end 32c is cleaned.

After the nozzle tip end 32c is cleaned, the control unit CONT cleans the opening 32a of the cleaned nozzle 32 by using the cleaning device 50. As shown in Fig. 17, after the nozzle tip 32c is cleaned, there is a possibility that the deposit 99 remains inside the opening 32a. Since the deposit 99 affects the discharge characteristics of the liquid, the deposit 99 is removed by the cleaning operation.

Until the cleaning operation is performed, the control unit CONT causes the cleaning device 50 to wait in the first waiting unit 48. Since the first waiting portion 48 is provided at a position away from the movement path of the nozzle cleaning device 43, the state in which the cleaning device 50 waits in the first waiting portion 48 does not interfere with the cleaning operation of the nozzle cleaning device 43.

When the cleaning operation is performed, the control unit CONT moves the cleaning member 51 to the -Z side of the opening 32a of the nozzle 32. In the present embodiment, first, the control unit CONT is disposed on the -Z side of the -Y side end portion of the opening 32a. In this state, the control unit CONT causes the cleaning member 51 to protrude from the concave portion 52a of the container 52 as shown in FIG. By this operation, the +Z side end portion of the cleaning member 51 is inserted into the opening portion 32a.

After the +Z side end portion of the cleaning member 51 is inserted into the opening portion 32a, the control portion CONT moves the cleaning member 51 to the -Y side of each container 52 by the cleaning member driving portion 53, and the cleaning member 51 reaches the opening portion. The -Y side of 32a. After the cleaning member 51 reaches the -Y side end portion of the opening portion 32a, the control portion CONT moves the cleaning member 51 to the +Y side of each of the containers 52 by the cleaning member driving portion 53.

Fig. 18 shows a state in which the nozzle 32 is cut in a plane parallel to the XZ plane. As shown in FIG. 18, the thickness of the tip end portion on the +Z side of the cleaning member 51 (t2: see FIG. 10) is smaller than the dimension of the opening portion 32a in the X direction. Therefore, the cleaning member 51 is along the opening portion 32a to + Y side moves.

When the cleaning member 51 moves the opening 32a to the +Y side, the deposit 99 remaining in the opening 32a is peeled off by the cleaning member 51. Therefore, the attached matter 99 is removed by the opening portion 32a. The control unit CONT moves the cleaning member 51 to the +Y side end portion of the opening 32a, and then the cleaning member 51 is housed in the concave portion 52a of the container 52. Thereafter, the control unit CONT moves the cleaning member 51 to the second waiting unit 49, and the cleaning unit 51 waits in the second waiting unit 49.

After the cleaning operation is performed on the opening 32a, the nozzle 32 is operated on the preliminary discharge mechanism 41. In the preliminary discharge mechanism 41, the distance between the opening 32a and the preliminary discharge surface is measured, and the opening 32a of the tip end of the nozzle 32 is moved to a specific position in the Z direction, and the nozzle 32 is moved in the -X direction while the opening 32a is opened. Prepare to squirt the photoresist R.

After the preliminary discharge operation is performed, the portal frame 31 is returned to the original position. When the next substrate S is transported, the nozzle 32 is made as shown in FIG. Move to a specific position in the Z direction. When the door frame 31 is returned to the original position, the control unit CONT returns the cleaning member 51 and the container 52 to the first waiting portion 48. In this manner, the application operation of the photoresist film R and the preliminary discharge operation are performed on the substrate, and a favorable photoresist film R is formed on the substrate S.

Further, if necessary, for example, each time the management unit 4 is accessed for a specific number of times, the nozzle 32 is accessed in the dip tank 42. In the immersion tank 42, the nozzle 32 is prevented from drying by exposing the opening portion 32a of the nozzle 32 to a vapor atmosphere of a solvent (thinner) stored in the immersion tank 42.

As described above, according to the present embodiment, the cleaning member 51 that can be inserted into the opening 32a can be moved in the longitudinal direction of the opening 32a to clean the opening 32a. Thereby, the opening 32a can be automatically cleaned without manual work, so that the cleaning operation of the nozzle 32 can be performed efficiently.

The technical scope of the present invention is not limited to the above-described embodiments, and can be appropriately modified without departing from the scope of the present invention.

For example, in the above-described embodiment, the configuration in which the first transport mechanism 60 and the second transport mechanism 61 are provided with one transporter 60a and 61a has been described. However, the present invention is not limited thereto.

As shown in FIG. 20, it is possible to provide the first transport mechanism 60 with three transporters 60a on the rail 60c. In addition, in FIG. 20, although the illustration is abbreviate|omitted, it is good also as the 2nd conveyance mechanism 61. Further, in the present invention, each of the conveyors 60a and 61a has been described. Although three configurations are described, the present invention is not limited thereto, and two or more of the conveyors 60a and 61a may be applied.

The configuration shown in FIG. 20 is sequentially described as the first conveyor 161, the second conveyor 162, and the third conveyor 163 from the upstream side in the conveyance direction of the substrate S. In addition, in the case of this general term, the conveyors 161, 162, and 163 are described.

These conveyors 161, 162, and 163 are moved to the rail 60c in a state in which they are synchronized in the conveyance of the substrate S. Further, each of the conveyors 161, 162, and 163 can independently move on the rail 60c when the substrate S is not transported. According to this configuration, the holding of the substrate S of each of the transporters 161, 162, and 163 can be set arbitrarily in accordance with the length of the substrate S to be transported.

The vacuum pad 60b of the conveyor 161 is preferably held within 250 mm from the end on the front side in the conveyance direction of the substrate S, and more preferably 80 mm or less. Specifically, the conveyor 161 holds the substrate S such that the distance W1 from the end of the substrate S in the transport direction to the vacuum pad 60b is within 80 mm.

In addition, the vacuum pad 60b of the conveyance machine 163 is preferably held within 250 mm from the end on the front side in the conveyance direction of the substrate S, and more preferably 80 mm or less. Specifically, the conveyance machine 163 holds the substrate S such that the distance W2 from the end portion of the substrate S in the conveyance direction to the vacuum pad 60b is within 80 mm.

These substrates S are uniformly protected by the conveyors 161, 162, and 163. Holding, the end portion of the substrate is prevented from hanging down, and the large substrate S can be transported while being uniformly floated. That is, it is possible to prevent the film which is dried and solidified by the photoresist applied on the large substrate S from being uneven.

Further, in the above-described embodiment, the configuration in which the cleaning member 50 and the nozzle cleaning device 43 are separately provided has been described as an example, but the invention is not limited thereto. For example, as shown in FIG. 21, the cleaning device 50 may be provided in the nozzle cleaning device 43. In the configuration shown in Fig. 21, the cleaning device 50 is provided integrally with the nozzle cleaning device 43. Specifically, the container 20 of the cleaning device 50 is configured to be fixed to the base 43a of the nozzle cleaning device 43.

In this configuration, the cleaning device 50 moves integrally with the base 43a by moving the base 43a of the nozzle cleaning device 43 by using the nozzle cleaning unit drive mechanism AC. In other words, the nozzle cleaning unit drive mechanism AC serves as a drive unit for driving the cleaning device 50. Therefore, it is not necessary to separately provide a driving unit for moving each device, and it is possible to simplify the space drawing and the control system.

In addition, as shown in FIG. 21, the nozzle cleaning apparatus 43 is disposed on the +Y side, and the cleaning apparatus 50 is disposed on the -Y side. The cleaning method and the cleaning method are as follows, and the following aspects are exemplified. First, when a liquid or liquid solidified material is adhered to the opening 32a of the nozzle 32, the cleaning liquid is used to allow the cleaning liquid to permeate the opening 32a. Thereafter, the opening 32a is cleaned by the cleaning member 51, and finally the nozzle tip 32c is washed by the nozzle cleaning device 43 to perform final finishing.

In addition, in the configuration of FIG. 21, the nozzle cleaning device 43 is disposed on the +Y side, and the configuration in which the cleaning device 50 is disposed on the -Y side is described as a force. However, the present invention is not limited thereto, and the cleaning device 50 may be disposed on the +Y side, and the nozzle cleaning device 43 may be disposed on the -Y side. In this case, since the nozzle tip 32c is cleaned by the cleaning member 51 after the cleaning member 51 is cleaned, the nozzle tip 32c can be moved to the coating operation immediately after the nozzle tip 32c is in the normal state.

In the above-described embodiment, after the cleaning member 51 is inserted into the opening 32a, the cleaning member 51 is once moved to the -Y side, and the -Y side end portion of the opening 32a is once described as an example. Not limited to this. For example, after the cleaning member 51 is inserted into the opening 32a, the cleaning member 51 may be directly moved to the +Y side to reach the -Y side end portion of the opening 32a. In this case, the cleaning member 51 may be moved to the -Y direction immediately after reaching the +Y side end portion of the opening 32a, and the cleaning member 51 may be once waited at the +Y side end portion of the opening 32a.

Further, in addition to the configuration of the above-described embodiment, as shown in FIG. 22, a configuration of the elevating mechanism 54 for elevating and lowering the nozzle 32 by the cleaning member 51 may be provided. Moreover, Fig. 22 shows a state in which the nozzle 32 is cut in a plane parallel to the XZ plane. The lifting mechanism 54 has a lifting guide member 54a and a moving mechanism 54b. The lifting guide member 54a is disposed parallel to the Z direction. The elevation guide member 54a is movably provided integrally with the guide member 53a.

The moving mechanism 54b is fixed to the container 52. The moving mechanism 54b has an actuator (not shown) such as a motor mechanism. The moving mechanism 54b is provided in such a manner as to be movable in the extending direction of the elevation guiding member 54a by the actuator. Moving by the moving mechanism 54b, the container 52 and the cleaning structure The piece 51 moves up and down in the Z direction. As described above, since the cleaning member 51 moves up and down in the Z direction, the opening 32a can be cleaned without moving the nozzle 32, so that the operation can be performed efficiently.

Further, in addition to the configuration of the above-described embodiment, as shown in FIG. 23, the configuration of the cleaning mechanism 55 for cleaning the cleaning member 51 may be provided. The cleaning mechanism 55 includes a cleaning liquid supply unit 55a and a cleaning liquid discharge port 55b. The cleaning mechanism 55 can be disposed, for example, in the first waiting unit 48 or the second waiting unit 49.

The cleaning mechanism 55 discharges the cleaning liquid supplied from the cleaning liquid supply unit 55a to the cleaning member 51 from the cleaning liquid discharge port 55b. According to this configuration, the cleaning member 51 can be cleaned by the cleaning liquid, and the cleaning member 51 can be maintained in a quiet state. Moreover, the configuration of the cleaning and cleaning member 51 is not limited to the configuration in which the cleaning liquid is discharged, and it may be washed with an air knife or washed with a dipping method.

Further, in addition to the configuration of the above-described embodiment, as shown in FIG. 24, a configuration of the position adjusting mechanism 56 that adjusts the position of the cleaning member 51 to the opening 32a of the nozzle 32 may be provided. Further, Fig. 24 shows a state in which the nozzle 32 is cut in a plane parallel to the XZ plane. In Fig. 24, as an example of the position adjustment mechanism 56, the configuration of the installation imaging device 56a is displayed. The photographing device 56a photographs the end portion on the +Z side of the cleaning member 51 and the opening portion 32a of the nozzle 32.

According to the photographing result of the photographing device 56a, for example, it is sent to the control unit CONT. In the control unit CONT, the positional relationship between the end portion on the +Z side of the cleaning member 51 and the opening portion 32a is calculated, and if there is a positional deviation, the position is adjusted using the cleaning member driving unit 53. Further, the photographic cleaning member 51 is separately provided The imaging device and the imaging device of the imaging opening 32a may be employed. With such a configuration, the positioning of the opening 32a and the cleaning member 51 can be performed with high precision.

Further, in the above-described embodiment, the configuration in which the container 52 accommodating the cleaning member 51 is provided has been described as an example, but it is not limited thereto. For example, the configuration in which the container 52 is not provided may be employed. In this case, the cleaning member 51 is always exposed.

Further, in the above-described embodiment, the configuration in which the cleaning member 51 is exposed from the container 52 by rotating around the shaft portion 52b of the container 52 or stored therein has been described as an example, but not limited thereto. For example, the configuration in which the cleaning member 51 is moved in the Z direction in parallel and the container 52 is exposed and housed may be used.

Further, the constituent elements described above are not limited to the separately provided aspects, and may be appropriately combined and used as needed.

CONT‧‧‧Control Department

AC‧‧‧Nozzle Washing Department Drive Mechanism

S‧‧‧Substrate

4‧‧‧Management Department

43‧‧‧Nozzle cleaning device

43a‧‧‧ base

50‧‧‧ cleaning device

51‧‧‧ cleaning components

52‧‧‧ Container

52a‧‧‧ recess

52b‧‧‧Axis

53‧‧‧ Cleaning member drive unit

53a‧‧‧Guide members

54‧‧‧ Lifting mechanism

54a‧‧‧ Lifting guide member

54b‧‧‧Mobile agencies

55‧‧‧ Washing agency

55a‧‧‧Cleans Supply Department

55b‧‧‧washing liquid spit

56‧‧‧Location adjustment mechanism

56a‧‧‧Photographing device

Fig. 1 is a perspective view showing the configuration of a coating apparatus according to this embodiment.

Fig. 2 is a front elevational view showing the configuration of a coating apparatus relating to the present embodiment.

Fig. 3 is a plan view showing the configuration of a coating apparatus relating to the present embodiment.

Fig. 4 is a side view showing the configuration of a coating apparatus according to the present embodiment.

Fig. 5 is a view showing the configuration of a conveying mechanism relating to the coating apparatus of the present embodiment.

Fig. 6 is a view showing the configuration of a nozzle cleaning device relating to the coating device of the present embodiment.

Fig. 7 is a perspective view showing the configuration of a nozzle, a nozzle cleaning device, and a cleaning device according to the present embodiment.

Fig. 8 is a perspective view showing the configuration of a cleaning device according to the present embodiment.

Fig. 9 is a perspective view showing the configuration of a cleaning device according to the present embodiment.

Fig. 10 is a side view showing the configuration of a cleaning device according to the present embodiment.

Fig. 11 is a view showing the operation of the coating apparatus according to the present embodiment.

Fig. 12 is a view showing the action of the coating apparatus relating to the present embodiment.

Fig. 13 is a view showing the operation of the coating apparatus according to the present embodiment.

Fig. 14 is a view showing the operation of the coating apparatus according to the present embodiment.

Fig. 15 is a view showing the operation of the coating apparatus according to the present embodiment.

Fig. 16 is a view showing the action of the coating apparatus relating to the present embodiment.

Fig. 17 is a view showing the operation of the coating apparatus according to the present embodiment.

Fig. 18 is a view showing the operation of the coating apparatus according to the present embodiment.

Fig. 19 is a view showing the action of the coating apparatus relating to the present embodiment.

Fig. 20 is a view showing another configuration of the coating apparatus relating to the present invention.

Fig. 21 is a view showing another configuration of the cleaning device relating to the present invention.

Fig. 22 is a view showing another configuration of the cleaning device relating to the present invention.

Fig. 23 is a view showing another configuration of the cleaning device relating to the present invention.

Fig. 24 is a view showing another configuration of the cleaning device relating to the present invention.

32‧‧‧Nozzles

32a‧‧‧ openings

43a‧‧‧ base

48‧‧‧First Waiting Department

49‧‧‧ Second Waiting Department

50‧‧‧ cleaning device

51‧‧‧ cleaning components

52‧‧‧ Container

53‧‧‧ Cleaning member drive unit

53a‧‧‧Guide members

Claims (11)

A coating apparatus comprising: a coating portion having a slit opening for discharging a liquid to a substrate, wherein the substrate and the nozzle move relative to each other to move the substrate and the nozzle; One of the driving portions is formed as a cleaning member that can be inserted into the slit opening, and a cleaning member driving portion that moves the cleaning member in the longitudinal direction of the slit opening. The coating apparatus according to claim 1, further comprising a management unit that manages a state of the tip end portion of the nozzle, wherein the cleaning member is provided in the management unit. The coating device according to the second aspect of the invention, wherein the management unit includes a nozzle cleaning unit that washes the tip end portion of the nozzle, and the cleaning member is provided in the nozzle cleaning unit. The coating device according to claim 3, wherein the management unit includes a nozzle cleaning unit drive mechanism that drives the nozzle cleaning unit, and the nozzle cleaning unit drive unit also serves as the cleaning member drive unit. The coating apparatus according to any one of claims 1 to 4, further comprising: The accommodating portion for accommodating the cleaning member and the inlet and outlet mechanism for allowing the cleaning member to enter and exit the accommodating portion. The coating device according to claim 5, wherein the cleaning member is configured to be movable integrally with the housing portion. The coating device according to any one of claims 1 to 6, wherein the cleaning member is formed into a film shape. The coating apparatus of claim 7, wherein the cleaning member is formed to be thinner toward the front end. The coating apparatus according to any one of claims 1 to 8, further comprising an elevating mechanism that elevates and lowers the cleaning member to the nozzle. The coating apparatus according to any one of claims 1 to 9, further comprising a position adjusting mechanism that adjusts a position of the cleaning member to the slit opening. The coating device according to any one of claims 1 to 10, further comprising a cleaning mechanism for cleaning the cleaning member.