TWI745876B - Coating machine and soaking method capable of slowing down the solvent backflow into the coating head - Google Patents
Coating machine and soaking method capable of slowing down the solvent backflow into the coating head Download PDFInfo
- Publication number
- TWI745876B TWI745876B TW109106538A TW109106538A TWI745876B TW I745876 B TWI745876 B TW I745876B TW 109106538 A TW109106538 A TW 109106538A TW 109106538 A TW109106538 A TW 109106538A TW I745876 B TWI745876 B TW I745876B
- Authority
- TW
- Taiwan
- Prior art keywords
- coating
- solvent
- nozzle
- machine
- lip
- Prior art date
Links
Images
Abstract
本發明係提供一種可減緩溶劑回流至塗佈頭內之塗佈機及浸泡方法,其中該塗佈機之機台上設置有塗佈平台,並於機台上安裝有用以帶動塗佈頭位移之驅動裝置及清洗單元,便可藉由驅動裝置帶動塗佈頭朝塗佈平台上之被塗佈件方向移動,並由噴嘴來將塗料自唇口噴出在被塗佈件表面上形成一塗佈膜,當驅動裝置帶動塗佈頭移動至清洗單元之浸泡槽上方且對應於彈性體處,並使噴嘴之唇口向下抵壓於彈性體上一起浸泡在溶劑中,且該唇口與彈性體接觸的部位為位於溶劑的液面高度之下,不但可隔絕外部空氣防止噴嘴內之塗料固化所造成之阻塞,亦可減緩溶劑沿著唇口回流至噴嘴內,以減少噴嘴塗佈前通過塗料將多餘的溶劑全部擠出所造成大量材料及時間的浪費。 The present invention provides a coating machine and a soaking method that can slow down the backflow of solvent into the coating head, wherein the machine platform of the coating machine is provided with a coating platform, and is installed on the machine platform to drive the displacement of the coating head The driving device and cleaning unit can be driven by the driving device to move the coating head to the direction of the coated part on the coating platform, and the nozzle sprays the paint from the lip to form a coating on the surface of the coated part. For cloth film, when the driving device drives the coating head to move above the soaking tank of the cleaning unit and corresponds to the elastic body, the lip of the nozzle is pressed down on the elastic body and soaked in the solvent together, and the lip and The contact part of the elastomer is below the liquid level of the solvent, which can not only isolate the external air and prevent the blockage caused by the curing of the coating in the nozzle, but also slow down the backflow of the solvent into the nozzle along the lip, so as to reduce the number of nozzles before coating. Extruding all the excess solvent through the paint causes a lot of waste of materials and time.
Description
本發明係提供一種可減緩溶劑回流至塗佈頭內之塗佈機及浸泡方法,尤指可將塗佈頭之噴嘴抵壓於浸泡槽內之彈性體上,並一起浸泡在溶劑中後,便可減緩溶劑回流至噴嘴內,以減少噴嘴通過塗料將多餘溶劑擠出所造成材料及時間的浪費。 The present invention provides a coating machine and a soaking method that can slow down the backflow of solvent into the coating head, especially the nozzle of the coating head can be pressed against the elastomer in the soaking tank and immersed in the solvent together. It can slow down the solvent backflow into the nozzle, so as to reduce the waste of material and time caused by the nozzle squeezing out the excess solvent through the paint.
按,現今常見的狹縫式塗佈(Slot Die Coating或稱為Slit Nozzle Coating)屬於高精密且相對成本較低的塗佈技術,可用以控制膜厚均勻性和塗佈的寬度,不僅廣泛應用於電子構裝(如印刷電路板、晶片構裝等)、光學膜、太陽能電池或鋰電池的極板等基材的塗佈,也可應用於半導體、平面顯示器等產業所使用的基材上的光阻塗佈,其中又以平面顯示器產品應用及電子構裝所需的塗佈精度最高,也更具有高附加價值,使得相關塗佈設備廠商更加積極投入研究與開發,皆因為其具有更高的薄膜均勻度、材料利用率和大面積塗佈等優點。 According to, the common slot coating (Slot Die Coating or Slit Nozzle Coating) is a high-precision and relatively low-cost coating technology that can be used to control the uniformity of film thickness and coating width, and is not only widely used It can be applied to the coating of substrates such as electronic packaging (such as printed circuit boards, wafer packaging, etc.), optical films, solar cells or lithium battery plates, and can also be applied to substrates used in the semiconductor, flat-panel display industries, etc. The photoresist coating, in which flat-panel display product applications and electronic components require the highest coating precision, and also has high added value, which makes relevant coating equipment manufacturers more active in research and development, all because of its greater The advantages of high film uniformity, material utilization and large area coating.
而目前狹縫式塗佈機(Slit Coater)主要應用於半導體、平面顯示器等製程中之光阻劑塗佈、水膠塗佈、PCB材料塗佈、LED高分子材料塗佈、OLED材料塗佈、離型材料塗佈等,並 利用內部形成寬方向較長的狹縫之噴嘴相對於基材水平移動,便可藉由注射式泵浦將供料模組中之塗料從狹縫中噴出後,使基材表面上形成一薄膜,但是狹縫式塗佈設備長時間持續進行噴塗作業時,有時會在狹縫中、狹縫開口處之噴嘴模唇及其外側面等,附著有塗料的固化物或混入塗料中的異物,造成噴嘴產生塗佈的缺陷或阻塞,甚至是影響到塗佈的品質,因此,便有業者在機台上加裝了一噴嘴清洗裝置,並在每一片基材進行塗佈之前或例行性停機時,可移動噴嘴將模唇浸泡在清洗容器內之溶劑中進行清洗之動作,且可透過供應管路將溶劑循環流動至噴嘴處,使附著在噴嘴模唇或狹縫中之固化物溶解浮出,以提升清洗的效果。 At present, the slit coater (Slit Coater) is mainly used for photoresist coating, water glue coating, PCB material coating, LED polymer material coating, OLED material coating in semiconductor, flat panel display and other manufacturing processes. , Release material coating, etc., and Using the nozzle that forms a long slit in the width direction to move horizontally relative to the substrate, the paint in the feeding module can be ejected from the slit by an injection pump to form a thin film on the surface of the substrate , But when the slit-type coating equipment continues to spray for a long time, sometimes the cured material of the coating or foreign matter mixed into the coating may adhere to the slit, the nozzle die lip at the slit opening and the outer surface, etc. , Causing the nozzle to produce coating defects or blockages, and even affect the quality of coating. Therefore, some manufacturers install a nozzle cleaning device on the machine, and before or routinely coat each piece of substrate When it is stopped, the movable nozzle immerses the die lip in the solvent in the cleaning container for cleaning, and the solvent can be circulated to the nozzle through the supply pipe to make the solidified substance attached to the nozzle die lip or slit Dissolve and float to enhance the cleaning effect.
惟該噴嘴之模唇浸泡在清洗容器或浸泡槽內之溶劑中時,其雖可利用溶劑對模唇進行清洗之動作,但因溶劑的密度、比重相較於塗料來的小,會在狹縫中產生虹吸作用之毛細現象,導致溶劑沿著狹縫回流進入至噴嘴中,所以溶劑與塗料二種材料會互相交換,即塗料會掉下去、溶劑會吸上去作高、低密度的置換,若是浸泡的時間很長,則噴嘴內會囤積有大量溶劑,如此一來,噴嘴在噴塗作業之前就要重新注入大量塗料,才能將多餘的溶劑全部擠出來,並造成大量材料及時間的浪費,即為有待從事於此行業者所亟欲研究改善之方向所在。 However, when the die lip of the nozzle is immersed in the solvent in the cleaning container or soaking tank, it can use the solvent to clean the die lip, but because the density and specific gravity of the solvent are smaller than that of the paint, it will be narrow. The capillary phenomenon of siphon effect in the slit causes the solvent to flow back into the nozzle along the slit. Therefore, the two materials of the solvent and the paint will exchange each other, that is, the paint will fall off and the solvent will suck up for high-density and low-density replacement. If the immersion time is very long, a large amount of solvent will accumulate in the nozzle. As a result, the nozzle must be refilled with a large amount of paint before spraying to squeeze out all the excess solvent and cause a lot of waste of materials and time. It is the direction that awaits those engaged in this industry who urgently want to study and improve.
故,發明人有鑑於上述缺失,乃搜集相關資料經由多方評估及考量,並以從事於此行業累積之多年經驗持續試作與修改,始設計出可減緩溶劑回流至塗佈頭內之塗佈機及浸泡方法發明專利誕生。 Therefore, in view of the above-mentioned deficiencies, the inventor collected relevant information, evaluated and considered by multiple parties, and continued to trial and modify with years of experience in this industry, and then designed a coating machine that can slow down the solvent backflow into the coating head. And the invention patent for the soaking method was born.
本發明之主要目的乃在於塗佈機之機台上為設置有供被塗 佈件定位之塗佈平台,並於機台上安裝有驅動裝置、塗佈頭及清洗單元,當驅動裝置帶動塗佈頭移動至清洗單元之浸泡槽上方,並使噴嘴之唇口向下抵壓於彈性體上一起浸泡在浸泡槽內之溶劑中,且該唇口與彈性體接觸的部位為位於溶劑的液面高度之下,不但可隔絕外部空氣,防止噴嘴內之塗料固化所造成之阻塞,亦可減緩溶劑與塗料密度不同所導致溶劑會沿著唇口回流至噴嘴內,藉此減少噴嘴塗佈前通過塗料將多餘的溶劑全部擠出所造成大量材料及時間的浪費,也可提高噴塗之效率。 The main purpose of the present invention is to provide the coating machine on the machine The coating platform where the cloth is positioned, and the drive device, coating head and cleaning unit are installed on the machine. When the drive device drives the coating head to move to the top of the soaking tank of the cleaning unit, the lip of the nozzle is pressed down Press on the elastomer and soak in the solvent in the soaking tank together, and the contact part of the lip with the elastomer is below the liquid level of the solvent, which can not only isolate the external air, and prevent the curing of the coating in the nozzle. Clogging can also reduce the solvent backflow into the nozzle along the lip caused by the difference in the density of the solvent and the paint, thereby reducing the waste of a large amount of material and time caused by all the excess solvent being squeezed out through the paint before the nozzle is coated. Improve the efficiency of spraying.
1:機台 1: Machine
11:基座 11: Pedestal
12:驅動控制系統 12: Drive control system
13:滑軌 13: Slide rail
14:門型框架 14: Door frame
141:立柱 141: Column
142:橫樑 142: Crossbeam
2:塗佈平台 2: Coating platform
3:驅動裝置 3: drive device
31:水平驅動機構 31: Horizontal drive mechanism
32:升降驅動機構 32: Lifting drive mechanism
4:塗佈頭 4: Coating head
41:噴嘴 41: Nozzle
410:唇口 410: lip
411:模唇 411: Mould Lip
412:內部流道 412: Internal runner
5:清洗單元 5: Cleaning unit
51:浸泡槽 51: Soaking tank
52:彈性體 52: Elastomer
521:膠條 521: Rubber Strip
6:塗料 6: Paint
7:溶劑 7: Solvent
[第1圖]係本發明較佳實施例塗佈機之立體外觀圖。 [Figure 1] is a perspective view of the coating machine of the preferred embodiment of the present invention.
[第2圖]係本發明較佳實施例塗佈機另一視角之立體外觀圖。 [Figure 2] is another perspective view of the appearance of the coating machine according to the preferred embodiment of the present invention.
[第3圖]係本發明塗佈頭之側視剖面圖。 [Figure 3] is a side cross-sectional view of the coating head of the present invention.
[第4圖]係本發明清洗單元之立體外觀圖。 [Figure 4] is a perspective view of the cleaning unit of the present invention.
[第5圖]係本發明之步驟流程圖。 [Figure 5] is a flow chart of the steps of the present invention.
[第6圖]係本發明噴嘴浸入於浸泡槽前之側視剖面示意圖。 [Figure 6] is a schematic cross-sectional side view of the nozzle of the present invention before being immersed in the soaking tank.
[第7圖]係本發明噴嘴浸入於浸泡槽後之側視剖面示意圖。 [Figure 7] is a schematic cross-sectional side view of the nozzle of the present invention after being immersed in the soaking tank.
[第8圖]係本發明第7圖之局部放大圖。 [Figure 8] is a partial enlarged view of Figure 7 of the present invention.
為達成上述目的及功效,本發明所採用之技術手段及其構造,茲繪圖就本發明之較佳實施例詳加說明其構造與功能如下,俾利完全瞭解。 In order to achieve the above-mentioned purposes and effects, the technical means and structure adopted by the present invention are illustrated in detail below to illustrate the structure and functions of the preferred embodiments of the present invention, so as to fully understand.
請參閱第1至4圖所示,係分別為本發明較佳實施例塗佈
機之立體外觀圖、另一視角之立體外觀圖、塗佈頭之側視剖面圖及清洗單元之立體外觀圖,由圖中可清楚看出,本發明之塗佈機為包括有機台1、塗佈平台2、驅動裝置3、塗佈頭4及清洗單元5,其中:
Please refer to Figures 1 to 4, which are respectively the preferred embodiments of the present invention.
The three-dimensional appearance view of the machine, the three-dimensional appearance view from another angle, the side cross-sectional view of the coating head, and the three-dimensional appearance view of the cleaning unit, as can be clearly seen from the figures, the coating machine of the present invention includes an
該機台1為具有一基座11,並於基座11或下機架內設置有驅動控制系統12,且基座11上方二側處設有一對橫向滑軌13,再於二滑軌13上分別安裝有一立柱141,且二立柱141之間安裝有一橫樑142,以構成門型框架14。
The
該塗佈平台2為設置於機台1之基座11上方處且位於二滑軌13之間,用以承載被塗佈件(如玻璃基板;塑料膜或軟性基板;膠帶;金屬箔片;光學膜包含偏光膜、擴散膜、增亮膜;電路板;電池極板等各種的基材或料片),並於塗佈平台2(如金屬或花崗石平台)表面上可通過複數吸附孔配合導引柱等定位有至少一個被塗佈件,而塗佈平台下方處則設置有校正模組之對位平台,並由對位平台通過馬達驅動螺桿的方式來進行XYZ軸方向的調整。
The
該驅動裝置3為安裝於機台1之門型框架14上並包含有水平驅動機構31(如塗佈方向之X軸或XY軸方向)及升降驅動機構32(如Z軸方向),而水平驅動機構31為了達到精確位移之目的,則可通過二組馬達驅動螺桿、齒輪組、齒條或皮帶搭配皮帶輪等方式來帶動二立柱141沿著滑軌13水平方向移動,並由升降驅動機構32亦可通過二組馬達驅動螺桿、齒輪組或齒條等方式來帶動橫樑沿著二立柱141垂直方向移動,也可進一步搭配光學尺或位置編碼器等作定位,使門型框架14以龍門移動(Gantry moving type)的方式精確
的線性位移。
The
該塗佈頭4為安裝於機台1之門型框架14或橫樑142上並包含一對模唇411前後對面結合之狹縫模,以構成一狹縫式模頭(Slot Die)或噴嘴(Slit Nozzle)41,並於二模唇411之間亦可進一步夾設有具預定厚度之墊片,且二模唇411之間具有內部流道412,再於二模唇411下方漸縮凸出的唇部內形成有與內部流道412相連通之唇口410,且唇口410為通過墊片之厚度隔開形成有一模唇間隙。
The
在本實施例中,塗佈頭4之噴嘴41為連接有具注射式泵浦(Syringe Pump)之供料模組,並由供料模組儲存有塗料6(如第3、8圖所示)之儲料桶通過供給管路連接至下游注射式泵浦,再由注射式泵浦將定量的塗料經由該供給管路所連結的噴嘴41供應至其內部流道412中,且該塗料6可依實際的需求選用如光阻劑包含正型光阻及負型光阻;功能性樹脂包含聚醯亞胺(PI)、聚醯胺醯亞胺(PAI)等;有機導電高分子材料包含聚3,4-二氧乙基噻吩(PEDOT)、聚3,4-二氧乙基噻吩:聚苯乙烯磺酸鹽(PEDOT:PSS)等;光固化塗料包含紫外光(UV)膠水或樹脂等;壓電材料包含聚偏氟二乙烯(PVDF);以及陶瓷氧化物包含鈣鈦礦(Perovskite)或其他具特定的性質與黏度之流體。
In this embodiment, the
該清洗單元5為安裝於機台1之基座11且位於塗佈頭4的移動路徑上,並包含框槽狀之浸泡槽51及設置於該浸泡槽51內長度方向之彈性體52,其中該浸泡槽51內儲存有用以清洗噴嘴41之溶劑
(Solvent)7(如第6至8圖所示),並於浸泡槽51上皆連接有輸入管路及排出管路,且各輸入管路為分別連接至上游儲存有溶劑7之儲料桶中,也可進一步將輸入管路與排出管路連接至包含泵浦、過濾器及多向閥等之循環管路中,以進行溶劑7之循環過濾使用,且該溶劑7可依實際的需求選用如丙二醇單甲基醚酯(PGMEA)、丁酮(MEK)、二甲基乙醯胺(DMAC)、丙酮(Acetone)、乙醇(Ethanol,酒精)、水、聚二甲基矽氧烷(PDMS,矽油)、二甲基甲醯胺(DMF)或其他密度小於塗料6之溶劑,用以對噴嘴41之模唇411來進行清洗或浸泡之作業。
The
此外,上述之彈性體52包含至少一個膠條521,且該膠條521之斷面在本實施例中為一實心D型膠條,但並不以此為限,其斷面亦可為一中空D型、E型(山型)或其他形狀,而膠條521頂部則形成有弧形凸起之抵壓面(如第8圖所示),且該膠條521也可依實際的需求選用如人造橡膠包含橡膠(Rubber)、矽膠(Silicon)、聚四氟乙烯(PTFE,鐵氟龍)、氟橡膠(FKM/FPM、Viton)等;天然橡膠包含乳膠或其他具良好的耐溶劑、耐油、化學介質等性能之彈性材料所構成。
In addition, the above-mentioned
請搭配參閱第5至8圖所示,係分別為本發明之步驟流程圖、噴嘴浸入於浸泡槽前之側視剖面示意圖、噴嘴浸入於浸泡槽後之側視剖面示意圖及第7圖之局部放大圖,由圖中可清楚看出,本發明上述之浸泡方法為適用於一塗佈機,係包括下列之實施步驟: Please refer to Figures 5 to 8, which are the step flow chart of the present invention, the side sectional view of the nozzle immersed in the soaking tank, the side sectional view of the nozzle immersed in the soaking tank, and the part of Figure 7 respectively. Enlarged view, it can be clearly seen from the figure that the above-mentioned soaking method of the present invention is suitable for a coating machine and includes the following implementation steps:
(S101)驅動裝置3帶動塗佈頭4朝塗佈平台2上定
位之被塗佈件方向移動,並由塗佈頭4之噴嘴41將塗料6自唇口410噴出在被塗佈件表面上形成一塗佈膜。
(S101) The
(S102)驅動裝置3帶動塗佈頭4移動至浸泡槽51上方且對應於彈性體52處,並使噴嘴41之唇口410向下抵壓於彈性體52一起浸泡在浸泡槽51內之溶劑7中。
(S102) The
由圖中及上述之實施步驟可清楚得知,當本發明之塗佈機於使用時,係利用機台1之驅動控制系統12進行塗佈平台2、驅動裝置3、塗佈頭4及清洗單元5相關的驅動與控制操作、即時偵測與狀態診斷等,其中該塗佈平台2上可利用移載平台搭配取料機構或機器人置放有被塗佈件(如基材或料片),並由驅動裝置3之水平驅動機構31與升降驅動機構32以龍門移動的方式來帶動塗佈頭4朝塗佈平台2方向移動,同時使噴嘴41接近被塗佈件表面上,且供料模組之注射式泵浦將定量的塗料6經由供給管路供應至噴嘴41之內部流道412中,便可將塗料6自唇口410之模唇間隙向下噴出,並在被塗佈件表面上形成有包含但不限於乾膜、功能性薄膜、導電薄膜、光固化膜、壓電薄膜或其他塗佈膜。
It can be clearly seen from the figure and the above implementation steps that when the coating machine of the present invention is in use, the driving
當每一片被塗佈件進行塗佈之前或塗佈完成後,可由驅動裝置3帶動塗佈頭4朝清洗單元5之浸泡槽51方向移動,並使噴嘴41之模唇411向下移動至浸泡槽51內,即可透過輸入管路來將溶劑7循環流動至噴嘴41處,也可藉由噴射的方式朝噴嘴41噴出,以進行噴嘴41之清洗動作,使附著在模唇411及其外側面或模唇間隙中之固化物或微粒等異物溶解浮出,且可避免產生塗佈的缺陷,甚至是噴嘴41阻塞所導致塗料6的供給被中斷等問題,同時確保塗佈的品質。
Before or after each piece of coated part is coated, the driving
此外,當塗佈機處於待機、停機(如維護或更新等)狀態或塗佈頭4噴塗、清洗作業完成時,亦可藉由驅動裝置3帶動塗佈頭4將噴嘴41移動至對應於彈性體52處,並使模唇411向下抵壓於膠條521之抵壓面上,其抵壓面受到模唇411或唇口410處的抵壓作用下(如第8圖所示)便會呈一壓縮變形,進而使模唇411部分與膠條521一起浸泡在浸泡槽51內之溶劑7中,且模唇411之唇口410(模唇間隙)與膠條521接觸的部位為位於溶劑7的液面高度之下,不但可隔絕外部空氣,防止噴嘴41內之塗料6固化所造成之阻塞,同時藉由唇口410抵壓在膠條521上,便可減緩溶劑7與塗料6的密度不同,會在模唇間隙中產生虹吸作用之毛細現象所導致溶劑7沿著唇口410回流進入至噴嘴41內的量,藉此減少噴嘴41塗佈前需要通過塗料6將多餘的溶劑7全部擠出所造成大量材料及時間的浪費,也可提高噴塗之效率。
In addition, when the coating machine is in standby, shutdown (such as maintenance or update, etc.) state or the
上述詳細說明為針對本發明一種較佳之可行實施例說明而已,惟該實施例並非用以限定本發明之申請專利範圍,凡其他未脫離本發明所揭示之技藝精神下所完成之均等變化與修飾變更,均應包含於本發明所涵蓋之專利範圍中。 The above detailed description is only for a preferred and feasible embodiment of the present invention, but the embodiment is not intended to limit the scope of the patent application of the present invention. All other equal changes and modifications made without departing from the spirit of the technique disclosed in the present invention All changes shall be included in the scope of patent covered by the present invention.
綜上所述,本發明上述之可減緩溶劑回流至塗佈頭內之塗佈機及浸泡方法為確實能達到其功效及目的,故本發明誠為一實用性優異之發明,實符合發明專利之申請要件,爰依法提出申請,盼 審委早日賜准本案,以保障發明人之辛苦發明,倘若鈞局有任何稽疑,請不吝來函指示,發明人定當竭力配合,實感德便。 In summary, the coating machine and soaking method of the present invention that can slow down the solvent backflow into the coating head can indeed achieve its effects and purposes. Therefore, the present invention is truly an invention with excellent practicability, and it actually complies with the invention patent. For the application requirements, Yan filed an application in accordance with the law, and I hope that the review committee will grant this case as soon as possible to protect the inventor’s hard-working invention. If there are any doubts, please feel free to write instructions.
4:塗佈頭 4: Coating head
41:噴嘴 41: Nozzle
410:唇口 410: lip
411:模唇 411: Mould Lip
412:內部流道 412: Internal runner
5:清洗單元 5: Cleaning unit
51:浸泡槽 51: Soaking tank
52:彈性體 52: Elastomer
521:膠條 521: Rubber Strip
6:塗料 6: Paint
7:溶劑 7: Solvent
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109106538A TWI745876B (en) | 2020-02-27 | 2020-02-27 | Coating machine and soaking method capable of slowing down the solvent backflow into the coating head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109106538A TWI745876B (en) | 2020-02-27 | 2020-02-27 | Coating machine and soaking method capable of slowing down the solvent backflow into the coating head |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202132008A TW202132008A (en) | 2021-09-01 |
TWI745876B true TWI745876B (en) | 2021-11-11 |
Family
ID=78777536
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109106538A TWI745876B (en) | 2020-02-27 | 2020-02-27 | Coating machine and soaking method capable of slowing down the solvent backflow into the coating head |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI745876B (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI313623B (en) * | 2005-08-09 | 2009-08-21 | Tokyo Electron Ltd | Coating treatment apparatus, coating treatment method and computer readable storage medium |
JP2013071033A (en) * | 2011-09-27 | 2013-04-22 | Dainippon Screen Mfg Co Ltd | Nozzle washing device and coating applicator with the nozzle washing device |
JP2015006656A (en) * | 2013-05-29 | 2015-01-15 | 東京エレクトロン株式会社 | Coating applicator and cleaning method of sealing part |
TWI571316B (en) * | 2011-04-13 | 2017-02-21 | Tokyo Ohka Kogyo Co Ltd | Coating device |
-
2020
- 2020-02-27 TW TW109106538A patent/TWI745876B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI313623B (en) * | 2005-08-09 | 2009-08-21 | Tokyo Electron Ltd | Coating treatment apparatus, coating treatment method and computer readable storage medium |
TWI571316B (en) * | 2011-04-13 | 2017-02-21 | Tokyo Ohka Kogyo Co Ltd | Coating device |
JP2013071033A (en) * | 2011-09-27 | 2013-04-22 | Dainippon Screen Mfg Co Ltd | Nozzle washing device and coating applicator with the nozzle washing device |
JP2015006656A (en) * | 2013-05-29 | 2015-01-15 | 東京エレクトロン株式会社 | Coating applicator and cleaning method of sealing part |
Also Published As
Publication number | Publication date |
---|---|
TW202132008A (en) | 2021-09-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN205148922U (en) | Stripping off device suitable for 3D photocuring three dimensional printing equipment | |
DE60307360T2 (en) | Use of a release film | |
TW200427521A (en) | Slit die, and method and apparatus for manufacturing base material having coated film | |
JP5923563B2 (en) | Coating apparatus and coating method | |
KR102218589B1 (en) | Apparatus for coating resin, method thereof and method for forming resin layer using the same | |
JP2015003320A (en) | Coating equipment and coating method | |
TWI745876B (en) | Coating machine and soaking method capable of slowing down the solvent backflow into the coating head | |
CN103728779A (en) | Method and device for coating alignment film | |
JP4862033B2 (en) | Light-absorbing mold, photosensitive resin pattern forming method using the mold, and printing plate manufacturing method | |
JP4391211B2 (en) | Manufacturing method of liquid crystal display device and liquid crystal dropping device used therefor | |
TW201544358A (en) | Flexographic printing plate, method for manufacturing the same and method for manufacturing liquid crystal display device | |
JP2014180604A (en) | Intermittent coating apparatus and intermittent coating method and method for manufacturing displaying member | |
CN103415381B (en) | The manufacture method of mould, mould and the manufacture method of nano impression film | |
JP4658997B2 (en) | Resin composition for pattern formation and in-plane printing process method using the same | |
CN113492080B (en) | Coating machine capable of slowing down solvent backflow into coating head and soaking method | |
JP2009286113A (en) | Letterpress for printing, and printing method using the same | |
EP3330794A1 (en) | Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask | |
KR20110109946A (en) | Resist coating method, resist coating apparatus, and manufacturing method of photomask blank and photomask using resist coating method | |
JP2011206654A (en) | Inkjet coating device and method | |
JP4200758B2 (en) | Panel resin coating method, display panel manufacturing method, and resin coating apparatus | |
KR101069811B1 (en) | Fabrication method of display panel and dielectric configuration applied thereto | |
JP2008018347A (en) | Alignment method, drawing method, alignment mechanism, and drawing device | |
CN116568486A (en) | Multi-material film for barrel polymerization printer | |
CN112654161A (en) | Process for reducing use amount of two-dimensional code rework substrate | |
CN109731834B (en) | Ultrasonic cleaning device and imprinting method |