TWI313623B - Coating treatment apparatus, coating treatment method and computer readable storage medium - Google Patents

Description

[Technical Field] The present invention relates to a coating processing apparatus and a coating processing method for applying a coating liquid such as a resist liquid to a substrate such as a glass substrate for a liquid crystal display device, and a computer processing method. Read the memory media. [Prior Art] ^ For example, in the manufacturing steps of a liquid crystal display device (LCD) or a semiconductor device, a photolithography technique is used to form a predetermined circuit pattern on a glass substrate or a semiconductor wafer.

case. In the photolithography technique, an anti-surname liquid is applied to a glass substrate to form a coating film, and then dried and successively subjected to exposure treatment and development treatment. Wherein, in the anti-touching agent coating treatment, the spin coating is used to rotate the glass plate and the like, and the surface of the secret ship_substrate is directly above the center of rotation thereof, and the resist liquid is expanded to the entire substrate; In the slit coating, the resist liquid is discharged from the slit nozzle, and the substrate and the nozzle are moved in a straight line, and the film is thick. In the case of the application-coating method, the viscosity of the anti-sputum liquid is made to make the film, and the reduction of the anti-liquid is made by the anti-side and the addition of the anti-liquid (= (four) rotation-like coordination, _ For the threat, it is necessary to change the ratio of the anti-paving and the dilute to the coating treatment. However, when using a different proportion of the resist liquid, it is necessary to prepare in advance for the anti-residue. The change of the film thickness of the film requires the resist liquid of the gate 1313623 to be supplied to the substrate to be processed such as a semiconductor wafer by a nozzle. However, in the above Patent Document 1, it is not disclosed whether or not the verification is actually a positive partial load ratio. 1 is away from the original case of the substrate thickness of the treated substrate, not only wasted the resistance used in the substrate, and the anti-caries agent present in the catheter 88 shown in Fig. 4 was discarded and tried again. Anti-side liquid Wei Lang f. In particular, the LCD-shaped glass substrate has become more and more large in recent years, and even a huge substrate with a unilateral side of 2 m has become impossible to ignore as above. In this case, the day-to-day separation will be wasted, resulting in a decrease in production. Xin [Patent Document 1]曰本特开平10_242〇45号 [Summary of the invention] (The problem to be solved by the invention;) . $=There is a case in which the purpose is to provide a coating treatment device, Ιίΐίΐ ' ^ forcefully suppress waste of anti-bloom Consumption, and can be implemented without reducing the application of the image (the iiJiT readable memory medium is provided. The device provides a coating treatment coating solution for the viewpoint; the solvent is used for the 3 liquid delivery portion) The high-concentration portion and the solvent delivery portion are sent to the coating liquid by the conduit connection & the coating liquid is supplied to the substrate to form a coating-slipping mechanism, and the diluted coating-bonding portion is discharged; 1313623, the standard (2), the mixing ratio The ratio of the high concentration of the coating liquid and the high-concentration ratio sent out from the coating portion of the coating unit 7 is set to "the mixing ratio of the three agents" at the delivery destination of the mixed liquid. The above-mentioned dilution is applied to the side of the coating liquid coffee machine. The number / 〃 1 is used to apply the high-concentration coating liquid delivery portion as the second viewpoint of the above-mentioned reference invention. ^定' is characterized by ^Release coating solution; coating city outlet mechanism, flow-agricultural feed dilution coating liquid; dilute (four) cloth liquid supply mechanism outflow mechanism, coating liquid outflow mechanism to supply diluted coating liquid, feeds and guides on the way to the front guide Extracting the diluted coating liquid and returning the smear from the feed to the circulation; and switching the mechanism to cut between the liquid feeding conduit outflow mechanism side of the diluted coating liquid and the coating liquid circulation portion in the coating liquid switching mechanism The coating mechanism for diluting the coating liquid is applied in the state of the ring portion in the manner of 'circulating and discharging the liquid from the diluted coating liquid; the front side of the iron is placed on the front of the device; the control mechanism is controlled as follows : determining the film thickness measurement range of the mixed film of the high-concentration coating liquid and the solvent by the film thickness of the film thickness and the film thickness of the film, and determining that the mixing ratio is not within the predetermined range; Maintaining the diluted coating liquid circulation portion, and discharging the mixing ratio of the high-concentration coating liquid sent from the coating liquid coating liquid sending portion to the concentration, when the mixing ratio is in a predetermined range 2 out of the solvent the switching mechanism of the coating solution fed was diluted two persons ^ purpose, the cutting operation side configuration. & As a coating liquid outflow machine 1313623, the mixing portion may have the following configuration: the meeting i has a swimming side. Further, as the coating liquid discharge means, it is possible to use: ΐ is a coating liquid. Further, in the step of cutting, the step of supplying the diluted coating liquid to the dilution coating liquid is "supplied by the mechanism supply, and the buffer solution is buffered by the first buffer tank; the buffer liquid supply means is preferably One of the means for connecting the front mechanism, and one of the flushing grooves is to flow out of the dilution monitoring tube with the coating liquid, and before the monitoring catheter is placed, the g-flow nozzle is used for the coating. Set the tube, from the above-mentioned monitoring with guided release coating; = ^ body? The coating is used for the temporary storage: 5% of the column: the monitoring buffer tank, the fluent channel is _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The hemorrhoids are provided before the monitoring catheter, and the liquid flow control valve for the coating is used to follow the dilute coating liquid, and the liquid is supplied to the diluted coating liquid. Pp 对 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控 监控Further, the object to be coated can be used by monitoring the coating while using the substrate for monitoring while causing relative movement between the substrate and the substrate for monitoring. Furthermore, the above-mentioned monitoring and coating machine can be used for monitoring and coating on the conveyor belt which is attached to most of the bribes. In this case, it is preferable that the film thickness measuring device is disposed above any of the above-mentioned transporting rolls, and the film thickness measuring device is disposed on the top of the transport roller.收 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ a mechanism for coating a thin surface on a substrate by correcting it; and whether the mixing ratio of the base cloth liquid and the solvent is within a predetermined range; and determining that the diluted coating liquid is applied, for the sub-substrate, Whether or not the mixing ratio of the cloth liquid and the solvent is in the range of the shape, and determining the range of the surrounding area, adjusting the high-concentration coating liquid and the thickness of the dissolved film, the read shape can be diluted and coated as described above. The fourth aspect of the present invention provides a coating treatment method characterized in that a high-concentration coating liquid and a solution of dilute to a concentration of distillate/diluted 1 cloth are mixed, and a diluted coating liquid formed in the mixing portion is extracted. The thickness of the coating film is controlled by the coating ; ΪΪ ΪΪ ; ; ; ; ; ; ; 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控 控High concentration coating In the case where the mixing ratio of the above-mentioned solvent is within a predetermined range, the diluted coating liquid is supplied to the coating liquid outflow mechanism, and the pre-dilution coating liquid is discharged from the coating liquid discharge mechanism. The diluted coating liquid is applied onto the substrate; and the substrate is coated with the coating liquid, and the diluted coating liquid formed in the mixing portion is subjected to the following steps for the secondary substrate, and the coating coating is performed; Thickness; from the result of the above-mentioned lining measurement, the high-concentration coating liquid and the solvent are judged to be in a range in which the mixing ratio is not within the predetermined range, and the mixing ratio of the coating material to the solvent is the same. The above-mentioned roller flows out of the thin; i cloth liquid: coating can be carried out by the side of the monitoring coating application flow while the relative flow of the monitoring coating is carried out, and the conveyor belt is suspended from the conveyor belt of the plurality of conveying rollers. The conveyor belt flows in this case, among the aforementioned monitoring coatings, two two two. The step of defeating the film thickness is preferably carried out directly above. Also, the film thickness was measured. r (4) is carried out in the - (4) directly above the weft-forming shape. The film thickness is calculated by making the aforementioned monitoring coating shape: ?: ϊίΐ f thick _ change. The memory is stored in the computer-executable control program, and the memory media is available to the computer. In the method of carrying out any of the above methods [Effects of the Invention] According to the present invention, a high-concentration coating liquid and a solvent are mixed on-line, followed by concentration 1313623 and substrate G delivery by the unit to the resist processing unit 23 by the unit . Rail. The transport I set 33 can be moved up and down, forward and backward, and rotated, and can also be close to any unit of the heat treatment early block (TB) 31 · 32. The first crystal heat treatment unit portion 27 has two heat treatment unit blocks (TB) 34 and 35 which are heat-treated by heat-treating the substrate G, and the heat treatment unit block 34 is disposed on the resist. On the processing unit 23 side, a heat treatment unit block (TB) 35 is provided on the development processing unit (DEV) 24 side. Further, a second conveying device 36 is provided between the two heat treatment unit blocks (TB) 34 and 35.

The heat treatment unit block (TB) 34 has a four-stage laminated structure, and is sequentially provided with: a passing unit for conveying the substrate G, and three pre-baking units for pre-baking the substrate G. Further, the heat treatment unit block (TB) 35 has a four-stage laminated structure, and is provided with a pass unit for performing substrate G delivery, a cooling unit for cooling the substrate G, and a substrate G to be sequentially arranged from below. 2 pre-bake units for baking treatment. The second transport device 36 performs the process of picking up the substrate G from the resist processing unit 2 by the passing unit, and the substrate G between the heat treatment units is carried in and out, and the display unit (DEV) 24 is passed through the unit. The substrate G is delivered, and the substrate G of the interface station 3, which will be described later, is delivered and picked up by the substrate G of the extension/cooling pedestal 44. Further, the second transporting device 36 has the same structure as the first transporting device 33, and can also be adjacent to any of the heat treatment unit blocks (TB) 34, 35. The third heat treatment unit portion 28 has two heat treatment unit blocks (TB) 37 and 38 which are formed by laminating heat treatment units for heat-treating the substrate G, and the heat treatment unit block (TB) 37 is provided in the development processing unit (DEV) 24 On the side, the heat treatment unit block is located on the side of the box station. Further, a third conveying device 39 is provided between the two heat treatment unit blocks (TB) 37 and 38. The heat treatment unit block (TB) 37 has a four-stage laminated structure, and is provided with a pass unit for performing substrate G delivery and three post-baking units for post-baking the substrate G in this order. Further, the heat treatment unit block (TB) 38 has a four-stage laminated structure, and is sequentially provided from the lower side: a rear supply unit, a substrate G delivery and cooling pass, a cooling unit, and a post-baking treatment of the substrate G. 2 after the supply unit. 1313623 The third transport device 39 picks up the substrate G from the U line Uv illuminating unit (i-UV) 25 by the passing unit, and transports the substrate between the heat treatment units, and passes through the cooling unit to the cassette station. Substrate G delivery. Further, the third transport device 39 has the same structure as that of the first transport device 33, and may be close to any unit of the heat treatment unit zone slopes (TB) 37, 38. As far as the processing station 2 is concerned, as in the above manner, two rows of conveying lines a · B are formed, and basically

In the upper = processing sequence, each processing unit and transport device are arranged, and a space 40 is provided between the transport lines A·B. Further, in the space 4, a shuttle (substrate mounting member) 41 that can move forward and backward is provided. The shuttle device 41 is a shuttle device 41 that can hold the substrate G, and performs substrate transport between the transport lines a and b. The delivery of the substrate G to the shuttle 41 is performed by the above-described third to third transfer means %:39. - the interface station 3 has: a transport device 42, a substrate G of the processing station 2 and the exposure device 4; a buffer pedestal (BUF) 43, a buffer cartridge; and a substrate delivery unit having a cooling function, Subtitle generation S (TITLER) and peripheral exposure device (4) are stacked up and down ^1 and sent 1 to 4^3. The transport device 42 has a transport arm 'transport # 42a ' between the processing station 2 and the exposure device 4, among the substrates g, among the resist coating and development processing systems 10, which are configured in a climatic manner, the outline of the processing operation will be described. . First, the substrate G in the cassette C disposed in the cassette station is transported by the transport apparatus (e-UV) 22 '«, and the substrate G is loaded into the rubbing cleaning process to be cleaned by the single cleaning. Cleaning department, level GM = ^, HR) 2 仃 仃 仃 于 笛 笛 献 献 Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar Ar The first is, the transfer 15 1313623 to improve the stability of the resist, is transported to the heat treatment unit block (ΤΒ) 31 of the adhesion processing unit and heat treatment unit block (ΤΒ) 32 of the adhesion processing unit, This j HMDS is subjected to an adhesion treatment (hydrophobic treatment). Thereafter, the substrate G is transported to the cooling unit and cooled, and then transferred to the passing unit of the heat treatment unit block (TB) 32. The substrate G transport processing in the series of processing as described above is performed by the second transport device 33. The substrate G disposed in the passing unit of the heat treatment unit block (TB) 32 is carried into the resist unit 23 by a substrate transfer mechanism such as a rolling conveyance mechanism provided in the passing unit. In the resist coating device (CT) 23a, the substrate is watered

The coating liquid is supplied while supplying the resist liquid while being conveyed, and then the coating film is subjected to a reduced-pressure drying treatment in a vacuum drying apparatus (VD) 23b. Thereafter, the substrate is transferred from the resist processing unit 23 to the passing unit of the heat treatment unit block (tb) 34 belonging to the second heat treatment unit portion 27 by the substrate transfer arm provided in the pressure drying device (VD) 23b. . The substrate g disposed in the unit of the heat treatment unit block 34 is transported to the pre-baking unit of the heat treatment unit block 34 and the heat=meta block (ΤΒ) 35 by the second feeding device 36. The pre-baking unit is - and pre-baked, and is cooled to a predetermined temperature by the cooling element of the processing unit (4) (ΤΒ) 35. And by the second conveying device 36, it is sent to the heat treatment unit block (ΤΒ) 35 through the early element. After the person is wide, the 'substrate 输送 is transported to the interface station 3 by the second transport device 36. ^ is two (ΕΧΤ · COL) 44, and as needed * 'transported by the interface station 3 襄 42 ', The peripheral exposure device (4) of the external device block 45, here, is used to remove the exposure of the outer peripheral portion (not the portion) of the etchant film. Beautiful

4, this, the county board g on the ^ button agent ^ 疋 疋 pattern to expose the domain. Moreover, the buffer box of the substrate G_43 is then transported to the exposure, first received, and inside the buffer pedestal.

The cargo substrate G is carried into the caption generator (T coffee R) of the upper portion of the external device block 45 by the transport device 42 of the boundary_3, and is placed on the extension/cooling pedestal after the information on the substrate is marked S 16 1313623 (EXT · COL) 44. The substrate G dreams of the second transport device 36, and is transported from the extension/cooling pedestal (Εχτ · COL) 44 to the passage unit of the heat treatment unit block (TB) 35 of the heat treatment unit portion 27. , punching - by means of a step extending from the unit of the heat treatment unit block (TB) 35 to the developing process f element (DEV) 24, for example, by a rolling transport mechanism, the substrate is removed from the & unit block (TB) The pass unit of 35 is carried into the development processing unit (DEV) 24. The towel of the processing unit (DEV) 24 is, for example, a horizontal posture view of the edge, and a shadow liquid is mounted on the substrate G. Thereafter, the substrate is stopped once (3 conveyance, and the visible light on the substrate G is tilted by the tilt of the US 1 Flowing, and supplying the rinsing liquid to the hybrid two pairs of soil plates G, and washing the developing solution. Thereafter, the substrate G is returned to the horizontal posture, the conveying is resumed, and the substrate is blown by nitrogen or air for drying, the plate G After the soil development processing is completed, the substrate G is transported from the development processing unit (DEV) 24 to the i-line UV irradiation unit 25 25 by a continuous conveyance mechanism, for example, by rolling, and the sub-substrate G is subjected to decolorization treatment. Thereafter, the substrate 搬 is carried out to the passing unit of the cooked processing unit block 37 belonging to the third heat treatment unit unit 28 by the rolling conveyance mechanism in the rifling irradiation unit. 3, in the heat treatment unit block (four) 37 through the unit substrate G, through the first 39 to the heat treatment unit block (TB) 37 after the drying unit and the heat to send the area, after the 38 after drying unit After the post-baking treatment, after the passage of the unit block (ΤΒ) 38 and the cooling unit and cooling to a predetermined temperature, the conveying device u of the /Yiyi station 1 is stored in the predetermined box arranged in the box station. The resist coating apparatus (CT) 23aM will be described in detail. A schematic plan view of the anti-reagent coating device (CT) 23a is installed. Anti-sand coating "Multi-Simi2 has a three-side r-position for spraying a predetermined q μ body jet 16; a substrate transport mechanism 13 for transporting the substrate on the pedestal 12; and a resist supply nozzle 14 for moving on the pedestal 12 The surface of the substrate is supplied with an anti-caries agent liquid; and the nozzle cleaning unit 15 is used for cleaning the anti-supply spray 17 1313623 nozzle 14 and the like. The dry feed 2d70 is mounted on the strut member 55, and the mosquito is disposed in the substrate-屮晗嵴 mechanism 118. The nozzle cleaning head 120 has a thinner; the vicinity of the resist outlet of the etchant supply nozzle 14 and the diluent discharge tube, and the cleaning agent is supplied to the spray; The fiscal nozzle is directed toward the vicinity of the recording agent supply spray b, and the nitrogen solution is predetermined to be called a two-seat portion, a coating pedestal portion 12b, and a discharge port to use the substrate G from the heat treatment unit block, and I" I2a. The coating pedestal portion 12b arranging portion of the anti-surname supply nozzle 14 flows out of the anti-doping machine M to move the liquid. The pedestal portion a is a region for forming a drying device (VD) 23b. The substrate G of the film having the soil and the film is transported out of the decompressed dry substrate G by the H-jet from the gas injection port 16 by the base gas conveying mechanism 13 to send the holding σ to the plate of the moving table. t ;; == word input will be the top of the substrate G top lift 47. Further, the other 5 has a nozzle movable mechanism 20 which is provided with a longitudinal direction of the Z-shaped member, and a member 54 for supplying the nozzle 56 to move the strut member 54 in the X direction. By the image and inspection drive mechanism Magic 4 in (4) D _ give two = = raise two, Yumou > monthly wash early 15 to clean the position between the positions and the position of the substrate transfer mechanism 13 in Figure 3 The configuration includes: the substrate holding members 51a and 51b, and the Y-direction end feeding mechanism 13 is similar to the wire guiding member, and the y=the blade holding substrate G of the pedestal 12; the straight universal side surface extending to the other side 18 1313623 The connecting member 50' is fitted to the holding substrate holding members 51a and 51b and the linear guiding members 52a and 52b, and the X-axis driving mechanism 53 moves the connecting member 5 in the X direction.

Each of the substrate holding members 51a and 51b has a structure in which one or more adsorption pads 48 for adsorbing and holding the substrate G to the pedestal portion 49 are provided. The adsorption pad 48 can be operated by a vacuum cylinder or the like (not shown). Adsorption is maintained. The adsorption pad 48 holds the substrate G on the back side of the portion of the substrate G where the resist liquid is not applied, that is, in the vicinity of the end portion of the substrate γ in the direction of the back surface. The X-axis drive mechanism 53 includes, for example, a belt drive mechanism or a ball screw, an air sliding member, an electric slider, a linear motor, and the like. FIG. 4 is a schematic perspective view showing the resist supply nozzle 14. The resist supply nozzle 14 has a structure in which a slit-shaped anti-reagent outlet port 14b for allowing the resist liquid to flow out in a strip shape is provided in the long-length case 14a having a long length in one direction. The resist supply nozzle 4 has a sensor (not shown) for measuring the distance between the anti-surname agent outlet i4b and the substrate G. Based on the measurement of the sensor, when the resist liquid is supplied to the substrate G, The anti-money agent is supplied to the nozzle 14 position. Next, a resist liquid supply system will be described. Fig. 5 shows the anti-caries liquid supply system among the above-described anti-money agent coating device (cT) 23a together with the control system. The resist liquid supply system of the present embodiment includes a high-name liquid solution tank 61 in which a south concentration anti-caries agent liquid is stored, a solvent tank 64 in which a diluted anti-money agent liquid is stored, such as a thin lake, and a mixing portion 7G. , the high concentration of tincture liquid and combined. The mixing portion 7G has a meeting block 67 for increasing the Reynolds number of the high-concentration anti-liquid and the dissolved reynolds (Reyn〇ldS _ (4); and static mixing and immersion to be more sure. And, (10), by age resistance The etchant liquid is mixed with the solvent and becomes a diluted resist liquid. The high-concentration resist liquid tank 61 and the rendezvous block 67 are connected by a conduit 62, and are provided with a high-concentration, agent (four) cylinder 63, high-synthesis anti-agent liquid tank The high anti-side liquid in the 61 is given by the #高叙减船(四)63 for the rendezvous block 67. The other ^ 1313623 = 64 is connected with the junction 65 by the conduit 65, and the conduit 6 (4) has the solvent of the solvent, for example, The diluent, by the solvent cylinder 66, the diameter of the conduit 62 and the guide tube 65 is thinned, and the liquid is easily extended from the meeting block 67 to the side of the nozzle liquid flowing out of the nozzle 14 to dilute the anti-_ delivery duct 69 , the above static mixer is set to ^ ^ = liquid feed conduit 69. The dilution anti-_feed f 69 borrows | 6 , is connected to the two buffer tanks 71a, 71b, and is adjusted to be mixed in the mixing portion 7Q To the buffer tanks 71a, 71b = the tube is connected to the anti-camphor_mouth 14. Further, 69 ==^= valves 75a, 75b, and the ducts 72a, 72b are provided with the opening groove 71a. 7ib, the buffer tanks 7la, 71b, and the anti-money agent supply / ^ = liquid. Moreover, the description of the can, 73, the valves 76a, 76b constitute the anti-axis supply, 69b, 72a, on the other hand, the conduit 69 The buffer tank 71 is connected to the monitoring buffer 7 by the conduit 69c. The return conduit 82 is connected to the portion between the conduit 69 and the feeder 68 by the three-way valve 76. The return conduit block 67 is statically mixed 69 - Monitoring _ Slot 77: a circulation line that leads to the conduit 69 through the conduit 76, and a three-way valve _ is provided with a valve W, which is provided in the passage ":^7, the rush=the conduit 69a, the 6% valve 75a, 75b and The conduit supply mechanism side of the valve 75e 1^7lb is switched to the circulation line side. The 4 θ _^ diluted resist liquid is used as a switching mechanism for the resist. It is said that 'a question 75a, wish, 75c Make

20 1313623 82, the conduits 82a, 82b are connected to the buffer tank 71a, and the cartridges 71 are returned to the cartridges 71a, 71b from the buffer tanks 71a, 71b. Further, the opening and closing valves 83a, 83b, and 83c are provided in the guides 82a, 82b, and 82c. In addition to the above-mentioned transfer _, the bottom of the control is connected to the monitor L; ^ is connected to the monitoring coating outflow nozzle 79 at the other end. (4) The cylinder (10)' is supplied to the monitor coating outflow nozzle 79 by the immersion nozzle 79 from the tank 77 by the operation of the cylinder 8G to supply the dilute diluted diluted resist liquid. Further, an opening and closing valve 81 is provided in the duct 78.抗, / ft control coating with the outflow mouth 79 out of the anti-sand liquid is monitored and applied in the spring? Coating body, = such as paving or glass substrate. In addition, in the vicinity of the monitoring coating, the distribution of the film is provided with a film (four) fixing device 85, which is formed by the monitoring coating, and the coatings of the coatings 63, 66, 74, 8G, and 84 can be used. The field is generally used, the wind phase π is the scale, the diaphragm η is the Diaphragm Pump, the injection 咋 筒 cylinder, and the like. Including the control of the anti-surname liquid supply system, the control of the resist coating device =T) 23a is performed by the controller 9A. The controller 9 performs control of the above-mentioned cylinders, 66, 74, 80, 84 and control of all valves, and can also control other components such as drive mechanisms. For the anti-liquid supply, based on the result of the measurement of the film thickness stagnation device 85 of the film formed by the above-mentioned coating, the high concentration of the resist liquid in the resist liquid tank 61 is controlled by ^= and 66'. Further, the mixing ratio of the release agent or the like in the solvent tank 64 can be finely adjusted, and the supply destination of the diluted resist liquid after mixing and dilution can be controlled. The controller 90 is controlled by the upper processing controller 92, which controls the resist coating and development processing system 1 of the upper level. The controller 90 and the processing controller 92 are composed of a computer. The processing controller 92 controls the respective components of the resist coating and development processing system 100 by controlling the cylinder and the valve like the controller 9 described above. The processing controller 92 is connected to the user interface 93, and the keyboard is commanded by the engineering manager to manage the resist coating and developing system 100, or the anti-surname agent is applied to the operation state of the 1313623 cloth development system 100. A display such as a display that is visible. Further, the control unit 92 is connected to the memory unit 94, and stores various control processes executed by the resist main cloth/developing system 100 by the control unit of the processing controller 92, or by using the interactive domain condition* In the construction of the plasma side of the device, the wealth of processing, but also the edpe). The stored recipe also includes controls such as the cylinder and valve performed by the controller 90 described above. The recipe can be stored in a hard disk or a semiconductor memory, or can be set in the memory unit 94 in a state of being stored in a portable memory medium such as a DDROM or a DVD.

The g ό can also be adapted from other devices, for example, by a dedicated line and as needed, by means of the instructions of the self-made interface 93, etc., the party will be called A from Ai Qing 94 and read by the control 92. The desired processing is performed in the resist coating and developing system under the control of the processing controller 92. Next, the processing operation in the resist coating apparatus (CT) 23a configured as described above will be described. In the state where the substrate G can float at a predetermined height, the material of the substrate G can be floated to the spleen and the spleen 123' on the substrate G. In part, the substrate G held in the gamma direction end of the substrate G and the substrate G held in the urging shape t are carried into the introduction pedestal portion i2a of the pedestal 12 by the rolling. When the substrate G passes under the resist supply nozzle i4 disposed at a predetermined position, the resist liquid is supplied from the resist supply nozzle 14 to the surface of the substrate G to form a coating film. ―2: For the step of the anti-side liquid coating treatment, it will be described with reference to the flowchart of Fig. 6. The first step is to supply the solution liquid and the solvent in a predetermined ratio from the high-concentration resist liquid tank 61 in which the high-concentration resist liquid is stored and the diluted anti-liquid solution, for example, the diluted surface 64. The mixing unit 7〇 (step 丨). At this time, the ratio of the high liquid to the agent is specified in the formula, and based on the information, the controller 58 is used to control the residual agent liquid π, the cylinder 63, the solvent π, the tube 66 output finger. 22 1313623 Order. The high-concentration anti-residue liquid and the solvent to be supplied to the mixing unit 70 are mixed by the rendezvous block and the static mixer 68 to form a diluted resist liquid in a sufficiently mixed state (step 2). Further, the valve 75c is opened, the valves 75a and 75b are closed, the valve 83c is opened, the j 81 is closed, and the circulation cylinder 84 is driven to constitute a passage 69, a monitoring anti-aftershoke 2, a conduit 82C, a return conduit 82, And the three-way valve 76 is re-routed to the conduit 69 of the conduit 69 to circulate the resist solution formed by mixing the anti-surname agent and the solvent in the above manner (step 3).

Then, the opening valve 81' is driven by the monitoring coating (4) 80, and the diluted anti-surname liquid is taken out from the control buffer tank 77 constituting the line 1 and supplied to the monitoring coating nozzle 79 to flow out from the monitoring coating. The nozzle 79 flows out of the mixed solution (anti-caries agent = controlled coating, and the film thickness of the coating film for monitoring is measured (step 4). The monitoring coating film can be used as a parameter for the ratio of the high-concentration anti-side liquid to the solvent. The steps can be carried out by the steps shown in Figures 7 and 8. The example of Fig. 7 is to dilute the anti-mite from the monitoring two-out nozzle 79, and the sputum is supplied to the roller % and opened on the roller % t Iff, heat treatment (Fig. 7 (8)), after that, the thickness of the coating film for monitoring is measured by the film thickness measuring device 85 (Fig. 7 (10), and then the cleaning roller is provided on the wire drawing plate 96 and formed on the wire plate 96 (10) 8 (8)), read, lie thick thief equipment (four) measurement formed in / If, supervision: control coating film thickness (Fig. 8 (b)), after cleaning the glass base - ~ (C)). When the 5 Hai special monitoring coating is carried out, the film reading pot after the first coating is defeated in the second half and the film can be monitored and coated by the device transferred by the ®9 or ig. For example, a steel conveyor belt ι〇ι is hung on the upper portion of the cylinders 104, 105' and one of the upper rollers is disposed directly above the control roller for dispensing, and the other is the upper nozzle 1G3. Between the top 23 1313623 and so on, the cleaning solution can be passed through the cleaning solution 1〇7, the transfer roller ft 102 ΪίΓ, and the cleaning solution. The lower light tube 105 is disposed with the spray rinsing nozzle 1 〇 8 and the gas is blown onto the towel like this device. The flow is discharged to the conveyor belt 1 〇t out of the nozzle 79. Dilution resistance _ The coating film is dried, and dried by a dry-pressure drying apparatus: followed by a coating process by applying a blowing gas to the secondary air blowing nozzle. Also set in the ^ easy ^ lack two (_ control. Also, the impact of bending, etc., stable to the ancient parts sound 3 - above, can be free from the conveyor belt 1 〇 dry drying please decompression; , small decompression pressure, := will be carried out::===) 23b minus to make it completely dry. In this way, by providing the heater no, the heater m can be transmitted, and the accuracy can be further improved. In the above, the resist liquid 15110 is changed to an oven. However, as an example of the coating film of the 疋 coating layer as shown in Figs. 7 to 13, the film thickness in the wet state may be measured from the age of Fig. U. , the cylinder 95, and on the roller 99 work 5 will be the liquid supply state by the film thickness measurement dream _,, the eye; 膘 (Fig. 11 (4)) 'after 'in the wet (2 points or more X map u ^ = the ^; after the coating film on the cylinder 95 changes with time ()), > the 冼 roll 95 (Fig. 11 (c)). Figure 12 24 1313623 Control cloth with flow nozzle 79 will dilute anti-liquid to small glass base. After discussion, .= (more than 2 points), (- (10) Figure 13 device is removed from the device of Figure 9. Decompression = cloth Hi when the mouth 79 is supplied to the Nai Weaving Ship = = coating film, and then the film thickness is measured in the wet state over time. The temporal change of the wet film thickness is formed, for example, the algorithm of Fig. 14 Calculate the dry film thickness after the solvent is volatilized. If the furnace uses the appropriate correct optical constant and the film thickness is formed, the film thickness of the target film is measured. J is ringing for baking, and then 'can be displayed at the same time. Monitoring coating and film thickness measurement of the device 1. The solvent in the anti-liquid solution of the insect evaporation is incomplete and changes from the axial thickness of the figure, the controller 9. The thickness measurement data is sent to the step 5). Whether the touch is in the range of the predetermined film thickness (when the judgment is within the predetermined range, the dilution anti-money agent is supplied by the anti-liquid supply mechanism, H:, the valve 75a is opened, and the pair 2 is first, the buffer grooves 71a and 71b In the sixth step, '. dilute the resist liquid. The buffer tank 71a can ## buffer tank 71a for 80% of the dilution anti-liquid% The amount required for coating the substrate is as follows (for example, the dilution anti-liquid is passed by ==7 to 6; =, the actual application is applied to the substrate g to apply the anti-surplus liquid. Further, it is stored in the buffer tank 71b.轱舳豳丨 轱舳豳丨 + 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人 人The back-receiving resist liquid and the solvent are supplied to the mixed ratio in a modified ratio, and the 70 meeting junction block 67 and the static mixer 68 are mixed, and the anti-side liquid is released from the ^2, and the above step 3 is performed. _Circulating the pipeline and "4 degrees again, proceed to the judgment of step 5. Usually, the rod の desert tank" is _ thick 敎 can be entered in a short period of about 5 seconds

The board, for about a minute, can be used in the conventional film J H degree. Therefore, the concentration period of the substrate can be performed piece by piece, and the concentration adjustment can be performed batch by batch. *,, 'also the monthly b agent line r in the anti-touch ability to master the dilute two ===, the soil in the "Hai,", the mouth of the month, the appropriate control of the proportion, = translation due to the coating during the coating The rolling adjustment of 2" 2 is performed twice: therefore, the production amount is not lowered. "Residual anti-fat solution used·5ΓΗ^Ρ3 7/: The anti-money solution of the buffer tank 71a or 71ί? is not in the established production zone, 84 833 ^ 83' ' times, the film thickness is measured. In the coating time, the measurement time of 1 * is 2, and the flow rate of the coating for the coating is from the monitoring buffer tank 77 to the monitoring frequency. Therefore, the monitoring amount is about 60% due to the substitution amount of about 3 (four) / /. If the volume of the static mixer 邰26 1313623 is set to circulate for _ 84 cycles, it is necessary to control the capacity of the buffer tank 77. 6〇mlΡ ^ 84=谷量编1 In the mode of measurement, the film thickness is measured in 1 minute. 2' times · . = 84.9 m1. The time when the correction amount supply time is assumed to be 3 seconds, the time from the ring of the Μ or 66 is the second division of the division: 84 Steps ^^ seconds make up = f in 2 times. Therefore, it is necessary to assume the actual condition at 44. The m is a ring of 519 mm/sec, which is also a realistic number. Therefore, 8 = flow rate. The concentration of the resist liquid is adjusted. The above-mentioned line method is filled with the above-mentioned "state" and can be variously deformed. For example, the nozzle is supplied with a long ruler. When the residual agent is supplied with the age of the cloth and the case of the miscellaneous coating, it is needless to say that the ratio of the ratio of the film thickness to the solvent is a coating film, but it is also applicable to the polypyrene 2 = glass as an example, but: It is suitable for use with lcd. 疋..., fascinating, ferroconductor wafers, etc., other substrates can also be [simplified in the drawing] 右明—the anti-diffuse coating and development processing system with anti-coating device Fig. 2 is a schematic view showing the anti-coating device of the present invention. (S) 27 1313623 FIG. 3 is a schematic cross-sectional view showing a substrate transfer mechanism of a resist coating apparatus according to an embodiment of the present invention. Fig. 4 is a schematic perspective view showing a resist supply nozzle of a resist coating apparatus according to an embodiment of the present invention. Fig. 5 is a resist liquid supply system and a control system in a resist coating apparatus according to an embodiment of the present invention. Fig. 6 is a flow chart showing the steps of the resist liquid coating treatment. Fig. 7 is a view showing the monitoring of the coated coating film by measuring the coating of the diluted resist liquid on the roll and measuring the dry state. Step △ Figure 8 shows the step of monitoring the coating of the diluted resist liquid on the glass substrate and measuring the film thickness of the coating film in the dry state. ', , 9 series are displayed on the shift conveyor to monitor the coating dilution and measure An example of a device for monitoring the film thickness of a coating film in a dry state. Another example of a device for monitoring the coating film thickness on a conveyor belt for monitoring and drying, and measuring the film thickness of the coating film in a dry state. And the change of the wet state of the control of the cloth film to obtain the step of the supervision of the thick layer of the step. The glass plate monitoring and coating of the diluted resist liquid, and the film thickness of the wet film is monitored to obtain the thickness of the film. step. Supervision (4) Closing and Resisting and Measuring Wet Figure 14 shows an example of the change over time of wet and thick. [Description of main component symbols] G substrate C cassette TITLER subtitle generator EE peripheral exposure device 1 cassette station 28 1313623 2 processing station 3 interface station 4 exposure device 9 mounting table 10 transport path 11 transport device 11a transport arm 12 pedestal 12a Base portion 12b Coating pedestal portion 12c Carrying pedestal portion 13 Substrate conveying mechanism 14 Coating liquid outflow mechanism, Resist supply nozzle 14a Case 14b Resist flow outlet 15 Nozzle cleaning unit 16 Gas ejection port 19 Substrate transfer arm 20 Nozzle moving mechanism 21 scrub cleaning processing unit (SCR) 22 excimer UV irradiation unit (e-UV) 23 resist processing unit 23a resist coating device (CT) 23b vacuum drying device (VD) 24 development processing unit (DEV) 25i line UV irradiation unit (i-UV) 26 first heat treatment unit portion 27 second heat treatment unit portion 28 third heat treatment unit portion 29 1313623 30 vertical drive mechanism 31 heat treatment unit block (TB) 32 heat treatment unit block (TB) 33 first conveying device 34 heat treatment unit block (TB) 35 heat treatment unit block (TB) 36 second conveying device 37 heat treatment unit block (TB) 38 processing unit block (TB) 39 third conveying device 40 space 41 shuttle Device 42 Conveying device 42a Transport arm 43 Buffer pedestal (BUF) 44 extension • Cooling pedestal (EXT · COL) 45 External device block 47 Top lift pin 48 Adsorption pad 49 Seat portion 50 Connecting member 51a Substrate holding member 51b Substrate holding member 52a Linear guide member 52b linear guide member 53X shaft drive mechanism 54 strut member 55 strut member 56 cross drive mechanism 30 1313623 61 high concentration resist liquid tank 62 duct 63 ie barrel 64 solvent tank 65 conduit 66 D, cylinder 67 rendezvous block 68 Static mixer 69 diluted resist liquid feed conduit 69a conduit 69b conduit 69c conduit 70 mixing portion 71a buffer tank 71b buffer tank 72a conduit 72b conduit 73 conduit 74 cylinder 75a opening and closing valve 75b opening and closing valve 75c opening and closing valve 76 three-way valve 76a opening and closing valve 76b opening and closing valve 77 monitoring buffer tank 78 monitoring conduit 79 monitoring coating mechanism, monitoring coating outflow nozzle 80 cylinder 31 1313623 81 opening and closing valve 82 returning conduit 82a conduit 82b conduit 82c conduit 83a opening and closing valve 83b opening and closing valve 83c opening and closing valve 84 cylinder 85 film thickness measuring device 90 control mechanism, controller 92 control mechanism, processing controller 93 user interface 94 memory portion 95 roller 96 glass substrate 100 resist coating and development processing system 101 conveyor belt 102 upper roller 103 upper roller 104 lower roller 105 lower roller 106 vacuum drying device 107 cleaning tank 108 spray washing nozzle 109 gas blowing nozzle 110 heater 111 cooling blow nozzle 118 head scanning mechanism 32 1313623 120 nozzle cleaning head

Claims (1)

1313623 X. Patent application garden: A coating processing device, comprising: a liquid sending portion for sending a high concentration coating liquid; a glutinating portion for delivering a solvent; a liquid; The portion and the solvent delivery portion are connected by a catheter, and the /X fresh U lion is combined to form a diluted coating structure of a predetermined concentration, and the diluted coating liquid flows out to form a coating film on the substrate; The mixing unit supplies the diluted coating liquid formed in the mixing unit to the coating liquid outflow mechanism, and monitors a parameter which is an index of the mixing ratio of the high/length coating liquid and the solvent; the switching mechanism 'dilutes the dilution formed in the mixing portion The coating mechanism side is switched to the monitoring unit side; the material is similar to (4) the camp machine out #盘 it! The mechanism i is based on the monitoring material monitoring parameter to turn off the high concentration coating is the county mosquito fine, and the town financing type implementation control: In the case of the range, the μm-degree coating which is sent out from the high-concentration coating liquid is applied to the coating vessel, and the delivery destination of the diluted coating liquid is set to the coating liquid discharge mechanism side. 2. The coating treatment apparatus according to claim 1, wherein the thickness of the coating film of the coating liquid is diluted. a coating processing apparatus of τ /, a plurality of horses and three types, comprising: a 咼/spread coating liquid sending portion for sending a high concentration coating liquid; a solvent sending portion 'for sending a solvent; and a mixing portion' Coating; the night delivery unit and the solvent delivery unit are connected by a catheter, and the horse concentration coating liquid and the lysate are combined to form a liquid-transfer coating liquid discharge mechanism that is diluted to a predetermined concentration. The diluted coating liquid flows out to form a coating film on the substrate. Dilute the coating liquid feeding conduit, and deliver the diluted coating liquid from the mixing portion toward the coating liquid outflow mechanism feed 34 1313623; - supply: a supply mechanism through which the coating liquid outflow mechanism is supplied to the coating liquid outflow mechanism and The purpose of tearing the lye surface is ΐίΐίϊϊ: the switching mechanism is set so that the diluted coating liquid is fed and diluted, and the thickness of the coating film coated by the S-structure is determined by the sparsely mixed circulation portion; the sewing liquid and the solvent == ====定,=, determine the high-concentration control: when the mixture is fed to the predetermined fine S 3, the diluted coating liquid circulation unit adjusts 4 the high-concentration coating liquid and the solvent to be sent. 'Narrowing the mixing ratio of the mixing agent in the predetermined range; diluting the coating (4) the destination mechanism to enable the coating processing device to meet the turbulent flow state; And the static mixing 5. The coating dispensing mechanism according to item 3 of the patent application has a slit corresponding to the width of the substrate, and the coating liquid flow state in the surface m' f is made while performing a relative linear motion; Interval 6. If the application of the third aspect of the patent application is made, the first opening and closing valve is provided, and the supply of the rare cloth liquid and the towel of the switching mechanism are performed from the dilution coating > night road f; 2;; guide & the diluted coating liquid: liquid transfer conduit to the diluted coating liquid supply mechanism ^ release coating 35 β13623 7. The coating liquid supply mechanism of claim 3 of the patent scope has: a buffer tank, diluted with = The coating cylinder is used for the coating liquid from the 嶋 即 , ie, the application of the paste _ 7 . The diluted coating liquid corresponding to one substrate is deposited. The cleavage '... in the 'buffer tank storage 9. If the patent is applied for The coating liquid supply mechanism of the seventh item has two sides The groove is dripped, and the towel is diluted with the coating liquid outflow mechanism to ship. #作做one and the 10. According to the third to the ninth aspect of the patent application, the monitoring and coating mechanism has the following: a coating processing apparatus for extracting the diluted coating liquid; a coating e-out nozzle; a cloth liquid circulation part taking end; and monitoring which tube is used for coating, and supplying the monitoring application tube to the monitoring coating outflow nozzle before the monitoring tube Dilution part of the diluted coating liquid. ～Drinking, Han quilt body, coated with 11. According to any one of claims 3 to 9, the coating liquid circulation part has: a monitoring buffer tank, which will be used = at the time of storage; returning the conduit from the monitoring buffer; and the circulating backing, provided in the return conduit for diluting the coating to the guide 12. For example, the coating fabric mechanism of claim U Having: a monitoring catheter, wherein the monitoring coating monitors the coating bribe, and the monitoring catheter is used to circulate the coating liquid from the diluted coating liquid; and the coated body is coated with no i. Coating area of item 10 of the patent scope The apparatus, wherein the object is coated, and the side is monitored by Wei Lai. 4. The coating processing apparatus according to the first aspect of the invention is the substrate for monitoring, and the object to be coated is a substrate for monitoring, and While causing relative movement between the age and the monitoring substrate, the supervision device 36 1313623 15. The coating processing device as disclosed in claim 10 is disposed on the conveyor belt of the majority of the delivery tube; Coating treatment of the 15th item of the range = use of the snail snail fresh cake (10) New — 该 该 如 如 如 如 如 如 如 如 如 如 如 专利 专利 专利 专利 专利 专利 g g g g g g g g g g g g g g g g g g g g Film thickness measurement is performed directly on the top of the cylinder. The coating treatment method is characterized in that: the liquid level coating liquid is mixed with the liquid, and the diluted coating liquid formed in the mixing portion is extracted by a dilution coating of a predetermined concentration. The step of the parameter of the ratio of the solvent to the solvent; 15 is the step of determining whether the high-concentration coating is within the predetermined range according to the parameter of the monitoring; Μ, the proportion of the agent is determined when Mixed ratio is in the established a step of mixing the ratio of the liquid to the solvent; the machine is very coated (4) in the range of the specified range 'the step of applying the diluted coating liquid on the substrate to the donor liquid outflow mechanism donor; the next step is to touch the New Zealand coating The ratio of the core to the dissolved age is a step of a mixture of the coating liquid and the solvent when the ratio of the coating liquid to the solvent is determined. π A difficult degree 19. The coating film thickness of the diluted coating liquid as applied in the coating item No. 8 of the patent application. 4 μ / number is 20. A coating treatment method, which is characterized by having a high-concentration coating core and a solution vessel as a dilution coating solution diluted to a predetermined concentration, for the sub-substrate, implementing 37 1313623 Step of cloth liquid; Fen: Step of monitoring coating; In the case of liquid and range, adjust the case of the high-concentration coating in the wire circumference, and apply the diluted coating liquid to the coating: The step of mixing the proportion of the solvent. ° Weekly tidy agronomic coating liquid and the coating of the smear of the smear of the smear of the smear of the smear of the smear of the smear The diluted coating solution is flowed out to feed. Control coating 24. The coating treatment of the Scope of the Patent No. 23, the leaching solution of the lion nozzle is in any one of 38 1313623. 25. The coating treatment method according to claim 23, wherein the coating film thickness is determined. The step is to measure the film thickness directly above any of the transporting light cylinders. The coating treatment method according to any one of claims 21 to 25, wherein the film thickness measurement is performed by drying the coating film formed by the monitoring coating. 27. The coating treatment method according to any one of claims 21 to 25, wherein, in the film thickness measurement, the film thickness is calculated based on a film thickness change of the coating film formed by the monitoring coating. , ' 28. A computer-readable memory medium, the memory has the computer to execute the control process 5 body', characterized in that the control program is implemented in the implementation of the application ^ Li · Items 18 to 25 One way of doing this is to make the computer control the coating process to crack. Ten ~, 囷 type: 39