TWI263542B - Apparatus for and method of processing substrate - Google Patents

Abstract

To inhibit application unevenness by optimizing the state of a slit nozzle. In a slit nozzle 41, the first lip side 410a of a first lip 410 is arranged in the position where only a level difference D is lower than the second lip side 411a of a second lip 411. Preliminary application processing is performed by applying resist liquid to a roller 71 of a spare applying member while making the slit nozzle 41 scan in the direction ((-X) direction) opposite to the scanning direction ((+X) direction) of the slit nozzle 41 in this application processing. The application processing is performed by applying the resist liquid to a substrate 90 while making the slit nozzle 41 scan in the direction (+X) which is normalized by the preliminary application processing.

Description

[Technical Field] The present invention relates to a glass-angle substrate for liquid crystal, a semiconductor wafer, a flexible substrate for a thin film liquid crystal, a substrate for a photomask, a substrate for a color filter, and the like. A technique of applying a treatment liquid such as a photoresist to the surface of a substrate (hereinafter simply referred to as "substrate"). More specifically, there is a technique for normalizing the nozzle state in order to improve the coating accuracy.

[Prior Art] Conventionally, a substrate processing apparatus which applies a treatment liquid such as a photoresist to a surface of a substrate is known. As such a substrate processing apparatus, it is generally known to use a slit nozzle including a slit-like discharge portion to perform slit coating for forming a coating film (slot coating). In the slit coating in which the coating film is not subjected to the spin treatment after the coating, the variation in the coating film thickness (hereinafter referred to as "coating unevenness") directly becomes a defect in the width of the product wiring (bad The reason sentence 〖avoids the specific state of the cloth processing. More specifically (4), as shown in the side view of Fig. u and Fig. 12, it is most desirable that the front end portion of the slit nozzle 341 covers the entire length direction of the slit nozzle. The lower end 1M of the nozzle 34 is in a state where the processing liquid B is not present (Fig. (1)': a state in which the liquid is left in the lower end surface of the slit nozzle 341 (Fig. 12). In short, slitting Front end of mouth 341:: No long-side direction and wide direction, ', take 対^b to be uniform. But 疋, when applying coating repeatedly> 乂山图13不, slit mouth 341 (4) The treatment liquid (6) is sometimes attached to the side. Thus, „

The Ba system interferes with the treatment liquid B discharged from the discharge port 341 and reduces the coating treatment. 104395.doc U63542 You: "" and causes uneven coating. In order to resolve this, in the sew coating & use the washing liquid to clean the opening of the nozzle before the end of the cleaning, right / even if this cleaning process, as shown in Figure 14 of the cleaning liquid R (or Air) I: Entering the discharge port 341a. Therefore, it is difficult to adjust the other end portions of the slit nozzles to a uniform specific state. Therefore, it has been known from the past that various techniques for recovering the state of the slit nozzle are known, for example, from Patent Document 1. In Patent Document 1, the technique of applying a hydrophobicity to the side surface of a slit nozzle or the like is such that the treatment liquid is not attached. However, since only the leading ends of the lm and J slit squirts are applied, the cost increases and the slit nozzle becomes expensive. In addition, the coating treatment may be caused by the heat treatment, which may cause distortion in the slit nozzle. :: In the slit coating, the liquid is discharged in a state where the slit nozzle is brought close to the outer circumference of the substantially circular roller 5 of the rotation, whereby the end portion of the slit can be adjusted to the front. u, the uniformity shown in Figure ^ (, Gentleman's patent documents 2, 3). This process is performed on the basis of the original and the cloth, so it is called "pre-coating process (pre-coating)" [Patent Document 1] JP-A-2002-282760 [Patent Document 2] [Patent Document 3] Japanese Patent Laid-Open No. 167476 (problem to be solved by the invention), _ only the above-described preliminary coating treatment is performed, and it is difficult to open the slit nozzle The heart of the king is the most appropriate. Therefore, for example, it is necessary to perform the cleaning process of the slit nozzle 104395.doc 1263542 or the like every time a certain number of times of processing, or special time is performed. Then, the production of the slit spray is reduced. 'Inb, during the period' due to the interruption of the coating technology needs to be further improved. 4 'The state of the normalized slit nozzle is prepared by the pre-coating treatment, and the mixture is mixed with the specific cleaning liquid, and the treatment liquid is a long-length blade, which can be obtained from the roll. The film on the outer peripheral surface of the roller is removed by Young's number of turns: 6 weeks. Generally speaking, the scraping _, MPa to 653 GMPa, the composition of polyethylene, polythene, and the like. As the size of the substrate is increased, the size of the slit nozzle for slit coating is also increased. Therefore, the dimension of the longitudinal direction of the roller is also increased as the diameter of the roller increases. Medium...: Due to the weight of the roller itself, the long side of the roller is on the + side. Therefore, it is difficult to arrange the outer surface of the roller in a straight line in the direction of the rigorous position. The above-mentioned sheet to which the attachment of the roller is removed can be arranged in a straight line along the roller. Therefore, when the outer peripheral surface of the roller is on the long side = when it is non-linear, the outer peripheral surface of the portion is weak, or the blade is not weakened by the blade, or the blade and the roller are not Where to contact. And the portion of the fruit is produced by the residue on the outer surface of the roller which cannot be removed by the blade, so that the residue hinders the adjustment of the slit nozzle to a specific state. In the inventor of the present invention, in order to optimize the shape of the slit nozzle, it is the first object to suppress coating. Further, the present invention is a second object of removing the roller of the roller from the entire longitudinal direction of the roller, 104395.doc 1263542. SUMMARY OF THE INVENTION A substrate processing apparatus for solving the above-mentioned problems, such as the claim item & the invention, includes: holding the substrate; and maintaining the beauty of the holding mechanism in the direction of the first direction scanning. The discharge port is at the same time as the above-mentioned substrate discharge portion 2'a, 丄, from < slitting, and 乂 乂 乂 预备 预备 开 开 开 则 则 则 则 则

It is for the aforementioned! The direction is almost reversed (4) The face of the W-belt member 4 4 The direction of scanning the surface of the aforementioned preliminary coating member is 'relatively moving the moving mechanism of the surface of the slit nozzle coating member', the position of the surface is X in X-shan again" In the middle, the slit nozzle is placed on the first lip surface on the first direction side of the discharge port, and the second square Chen & The lip surface, the first surface of the second lip portion protrudes from the discharge direction of the treatment liquid, and the invention of claim 2 relates to the invention of the request item. Ten, the cat is very 1 earth plate processing equipment, "/ coating member, is a substantially cylindrical member ^; L tempo mechanism, the surface of the coating member is prepared by the above-mentioned slitting spray. (2) The substrate processing apparatus of the invention of claim 2 is more prominent, and the adjustment mechanism of the first lip surface is larger than the second lip surface. , w board (four) about request items 1 to 3... out 30 ^ put the order of 'the first lip part is more than the aforementioned part of the face protrusion 1〇4395.d〇c 1263542 Also, the invention of claim 5 is about the request The substrate processing apparatus according to the invention of claim 2, further comprising a long-sized blade which removes the adhering matter of the surface by a surface I of the preliminary coating member, wherein the blade has a Young's modulus of 1 It consists of an elastomer in the range of MPa to 20 MPa. Further, the invention of claim 2 is the substrate processing apparatus of the invention of claim 2, further comprising a long-sized blade which is removed by abutting the surface of the preliminary coating member; The aforementioned blade is made of rubber and sister. Further, the invention of claim 7 is characterized in that the processing liquid is discharged from the discharge port of the slit nozzle, the substrate processing method of the substrate coating processing liquid, and the holding step of the substrate is held; In the main coating step of the substrate coating, the substrate is scanned in the first direction, and the main coating step of the substrate coating treatment liquid is performed, and the slit nozzle can be reversed in the direction of the tray 1 In the second direction scanning mode, the relative movement is: - the surface of the cloth member and the coating step of the preliminary coating member; wherein, in the main coating step and the front center =, it is set to it, +, 1 Ϊ The shell-coating step is lower than the first lip surface on the first direction side of #PP, and it is placed lower than the position before the spout. The invention of the second roll portion on the second direction side is provided in the d-be 8 and is characterized in that the plate processing method is performed; and the preliminary coating step is performed on the basis of the invention of the former; ...Before the description of the main finishing step, the "S" is followed by the actual coating step, and the invention of Item 9 is applied to the substrate coating process. And including: extending along the direction of the substrate of the large substrate, in the third direction, the third party I04395.doc -10- a^W542 to the fourth level of the normal level of the fourth substrate on the substrate spit two, + , + 〇, for the relative movement of the above-mentioned substrate, and can be processed in the right direction, extending in the right direction, the slit nozzle of the ϋ ^ liquid, and the third ^ 1 error along the edge, because of the outer peripheral surface, you a sputum, spleen a, +, ^ 攸 攸 攸 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开 开The long-length blade of the attachment of the outer peripheral surface of the outer mu I, which is extended by the outer and the gimbal, and the "dry", the shaving blade is made of the elastic body of the Young's _. "The number is -a to 2 〇 MPa in the range of the plate treatment, G & Ming is characterized by the base of the substrate coating treatment liquid = device, and includes: extending along the third horizontal direction The third direction is orthogonal to the substantially 弑^α 炙 fourth direction, and the substrate is relatively moved and can be on the substrate

The slit nozzle of the treatment liquid is extended in the direction of the stalker U, and the funeral 仏L Lu &> _ "; the outer peripheral surface is spouted from the aforementioned slit nozzle The nozzle's life, the ^ ^ ^ 调整 调整 调整 调整 调整 调整 调整 调整 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴A long-sized blade of the attachment, wherein the blade is made of rubber. Further, the invention of claim 11 is made in the substrate processing device of #9 or 1 〇, and the thickness of the blade is in the range of 0 5 _ to 1 〇 _. Further, the invention of claim 12 is described in the request item 9 or the substrate processing apparatus, further comprising & ^ + 3 in the third direction, wherein the blade for the roller is partially adjustable Press the pressure adjustment mechanism. Further, the invention of claim 13 is the substrate processing device described in claim 12; wherein the adjustment mechanism is partially changed by the third direction 104395.doc 11 UW542 for the aforementioned roller [effect of the invention] From the angle of the cymbal, adjust the aforementioned force. In the invention described in 1 to 8, the base surface of the scanning and holding in the first direction is: 2: the first lip of the slit nozzle of the substrate discharge processing liquid is nearly reversed. The kneading surface protrudes in the discharge direction of the treatment liquid. The method of moving the surface of the slitting spray member to the first side is described on the surface of the smear element, and coating unevenness can be suppressed. According to the invention of claim 2, the preliminary coating system is provided, and the moving machine m 1 has a surface in which the soil cloth member has a substantially cylindrical structure, and the slit nozzle scans the preliminary coating member in the second direction. In the invention of claim 3, the rough surface is larger than the second lip portion, and the first lip is processed in one step, and the night is planted in the night. The (4) organization, for example, can make position adjustments according to the type of inside/night. ° has been carried out in the invention of claim 8, the preparation is carried out first, the main cold your half-track cloth is more than the above-mentioned main coating walk, because it can be used in the mang, "after the preparation of the coating step, the actual take-up is optimal The slitting nozzle coating process (4) immediately performs the main coating of the substrate to the south precision coating processing liquid. With the inventions of claims 5, 6 and 9 to 13, the shape of the outer surface of the surface is deformed, so that the charm Since the sheet may be along the roller core, covering the entire 3'th, even if the weight is bent or biased, the =3 direction wiper can contact the outer circumference of the roller. The third direction of the cullet can be removed. In addition, the balance of the deformation state of the hair strand is requested, in particular, the durability of the blade can be obtained and 104395.doc 1263542, in particular, by the invention of claims 12 and 13 Since the pressing force of the blade of the roller can be adjusted, the portion where the pressing force of the blade is weak in the third direction portion can be adjusted, and the object of the roller can be removed even if the direction is removed. In particular, it is easy to change this pressing pressure by means of the ^^ system. "Invention of 13, [ Hereinafter Shi embodiment 'of the present detailed description made with reference to add & lt pay drawings; Embodiment 1 > and only through congested nose shape. <^1·Structure of Substrate Processing Apparatus> Fig. 1 is a perspective view showing an embodiment of the present invention. In addition, the middle is 7 with the figure 2: the direction of the sense axis is the direction of the straight line, and the plane of the χγ plane is the horizontal plane. However, the definition of the positional relationship is not limited to the following descriptions. The door. The following slit coating 1 is roughly divided into an electrode substrate "" of the coating processing portion 2 and the control portion", and is selectively formed on the surface of the substrate 90, and the surface of the substrate 90 is coated on the surface of the substrate 90. Night: Coating treatment. Therefore, in this embodiment, the photoresist is opened. Further, the slit coating 1 system can be modified not only by liquid crystal display, but also by the glass substrate device, and can be deformed by using various coating treatment liquids for the panel display, and the coating processing unit 2 is used. It functions as a holding table for holding the substrate 9A, and also includes a platform 3 that functions as a base for each of the attached mechanisms. W4395.doc 1263542 Flat mouth 3 series of stone products, for example, integrally formed in the shape of a cube, the upper surface (holding surface 30) and the side surface are processed into a flat surface. The upper surface of the platform 3 is formed into a horizontal plane and is a holding surface 30 of the substrate 90. The holding surface 30 is formed with a plurality of vacuum suction holes (not shown). In the slit coating 1, the substrate 90 is held by the substrate 90 while the substrate is being processed, and the substrate 90 is held at a specific X flat position. Further, a plurality of lift pins Lp which are vertically movable up and down by a boat moving step (not shown) are provided at appropriate intervals on the holding surface 3'. The lift pin calls the LP to be used to push the substrate upward when the substrate 9 is removed. The both end portions ' of the holding surface (the region of the material base (4)) of the holding surface 9G in the holding surface 30 are extended in the substantially horizontal direction in parallel to the traveling track 31. The running track 31 is the same as the supporting block which is fixed to the lowermost end portions of the bridge structure 4 and not shown, and guides the movement of the bridge structure 4 (the moving direction is regulated in a specific direction), and constitutes the bridge structure 4 support. To maintain (four). Linear guidance. Above the platform 3, a substantially horizontal h 2 bridge configuration 4 from both sides of the platform 3 is provided. The carriage structure 4 is mainly composed of, for example, a nozzle support portion 40 which is made of a carbon fiber reinforced tree, and a lifting mechanism that supports both ends thereof. A slit nozzle 41 is attached to the nozzle support portion 40. In the drawing, the slit nozzle 41 including the longitudinal direction in the γ-axis direction is connected to a pipe containing a photoresist for the slit nozzle 2 or a light-resistance (s) slit nozzle 41 of a light duck or the like. The "light-resistance liquid supplied from the photoresist" is spit out of the surface of the substrate 9 to be referred to as "photoresist coating field", and the substrate (four) is greened. Also, '104395.doc _ 14· 1263542 The term "resistive coating area" refers to the area of the surface of the substrate 90 where the photoresist is to be applied, and generally the specific width of the substrate 90 is removed from the entire area of the substrate 90. The area of the area. Further, the slit nozzle 4H not only scans the substrate 9 but also scans the surface of the roller 71 (Fig. 2) beforehand and applies the photoresist. The detailed actions of the slit coating are described later. The elevating mechanisms 43, 44 are connected to the slit nozzles 41 by the nozzle #support portion 40 on both sides of the slit nozzle 41, respectively. The elevating mechanisms 43 and 44 are mainly composed of AC servo motors 43a and 44a and a ball screw (not shown), and generate and lower the driving force of the bridging structure 4 based on the control signal from the control unit 8. Thereby, the squatting mechanism 43, 44 is followed by the lifting slit nozzle 4 in parallel. Further, the lifting mechanisms 43 and 44 can also be used to adjust the posture in the plane of the slot 2 of the slot nozzle 41. At both end portions of the bridge structure 4, along the edge sides of the platform 3, each of which is fixedly disposed to include a pair of stators 50a (state) and a moving sub-port 5b and a fixed sub-5丨& and a moving sub-51b The AC coreless linear motor 5〇, 51 (hereinafter referred to as "linear motor"). Further, linear encoders 52 and 53 each including a scale portion and a detector are fixedly disposed at both end portions of the bridge structure 4. The linear encoders 52, 53 detect the position of the linear motors 50, 51. These linear motors 5, 51 and the linear encoders 52, 53 are mainly composed, and the bridging structure 4 is guided to the traveling track 31 while moving the traveling mechanism on the platform 3. The control unit 8 controls the movement of the bridge structure 4 on the work platform 3 based on the detection results from the linear encoders 52 and 53 and the control of the bridge structure 4 on the work platform 3, and the control is always generated by the slit nozzle 41. Scanning of the substrate 9〇. 104395.doc -15- 1263542 In the holding surface 30 of the coating processing unit 2, an opening 32 is provided on the (_χ) direction side of the holding area. The opening 32 is the same as the slit nozzle 41 in the longitudinal direction of the ¥ axis direction, and the length in the longitudinal direction is substantially the same as the length in the longitudinal direction of the slit nozzle 41. Fig. 2 is a side view showing the construction of the preliminary coating mechanism 7 in the opening 32. Although not shown in Fig. 1, a preliminary coating mechanism 7 is provided inside the coating treatment portion 2 below the opening 32.

The preliminary coating mechanism 7 is previously applied to the substrate 90 by applying a photoresist (main coating treatment), and is used in a preliminary coating treatment (described later). The preliminary coating mechanism 7 includes a casing 70, a pre-coating roller 71 (hereinafter simply referred to as "roller"), a rotating mechanism 72, and an attachment removing portion 74. The deposit removing portion (10) includes a blade 73 for liquid removal. As shown in Fig. 2, the casing 70 is formed by exposing a part of a member having a substantially box shape from above. The internal storage in the casing 7 can be adapted to: a cleaning liquid in a part of the coated surface of the crushing shaft 71. Further, the details are not shown in the figure. However, the stored cleaning liquid is supplied from the cleaning liquid supply unit, and is discharged from the casing 70 by overflow or incompleteness. Further, it is preferable that the washing liquid is a volatile liquid containing a photoresist liquid-soluble component, but it is of course not limited thereto. The cylindrical roller 71 is formed by the slit nozzle 41 at the time of the preliminary coating process to form a coated surface of the coating photoresist. Also #, roller π = as the preliminary coating member of the present invention. The center of the cylinder of the roller 71 is the pivoting force of the shaft to the shaft center p of the roller 7丨. The rotation mechanism 72 is not shown in detail. The rotation of the driving force is generated by the generator. 104395.doc -16- 1263542 The mechanism that constitutes the circular member such as the rotational driving force. The rotational driving force generated by the 疋 motor is rotated clockwise in FIG. 2 via the ring member: 71. Thereby, the roll 2; the cloth surface and the slit nozzle 41 are relatively moved. In addition, by rotating the roller 71 by the rotating mechanism 72, the stored cleaning liquid is immersed. Further, the portion impregnated in the coated surface is taken out from the washing and washing by the rotation of the roller 71. In the preliminary coating mechanism 7, in the preliminary coating mechanism 7, by applying the roller 7 to the cleaning liquid, it can be removed and applied to the coating in the preliminary coating process. The second time. The 'and' mechanism for washing the coated noodles is not limited to the structure. For example, it can be placed in the basket (four) to be sprayed toward the coated surface. ^In the case of the housing 70, the internal fixed setting includes Benqi 7ZL wu Yu Xin The attachment of the blade 73 is removed #74. The blade 73 is slightly pressed against the coated surface of the roller 71, and is uniformly abutted in the Y-axis direction. When the state is rolled (four), the blade is moved relative to the coated surface. The blade 73 is used to remove and remove the adhering surface. The preliminary coating mechanism 7 performs a preliminary coating operation, and the trailing mechanism and the lowering mechanism 43 and 44 are placed at a position shown in FIG. 2 (hereinafter referred to as a preliminary coating position); the slit nozzle 41 is opened. That is, in the preliminary coating process, the slit squeegee 41 is substantially in a stationary state. Fig. 3 is a view showing a slit nozzle 41 disposed at a preliminary application position. The slit _ is attached to the nozzle support. Below the portion 4, the lip portion 41 2 lip portion 411 and the shim plate 412 are included. The first shame portion 410 and the second lip portion 411 are as shown in Fig. 3, and have substantially the same shape 104395.doc 1263542. The member is formed so as to meet the slit nozzle 41. The lower end of the first lip portion 410 is the first lip surface 410a disposed in the substantially horizontal direction. Similarly, the lower end of the second lip portion 411 is The second lip surface 4 Ua is disposed in a substantially horizontal direction. Further, the first lip surface 410a and the second lip surface 41 la are both coated with a photoresist liquid, and both of them are The surface of the surface of the object to be coated (substrate % or roller 71). In the slit coating 1, the space between the first lip portion 410 and the second lip portion 411 is formed. The flow path (not shown) of the photoresist liquid in the slit nozzle 41 is formed, and the opening of the flow path in the (-z) direction forms a discharge port 41a (slit). The lip surface P is disposed on the (+X) direction side of the discharge port 41a, and the second lip surface 41a is disposed on the side of the discharge port 41a. As shown in Fig. 3, the second lip portion 41 is attached to the nozzle support portion 40 via a shim plate 412. Therefore, in the i-th lip surface 41〇a, only the thickness component (step D) of the shim plate 412 in the two-axis direction is protruded in the (-Z) direction from the second lip surface 411a. Thus, by using the shim plates 412 having different thicknesses, the shim plate 412 can function as an adjustment mechanism for adjusting the step of the first lip surface 410a and the second lip surface 411a. Further, in the slit coating 1 of the present embodiment, the Z-axis direction indicates the vertical direction, so the first lip surface 41〇a is disposed at a lower position than the second lip surface 411a. In the slit coating 1, the photoresist liquid is supplied to the slit nozzle 4 1 from a supply port (not shown), and the photoresist liquid flows through the flow path in the slit nozzle 4, from the discharge port 4 1 & (-ζ) direction spit out. That is, the first lip surface 41〇a is smaller than the second lip surface. Only the step D is protruded in the (-Z) direction, and the discharge direction of the photoresist in the slit coating j is (-Z) direction, so the i-th lip surface 41〇a becomes the second lip Face 104395.doc -18- 1263542 411a, prominent in the mouth + gentleman ^,,, out direction. In other words, in other words, it means that the slitting nozzle 41 is in the coating process (main coating process and preliminary coating process)! The lip surface 41〇a' is closer to the object than the second lip surface 41 la. In the control unit 8, the control unit 8 includes a calculation unit 8 for processing various kinds of data, and a storage unit 81 for storing programs or various materials. Further, in the front panel 3, the operator inputs a necessary instruction to the slit coating, and a display portion 83 for displaying various materials.于: The system is shown in Fig. 1, and is electrically connected to the respective mechanisms and the cloth processing unit 2 by a cable (not shown). The control unit 8 controls the lifting operation by the elevating mechanisms 43 and 44 based on signals from various sensors or the like that are not shown in the operation unit 82, and is caused by the traveling mechanism. The slitting spray 41 is operated, and the scanning operation of the slit nozzle 41 caused by the rotating mechanism is further advanced. As a specific example of the hexadecimal portion 8 1 , it is equivalent to R 〇 M and a disk device which are dedicated to temporarily storing data. However, the memory unit 8 1 can be replaced by a removable media such as a floppy disk or a memory card, and the like, and the reading device can be used as a separate operation. 卩 82 has a button and a switch (including a keyboard and a mouse). Alternatively, the touch display can also function as the display unit 83. The liquid crystal display, various lamps, and the like correspond to the display unit 83. <1-2. Structure of Substrate Processing Apparatus> /, Person's Summary 9 The photoresist coating operation by the slit nozzle 4 is shown. Further, in particular, the following operations are controlled by the control signal from the control unit 8, in particular. FIG. 4 is a flow chart illustrating the operation of the slit coating 1. Apply in the slit! In the case of 104395.doc 19 1263542, the substrate 9 is sent to the lift pin Lp by an operator or a transfer mechanism not shown. After the lift pin LP receives the substrate 90, it starts to descend and is buried in the stage 3, and the received substrate 90 is placed on the holding surface 3〇. Thereby, the substrate 9 is placed at a specific position on the holding surface 30 of the stage 3, and remains adsorbed (step § 1). Unlike the carrying-in process of the substrate 90, in the slit coating}, before the main coating process, the optimum process of returning the front end portion of the slit nozzle 41 is performed, that is, the preliminary coating process is performed (step S2). . • In the preliminary coating process, first, the linear motors 50 and 51 move the slit nozzle 4 1 ' in the X-axis direction and are disposed above the roller 7} of the preliminary coating mechanism 7. The eight-person, lifting mechanism 43, 44 adjusts the posture of the slot nozzle 41 in the plane of the ¥2 plane and simultaneously closes the slot nozzle 41 to the roller. Thus, the slot nozzle 4 1 is Move to the preparatory coating position (Fig. 2 and Fig. 3): After the slit spray purple 4 1 is moved to the preliminary coating position, the control is controlled from the control 4 彳 § 'the photoresist supply mechanism is the slit The nozzle Μ is supplied with the photoresist liquid, and by this, the discharge is sputtered from the discharge nozzle of the slit nozzle, and the discharge is made synchronously with the photoresist, and the rotary mechanism 72 is rotated by the roller. The coating is coated with a photoresist solution, and a preliminary coating treatment is performed. Although the slit nozzle 41 is in a nearly stationary state, the slit nozzle 41 and the coated surface are relatively moved by causing the knob 72 to rotate the roller 71. In the sweat-sand cloth 1 , the coated surface of the coated fabric by the rotating mechanism 72 is ready to be scanned for the slit coating 41 in the processing. The direction of rotation of the cold main fabric prepared by the preliminary coating treatment is the clockwise direction in Figs. 2 and 3. Therefore, the relative movement direction of the slit nozzle 41 in the pre-saw main cloth processing and the coated surface is A, , , , , . However, the portion of the photoresist 71 coated with the photoresist (the portion scanned in the instant of coating 104395.doc -20-1263542) is the highest point of the roller 7ί is the maximum point). Therefore, for example, even if the coated surface is rotated, the scanning direction of the opening nozzle 41 at the instant of application is the direction of the wiring of the direction, that is, the (_x) direction. Paired rotation: As will be described later, in the slit coating m main coating treatment, the slitting is performed in the (four) direction sweep (four) (four). Therefore, the scanning direction of the preliminary coating nozzle 41 is the scanning direction q = t in the main (4) processing. That is, the pre-injury of the "slot coating" in the present embodiment: the region where the photoresist is applied to the coated surface is immersed in the rinsing and ordering light stored in the lower portion of the casing 7 by rolling The liquid blocking system can be immediately removed by washing with a washing solution. Further, the coating surface of the cleaning liquid is taken out from the cleaning liquid by the roller 7 condensing, and the washing treatment of the coated surface is completed. In the coated surface, the area where the cleaning treatment is completed is rotated by the roller 71, and the y-scraping sheet 73 picks up the deposit (mainly the residue of the cleaning liquid or the photoresist). In this way, the removal process by the blade 73 is performed. By applying the coating treatment to the region where the photoresist is applied to the coated surface of the roller 71, the coated photoresist is removed, and the position of the photoresist is again returned (the southernmost reaching point). Thereby, the slitted mouthpiece 41 can be prevented from being contaminated by the coated surface of the roller 71. After discharging a specific amount of photoresist from the opening (four) nozzle 41 and ending the preliminary coating process, the linear motors 50, 51 move the slit nozzle 41 to the coating start position 104395.doc -21 - 1263542, The lifting mechanisms 43, 44 adjust the height of the slit nozzle 41 to a specific height. The coating start position means that the slit nozzle 41 is located almost along the (_x) side end side of the photoresist coating region of the substrate 90.

As the position adjustment is completed, the photoresist supply mechanism supplies the photoresist liquid to the slit nozzle 41 while moving the bridge structure 4 in the (+X) direction at a specific speed by the linear motors 5, 51, and performs the counter substrate. % of the photoresist is applied, and the main coating treatment is performed (step S3). As described above, in the slit coating 1 of the present embodiment, in the main coating process, the scanning direction of the slit nozzle 41 is (+χ) direction, and the scanning direction of the preliminary coating direction is reversed. Further, in the slit coating 1 of the present embodiment, a small amount of photoresist is discharged from the photoresist supply mechanism when the slit nozzle 41 is moved from the preliminary (four) position to the application start position. A liquid volume of the photoresist liquid is formed at the front end of the slit nozzle 41. Thereby, when the slit nozzle 41 approaches the substrate 9〇, a uniform meniscus is formed in the direction of the ¥ axis, and the coating precision is improved. The method comparison shows the effect of performing the preliminary coating treatment of the slit coating 1 in the present embodiment (step S2) and the main coating treatment (step S3). In the pre-coating process, the front end of the slit nozzle is matched with the pre-coated member, the sound 4 ^ , 6 is finally reached, and The distance between the roller and the slotted nozzle is tied to either one. In the middle, the condition of "shun Γ 。 并且 并且 滚 滚 # # # # # # # # 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备 预备The side of the month [the so-called "reverse direction" means that the direction of the pre-drawing is almost the same as the scanning direction of the main coating process. 104395.doc -22-1263542: In addition, the so-called "lip step" refers to This is equivalent to the value of the difference between the middle and the middle of the present embodiment, and is an example of the first part before the scanning direction is arranged in the main coating process (phase # is in the first lip, and is placed in the rear after the lip (equivalent to the first 2 The value of the lip portion 411) protruding in the discharge direction. Further, the coating unevenness is generated in Fig. 5, and the following results are indicated by the symbols. ^ From the younger brother, the sheet substrate is unevenly distributed. : A few sheets of coating m are uneven. 〇: Continuous processing (10) sheets, occasionally uneven streaks. ◎: 100 sheets are continuously processed, and unproduced w is uneven. Here, the so-called α-processing 100 sheets refers to In the meantime, the intention to deal with the washing treatment of the same squirting sound is not treated, and it does not mean that only the main coating is continuously performed. The case of the lip step (the scan p * AT 7 tiger code I, 6 in the coating process) does not depend on the preparation. This 开始 and after the application of several sheets, the stripes are not nearly It is equivalent to the case of Lu Li in the previous device: the situation that does not make it stand out' rm# The processing in the center is also shown in Figure 5.

It is known that the processing of the slit nozzle is made for each treatment specific T, the profit walking, and the 1 owing. The dry skin of the crotch of the crotch is recognized by the cow. The lip of the slit nozzle, the heart, and the side of the front end of the slit nozzle are attached with a % of light resistance. β Α attached to the first blocking solution, or prognosis, before the slit nozzle, the proximity of the L substrate such as the contact between the substrate and the photoresist liquid r: t a liquid volume retention, etc. . The lip step is "negative" and is "shun-time code 2", which is the case where the number of coatings is ... g in the direction of the direction (in Figure 5, the photoresist on the back lip side. This system can be considered as Inconsistent, the results of postpartum lip comparison and withdrawal of the strip, and the text is uneven. That is, the situation with the lip (the former Lu is the higher position of W4395.doc *23-1263542 October) 'When the scanning direction of the preliminary coating process is matched with the scanning direction of the main coating process, the cleaning process for each specific number of sheets can be performed to the same extent as the device. However, the lip step is In the case of "negative" and "counterclockwise direction" (numbers 7 and 8 in Fig. 5), streaks are uneven from the third sheet, and the coating accuracy is lower than that of the conventional device. This system can be considered as After the preliminary coating treatment, the photoresist on the side of the lip is unevenly flowed from the bottom to the top, which promotes uneven streaks. The lip step is "positive" and is "clockwise" (Figure 5 , No. ^ 4 5) 'In order to produce uneven streaks from the third sheet, the coating accuracy is lower than that of the conventional device. It is considered that the photoresist solution on the lip side is not uniform after the preliminary coating treatment, and as a result, uneven streaking is further promoted. Further, in the same manner as the slit coating 2 in the present embodiment, the lip is used. When the step difference is "positive" and the scanning direction of the preparatory (4) processing is made "inverse clockwise direction" (numbers 9, 1 in Fig. 5), it can be compared with the conventional device: a small amount of uneven coating Specifically, the lip step is taken as "3〇_" ^ ', and the (4) unevenness can be suppressed in the continuous processing (10) when the stripes are not even: ... presentation. Especially in the lip order When the difference is "7〇_", even if 100 sheets are processed continuously, unevenness will not occur. Degree: 2: !图=明' Only the lip step is "positive", coated fine "文,二In the case of the numbers 4 and 5 shown in the figure, it may be... In order to suppress uneven coating, the lip step is taken as follows, 1 = the scanning direction of the slit nozzle in the preliminary coating process, and the main soil is created. The reverse direction of the scanning direction of the slit nozzle in the cloth processing. 104395.doc -24- 1263542 The opening and the strip in this embodiment , cold # ^ & ...... Since the coating 1 system meets this condition, it can suppress the occurrence of uneven coating even more than the previous break. w ^ ^ ptb , ^ , and is set in the slit nozzle. 邛13⁄4 The difference is not only the device structure, but also the one that is called the hybrid.

It is more suitable for the coating process to open the P ... η ... to describe the direction, and will not produce the resulting cost increase. That is, the slitting ^ 卩 slit coating 1 series can achieve an increase in the suppression cost.

Further, in Fig. 5, the slit coating 1 is made to have a step of "30 _ or more", and the coating unevenness can be suppressed more than the conventional one, but it is preferable to create "7 - or more". 3 is not shown in Fig. 5 as the upper limit of the lip step, and "200 Å or less" can effectively suppress coating unevenness, but it is preferable to "(10) call below". Referring back to Fig. 4, the slit nozzle 41 is moved in the (+X) direction to reach the (+X) side end of the photoresist coating region. The main coating process of the step S3 is completed. Further, after the main coating process is completed, the bridge structure 4 is moved by the linear motors 5G and 51, and the slit nozzle 41 is returned to the standby position. Further, the "standby position" refers to a position at which the slit nozzle 41 waits without being processed, and does not interfere with the slit nozzle 41 when the substrate 9 () is carried in and out. When the slit nozzle 41 is moved to the standby position, the holding of the stage 3 (4) stops the adsorption of the substrate 90 and carries the substrate 90 out of the apparatus (step S4). Further, the slit coating 1 determines whether or not there is another substrate 9 to be processed (step s5), and if another substrate 90 exists, the process returns to the step "repeated processing. In addition, there is no other processing that should be handled. In the case of the substrate 90, the processing is completed. As described above, in the slit coating of the present embodiment, the first lip surface 410a of the slit nozzle 41 protrudes from the discharge of the photoresist liquid than the second lip surface 411a. Direction 104395.doc -25-1263542 ((-z) direction), in the main coating process, the substrate is scanned in the (+χ) direction and the processing liquid is discharged from the discharge port 41a to the substrate 90, and the coating is applied. In the cloth processing, the slitting nozzle 41 scans the coated surface of the roller 71 in the opposite (^) direction in the (+X) direction, and the rotating mechanism 72 relatively moves the slit nozzle ο and the roller 71. Therefore, the coating unevenness can be suppressed and the unevenness of the coating can be suppressed. Further, the roller 71 is a substantially cylindrical member, and the rotating mechanism 72 is configured to scan the coated surface of the roller 71 in the (-X) direction by the slit nozzle 41. In this way, by the rotation of the roller 71 around the axis, for example, with the pre-coating of the plate shape, the coating is pre-coated. In addition, as a method of adjusting the protrusion of the first lip surface 410a to the second lip surface 41 &amp; the gap is formed by the shim plate 412, for example, The type of the photoresist can be adjusted (position height adjustment). Further, the preliminary coating treatment is performed before the main coating treatment is started, and the main coating is started in the state where the slitting nozzle 41 is optimized by the preliminary coating treatment. In the first embodiment of the present invention, the first embodiment of the present invention is not limited to the above-described first embodiment, and can be performed. Various deformations. ♦J, for example, the preliminary coating member # yii, the tens of the system is not limited to a cylindrical shape such as the roller 71. For example, it may be a plate-like member that is disposed substantially in the shape of a Umbrella. In the case where the coating member is used, the processing member is used in (4) (4). The linear motor 5G, 51 is opposite to the slit nozzle 4m and the preliminary coating structure. The processing sequence shown in Fig. 4 is not limited thereto. For example, J〇4395 of step S1. d -26· 1263542 The process of holding the substrate 90 may be performed after the preliminary coating process of step S2, or may be performed simultaneously. That is, if the same effect can be obtained, the process is performed in any order. In addition, the method of projecting the first lip surface 41〇a to the second lip surface 411&amp; in the discharge direction is not limited to the form of using the caulking plate as described in the above embodiment. For example, a member that makes the i-th lip 41〇 longer than the second lip 4 in the direction of the z) may be preliminarily manufactured. A mechanism such as an adjusting screw may be provided to form a magic lip portion 410 in the (-Z) direction. 2. 2. Second embodiment> <2-1·Overview of substrate processing apparatus Fig. 6 is a perspective view showing a schematic configuration of a slit coating 210 of a substrate processing apparatus according to a second embodiment of the present invention. The slit coating 21 is a method of applying a light to a surface of a substrate 29 The k-cloth treatment of the coating treatment of the slit-coating of the liquid-repellent coating is used for the process of selectively forming the electrode layer formed on the surface of the substrate, etc. The substrate 29 to which the slit coating 210 is applied 〇 The expression is a prismatic glass substrate for manufacturing a screen panel of a liquid crystal display device, but may be another substrate such as a semiconductor substrate, a flexible substrate for a thin film liquid crystal, a substrate for a photomask, or a substrate for a color filter. As shown in Fig. 6, the slit coating 207 is roughly divided into a control unit 2〇1 of the entire control device and a coating processing unit 202 that performs a coating process. The control unit 2〇1/1 is treated. Each part of the crucible 202 is electrically connected to cover the operation of each unit of the coating processing unit 2 to 2. The control unit 201 includes a microcomputer composed of a CPU, a RAM, a ROM, etc. The various units generated by the control unit 2〇1 Control function, which uses ram to use ram according to specific programs or materials. In addition, the control unit 201 is provided with an operation unit 211 that accepts an operator's input operation and a display unit 212 that displays various materials, and functions as a user interface. The coating processing unit 202 is mainly composed of a stage 2〇3 for holding the substrate 290, a discharge mechanism 2〇4 for discharging the photoresist liquid to the substrate 29 held by the stage 203, and a moving mechanism 2 for moving the discharge mechanism 204 in a specific direction. In the following description, for convenience of explanation, the axial direction is the inner surface direction (the +x side is the front side, the -X side is the back side), and the Y-axis direction is the left-right direction (from the front side). When viewed from the side, the +γ side is the right side, and the _¥ side is the left side. The platform 203 is composed of a stone such as granite having a substantially rectangular parallelepiped shape, and is processed to be substantially horizontal and flat, and functions as a holding surface 230 of the substrate 29. A plurality of vacuum suction ports are formed on the holding surface 23〇. By adsorbing the substrate 29 by the vacuum suction ports, the substrate 29 can be held at a specific position during the coating process. The discharge mechanism 204 is mainly composed of a slit nozzle 241 that discharges a photoresist, a nozzle support portion 242 that supports the slit nozzle 241, and two lift mechanisms 243 that support both ends of the nozzle support portion (4). The slit nozzle 241 discharges the photoresist liquid supplied from the supply means outside the drawing from the discharge port of the slit shape to the upper surface of the substrate. In the slit nozzle Μ, the discharge port is extended along the γ-axis direction substantially parallel to the holding surface 230, and is directed downward (·Ζ side) and can discharge the photoresist liquid, and is supported by the nozzle support portion (4). . The nozzle support portion 242 is composed of a plate-like member such as a carbon fiber reinforcing resin having a γ-axis direction as a longitudinal direction. The two lifting mechanisms 243 are coupled to the left and right ends of the nozzle support portion 242, 104395.doc -28-1263542. Since these lifting mechanisms 243 each include an AC servo motor, a ball screw, and the like, the nozzle support portion 24A and the slit nozzle 241 supported thereby can be lifted in the vertical direction (z-axis direction). By the two elevating mechanisms 243, the interval between the slit nozzle 241 and the substrate 29 (the slit) can be adjusted, or the posture of the slit nozzle 241 of the substrate 29 can be adjusted. As shown in FIG. 6, the entire left and right ends of the platform 203 are formed along the γ-axis direction by the entire discharge nozzles 241 including the slit nozzles 241, the nozzle support portion, and the two lift mechanisms 243. The bridge structure of the department. The moving mechanism 2〇5 moves the entire body including the ejection mechanism 2〇4 having such a bridge structure in the X-axis direction. As shown in the figure, the moving mechanism 205 is a left-right symmetric structure (symmetry between the +γ side and the _¥ side)', and each of the left and right portions includes a traveling way 25 for guiding the movement of the discharge mechanism 2〇4 to the X-axis direction; 1. A linear motor 252 that generates a moving force for moving the discharge mechanism 2〇4 and a linear encoder that detects the position of the discharge mechanism 2〇4. Each of the two running lanes 251 is extended along the X-axis direction at the end (left and right ends) of the y-axis direction of the platform 2〇3. The lower end portions of the two elevating mechanisms 243 are guided along the two traveling lanes 251, and the moving direction of the ejection mechanism 2〇4 is defined in the X-axis direction. The two linear motors 252 are each composed of an AC coreless linear motor including a stator and a moving sub-252b. The stator 25 is disposed along the X-axis direction on the side (left and right sides) of the y-axis direction of the platform 2〇3. In addition, the moving member is placed on the outer side of the lifting mechanism 243. The linear motor 252 is a magnetic force output mechanism 204 which is generated by the stator 252a and the moving member 25. 104395.doc -29- 1263542 Further, the two linear encoders 253 each include a scale portion 253a and a detecting portion 253b. The scale portion 253a is provided below the stator 252a fixed to the linear motor 252 of the stage 203, and is disposed along the X-axis direction. Further, the detecting portion 253b is fixedly disposed outside the moving member 252b of the linear motor 252 fixed to the elevating mechanism 243, and is disposed opposite to the scale portion 253a. The linear knitting device 253 detects the position of the discharge mechanism 2〇4 in the X-axis direction based on the relative positional relationship between the scale portion 253a and the detecting portion 253b (more specifically, the discharge port position of the slit nozzle 241) . According to the above configuration, the slit nozzle 24 is configured to hold the upper space of the holding surface 230 of the substrate 29, and to move the holding surface 23 in the X-axis direction of the parallel, and to move the holding surface 230 relatively. The slit nozzle 24 1 is configured to stand by the specific standby position 23 1 on the back side (-X) of the specific position of the substrate 290 before being carried into the substrate 29 (FIG. 6). State of indication). At the time of the coating process, first, the substrate 290 is carried and held on the holding surface 230 of the stage 2〇3. Then, the slit nozzle 241 is moved to the upper position on the back side (-X side) end of the substrate 29, and at the same time, the photoresist is discharged from the discharge port of the slit nozzle 24 1 . Then, the state in which the photoresist is discharged is maintained, and the slit nozzle 241 is moved toward the front side (+χ side) at a specific speed. Thereby, scanning (discharging scanning) of the slit nozzle 241 of the substrate 290 is performed. Then, the slit nozzle 24 1 is moved to the upper position on the front side (+χ side) end of the substrate 290, and after the discharge scanning is completed, the discharge of the photoresist from the slit nozzle 24 1 is stopped. By doing so, substantially all of the substrate 290 is coated with a photoresist solution, and a photoresist layer having a specific film thickness is formed on the surface of the substrate 290. After 104395.doc -30-1263542, the slit nozzle 241 stands by again to the standby position 231, and carries out the processed substrate 29G from the stage 2〇3. By this, the processing of the substrate is terminated. The control system for such a coating process is formed by the control unit 2〇0&lt;2-2. Nozzle adjusting unit&gt; The slit coating 210 is applied to perform the above-described continuous coating process (main coating process ^ Previously, the nozzle adjustment unit 2〇6 for adjusting the front end portion of the slit nozzle 241 to the uniform normal shape is processed. The nozzle adjustment unit can be used for the standby position 23 in the standby position 23 The processing method is disposed below the standby position 23 1 (the -Z side). The nozzle adjusting unit 2〇6 is also electrically connected to the control unit 201, and is controlled by the control unit 2〇1. ', ^ Figure 7 is an illustration of the slave _γ side view side view of the structure of the nozzle adjustment unit 2〇6. The spray adjustment processing system washes the slit nozzle 241 with the cleaning liquid, and prepares the slit nozzle 241 to discharge the liquid amount The coating treatment is carried out in two stages. Therefore, the nozzle adjustment unit is provided as shown in the figure, and includes a cleaning treatment unit 261 for performing the cleaning treatment and a preliminary coating machine for performing the pre-coating treatment = 2 6 2 / washing The processing unit 26 includes a cleaning space 26 that matches the shape of the tip end portion of the slit nozzle 2 * 1a; a plurality of discharge ports for discharging the cleaning liquid are disposed on the opposite surface of the cleaning space 26; and the preliminary coating mechanism 262 mainly includes the nozzle for discharging the photoresist from the slit nozzle. The roller 2 6 3 (hereinafter referred to as "roller") is pre-coated, and is composed of a casing 264 surrounding the roller 263. The roller 263 is 'diameter, for example, from 1 mm to 120 mm, and the longitudinal direction is A substantially cylindrical member having a size slightly larger than the dimension of the slit nozzle 241 in the γ-axis direction is disposed in the longitudinal direction (the direction in which the axis 263a extends) along the y-axis direction. The material of the roller 263 is iron, and a hard black record is applied to the surface including the outer peripheral surface thereof. The roller 263 can be rotated around the axis 263a by a driving mechanism outside the drawing, and the rotation direction is in the figure. The arrow (four) indicates the direction (clockwise in Fig. 7). The desired body 264 is a box-shaped member and has an opening formed in the upper portion thereof. The roller 263 is exposed from the opening of the casing 264 to the outside. In the manner, Lu is placed in the casing 264. Also, the uppermost portion 263b of the outer peripheral surface of the roller 263 The height of the substrate 290 disposed on the stage 203 is substantially the same. When the preliminary coating process is performed, the photoresist is discharged from the slit nozzle 241 to the uppermost portion 263b. Further, a certain amount of the cleaning liquid is stored inside the casing 264. 281, the roller-added portion is immersed in the cleaning liquid 281. The pre-application mechanism 262 includes an attachment removing portion 207 that removes the adhering matter adhering to the outer circumferential surface of the roller 263. The adhering substance removing portion 2〇 7, the long-length blade 271 (scraping blade) extending in the γ-axis direction is brought into contact with the outer peripheral surface of the roller shaft 263. In the blade 271, the outer peripheral surface of the roller 263 is scanned by the rotary knuckle 263, and the deposit on the outer peripheral surface of the roller 263 is pulled. The attachment removing unit 207 will be described later in detail. The nozzle adjustment processing system implemented by the nozzle adjustment unit 206 having such a configuration is also controlled by the control unit 201. At the time of the nozzle adjustment processing, first, in order to perform the cleaning process, the slit nozzle 24 is moved to a position where the tip end portion thereof enters the washing space 261a of the washing processing unit 261 (the position indicated by a broken line in Fig. 7) ). Then, from the plurality of discharge ports of the cleaning processing unit 261, the cleaning liquid is discharged to the front end portion of the slit nozzle 241. By this, it is possible to remove the photoresist liquid attached to the side of the front end of the nozzle 241 of the slit spray 104395.doc -32-1263542. After the cleaning process is completed, the nozzle "I-shift::," "second" 4 is subjected to preliminary coating treatment, and the uppermost portion 263b of the outer peripheral surface of the slit is placed upside down. After the absence of ::)), the outer peripheral surface of the roller 263 is separated from the outer peripheral surface by a specific moxibustion, and the roller 263 is started. The outer peripheral surface of the rotating roller 263 is ejected from the slit nozzle 241. When the light is blocked.曰 Also prepare the coating process and open the nozzle as shown in Figure 11 or Figure 12.

Before 241, the end system can be adjusted to the uniform state. By this, the nozzle tempering process is finished. In the preliminary coating treatment, a portion of the outer peripheral surface of the roller 263 from which the photoresist is discharged (hereinafter referred to as "the sole surface") is sequentially immersed in the casing 264 by the rotation of the roller 263. By the lower portion of the cleaning liquid 28, the photoresist liquid adhered to the surface of the object is mixed with the cleaning liquid 28i, and the photoresist liquid is substantially removed from the viewpoint. Further, when the roller 263 is rotated, it is immersed in the surface of the cleaning liquid 281, and is taken out from the cleaning liquid 281, and then scanned by the blade 271. Thereby, the attachment of the surface of the object (mainly the residue of the cleaning liquid or the photoresist) is removed by the blade 271, and the deposit can be removed from the surface of the object. By such treatment, the uppermost portion 263b of the outer peripheral surface of the roller 263 of the discharge target of the photoresist is always in a state of no deposit. Thus, the dial removed by the blade 271 is accumulated in the space 265 formed by the roller 263 and the blade 271. When the accumulated dispensing material is placed for a long time, the cleaning effect of the blade 27 1 is adversely affected. Therefore, in the optimum position inside the casing 264, the space for accumulating the removed material is 2 6 5, and the discharge is set to be washed. The liquid is dropped onto the cleaning nozzle 266 below. 104395.doc -33- 1263542 This cleaning spray system is arranged along the x-axis direction as shown in Fig. 8, and covers the entire axial direction of the space 265 to discharge the cleaning liquid 282. The cleaning nozzle 266 is supplied with the cleaning liquid from the cleaning liquid supply unit 283 via the control unit 2〇1 via the controllable control plug (10). Thereby, the discharge of the cleaning liquid 282 generated by the washing (4) nozzle (10) is controlled by the control unit 2〇1. However, when the preliminary coating treatment is repeated, the cleaning liquid stored in the desired body is gradually contaminated by the photoresist, and the cleaning ability of the cleaning liquid 281 is lowered, so that the coating is applied to the slit 2! The cleaning solution 281 stored in the desired body 264 is periodically exchanged. That is, as shown in Fig. 8, in the γ-axis direction of the casing 264, the supply port 264 is supplied with the cleaning liquid 281, and the lower portion of the casing 264 is provided with the discharge of the cleaning liquid 281. . The supply port (10) is connected to the cleaning liquid supply unit 283 via the control check, and the discharge port 264b is guided to the outside of the slit coat 210 via the control plug 286. Both the control plug 285 and the control test (10) are switchable and controlled by the control unit 2〇1, and the switches 285 and 286 are controlled to exchange the cleaning liquid 281 stored in the casing 264. Further, the liquid level of the cleaning liquid 281 is always kept constant by the overflow pipe formed under the casing 264. There is no particular limitation on the time when the door or the sputum is changed to the cleaning liquid 28 1 of the casing 264 when the cleaning liquid 282 is ejected from the cleaning nozzle 266, but for example, at the time of starting, at the time of stopping, when the operation is interrupted, It is sufficient to process a specific number of substrates or the like for each specific item in the operation of the slit coating 210. &lt;2-3. Attachment Removal Unit&gt; Next, the attachment removal unit 207 will be described in further detail. Fig. 9 is a structural view showing a detail removing portion 207 of the example 104395.doc -34-1263542. As shown in the figure, the attachment removing portion 2 is composed of a blade of an elastic body and a blade holding member 272 made of metal which holds the blade 2?. The specific material of the blade 271 of the elastomer is preferably Shishi rubber (Shixi resin), EPDM (Ethylene Propylene Diene Methylene Linkage propylene copolymer/ethylene propylene rubber), butyl rubber, fluororubber, Perfl〇ur. (registered trademark) and synthetic rubber such as Kalrez (registered trademark). • The best range for the Young's modulus of the material of this blade 271 is from i MPa to 20 MPa (ie, above! and below 2 〇 Mpa), but better ranges from 6 MPa to 20 MPa. Further, in particular, in the case where Shishi rubber is used as the sheet 271, the Young's modulus is preferably in the range of from 6 to 95 Mpa. Since the elastic material having a small hardness is not used as the blade 271', the blade 271 is more easily deformed. Therefore, as shown in FIG. 9, the blade 27! is deformed in the plane of the crucible by abutting, and the outer peripheral surface of the roller is not in line contact but is in surface contact, so that the dial roller can be greatly increased. • The performance of the attachments on the circumference. Further, the blade 27 can also be easily deformed in the γ-axis direction. Therefore, due to the eccentricity or the self-weight, the outer peripheral surface of the roller 263 has "undulation" or "bending", and the outer peripheral surface of the roller 263 is disposed on a straight line not along the γ-axis direction, and is fitted to the outer peripheral surface of the abutting roller 263. The shape of the axis direction ("undulation" or "bending")' blade 271 is deformed. As a result, the y-axis direction disappears when the sheet π does not contact the outer peripheral surface of the roller 263. Therefore, the blade 271 covers the entire axial direction of the outer peripheral surface of the contact roller 263. In short, the entire attachment of the outer peripheral surface of the roller 263 in the γ-axis direction is removed by the blade 27丨. 104395.doc -35- ^263542 The thickness of the blade 27 1 (the length shown by the symbol 27 11 in Fig. 9) is preferably from 〇·5 mm to 10 mm (i.e., 〇·5 mm or more and 1 When the thickness of the blade 271 is reduced within the range of 〇mm or less, the durability of the blade 27j is lowered, so that the blade 271 must be replaced. Further, although the durability of the blade 271 is increased when the thickness of the blade 271 is increased, the deformation property of the blade 271 in the z-axis direction is lowered. When the thickness of the blade 27 1 is within the above range, the balance between the durability and the deformation property of the blade 27 can be obtained. Further, the pressing force of the blade 271 on the outer peripheral surface of the roller 263 can be adjusted by changing the relative angle of the casing 264 of the blade 27 1 (hereinafter referred to as "arrangement angle"). In short, the relative arrangement relationship between the housing 264 and the roller 263 is fixed. Therefore, the arrangement angle of the blade 271 defines the angle of the blade 271 of the roller 263, and further, the pressing of the blade 271 of the roller 263 is specified. pressure. The arrangement angle of the blade 271 can be changed by holding the holding member 272 of the blade 271. As shown in FIG. 9, the blade holding member 272 mainly supports the first holding portion 273 of the blade 271 directly by the two claws 27, 273b, and the second holding portion 274 that supports the second holding portion 273. It is composed of a third holding portion 275 fixed to the casing 264. The second holding portion 274 and the third holding portion 275 are fixed by the angle adjusting screw 276 so as to be adjustable in angle with each other. Therefore, by adjusting the angle adjusting screw 276, the second holding portion 274, the holding portion 273 held therein, and the blade 27 of the first holding portion 273 can be further adjusted to the housing 264. Relative angle (also known as "configuration angle"). Further, the arrangement angle of the blade 27 1 can be partially changed in the γ-axis direction. 104395.doc -36· 1263542: The figure: the holding portion 273 is supported by the second holding portion 274 by the upper and lower two bolts ·, and the elastic ball 278_'. The lower bolt η is passed through the first holding portion 273 in a non-bonding manner, and the front end portion thereof is fixed to the second holding portion μ. However, the spring κ 278 ' is disposed between the head of the lower thread 277 and the lower surface of the second holding portion 273, whereby the second holding portion 273 is biased toward the second holding portion η#. Further, the upper bolt 279 is coupled to the screw holder ′ formed in the second holding portion 274 and penetrates the second holding portion 274, and the distal end portion thereof abuts against the upper portion of the holding portion (7). In short, the upper bolt 279 abuts against the first holding portion 273 by the elastic force generated by the anti-spring 278. Further, the claw on the upper side of the first holding portion 273 which the upper bolt 279 abuts is composed of, for example, a thin stainless steel plate of about 2 mm, and is elastically deformable by the pressing force generated by the upper bolt 279. Therefore, when the upper bolt 279 is locked, the claw which is in contact with this portion is deformed, and the blade 271 which is held by the portion of the claw 273a which is changed to I is also deformed and faces downward. In short, by adjusting the upper bolt 279, in the γ-axis direction, it is possible to adjust only the arrangement angle of the blade 271 at the abutment of the square screw 279. As shown in the rear view of the blade 271 of Fig. 10, such an upper bolt 279 is disposed at a plurality of positions in the γ-axis direction at every specific interval. Therefore, the arrangement angle of the blade 271 can be locally adjusted at each position where the upper bolt 279 is disposed. In short, the arrangement angle of the blade 271 in the overall Y-axis direction can be changed by the angle adjusting screw 276 to change the arrangement angle of the portion in the Y-axis direction to the sheet 271, which can be changed by the upper bolt 279. Thus, by pressing the arrangement angle of the blade 27 in the x-axis direction portion, the pressing force of the roller 263 of the blade 271 by 104395.doc -37 - 1263542 is also locally adjusted in the γ-axis direction. Even if the above-mentioned elastic material is used as the doctor blade 271, the pressing force of the blade 271 on the outer peripheral surface of the roller 263 may not be uniform in the direction and the pressure is locally weakened by the pressing force of the blade 271 on the outer peripheral surface of the roller 263. . Therefore, in this case, if the pressing force of the blade 271 of the pair of rollers 263 is adjusted to be raised, the deposit can be surely removed even here. Therefore, it is possible to cover the entire γ-axis direction to more reliably remove the attachment of the roller 263. _ &lt; 3 Other Embodiments In addition, in the first embodiment, as the attachment removing portion 74 shown in Fig. 2, the attachment removing portion of the second embodiment shown in Fig. 9 can be used. 7 The same structure. In this case, the blade 73 of the first embodiment can be made of the same material as the blade 271 of the second embodiment. By adopting this configuration, even if "undulation or "bending" occurs in the roller 7'' of the first application-formed member, the attachment on the surface of the roller 71 can be surely removed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic perspective view showing a substrate processing apparatus according to an embodiment of the present invention. Fig. 2 is a side view mainly showing the structure of a preliminary coating mechanism in the opening. Fig. 3 is a view showing a slit nozzle disposed at a preliminary application position. Fig. 4 is a flow chart showing the operation of the substrate processing apparatus. Fig. 5 is a graph showing the results of uneven coating at the time of performing the main coating treatment. Fig. 6 is a perspective view showing a schematic structure of slit coating. Fig. 7 is a side view showing the structure of the nozzle adjusting portion. Fig. 8 is a view showing a supply system and a row of cleaning liquids. I04395.doc -38 - 1263542 Fig. 9 is a structural diagram illustrating the attachment removing portion in detail. Fig. 10 is a view showing an arrangement of the upper screws. Fig. 11 is a view showing an example of a normal state of the tip end portion of the slit nozzle. Fig. 12 is a view showing an example of a normal state of the tip end portion of the slit nozzle. Fig. 13 is a view showing an example of a failure state of the tip end portion of the slit nozzle. Fig. 14 is a view showing an example of a failure state of the tip end portion of the slit nozzle. [Main component symbol description]

41 slot nozzle 410 first lip 411 second lip 412 shim plate 41a spout 7 preparatory coating mechanism 71 roller D step 271 blade 272 blade holding member 279 upper screw 104395.doc -39-

Claims (1)

1263542 X. Patent application scope: A substrate processing apparatus characterized in that it is attached to a substrate coating treatment liquid, and includes: a holding mechanism that holds the substrate; and a slit nozzle that is scanned in the first direction a plate, and at the same time, from the discharge port to the substrate discharge portion = the base preparation member of the mechanism, by the foregoing: the liquid; the '__ nozzle is for scanning the second direction to the second direction The cloth member 1 slightly reverses the movement of the opening (four) nozzle and the preliminary coating, and the surface of the slit nozzle includes a surface; wherein the position is on the side of the spit The first lip surface is the second lip surface on the second direction side; the first lip surface is protruded in the direction of the treatment liquid than the second lip surface. 2. The substrate processing apparatus according to claim 1, wherein the preliminary coating member is a substantially cylindrical member; and the moving mechanism is formed by the slitting nozzle in the second party. The method of the surface of the member is as follows: (4) „ before the rotation = preparing the coating member. The substrate processing device according to the second aspect of the invention, wherein the method further comprises: arranging the first σ surface to describe the second lip surface The substrate processing apparatus according to any one of claims 1 to 3, wherein the first side surface is protruded by 3〇μηι or more than the second lip surface. 104395.doc 1263542 5. The substrate processing according to the item 2 of claim 2, pull, set, and further include the burial by the contact with the reference preparation coating member / the method of arranging the scraping μ &amp; The long octagonal piece of the attachment of the surface is removed, and the elastic body of the sulcus having a coefficient of 1 MPa to 20 MPa is described. The consumption of UMPa is 6. The substrate of claim 2 Handling the description, and the system further includes preparing the coating structure by abutting on the former The surface sheet, + the long rule of the attachment of the silk surface is removed to the sheet, wherein the sheet is made of rubber. 7. The substrate processing method is characterized in that: the spit is set from the spout nozzle&gt; The m-soil treatment liquid is applied to the substrate to apply the treatment liquid, and includes: a soil-soil retention step for holding the substrate; a main coating step for the aforementioned US-preserved sheet retained by the capture step Scanning the slitted soil and the nozzle in one direction, and performing a substrate coating process, and a preliminary coating step, wherein the slit nozzle is scanned in a second direction opposite to the first direction, And moving the coating member to the preliminary coating member; and applying the processing liquid to the preliminary coating member; &quot; in the main coating step and the preliminary coating step, the first surface of the discharge port on the second side of the discharge port The lip surface is disposed at a lower position than the second lip surface provided on the second direction side of the discharge port. X8. The substrate processing method of claim 7, wherein the front box is from eight T just described the preparation step The first coating step is performed after the preliminary coating step. The main coating step is performed after the preliminary coating step. 104395.doc 1263542 A substrate processing apparatus characterized in that: y. is applied to a substrate coating treatment liquid, The slit nozzle is arranged to extend in a substantially horizontal direction of the sacred 3, and is substantially horizontal in the third direction and can be moved in the front, +, and direction relative to the substrate, and then returned to the substrate. The processing liquid; the substantially cylindrical roller extending in the direction of the casualty 4, and the discharge nozzle is discharged from the outer peripheral surface k, and the slitting nozzle is smashed And a long-sized blade; and a long-sized blade extending in the third direction of the front, ten, and red 1 and abutting against the outer peripheral surface of the roller, except for the tooth, The attachment of the outer peripheral surface; the squeegee blade is composed of an elastomer having a number of numerators in the range of 1 MPa to 20 MPa. In the substrate processing apparatus, the substrate processing apparatus includes: a slit nozzle extending in a substantially horizontal direction, and the third direction positive parent In the fourth direction of the substantially horizontal direction, the substrate is relatively moved to the substrate, and the processing liquid is discharged from the substrate, and the substantially cylindrical roller is extended along the third direction. The surface is ejected from the opening nozzle 3, and the treatment liquid is discharged by the outer bird, and the crotch portion of the slit sneeze is adjusted to a specific state; and the surface is removed to the m surface, and the attachment of the outer peripheral surface is removed. Made of rubber. , U. If the substrate of claim 9 or 1 is defeated, the thickness of the aforementioned blade is 104395.doc 1263542 ranging from 0.5 mm to l〇 mm. 12. The substrate processing apparatus according to claim 9 or 1 further comprising the third direction in the foregoing, wherein the adjustment mechanism for the force is partially adjustable. The pressing of the blade as shown in the third direction is partially changed in the third direction, and the pressing force is adjusted for the adjustment mechanism. The aforementioned blade of the aforementioned roller 104395.doc