TW201138015A - Semiconductor wafer transport system - Google Patents
Semiconductor wafer transport system Download PDFInfo
- Publication number
- TW201138015A TW201138015A TW099145326A TW99145326A TW201138015A TW 201138015 A TW201138015 A TW 201138015A TW 099145326 A TW099145326 A TW 099145326A TW 99145326 A TW99145326 A TW 99145326A TW 201138015 A TW201138015 A TW 201138015A
- Authority
- TW
- Taiwan
- Prior art keywords
- plate
- wafer
- outlets
- rod
- gas
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
- B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
- H10P72/3302—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7602—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
- B65G2249/045—Details of suction cups suction cups
Landscapes
- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/645,565 US20110148128A1 (en) | 2009-12-23 | 2009-12-23 | Semiconductor Wafer Transport System |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201138015A true TW201138015A (en) | 2011-11-01 |
Family
ID=43795168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099145326A TW201138015A (en) | 2009-12-23 | 2010-12-22 | Semiconductor wafer transport system |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110148128A1 (https=) |
| EP (1) | EP2517236A1 (https=) |
| JP (1) | JP2013516061A (https=) |
| KR (1) | KR20120115279A (https=) |
| CN (1) | CN102687262A (https=) |
| TW (1) | TW201138015A (https=) |
| WO (1) | WO2011077338A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI565569B (zh) * | 2016-02-05 | 2017-01-11 | 南京瀚宇彩欣科技有限責任公司 | 吸著裝置、吸著系統及其應用 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG10201402399RA (en) * | 2013-05-23 | 2014-12-30 | Asm Tech Singapore Pte Ltd | A transfer device for holding an object using a gas flow |
| DE102013021664A1 (de) | 2013-12-19 | 2014-07-31 | Daimler Ag | Verbrennungskraftmaschine, insbesondere für einen Kraftwagen |
| JP6128050B2 (ja) * | 2014-04-25 | 2017-05-17 | トヨタ自動車株式会社 | 非接触型搬送ハンド |
| US9911640B2 (en) * | 2015-09-01 | 2018-03-06 | Boris Kesil | Universal gripping and suction chuck |
| CN107301964A (zh) * | 2016-04-15 | 2017-10-27 | 上海新昇半导体科技有限公司 | 伯努利基座装置及沉积设备 |
| CN108346607B (zh) * | 2017-01-25 | 2020-11-03 | 上海新昇半导体科技有限公司 | 竖直插入式阻挡脚及伯努利吸盘 |
| US10804133B2 (en) | 2017-11-21 | 2020-10-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Article transferring method in semiconductor fabrication |
| CN108183084B (zh) * | 2017-12-28 | 2019-03-22 | 英特尔产品(成都)有限公司 | 真空吸嘴组件 |
| CN211605120U (zh) * | 2020-03-16 | 2020-09-29 | 上海晶盟硅材料有限公司 | 半导体晶圆的持取装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0663254U (ja) * | 1993-02-24 | 1994-09-06 | 新明和工業株式会社 | 非接触式チャック装置 |
| US6183183B1 (en) * | 1997-01-16 | 2001-02-06 | Asm America, Inc. | Dual arm linear hand-off wafer transfer assembly |
| WO1999033725A1 (en) * | 1997-12-30 | 1999-07-08 | Krytek Corporation | Contactless wafer pick-up chuck |
| US6929299B2 (en) * | 2002-08-20 | 2005-08-16 | Asm America, Inc. | Bonded structures for use in semiconductor processing environments |
| US7100954B2 (en) * | 2003-07-11 | 2006-09-05 | Nexx Systems, Inc. | Ultra-thin wafer handling system |
| US20080025835A1 (en) * | 2006-07-31 | 2008-01-31 | Juha Paul Liljeroos | Bernoulli wand |
| US20080129064A1 (en) * | 2006-12-01 | 2008-06-05 | Asm America, Inc. | Bernoulli wand |
-
2009
- 2009-12-23 US US12/645,565 patent/US20110148128A1/en not_active Abandoned
-
2010
- 2010-12-16 KR KR1020127016257A patent/KR20120115279A/ko not_active Withdrawn
- 2010-12-16 WO PCT/IB2010/055899 patent/WO2011077338A1/en not_active Ceased
- 2010-12-16 EP EP10812914A patent/EP2517236A1/en not_active Withdrawn
- 2010-12-16 CN CN2010800586516A patent/CN102687262A/zh active Pending
- 2010-12-16 JP JP2012545503A patent/JP2013516061A/ja active Pending
- 2010-12-22 TW TW099145326A patent/TW201138015A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI565569B (zh) * | 2016-02-05 | 2017-01-11 | 南京瀚宇彩欣科技有限責任公司 | 吸著裝置、吸著系統及其應用 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013516061A (ja) | 2013-05-09 |
| KR20120115279A (ko) | 2012-10-17 |
| US20110148128A1 (en) | 2011-06-23 |
| EP2517236A1 (en) | 2012-10-31 |
| CN102687262A (zh) | 2012-09-19 |
| WO2011077338A1 (en) | 2011-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW201138015A (en) | Semiconductor wafer transport system | |
| JP5386046B1 (ja) | サセプタ支持部およびこのサセプタ支持部を備えるエピタキシャル成長装置 | |
| TWI327339B (en) | Vapor phase growing apparatus and vapor phase growing method | |
| TWI354320B (en) | Vopor phase deposition apparatus and support table | |
| EP2103720B1 (en) | Susceptor for vapor phase epitaxial growth device | |
| JP2014179466A (ja) | エピタキシャル成長による成膜方法、および、エピタキシャル成長装置 | |
| JP6038618B2 (ja) | 成膜装置および成膜方法 | |
| JP6606403B2 (ja) | シャワープレート、気相成長装置および気相成長方法 | |
| WO2008070302A2 (en) | Bernoulli wand | |
| JP2007251078A (ja) | 気相成長装置 | |
| TW200936931A (en) | Apparatus for gas distribution and its applications | |
| TW200411717A (en) | Method and apparatus for supporting semiconductor wafers | |
| KR102402754B1 (ko) | 에피택셜 성장 장치 및 유지 부재 | |
| TW200845267A (en) | High temperature anti-droop end effector for substrate transfer | |
| JP2013516061A5 (https=) | ||
| JP4470199B2 (ja) | 半導体基板の温度調節装置 | |
| JP2010080614A5 (https=) | ||
| KR101699690B1 (ko) | 가스 공급부를 갖는 석영 윈도우 및 이를 통합하는 프로세싱 장비 | |
| US10410909B2 (en) | Waffer pedestal and support structure thereof | |
| CN108573898A (zh) | 气体喷射装置、衬底加工设施以及衬底加工方法 | |
| TWI254979B (en) | Vapor-phase growth apparatus and vapor-phase growth method | |
| JP6309252B2 (ja) | エピタキシャル成長による成膜方法、および、エピタキシャル成長装置 | |
| JP6198584B2 (ja) | エピタキシャル成長による成膜方法、および、エピタキシャル成長装置 | |
| JP2013229554A (ja) | 周期表第13族金属窒化物半導体結晶の製造方法、それに用いるノズルおよび製造装置 | |
| JP6781054B2 (ja) | 窒化物結晶基板および窒化物結晶基板の製造方法 |