TW201021054A - Conductive powder and manufacturing method of conductive material and conductive particle containing the same - Google Patents

Conductive powder and manufacturing method of conductive material and conductive particle containing the same Download PDF

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TW201021054A
TW201021054A TW098133952A TW98133952A TW201021054A TW 201021054 A TW201021054 A TW 201021054A TW 098133952 A TW098133952 A TW 098133952A TW 98133952 A TW98133952 A TW 98133952A TW 201021054 A TW201021054 A TW 201021054A
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Taiwan
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particles
conductive
nickel
film
particle
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TW098133952A
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Chinese (zh)
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TWI479508B (en
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Matsuura Hiroto
Oyamada Masaaki
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Nippon Chemical Ind
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/17Metallic particles coated with metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/18Non-metallic particles coated with metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1651Two or more layers only obtained by electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • C23C18/44Coating with noble metals using reducing agents
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0218Composite particles, i.e. first metal coated with second metal

Abstract

The invention provides conductive powder having a particle diameter smaller than the conventional technique, better dispersibility and conductivity and made from conductive particle of nickel or nickel alloy coating on the surface of core particle. The conductive particle has a plurality of projections projected from the surface of the coating, combined with the coating to form a continuum and with the aspect ratio over 1. The number of the projections with the aspect ratio above 1 is over 40% of the total number of the projections. As to the conductive powder, the weight of the one-time particle of the above-mentioned conductive particle is over 85% of the weight of the conductive powder.

Description

201021054 六、發明說明: 【發明所屬之技術領域】 本發明是關於導電性粉體及含有此導電性粉體的導電 ! 生材料。另外,本發明是關於導電性粒子的製造方法。 【先前技術】 ❿ 參 本案中4人在先前’已提出在表面具有錄或錄合金所 構成的微小突起之導電性無電解電鍍粉體(請參考專利文 獻1)此粉體中的無電解電鍍粒子,由於此微小突起的作 ^而顯示出良好料電性。此無該電㈣子是由將球狀 心材之水性漿液添加至包含錄鹽、還原劑、錯合劑等之無 電解電鑛浴中的蛊雷解雷# …、免解電鍍步驟(A步驟)與於球狀芯材之 水性裝液中將無電解錢敷液之構成成分至少分離為2液並 將其分別同時地、經時神灿、-n i & '吁性地添加之無電解電鍍步驟(B步驟) 所製造。關於此製造方法,在A步釋中,在芯材粒子的表 ^成㈣皮膜的㈣,而形成作為突起的生成的起點之 無孕核在驟中成長而形成突起。藉此所完成的 =電解電㈣子是適用於例如詩㈣、接㈣向的連接 電路的導電性接著劑、異 等。 江导冤膜、異向性導電接著劑 除了此技術之外,在專利文獻 的芯材粒子的表面附著輪〜 杈出了使粒徑4" 的表面附著粒杈5〇nm之鎳芯物質,接 的的無電解電鑛的進行,而完成具有突起部的導電性粒子 、方法。然而此方法中’由於芯材粒子與鎳芯物質的密接 201021054 性弱’故缺乏被覆芯材粒子的表面之鎳層與突起部的一體 性,而在導電性粒子施加壓力的情況中,突起部容易破損。 另外’在粒徑4仁m的芯材粒子的表面,非常難以均勻地附 著粒徑遠小於此之50nm的鎳芯物質❶其原因在於與鎳芯物 質附著於芯材粒子的表面相比,還更容易發生鎳芯物質彼 此的凝集之情況。其結果,鎳芯物質彼此凝集而成之大粒 徑的凝集粒子附著於芯材粒子的表面的情況很多,而容易 形成非常大的突起部。 另一方面,近年來伴隨著電子機器類的進一步的小型 化,電子電路的電路寬度、間距(pitch)愈變愈小。隨著而 來的是對於用於上述之導電性接著劑、異向性導電膜異 向性導電接著劑等的無電解電鍍粉體而言,需要其粒徑較 小者。然而若縮小粒子的粒徑,粒子彼此就容易發生凝集, 即使使用粒徑較小的粒子,因凝集而成的外觀粒徑(二次粒 拴)仍變大。另外,使用小粒徑的情況中,在提高導電性(降 低電阻)方面,比使用大粒子的情況困難。 【專利文獻1】特開2000-243132號公報 【專利文獻2】特開2006 — 228474號公報 【發明内容】 【發明所欲解決的問題】 因此,本發明的目的是提供各種功能比上述習知技術 的導電性粉體還要提昇之導電性粉體。 201021054 【用以解決問題的手段】 為了達成上述目的,本案諸位發明人精心研究的結 果,研九出在使用具有與習知相同程度的分散性、且粒徑 小於習知技術的導電性粒子的情況中,藉由使形成於其表 面的犬起的形狀比習知技術還長,而可以抑制導電性的降 低0 本發明基於上述研究,而提供一種導電性粉體,適用 鲁;在匕材粒子的表面形成有鎳或鎳合金皮膜之導電性粒子 所構成的導電性粉體,其特徵在於: 、上述導電性粒子具有從上述皮膜的表面突出、且與上 述皮膜成為連續體、离官 史貝菔间寬比(aspect ^乜幻為i以上之複 數個突起部; 高寬比為 起部的數量的 1以上之上述突起部的數量比例,為全部突 4 0 %以上;以及201021054 VI. Description of the Invention: [Technical Field] The present invention relates to a conductive powder and a conductive material containing the conductive powder. Further, the present invention relates to a method for producing conductive particles. [Prior Art] 4 In the present case, four people have previously proposed electroless electroless plating powder having minute protrusions composed of recorded or recorded alloys on the surface (refer to Patent Document 1). The particles show good electrical properties due to the microprotrusions. The absence of the electricity (four) is to add the aqueous slurry of the spherical heart material to the electroless ore bath containing the recorded salt, the reducing agent, the wrong agent, etc., and the electroplating step (A step) And in the aqueous liquid filling of the spherical core material, the constituents of the electroless liquid dressing liquid are separated into at least two liquids, and they are simultaneously and simultaneously, and the electroless plating is added by -ni & Step (Step B) Manufactured. With regard to this manufacturing method, in the A-step release, the (ii) film of the core material particles forms (4), and the non-pregnant nucleus which forms the starting point of the formation of the protrusion grows in the middle of the step to form a protrusion. The electrolysis (4) which is completed by this is a conductive adhesive or the like which is suitable for connection circuits such as poems (4) and (4). In addition to this technique, the water-conducting film and the anisotropic conductive adhesive adhere to the surface of the core material particles of the patent document, and the nickel-core material having a particle size of 4 Å is adhered to the surface of the particle size of 5 〇 nm. The electroless ore of the connected electroless ore is completed, and the conductive particles having the protrusions are completed. However, in this method, 'the adhesion between the core material particles and the nickel core material 201021054 is weak, so the integration of the nickel layer and the protrusion portion on the surface of the core material particle is lacking, and in the case where the pressure is applied by the conductive particles, the protrusion portion is formed. Easy to break. In addition, it is very difficult to uniformly adhere a nickel core material having a particle diameter much smaller than 50 nm on the surface of the core material particle having a particle diameter of 4 m, because the nickel core substance is attached to the surface of the core particle. It is more likely that the nickel core materials are agglomerated with each other. As a result, the agglomerated particles having a large particle diameter in which the nickel core materials are aggregated adhere to the surface of the core material particles, and it is easy to form a very large projection. On the other hand, in recent years, with the further miniaturization of electronic devices, the circuit width and pitch of electronic circuits have become smaller and smaller. As a result, the electroless plating powder used for the above-mentioned conductive adhesive, an anisotropic conductive film anisotropic conductive adhesive or the like is required to have a small particle diameter. However, when the particle diameter of the particles is reduced, the particles are likely to aggregate with each other, and even if particles having a small particle diameter are used, the apparent particle diameter (secondary particle size) due to aggregation becomes large. Further, in the case of using a small particle diameter, it is difficult to increase the conductivity (reducing the electric resistance) than when a large particle is used. [Patent Document 1] JP-A-2000-243132 [Patent Document 2] JP-A-2006-228474 SUMMARY OF INVENTION [Problems to be Solved by the Invention] Accordingly, it is an object of the present invention to provide various functions as compared with the above-mentioned The conductive powder of the technology is also improved by the conductive powder. 201021054 [Means for Solving the Problem] In order to achieve the above object, the results of intensive research by the inventors of this case have been made to use conductive particles having the same degree of dispersibility as the conventional ones and having a particle diameter smaller than the conventional technique. In the case, the shape of the dog formed on the surface thereof is longer than the conventional technique, and the decrease in conductivity can be suppressed. The present invention provides a conductive powder based on the above research, and is applicable to the coffin. a conductive powder comprising a conductive particle of a nickel or a nickel alloy film formed on the surface of the particle, wherein the conductive particle has a surface protruding from the surface of the film and is a continuous body and a history of the film. a ratio of the number of protrusions in which the aspect ratio is i or more; the ratio of the number of the protrusions having an aspect ratio of one or more of the number of the upper portions is more than 40% of the total protrusion;

關於上述導電性粉體,上述導電 所佔的重景盔I·、+、播 一人祖千 為上迹導電性粉體的重量之85重量%以上。 本發明還提供—種導電 於包含·· π卞旳•方法,其特徵在 二:驟’將含分散劑及鎳離子的 有貴金屬的芯材粒子混人又合”表面具 成錄初期薄膜層之時,;4芯材粒子的表面形 為。·咖〜。御爾"4的丄么升之將錄離子濃度調整 積總和…“:二:上的上述無電㈣,使用表面 B步驟,心Γ 芯材粒子;以及 步驟所完成之具有鐵初期薄琪層的上述 201021054 材粒子α及含有上述分散劑的水性聚料維持在展現上 述分散劑的分散效果的ρΗ值範圍,並經時性地添加使每小 時的析出量為25]00咖之相當的量的鎳離子及還原劑而 在上述水性漿料中生成鎳的孕核粒子的同Bf,將生成的孕 核粒子附著於上述芯材粒子,而以已附著的孕核粒子為起 點而使上述孕核粒子成長,而形成高寬比$ i以上之突起 部0 【發明效果】 本發明之導電性粉體,構成其的導電性粒子的粒徑比 習知技術還小,但是分散性及導電性良好。另外若藉由本 發明的製造方法,可以容易地製造上述的導電性粉體。 【實施方式】 【用以實施發明的最佳形態】 以下’根據本發明的較佳實施形態來說明本發明。本 發明之導電性粉體’是在芯材粒子的表面形成鎳皮膜或鎳 合金皮膜(以下將這些皮膜簡稱為「鎳皮膜」)而成。本發 明之導電性粉體所具有的特徵之一,是具有複數個從鎳皮 膜的表面突出的突起部。以下,針對此突起部來作說明。 在導電性粉體的表面形成複數個突起部,如同本說明 書的習知技術的項目中所述,是此技術領域中已廣為人知 的技術。相對於這樣的背景技術,在本發明中,採用特定 形狀之物來作為突起部,是明顯與習知的導電性粉體不同 的一點。具體而言,本發明之導電性粉體中的突起部的特 201021054 徵在於高寬比為1以上。本說明書中的高寬比是指突起部 的局度Ή與在突起部的基部之突起部的寬度D之比,也就 是以Η/D所定義的值。從此定義可以瞭解高寬比是突起部 的細長程度的尺度,其意義在於其值愈大則突起部為細長 的形狀。 具有突起部的習知的導電性粉體中的此突起部的高寬 比’以本說明書的習知技術項目所述的專利文獻1來說, 就本案諸位發明人所知,不容易使其成為i以上。習知的 導電性粉體中的突起部,可以說是具有矮胖的形狀(例如參 考後文所述的帛2圖)。㈣於此,本發明之導電性粉體中 的突起部,例如後文所述的第i圖所示,為從粒子的表面 ^呈放射狀地延伸之細長的突起。本案諸位發明人針對 ::部的高寬比作研究,揭曉了若使其值纟“乂上、也就 :犬起邛的形狀比習知技術還細&,導電性性就變得非常 同、。其理由我們認為是使用本發明之導電性粉體來將電極 導,的情況,遇到在電極表面自然地形成薄氧化皮膜等、 或是故意形成電極的氧化皮膜等情況之時,若突起部的高 寬比較大’可以容易地穿透此氧化皮膜的緣故。另外,^ 使=導電性粉體而形成異向性導電膜的情況中,若突起部 的门寬比車乂大,我們認為由於樹脂排除性變高,而提高導 電性。有鑑於此理由’我們亦認為突起部的高寬比的值若 過大,則突起部會破損,因此高寬 仏门見比的較佳範圍是In the above-mentioned conductive powder, the weight of the heavy-duty helmet I·, +, and the broadcaster is 85 wt% or more of the weight of the conductive powder. The invention also provides a method for conducting electricity containing a ·························································································· At the time, the surface shape of the 4 core material particles is .· 咖 〜 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The core material particles; and the above-mentioned 201021054 material particles α having an initial layer of iron and the aqueous polymer material containing the above dispersing agent are maintained in a range of pH values exhibiting the dispersion effect of the above dispersing agent, and are temporally-oriented. A nickel ion and a reducing agent are added in an amount such that the amount of precipitation per hour is 25] 00, and the same Bf of the pronuclear particles in which nickel is formed in the aqueous slurry is attached to the core. In the case of the material particles, the nucleus particles are grown by using the deposited nucleus particles as a starting point, and the protrusions 0 having an aspect ratio of $ i or more are formed. [Effect of the invention] The conductive powder of the present invention constitutes the conductivity thereof. Particle size ratio is known Surgery is still small, but the dispersion and good electrical conductivity. Further, according to the production method of the present invention, the above-mentioned conductive powder can be easily produced. [Embodiment] [Best Mode for Carrying Out the Invention] Hereinafter, the present invention will be described based on preferred embodiments of the present invention. The conductive powder of the present invention is formed by forming a nickel film or a nickel alloy film on the surface of the core material particles (hereinafter, these films are simply referred to as "nickel film"). One of the characteristics of the conductive powder of the present invention is that it has a plurality of protrusions protruding from the surface of the nickel film. Hereinafter, the protrusion will be described. The formation of a plurality of protrusions on the surface of the conductive powder is a well-known technique in the art as described in the prior art of the present specification. With respect to such a background art, in the present invention, the use of a specific shape as a projection is a point which is remarkably different from a conventional conductive powder. Specifically, the special 201021054 of the protrusions in the conductive powder of the present invention is characterized by an aspect ratio of 1 or more. The aspect ratio in the present specification means the ratio of the degree of the protrusion 突起 to the width D of the protrusion at the base of the protrusion, that is, the value defined by Η/D. From this definition, it can be understood that the aspect ratio is a measure of the degree of slenderness of the protrusion, and the significance is that the larger the value, the more the protrusion has an elongated shape. The aspect ratio of the protrusions in the conventional conductive powder having the protrusions is known from the inventors of the prior art in the patent document 1 described in the prior art item of the present specification, and it is not easy to make it Become i or above. The protrusions in the conventional conductive powder can be said to have a short fat shape (for example, refer to the 帛 2 diagram described later). (4) Here, the protrusions in the conductive powder of the present invention are elongated protrusions extending radially from the surface of the particles as shown in Fig. i to be described later. The inventors of this case have studied the aspect ratio of the Department: It is revealed that if the value is 乂, it will be: the shape of the dog is thinner than the conventional technology, and the conductivity becomes very In the case where the electrode is guided by the conductive powder of the present invention, it is considered that when a thin oxide film or the like is naturally formed on the surface of the electrode, or an oxide film of the electrode is intentionally formed, If the height and width of the protrusions are relatively large, the oxide film can be easily penetrated. In the case where the conductive powder is formed to form an anisotropic conductive film, the gate width of the protrusion is larger than that of the rudder. We believe that the conductivity is improved due to the high resin exclusion. For this reason, we also think that if the value of the aspect ratio of the protrusion is too large, the protrusion will be damaged, so the height and width of the door are better. Range is

Uj4·。、更好為U〜3,5、再更好為 述咼寬比大的突起部的道 八 的大起。卩的導電性粒子,可以藉由例如後文所 7 201021054 述的方法來製造。 著眼於導電性粉體中的各個粒子的情況各㈣子所 具有的突起部的高寬比全部都滿足上述範圍的情況是最理 想,但=經由本案諸位發明人的研究,可以瞭解高寬比滿 j上述耗圍的大起部的比例’相對於全部的突起部的數量 右為40%以上、較杯主 較好為45%以上、更好為5〇%以上,就可以 得到足夠的導電性。Uj4·. More preferably, it is U~3,5, and it is better to say that the height of the ridges of the protrusions having a large aspect ratio is large. The conductive particles of ruthenium can be produced, for example, by the method described in the following Japanese Patent No. 7, 201021054. In view of the individual particles in the conductive powder, it is preferable that the aspect ratios of the protrusions of each of the (four) sub-mass satisfy the above range, but the study of the inventors of the present case can understand the aspect ratio. The ratio "the ratio of the large-sized portion of the above-mentioned full circumference" is 40% or more with respect to the total number of the protrusions, and is preferably 45% or more, more preferably 5 % or more, more preferably 5 to 5% or more. Sex.

上述南寬比的泪丨丨令士、+ L ❹ 導電性粉"的夂 以下所述。以電子顯微鏡將 Π粉體中的各個粒子放大觀察。針對-個粒子,測定 其至少一個突起部的基部長D及高H。此情況 ^ 於觀察影像中的粒子的中央的突起部,較傾向以存在予 子的周圍邊緣的突起部來作 存在於粒 定這-點來看报重 從尺寸的正確測 上述測定。將上述方法/ 不同的粒子為對象進行 數平均,以其值來作為高寬比=同寬比的數據作算 示,由於突起” # 後文所述的M i圖所 ❹ 圓形),由粒子觀察 (幻如為大致呈 改變的顧慮較小。 所造成的突起部的基部長D的值 突起部的高寬比為如上所 長D本身以及突” μ *起部的基部的 L0. 5"、特别是 ’在基部的長D方面為 〇.05〜〇.5…特別是較好為〇./ .4㈣,高β方面為 的長D以及突起部的 一 广4㈣。突起部的基部 導電性。 门右在此範圍内,則進—步地提升 8 201021054 導電性粉體的各個粒子中的高寬比為1以上之突起的 數量,亦與粒子的粒徑有關,但如後文所述,粒子的粒徑 為3/zm以下的情況中為每個粒子2〜4〇個、特別是較好為 2~20個,因為會進一步地提升導電性粉體的導電性。 ❹ 導電性粉體中的各個的突起部,是與被覆芯材粒子的 錄皮膜成為連續禮。因此,突起部與錄皮膜-樣是由錄或 鍊合金所構成。在此處所稱的「連續體」,其意義是指鎳 皮膜與突起部全體是由同一個材料所構成、突起部是由單 -的步驟所形成、且錄皮膜與突起部之間並未存在接鏠等 的會抽及-體性的部位。因此,例如在芯材粒子的表面形 成錄皮膜,而在其上附著用於形成突起部的孕核粒子而以 此孕核粒子為成長的起點所形成的突起部,由於突起部並 非以單一的步驟來形&,並$包含於本發明所指的連續 體在大起部與突起部成為連續體的情況下,由於確保突 起部的強度’即使在使用導電性粉體時施加壓力,突起部 仍難以破損。其結果可以得到良好的導電性。 關於上述錄皮膜的厚度,若其過薄則導電性粉體就難 以顯示足夠的導電性’·相反地若過厚則容易從芯材粒子的 表面剝離°«:^些觀點’鎳皮膜的厚度(在不存在突起部的 部位的厚度)較好為〇.0卜0.3㈣、更好為0.05〜0.2心。 鎳皮膜的厚度,可以藉由從導電性粉體溶解鎳,再對 解的錄作定量而求得。而若使 ^ 办 更用此方法,並非只有鎳皮膜, 大起部的鎳亦會溶解,但* 、 因為犬起部在鎳全體所佔的比例 戸常低,而可以忽略突起部的鎳的量。 9 201021054 關於本發明之導電性粉艘,各個粒子的形狀較 形。在此處所稱的粒子的形狀’是指突起部以外的… 形狀。由於粒子為球形、與具有突起部,故 * 性粉體的導電性很高。 月之導電 本發明之導電性粉體中,各個的粒子的 、 應導電性粉體的具體用途來作 T以因 ,,^ 又疋本案諸位發明 結果’在與上述突起部的高寬比的關 到導電性粒子的粒徑小,但仍提升導電性瞭: 電?粒子的粒徑為Η。""別是較好為二::更: I較好為。另外’導電性粒子的粒 =ΠΓ粒子的粒徑,_子顯微= 亦可以分別測定芯材粒子的粒徑以及: 皮膜=厚度,再從這些值來求得導電㈣子的粒徑。 導電性粒子,其粒徑芸繕 發峰誠,▲ 則有容易凝集的傾向。若 發生凝集,則會發生使用導電性粒子 引起短路等的缺陷。另外、°冑電膜容易 參 的處理,則鎳皮膜^ 凝集而施作粉碎等 觀點來看,關=為導電性降低的原因。從此 觀點朿看’關於本發明之導t 散性是报重要。函从 美阿各個粒子的分 私工 此關於本發明,導電性粒子之令,一分 粒子所佔的重量為相對於導μ㈣一次 上、較好為9。重量%以上、更好為92重量二重量心 高導電性粒子m丨生,例 。為了提 電性粒子即可。一次“ 後文所述的方法製造導 定。將…的導電:=佔的重量則以下列方法來測 电i王物體放入 iuumL的水中,以超音波均 10 201021054 質機(h〇mogenizer)分散i分鐘。接下來,藉由庫爾特粒度 分析(Coulter Counter)法來測定粒度分佈。由此結果計算 出一次粒子的重量比例。 如上所述,導電性粒子中的鎳皮膜及突起部是由相同 材料所構成,具體而&是由金屬鎳或鎳合金所構成。關於 鎳合金是包含例如鎳-磷合金。鎳—磷合金是在後文所述的 導電度泰體的製造中’使用次亞磷酸鈉作為鎳的還原劑的 魯 情況所產生的合金。 關於本發明之導電性粉體,各個的粒子的表面是由鎳 或鎳合金所構成,或是亦可以以貴金屬來覆蓋鎳或鎳合金 的表面。關於貴金屬,是使用高導電性金屬之金或鈀特 別疋較好為使用金。藉由貴金屬的被覆,可以進一步提高 導電性粉體的導電性。以貴金屬被覆的厚度一般而言是 0· 001〜0.5仁m左右。其厚度可以從貴金屬離子的添加量、 _ 化學分析等計算出來。 接下來,針對適用本發明之導電性粉體的製造方法來 作說明。本製造方法是粗分為(1)在芯材粒子的表面形成鎳 初期薄膜層的A步驟、與(2)使用以A步驟所完成的粒子作 為原料而形成標的之導電性粒子的的步驟B之二個步驟。 以下針對各個步驟來作說明。 步驟A中’混合含有分散劑及錄離子的無電解電鍵 冷與在表面攜帶貴金屬的芯材粒子混合,在芯材粒子的表 V成鎳初期薄膜層。芯材粒子的種類並無特別限制,有 機物及無機物均可使用。若考量到後文所述的無電解電艘 11 201021054 法’心材粒子較好為·5|~丨、7 , 马了以在水中分散者。因此,芯材粒子 較好為實質上不溶7tc本 、水者’更好為對於酸、鹼等不會溶解 或變質者。可以在水中分埒β 甘不甲刀散疋指藉由攪拌等的通常的分散 手法,而可以形成右 中實質上地分散的懸浮液,分散的 程度=可以在芯材粒子的表面形成錄皮膜的程度。 材粒子的形狀是對作為標的的導電性粒子的形狀有 很大影響。如前所述,由於被覆芯材粒子的表面的鎖皮臈 的厚度薄’芯材粒子的形狀是幾乎照原樣反映為導電性粒 子的形狀。由於前述導電性粒子較好為球形,芯材粒子的❹ 形狀亦較好為球形。 心材粒子為球形的掩、^ +. J, 旳it况心材粒子的粒徑是對作為榍 的的導電性粒子的粒稽右彡 有很大影響。如前所述,由於被遷 芯材粒子的表面的錄皮膜的厚度薄,芯材粒子的粒極是慈 乎反映為導電性粒子的粒徑。從此觀點,芯材粒子的粒和 可以與作為標的的導雷妯# 2 u u " 電丨生粒子的粒徑相同程度,具體而1 為1〜10/zm、特別是較接良 °The above-mentioned aspect ratio tears, + L ❹ conductive powder " Each particle in the tantalum powder was magnified by an electron microscope. The base D and the height H of at least one of the protrusions were measured for each of the particles. In this case, the protrusion in the center of the particle in the observation image tends to be measured by the protrusion of the peripheral edge of the pre-existing edge. The above method/different particles are number-averaged for the object, and the value is used as the data of the aspect ratio=the same width ratio, because the protrusion “# 后 所述 后 后 后 后 ) ) ) ) ) The particle observation (the illusion is generally less of a concern). The resulting aspect ratio of the base D of the protrusion is as long as the length D itself and the protrusion "μ * the base of the part L0. 5" In particular, 'the length D of the base is 〇.05~〇.5... especially preferably 〇./.4(4), the long D in the high β aspect and the wide 4 (four) of the protrusion. The base of the protrusion is electrically conductive. The right side of the door is within this range, and the number of protrusions with an aspect ratio of 1 or more in each particle of the conductive powder is also related to the particle size of the particle, as will be described later. In the case where the particle diameter of the particles is 3/zm or less, it is 2 to 4, and particularly preferably 2 to 20, per particle, because the conductivity of the conductive powder is further improved. Each of the protrusions in the powder is continuous with the film on which the core material particles are coated. The protrusion and the film-like film are composed of a recording or chain alloy. The term "continuous body" as used herein means that the nickel film and the protrusion are composed of the same material, and the protrusion is composed of a single piece. - a step formed by the step of forming a film and a protrusion between the film and the protrusion portion. Therefore, for example, a film is formed on the surface of the core material particle, and is attached thereto for attachment thereon. The protrusions formed by the pronuclear particles forming the protrusions and the pronuclear particles as the starting point of growth are not formed in a single step by the protrusions, and are included in the continuum of the present invention. When the portion and the protrusion portion are in a continuous body, the strength of the protrusion portion is ensured. Even when the conductive powder is used, the protrusion portion is hardly broken. As a result, good conductivity can be obtained. If it is too thin, it is difficult for the conductive powder to exhibit sufficient conductivity. · Conversely, if it is too thick, it is easy to peel off from the surface of the core particle. «: Some views 'The thickness of the nickel film (in the absence of protrusions) The thickness of the portion is preferably 〇.0b 0.3 (four), more preferably 0.05 to 0.2. The thickness of the nickel film can be obtained by dissolving nickel from the conductive powder and quantifying the solution. If this method is used, it is not only the nickel film, but the nickel in the large part will also dissolve, but *, because the proportion of the dog in the nickel is always low, and the amount of nickel in the protrusion can be ignored. 9 201021054 In the conductive powder boat of the present invention, the shape of each particle is relatively shaped. The shape of the particle referred to herein means a shape other than the protrusion. Since the particle is spherical and has a protrusion, it is * The conductivity of the powder is very high. Conductivity of the moon In the conductive powder of the present invention, the specific use of the respective particles of the conductive powder is made of T, and the results of the invention are in the same case. The aspect ratio of the protrusions is small to the particle diameter of the conductive particles, but the conductivity is improved: The particle size of the electro-particles is Η. "" Don't be better for two:: more: I is better. Further, the particle size of the conductive particles = the particle diameter of the cerium particles, and the _ submicron = the particle diameter of the core material particles and the film = thickness, respectively, and the particle diameter of the conductive (tetra) is determined from these values. Conductive particles, which have a particle size of 峰Fengfengcheng, ▲ tend to aggregate easily. When agglomeration occurs, defects such as short-circuiting due to the use of conductive particles occur. Further, when the 胄 胄 film is easily treated by the ginseng, the nickel film is agglomerated and applied to pulverize, etc., and the reason is that the conductivity is lowered. From this point of view, it is important to report on the conductability of the present invention. In the present invention, the weight of the particles is one-time, and preferably nine, with respect to the guide μ (four). The weight% or more, more preferably 92 parts by weight, the weight of the high-conductivity particles m, for example. In order to lift the particles. Once "the method described in the following article is made. Conduction: = the weight of the electric weight is measured by the following method to put the i king object into the water of iuumL, to supersonic wave 10 201021054 (h〇mogenizer) The dispersion was measured for 1 minute. Next, the particle size distribution was measured by Coulter Counter method. From this result, the weight ratio of the primary particles was calculated. As described above, the nickel film and the protrusions in the conductive particles were It is composed of the same material, and specifically & is composed of a metal nickel or a nickel alloy. The nickel alloy is, for example, a nickel-phosphorus alloy. The nickel-phosphorus alloy is in the manufacture of a conductivity Thai body as described later. An alloy produced by using sodium hypophosphite as a reducing agent for nickel. Regarding the conductive powder of the present invention, the surface of each particle is composed of nickel or a nickel alloy, or nickel may be covered with a noble metal. Or the surface of a nickel alloy. Regarding the noble metal, gold or palladium of a highly conductive metal is used, and gold is preferably used. The coating of the noble metal can further improve the conductivity of the conductive powder. The thickness of the noble metal coating is generally about 0. 001 to 0.5 min. The thickness can be calculated from the amount of precious metal ions added, chemical analysis, etc. Next, the production of the conductive powder to which the present invention is applied is applied. The production method is roughly classified into (1) a step of forming a nickel initial film layer on the surface of the core material particles, and (2) using the particles completed in the step A as a raw material to form a target conductivity. The two steps of the step B of the particles are described below for each step. In step A, 'mixing the electroless bond containing the dispersant and the recorded ions is cold mixed with the core particles carrying the precious metal on the surface, in the core particles Table V is an initial film layer of nickel. The type of the core material particles is not particularly limited, and both organic matter and inorganic matter can be used. Considering the electroless electric boat 11 described later, 201021054 method 'heart material particles are preferably 5|~丨, 7, the horse is dispersed in the water. Therefore, the core material particles are preferably substantially insoluble 7tc, the water is better for the acid, alkali, etc. will not dissolve or deteriorate. Can be divided in water β 甘甲刀刀疋 means that a suspension which is substantially dispersed in the right middle can be formed by a usual dispersing method such as stirring, and the degree of dispersion = the extent to which a film can be formed on the surface of the core material particles. The shape of the conductive particles has a large influence on the shape of the conductive particles. As described above, since the thickness of the lock skin on the surface of the coated core particles is thin, the shape of the core particles is almost exactly reflected as conductivity. The shape of the particles. Since the conductive particles are preferably spherical, the shape of the core particles is preferably spherical. The core particles are spherical, and the surface of the core particles is The particle size of the conductive particles has a great influence. As described above, since the thickness of the film on the surface of the particles to be transferred is thin, the particle size of the core particles is reflected as conductive particles. Particle size. From this point of view, the particle size of the core material particles can be the same as the particle size of the conductive particles of the target material, specifically 1 to 10/zm, especially the better.

权好為1〜更特別是較好名 1〜3 # m。芯材粒子的鈿依 " 的粒徑,可以以與導電性粒子的粒徑民 樣的方法來作測定。 藉由上述的方法所測定的芯材粉體的粒度分佈是具有 寬度。-般而t,粉體的粒度分佈的幅度,是以下式 所示的變動係數來表示。 一方面,若 關於芯材粒 變動係數(%)=(標準偏差/平均粒徑)xl〇〇 若此變動係數大,則表示分佈寬度大;另 變動係數小則顯示粒度分佈窄。在本發明中, 12 201021054 子’較好為使用此變動係數為3_下、特別是較好為· 以下、更好為10%以下者。其理由在於,在使用本發明之 導電性粒子作為異向性導電骐中的導電粒子的情況中,具 有對於連接有效的貢獻比例變高的優點。 關於芯材粉體的具體例,在無機物方面,可舉出金屬 (亦包含合金)、玻璃、陶窨、―备外访 闽瓮一氧化矽、碳、金屬或非金 屬的氧化物(亦包含含水物)、含銘矽酸鹽的金屬矽酸鹽、 籲金屬碳化物、金屬氮化物、金屬碳酸鹽、金屬硫酸鹽、金 屬鱗酸鹽、金屬硫化物、金屬酸鹽、金屬齒化物及碳等。 在有機物方面,可舉出天然纖維、天然樹脂、聚乙稀、聚 丙烯、聚氣乙烯、聚笨乙烯、聚丁烯(p〇iybMene)、聚醯 胺(polyamide)、聚丙烯酸酯(polyacryHc ester)、聚丙 烯腈(polyacrylonitrile)、聚縮醛(p〇lyacetal)、含離子 鍵的聚合物(ionomer)、聚酯等的熱塑性樹脂;醇酸(alkyd) 樹脂、酚樹脂、尿素樹脂、三聚氰胺樹脂、二甲苯樹脂、 ❹聚矽氧樹脂(silic〇ne resin)、環氧樹脂或酞酸二烯丙酯 (diallylphthalate)樹脂等。這些物質可以單獨使用,也 可以以二種以上的混合物來使用。 另外’芯材粒子的其他物性並無特別限制,但是芯材 粒子為樹脂粒子的情況,則較好為以下列的式(2 )所定義的 K 值在 20C 為 10kgf/mm2~1 000〇kgi/imn2 的範圍、且 壓 縮變形後的回復率在20°C為1%〜1〇〇%的範圍。其原因在於 在滿足這些物性值之下’在電極彼此壓合時不會傷及電 極’而可以與電極充分地接觸。 13 201021054 κ 值(kgf/mm”=(3//2))FxS-3/2xR-w2......⑵ 式(2)所示的F及S是以微小壓縮試驗機MCTM-500 (島 ;拿製作所股份有限公司製)所測定的值,分別為在此微球體The right is 1 to more especially the better name 1~3 # m. The particle size of the core material particles can be measured by a method similar to the particle size of the conductive particles. The particle size distribution of the core material powder measured by the above method has a width. Generally, the amplitude of the particle size distribution of the powder is expressed by a coefficient of variation shown by the following formula. On the other hand, if the core material particle variation coefficient (%) = (standard deviation / average particle diameter) xl 〇〇 if the coefficient of variation is large, the distribution width is large; and when the coefficient of variation is small, the particle size distribution is narrow. In the present invention, the 12 201021054 sub' is preferably such that the coefficient of variation is 3 Å, particularly preferably hereinafter, more preferably 10% or less. The reason for this is that when the conductive particles of the present invention are used as the conductive particles in the anisotropic conductive ruthenium, there is an advantage that the contribution ratio effective for the connection becomes high. Specific examples of the core material powder include metals (including alloys), glass, ceramics, bismuth oxide, carbon, metal or non-metal oxides (including Aqueous), metal citrate containing metal citrate, metal carbide, metal nitride, metal carbonate, metal sulphate, metal sulphate, metal sulphide, metal sulphate, metal dentate and carbon Wait. Examples of the organic substance include natural fiber, natural resin, polyethylene, polypropylene, polyethylene, polystyrene, polybutylene (polyamide), polyacrylic acid (polyamide), and polyacrylic acid (polyacryHc ester). ), polyacrylonitrile, p〇lyacetal, ionomer-containing polymer (ionomer), thermoplastic resin such as polyester; alkyd resin, phenol resin, urea resin, melamine resin , xylene resin, silicin resin, epoxy resin or diallylphthalate resin. These may be used singly or in combination of two or more. Further, the other physical properties of the core material particles are not particularly limited. However, when the core material particles are resin particles, it is preferred that the K value defined by the following formula (2) is 10 kgf/mm 2 to 1 000 〇 kgi at 20 C. The range of /imn2 and the recovery rate after compression deformation are in the range of 1% to 1%% at 20 °C. The reason for this is that the electrode can be sufficiently brought into contact with the electrode without satisfying the electrode when the electrodes are pressed against each other. 13 201021054 κ value (kgf/mm"=(3//2))FxS-3/2xR-w2 (2) F and S shown in formula (2) are micro compression tester MCTM-500 The value measured by (Island; manufactured by Seiko Co., Ltd.) is the microsphere here.

的1〇%壓縮變形時的荷重值(kgf)及壓縮應變(nun),R是此 微球鱧的半徑(mW 芯材粒子較好為其表面具有捕捉貴金屬離子的能力, 或是受到表面改質而具有捕捉貴金屬離子的能力。貴金屬 離子較好為把、銀等的離子。具有捕捉貴金屬離子的能力, 疋指可以捕捉貴金屬離子來作為螯合物或鹽類。例如在芯❹ 材粒子的表面存在胺基、亞胺基(imin〇)、酿胺基、醯亞胺 基、氰基、氫氧基、腈基(nitrile)、羧基等的情況中,此 芯材粒子的表面具有捕捉貴金屬離子的能力。作表面改質 而具有捕捉貴金屬離子的能力的情況中,可使用例如特開 昭61-64882號公報所揭露的方法。 使用上述的芯材粒子,使其表面攜帶貴金屬。具體而 吕,將芯材粒子分散於氣化鈀、硝酸銀這樣的貴金屬鹽類 的微酸性水溶液中。藉此使粒子的表面捕捉貴金屬離子。 貴金屬鹽的濃度為每lm2的粒子表面積1χ1〇 —7〜1χ1〇_2莫爾 的範圍則足夠。已捕捉貴金屬離子的芯材粒子從系統分離 後再水洗。接下來,將芯材粒子在水中懸浮,並在其中加 入還原劑而進行貴金屬離子的還原處理。藉此使芯材粒子 的表面攜帶貴金屬。關於還原劑,是使用例如次亞磷酸鈉、 蝴氮氧化納、碼氫化卸、二甲胺基甲硼燒 (dimethylaminoborane ; DMAB)、聯胺(hydrazines)、福馬 14 201021054 林等。 使芯材粒子的表面捕捉貴金屬離子之前,可施以使粒 子的表面吸附錫離子的敏化(sensi1;izing)處理。關於使粒 子的表面吸附錫離子,例如只要將已受到表面改質處理的 芯材粒子投入氣化亞錫的水溶液並攪拌既定時間即可。 將已施以上述前處理的芯材粒子,與含有分散劑及鎳 離子的無電解電鍍浴混合。無電解電鍍浴是以水為媒介的 • 溶液,關於其所包含的分散劑,可舉出例如非離子界面活 性劑、兩性離子介面活性劑以及水溶性高分子。關於非離 子界面活性劑,可使用聚乙二醇(polye1:hylene glyc〇i)、 聚乙二醇烴基醚(polyoxyethylene alkyl ether)、聚乙二 醇烷基酚基醚(p〇lyOXyethylene alkylphenyl e1:her)等的 聚氧烷基醚(polyoxyaIky lene ether)系的界面活性劑。關 於兩性離子介面活性劑,可使用烷基二甲基醋酸甜菜鹼 (alkyldimethyl acetate betaine)、院基二甲基幾基甲基 ❿醋酸甜菜鹼(alkyl dimethyl carboxyl methyl acetate betaine)、烧基一甲基胺基醋酸甜菜驗(alkyl dimethyl amino acetate betaine)等的甜菜鹼系的界面活性劑。關 於水溶性高分子,可使用聚乙烯醇(polyvinyl aic〇hQl ; PVA)、聚乙浠吡咯酮(polyvinyl pyrrol idinone)、經基乙 基纖維素(hydroxy ethy 1 cellulose)等。分散劑的使用量 是與其種類有關,但一般為相對於液體(無電解電鍍浴)的 體積之0· 5~30g/L。特別是若分散劑的使用量為相對於液 體(無電解電鍵浴)的體積之1〜10g/L的範圍,以提昇鎳皮 15 201021054 膜的密接性的觀點而言是較佳㈣擇。The load value (kgf) and compressive strain (nun) of 1〇% compression deformation, R is the radius of the microspheres (mW core particles preferably have the ability to capture precious metal ions on their surface, or are subject to surface modification It has the ability to capture noble metal ions. The noble metal ions are preferably ions such as silver and silver. They have the ability to capture noble metal ions, and the fingers can capture precious metal ions as chelate or salts. For example, in core particles. In the case where an amine group, an iminium group, a amide group, a quinone group, a cyano group, a hydroxyl group, a nitrile group, a carboxyl group or the like is present on the surface, the surface of the core material particle has a noble metal. In the case where the surface is modified to have the ability to capture noble metal ions, a method disclosed in, for example, JP-A-61-64882 can be used. The above-mentioned core material particles are used to carry a noble metal on the surface. Lv, the core material particles are dispersed in a slightly acidic aqueous solution of a noble metal salt such as vaporized palladium or silver nitrate, whereby the surface of the particles is trapped of noble metal ions. The concentration of the noble metal salt is per l. The particle surface area of m2 is 1χ1〇—7~1χ1〇_2 The range of Moir is sufficient. The core particles that have captured the noble metal ions are separated from the system and then washed. Next, the core particles are suspended in water and added thereto. The reduction agent is used to carry out the reduction treatment of the noble metal ions, whereby the surface of the core material particles carries the noble metal. Regarding the reducing agent, for example, sodium hypophosphite, sodium oxynitride, code hydrogenation, and dimethylaminoboron are used. Dimethylaminoborane; DMAB), hydrazines, fuma 14 201021054, etc. Before the surface of the core particle is captured by the noble metal ion, sensitization (sensi1; izing) treatment of adsorbing tin ions on the surface of the particle can be applied. When the surface of the particle is adsorbed with tin ions, for example, the core material subjected to the surface modification treatment may be introduced into an aqueous solution of vaporized stannous and stirred for a predetermined period of time. The core material particles subjected to the pretreatment described above and the dispersant are contained. It is mixed with an electroless plating bath of nickel ions. The electroless plating bath is a water-based solution. For the dispersant contained therein, for example, Ionic surfactants, zwitterionic surfactants, and water-soluble polymers. For nonionic surfactants, polyethylene glycol (polye1:hylene glyc〇i), polyoxyethylene alkyl ether, a polyoxyalkyl Iether lene ether-based surfactant such as p-butyloxyalkylphenyl ephenyl (her). For the zwitterionic surfactant, an alkyl dimethyl group can be used. An alkyldimethyl acetate betaine, an alkyl dimethyl carboxyl methyl acetate betaine, an alkyl dimethyl amino acetate betaine, or the like Betaine surfactant. As the water-soluble polymer, polyvinyl alcohol (polyvinyl aic〇 hQl; PVA), polyvinyl pyrrol idinone, hydroxy ethy 1 cellulose or the like can be used. The amount of the dispersant used is related to the type thereof, but it is generally 0.5 to 30 g/L with respect to the volume of the liquid (electroless plating bath). In particular, when the amount of the dispersant used is in the range of 1 to 10 g/L with respect to the volume of the liquid (electroless electroless bond bath), it is preferable to improve the adhesion of the film of the nickel skin 15 201021054.

無電解電鍍浴中所含的鉾齙 B 作為結丨M 離子,是使用水溶性鎳越來 作H原。關於水溶性錦鹽,可使用•錄、:來 但並不限定於此。無電解 ’、、,、, 〇·_Η,莫爾/公升、特=1含的錄離子漠度為 爾/公升。 升特別疋較好為卜〇.005莫 在無電解電錄浴中,含有上述成 劑。關於還原劑,可使用 的還原 參 還原相同的還原劑。盔雷鉉铯城 貝金屬離子的The 鉾龅 B contained in the electroless plating bath is used as the knot M ion, and the water-soluble nickel is used as the H-origin. As for the water-soluble salt, it can be used, but it is not limited to this. Electroless ‘,,,,, 〇·_Η, Mohr/L, and +1 contain recorded ion inversions in liters per liter. It is better to raise the special 疋. 005 在 在 In the electroless electroplating bath, the above-mentioned composition is contained. With regard to the reducing agent, the reducing agent can be used to reduce the same reducing agent. Helmet Thunder City

約.0莫爾/八升: 中的還原劑的濃度為4X 升。爾/么升、特別是較好為2.〇χΠΓΜ).2莫爾/公 在無電解電鍍浴中,可更合 m , Η -,, 更3有錯化劑。藉由含有錯化 劑疋達成抑制鍍液的分解之有利 羧酸哎JLai# 有利的效果。可列舉出有機 叛毁A其鹽類例如檸檬 acid)、、、西 π # 幺乙酸(hydr〇xyacetic 或其驗金屬鹽、::二=葡萄糖酸—⑷ 等上述錯化劑可使用一種或二種以 。無電解電鑛浴中的錯化劑的濃度為〇〇〇5 升、特別是較好為〇,〇卜3莫爾/公升。 、爾 、、 包以則處理的芯材粒子與無電解電鍍浴混合的方 法並無特別限制 。幻如可以先將無電解電鍍浴加熱至鎳離 子之可還原的、、田痒 ., 皿又,在此狀態下’將已施以前處理的芯材 粒子投入^叙雷兩 …、解電鑛浴中。藉由此操作’將鎳離子還原’ 因還原所生& & &。, 、錄則在芯材粒子的表面形成初期薄膜層。 初期薄膜;s & 曰、形成厚度較好為0.1〜l〇nm、更好為 16 201021054 0· 1〜5mn。在此時間點,尚未形成突起部。 A步驟中的重點在於無電解電鍍浴中所含的 碑離子的 量與投入的芯材粒子的量的關係。具體而言,相 ^野於已將 鎳離子的濃度調整在〇.000卜〇.008莫爾/公升、 柯別是較 好為0.0001〜0.005莫爾/公升之1公升的無電解 电趟浴, 使用表面積的總和為卜15m2、特別是較好為2〜8 瓜的量之 芯材粒子。藉此,可以容易地形成具有上述厚度的初期薄 φ 膜層。另外,藉由使鎳離子的量與芯材粒子的量成為如上 述的關係’可以有效地防止已形成有初期薄膜層的芯材粒 子彼此的凝集。此情況在芯材粒子的粒徑較小的情況,例 如在粒徑為3 e m以下的情況特別有效。 完成錄離子的還原之後,接下來進行步驟B。步驟B 疋接續步驟A來進行,並未進行將在步驟a完成之具有鎳 初期薄膜的芯材粒子從液體分離等的操作。因此,在含有 具有鎳初期薄膜的芯材粒子的水性漿料中,仍殘留著在步 眷驟八所添加的分散劑。在步驟B中,是在步驟A所完成之 具有鎳初期薄膜的芯材粒子、以及含有步驟A中所使用的 分散劑的水性漿料中,經時性地添加鎳離子及還原劑。「經 時1±添加」的意義在於不是一次添加所有的錄離子及還原 劑,而是要在某個固定時間内連續性地或斷續性地添加鎳 子及還原劑。此一情況,錄離子及還原劑的添加的時間 點可以疋全—致;或者亦可以是先行添加鎳離子,再接著 添加還原劑;亦可以是上述的相反順序。還有,關於添加 的終點,可以先結束鎳離子的添加,再接著結束還原劑的 17 201021054 添加,亦可以是上述的相反順序。 關於在B步驟所使用的鎳離子的離子源,可使用與步 驟A所使用的相同的離子源。關於還原劑也是同樣。乂Approximately .0 moor/eight liters: The concentration of reducing agent in the medium is 4X liters.尔 / 升, especially preferably 2. 〇χΠΓΜ). 2 Moor / Gong In the electroless plating bath, can be more m, Η -,, more 3 have a wrong agent. The advantageous effect of the carboxylic acid hydrazine JLai#, which inhibits the decomposition of the plating solution, is achieved by the inclusion of a distoring agent. It can be exemplified that organic defiant A (such as lemon acid), western π # 幺 acetic acid (hydr〇xyacetic or its metal salt, :: di = gluconic acid - (4), etc., can be used one or two The concentration of the staggering agent in the electroless electrothermal ore bath is 〇〇〇5 liters, especially preferably 〇, 〇 3 3 摩尔/liter liter, er, and The method of mixing the electroless plating bath is not particularly limited. The illusion can be first heated to an electroless plating bath to a nickel-reducible, itch, dish, and in this state, the core that has been treated before The material particles are put into the suilei two..., in the electric mine bath. By this operation, 'reducing the nickel ions', the original film layer is formed on the surface of the core material particles by the reduction of the &&&& The initial film; s & 曰, the formation thickness is preferably 0.1~l〇nm, more preferably 16 201021054 0·1~5mn. At this time point, no protrusion is formed. The focus of step A is electroless plating. The relationship between the amount of the monument ion contained in the bath and the amount of the core material to be charged. In other words, it has been adjusted to a concentration of nickel ions of 〇.000 〇.008 摩尔/liter, and a liter of an electroless electrolysis bath of preferably 0.0001 to 0.005 mole/liter of 1 liter. The total surface area used is a core material particle of 15 m 2 , particularly preferably 2 to 8 melons, whereby an initial thin φ film layer having the above thickness can be easily formed. Further, by the amount of nickel ions The amount of the core material particles is as described above. The aggregation of the core material particles in which the initial film layer has been formed can be effectively prevented. In this case, when the particle diameter of the core material particles is small, for example, the particle diameter is 3 The following conditions are particularly effective. After the reduction of the recorded ions is completed, the step B is performed next. The step B is carried out in the subsequent step A, and the core material particles having the nickel initial film completed in the step a are not separated from the liquid, etc. Therefore, in the aqueous slurry containing the core material particles having the nickel initial film, the dispersant added in the step 8 is still left. In the step B, it is the initial stage of the nickel completed in the step A. Film core pellet In the aqueous slurry containing the dispersant used in the step A, nickel ions and a reducing agent are added over time. The meaning of "addition 1±addition" means that not all of the recorded ions and the reducing agent are added at a time. Rather, it is necessary to continuously or intermittently add nickel and a reducing agent for a fixed period of time. In this case, the time at which the recording ions and the reducing agent are added may be all the same; or it may be added first. Nickel ions, followed by the addition of a reducing agent; may also be in the reverse order described above. Also, with respect to the end point of the addition, the addition of nickel ions may be terminated first, followed by the addition of the reducing agent 17 201021054, or the reverse order described above. . Regarding the ion source of the nickel ions used in the step B, the same ion source as used in the step A can be used. The same applies to the reducing agent.乂

在B步驟中,藉由鎳離子的還原,首先在液體中形成 微小的錄的孕核粒子,再使此孕核粒子附著於步驟A所完 成之具有鎳初期薄膜的芯材粒子的表面,而以已附著的: 核粒子為起點使其成長,而形成突起部。藉由採用此方法, 可以有效地防止粒子彼此的凝集,且可以容易地形成高寬 比為1以上的突起部。相對於此,本說明書的先前技術的 項目中所敘述的㈣讀】巾,首先在騎粒子的表面形 成錄的皮膜的同時,並形成作為突起的生成的起點的孕核 (第-步驟);接下來使孕核在下一個步驟成長而形成突起 (第一步驟)。在此方法中,由於有必要使第一步驟中的鎳 離子的濃度相對較高,因此成為粒子凝結的成因而容易引 起粒子的凝結。另外,其難以形成高寬比高的突起部。In the step B, by the reduction of nickel ions, firstly, the micronuclear particles are formed in the liquid, and the pronuclear particles are attached to the surface of the core material particles having the nickel initial film completed in the step A, and The raised particles are grown by using the attached nuclear particles as a starting point to form protrusions. By adopting this method, aggregation of particles can be effectively prevented, and protrusions having an aspect ratio of 1 or more can be easily formed. On the other hand, the (four) reading towel described in the prior art item of the present specification first forms a recorded film on the surface of the riding particle, and forms a pregnancy (step-step) as a starting point of generation of the protrusion; Next, the nucleus is grown in the next step to form a protrusion (first step). In this method, since it is necessary to make the concentration of the nickel ions in the first step relatively high, the formation of particles is condensed and thus the particles are likely to be coagulated. In addition, it is difficult to form a protrusion having a high aspect ratio.

關於B步驟中的錄離子的還原,重要的一點是將水性 襞料維持在會展録A步驟所添加的分散劑(此添加劑仍 殘留在B步驟中)的分散效果之PH值範圍。藉此,可以有 效地防止粒子彼此的凝集。關於PH值的調整,只要一面監 漿㈣邱值、—面在水性漿料中添加各種無機酸等 、或氫氧化鈉等的鹼即可。PH值的調整範圍,只要是因 使用的刀散劑而採用適當的值即可。使用例如非離子 界面’舌性劑來作為分散劑的情況中’較好為將水性漿料的 PH值維持在5〜1〇的範圍。使用兩性離子界面活性劑來作 18 201021054 為分散劑的情況中,較好為將水 的範圍。使用水性高分子來作為二值:持:w 好為將水性漿料的·^值維持在5〜8的範二况中’也是較 關於B步驟中的鎳離子 離子的量 逻原’添加於水性漿料的鎳 1 X及還原劑的1也是重點。藉 良好地形成高寬比高的突起部 了 "自始至終 ,,., 關於具體的條件,經時Μ 地在水性漿料中添加使每小時的鎳 、Regarding the reduction of the recorded ions in the step B, it is important to maintain the aqueous dip in the pH range of the dispersing effect of the dispersing agent added in the step A (the additive remains in the step B). Thereby, aggregation of particles with each other can be effectively prevented. For the adjustment of the pH, it is sufficient to add a variety of inorganic acids or the like, or a base such as sodium hydroxide to the aqueous slurry while superimposing the slurry (iv). The adjustment range of the pH value may be an appropriate value as long as it is a used powder. In the case of using, for example, a nonionic interface <RTIgt; lingual agent as a dispersing agent', it is preferred to maintain the pH of the aqueous slurry in the range of 5 to 1 Torr. In the case where a zwitterionic surfactant is used as the dispersant in the case of 2010 201054, it is preferred to range the water. The use of a water-based polymer as a binary value: holding: w is good to maintain the value of the aqueous slurry in the range of 5 to 8 'the same as the amount of nickel ion ions in the step B is added to Nickel 1 X of the aqueous slurry and 1 of the reducing agent are also important points. By forming the protrusions with high aspect ratio well, "from beginning to end,,., about the specific conditions, adding nickel per hour to the aqueous slurry over time,

好為4〇,nra所需的量之錄離子及:為25〜1〇_、較 的添加條件,相對於初期J層子及藉由使用上述 鎳的析出會在孕核粒子 優先發生,而容易地形成高寬比高的突起部。 關於鎳離子及還原劑的添加,可將水性漿料加熱至既 定溫度’使還原劑所造成的鎳離子的還原平順地進行,關 於鎖離子及還原劑的添加,可以先攪拌水性漿料,而均勾 地發生還原鎳的附著。 如上所述,完成目標的導電性粒子。此導電性粒子可 視需求來附加後處理。關於後處理,可列舉出無電解錄金 步驟或無電解鍍鈀步驟。藉由附加此一步驟,在導電性粒 子的表面形成鍍金層或鍍鈀層。鍍金層的形成,可依據習 知的無電解電鍍法。例如在導電性粒子的水性懸浮液中含 有乙二胺四乙酸四鈉(tetrasodium ethylenediaminei:e1:raaceta1;e)、檸檬酸二鈉及氰化金 鉀’藉由添加以氫氧化鈉調整pH值的無電解電鍍液,而可 以形成鍵金層。 另外,鑛纪層的形成,可依據習知的無電解電鑛法。 19 201021054 例如在導電性粒子的水性懸浮液中,加入氣化鈀等的水溶 性把化合物;次亞磷酸、亞磷酸、甲酸、乙酸、聯胺 (hydrazines)、氫化蝴、胺基领院(amjne b〇 rane)化合物、 或上述之鹽類等的還原劑;以及含有錯化劑等常用的無電 解鍍鈀液;還有,視需求添加分散劑、穩定劑、pH緩衝劑。 然後,以鹽酸、硫酸等的酸類或氫氧化鈉等的鹼類調整pH 值,並同時進行還原型無電解電鍍,而可以形成鍍鈀層。 關於其他方法,亦可以在導電性粒子的水性懸浮液中,添 加四氨鈀(tetraainininepalladium)鹽等的鈀離子源錯化鲁 劑及依據需求的分散劑,利用鈀離子與鎳離子的置換反 應,進行置換型無電解電鍍,來形成鍍鈀層。 為了形成上述的鍍層,例 型無電解電鍍的情況中, 酸)。 而上述的鍍鈀層,較好為實質上不含磷、或是磷含量 減低在3重量%以下,因為有利於導電性以及電氣可靠度。 例如進行置換型無電解電鍍或還原 ,可使用不含磷的還原劑(例如 關於在置換型#t冑電鍍或還原型纟電解電 卫热1:解電鍍所佶田For 4 〇, the amount of ions required for nra and: 25~1〇_, the relative addition conditions, relative to the initial J layer and by the use of the above nickel precipitation will occur preferentially in the nucleus particles, and It is easy to form a protrusion having a high aspect ratio. With regard to the addition of nickel ions and a reducing agent, the aqueous slurry can be heated to a predetermined temperature to smooth the reduction of nickel ions caused by the reducing agent. For the addition of the lock ion and the reducing agent, the aqueous slurry can be stirred first. The adhesion of reduced nickel occurs in the hook. As described above, the target conductive particles are completed. This conductive particle can be post-processed as needed. As the post-treatment, there may be mentioned an electroless gold plating step or an electroless palladium plating step. By adding this step, a gold plating layer or a palladium plating layer is formed on the surface of the conductive particles. The formation of the gold plating layer can be carried out according to a conventional electroless plating method. For example, in an aqueous suspension of conductive particles, tetrasodium ethylenediamine (e1:raaceta1;e), disodium citrate, and gold potassium cyanide are added to adjust the pH by adding sodium hydroxide. An electroless plating solution can form a bond gold layer. In addition, the formation of the ore layer can be based on the conventional electroless electrowinning method. 19 201021054 For example, in an aqueous suspension of conductive particles, a water-soluble compound such as vaporized palladium is added; hypophosphorous acid, phosphorous acid, formic acid, acetic acid, hydrazines, hydrogenated butterfly, and amine-based consortium (amjne) a reducing agent such as a compound or a salt thereof; and a commonly used electroless palladium plating solution such as a distorting agent; and a dispersing agent, a stabilizer, and a pH buffering agent are added as needed. Then, the pH is adjusted with an acid such as hydrochloric acid or sulfuric acid or a base such as sodium hydroxide, and a reduction-type electroless plating is simultaneously performed to form a palladium plating layer. In another method, a palladium ion source miscluster such as tetraammine palladium salt or a dispersant according to requirements may be added to an aqueous suspension of conductive particles, and a substitution reaction between palladium ions and nickel ions may be used. Displacement type electroless plating is performed to form a palladium plating layer. In order to form the above-mentioned plating layer, in the case of electroless plating, for example, acid). Further, the palladium plating layer is preferably substantially free of phosphorus or has a phosphorus content of 3% by weight or less because it contributes to electrical conductivity and electrical reliability. For example, a replacement type electroless plating or reduction may be used, and a phosphorus-free reducing agent may be used (for example, in the replacement type #t胄 plating or reduction type 纟 electrolytic heat 1: deplating

20 201021054 了 乂更合易地將相對於導 ^ ^ ^ ^ 守电注鮝體的重量之一次性粒子所 佔的重量设定至上述範圍内。 如此而完成的本發明之導電 AM·.#雨 电胜粒子,是適用於例如異 向性導電膜(ACF)、熱密封連接 ttCp. _ ytieat seal connector ; SC)、用於將液晶顯示器 孜的電極連接至驅動用LSI晶 片的電路基板的導電材料等。 τ专将別疋本發明的導電性粉 體’疋適合用來作為導電性接著射的導電性填充物。 ❿ 上述的導電性接著劑’是較好為用來作為配置在形成 導電性基板的二片基板之間,藉由加熱加愿而接著上述 導電性基材並導通之異向性導電性接著劑。此異向性導電 性接著劑是含有本發明之導電性粒子與接著劑樹脂。關於 接著劑樹脂,只要是絕緣性、且用來作為接著繼者, 都可以使用而無特別限制,並可以使用熱塑性樹脂或熱固 ㈣脂’較好為因加熱而展現接著功能者。關於這樣的接 著性樹脂’例如有熱塑型、熱固型、紫外線硬化型等。另 外還有顯示出熱塑型與熱固型的中間性質之所謂的半熱固 型、熱固型與紫外線型的複合型等。這些接著劑樹脂,可 以與被黏著對象之電路基板等的表面特性、使用形態等配 合’來作適當選擇。特別較好是含有熱固性樹脂而構成的 接者劑樹脂,因為接著後的材料強度優異。 關於接著劑樹脂’具體而言,可以舉出以選自乙烯— 醋酸乙烯共聚物、羧基改質(carb〇xy pm〇di f ied)乙烯—醋 酸乙烯共聚物、乙烯一丙烯酸異丁酯(isobutylacryla伪) 共聚物、聚醯胺、聚醯亞胺、聚酯、聚乙晞醚(p0lKinyl 21 201021054 ether)、聚乙烯縮丁醛(polyvinyl butyral ; PVB)、聚胺 酯(polyurethane) 、SBS 嵌段共聚物(sbs block copolymer)、羧基改質SBS共聚物、SIS共聚物(SIS copolymer)、SEBS 共聚物、丁 烯二酸(maieic acid)改質 SEBS 共聚物、聚丁 一 稀橡膠(p〇 1 ybutadiene rubber)、氯 平橡膠(chloroprene rubber)、羧基改質氯平橡躁、苯乙 稀—丁二烯橡膠、異丁稀(isobutylene)—異戊二稀 (18 0口『6116)共聚物、丙烯腈一聚丁二稀橡谬(以下稱|^抓)、 羧基改質NBR、胺改質NBR、環氧樹脂、環氧酯樹脂(ep〇xy ® ester resin)、壓克力樹脂、紛樹脂或聚石夕氧樹腊等的一 種或二種以上的組合所得之物作為主成分調製而成者。在 上述物質之中,對熱塑性樹脂而言,較好為苯乙烯—丁二 烯橡膠、SEBS等,因為其重工(rew〇rk)性優異;對熱固性 樹脂而言,較好為環氧樹脂。在這些物質之中,從接著力 高、耐熱性優異、絕緣性優異、再加上熔融黏度低 '可以 在低壓力之下連接等的優點來看,最佳為環氧樹脂。 參 對於上述環氧樹脂而言,只要是在一個分子中有二個 以上的環氧基之多元環氧樹脂,則可使用一般所使用的環 氧樹如。關於具體的例子,例如酚醛清漆(灿如〇1 novolac)、甲酚清漆(cres〇1 N〇v〇lac)等的清漆樹脂;雙 酚A、雙酚F、雙酚AD、間苯二酚(res〇rcin)、雙羥基二 本醚(tushydroxydiphenyl ether)等的多元酚類;乙二醇 (ethylene glyC〇i)、新戊二醇(ne〇pentyl 、甘油 (glycerin)、二羥甲基丙烷(trimethyl〇1叩叩⑽e)、聚丙 22 201021054 二醇(polypropylene glycol)等的多元醇類;乙二胺 (ethylenediamine) 、 三伸 乙四胺 (tr iei:hylene1;e1:ramine)、苯胺(ani 1 ine)等的聚胺基化合 物;已二酸(adipic acid)、苯二曱酸(phthalic acid)、 異苯二甲酸(isophthal ic acid)等的多元羧基化合物等與 表氯醇 (epichlorohydrin)或 2-甲基表氣醇 (2-me1:hylepichlorohydrin)反應所得到的環氧丙基 φ (glycidyl)型的環氧樹脂。另外,可舉出環氧化倍環戊二 烯(dicyciopentadiene epoxide)、二環氧化丁二烯二聚物 (butadiene dimer dieP〇xide)等的脂肪族及環脂族環氧樹 脂等。可以將上述物質單獨或混合二種以上來使用。 而上述各種的接著樹脂’較好為使用已減低不純物離 子(Na、n等)' 加水分解性氣等的高純度品,因為可防止 離子遷移。 異向性導電性接著劑中的本發明之導電性粒子的使用 重量續重量份的接著_脂成分,通常為0.H0 重量伤、較好為0·5〜25重量份、 由使導電性粒子的使用量在 …2°重量份。藉 阻、熔融黏度等的提昇,提昇連接:靠:可:抑制接觸電 接的異向性。 牧」靠度,充分地確保連 除了上述的導電性粒 中’可以添加習知的 域中已知的範圍内。 點著賦予劑、助反應 述異向性導電性接著劍 子及接著劑樹脂之外,在本技術 添加劑,其⑨加量亦可以在本技 關於其他的添加劑,可例示的有 23 201021054 劑、環氧樹脂硬化劑、金屬氧化物、光起始劑、增感劑、 硬化劑、加硫劑、抗劣化劑、耐熱添加劑、熱傳導提昇劑、 軟化劑、色素、各種耦合劑或金屬鈍化劑等。 關於黏者賦.予劑’可列舉出例如松香(Γ〇 s i n )、松香衍 生物、萜烯樹脂(terpene resins)、萜稀-酌·樹脂 (terpene-phenol resin)、石油樹脂、苯并呋喃—茚樹脂 (coumarone-indene resin)、苯乙烯樹脂、異戊二烯樹脂、 烧基苯酚樹脂(alkylphenol resins)、二甲苯樹脂等。關 於助反應劑也就是交聯劑,可列舉出例如聚醇(p〇ly〇1)、 異氰酸酯類(isocyanate)、三聚氰胺樹脂、尿素樹脂、烏 洛托品(urotropine)類、胺類、酸酐、過氧化物等。關於 環氧樹脂硬化劑’只要是在一個分子中有二個以上的活性 氫的物質,就可以無特別限制來使用。關於具體的粒子可 列舉出例如二伸乙三胺(diethylene triamine)、三伸乙四 胺、間位苯二胺(metaphenylenediamine)、二氰二胺 (<11〇)^11(^31111(16)、聚醯胺胺(卩〇1}^11^(1〇31^!16)等的聚胺基 化合物;苯二甲酐(phthal ic anhydride)、甲基納迪克酸 肝 (methylnadic anhydride) 、六 氫肽針 (hexahydrophthalic anhydride)、苯四甲酸二酐 (pyromellitic anhydride)等的有機酸酐;紛搭清漆、$ 酚清漆等的清漆樹脂等。可以將上述物質單獨或混合二 以上來使用。另外,因應用途、需求等,亦可以使用潛在 性硬化劑。關於可使用的潛在性硬化劑’可列舉出例如。米 唑(imidazole)系、聯胺(hydrazide)系、三氟化硼―胺錯 201021054 合物、鎸鹽(ph〇SPh〇niuffi salt)、胺醯亞胺(amine i]nide)、 聚胺(polyamine)的鹽類、二氰二胺等及上述的改質物。可 以將上述物質單獨或以二種以上的混合物來使用。 上述的異向性導電性接著劑,是通常使用廣泛受到本 發明所屬技術領域中具有通常知識者之間所使用的製造裝 置,調製本發明之導電性粒子及接著劑粒子、還有視需求 使用的硬化劑、各種添加劑等,接著劑樹脂為熱固性樹脂 φ 的情況則在有機溶劑中混合來製造;接著劑為熱塑性樹脂 的情況則在其軟化點以上的溫度,具體而言較好為約 50〜130C左右、更好為約60〜110 °c左右來作熔融混練來製 造。如此所完成的異向性導電性接著劑,可以用來塗佈, 也可以適用於薄膜狀。 【實施例】 以下,藉由實施例來更詳細地說明本發明。然而,本 發明的範圍並未受限於這些實施例。 Φ [實施例1〜4] (1)A步驟 使用具有表1所示的粒徑、真比重為1.1之球狀苯乙 烯一二氧化矽複合樹脂[(股)日本觸媒製、商品名: SOL 10STAR ]作為怒材粒子。一面授拌、一面將4〇g的此芯 材粒子投入400 mL的調質(condii; ioner)水溶液(R〇hm and Haas Electronic Materials K.K. 製 的 「CLEANER-CONDITIONER231」)。調質水溶液的濃度為 40ml/L。接下來,在60°C的液溫一面施加超音波一面授拌 25 201021054 30分鐘,進行芯材粒子的表面改質及分散處理。將水溶液 過滤’經過-次再漿(repulp)水洗的芯材粒子成為2驗 的漿料。將200ml的氣化亞錫水溶液投入至此漿料。此水 溶液的遭度為5xl{r3mQl/L。在常溢下撲拌5分鐘進行使 怒材粒子的表面吸附錫離子之敏化處理。接下來過濾水溶 液,進行一次再衆水洗。接下來將芯材粒子成為400ml的 衆料’維持在6Gt。-併使用超音波,—面授拌漿料,一 面添力2mL的〇· 1 im〇i /l之氣化纪水溶液。將這樣的挽拌 狀^維持5分鐘,進行使芯材粒子的表面捕捉鈀離子的活❹ 性化處理。 接下來,溶解20g/L的酒石酸鈉、5.4g/L的次亞磷酸 鈉、表1所示濃度的硫酸鎳六水合物、同表所示種類及濃 度的分散劑而成為水溶液,將由此水溶液所構成的3公升 的^電解鑛浴升溫至耽,並以同表所示的量,將構^ 的芯材粒子投入此無電解鍍浴,而開始A步驟。另外,表 1所示的分散劑的具體内容則如表2所示。攪拌5分鐘, 確認氳氣氣泡停止產生,則結束A步驟。 鲁 (2) B步驟 使用各為30 0mL之224g/L的硫酸鎳水溶液、與含 210g/L的次亞磷酸鈉及8〇g/L的氫氧化鈉的混合水溶液, 藉由定量幫浦將上述水溶液連續性地分別添加於a步驟所 完成的芯材粒子的漿料中,而開始無電解電鍍步驟。 添加 速度均為2· 5mL/分鐘。本步驟的具體條件示於表3。全數 添加液體之後,一面保持在7(rc的溫度,一面繼續攪拌 26 201021054 分鐘。接下來過濾液體, 〇 士 將/慮传的物質清洗三次之德,,v20 201021054 It is more convenient to set the weight of the disposable particles relative to the weight of the control body to the above range. The conductive AM·.# rain-powered particle of the present invention thus completed is suitable for, for example, an anisotropic conductive film (ACF), a heat-sealed connection ttCp. _ ytieat seal connector; SC), for smashing a liquid crystal display The electrode is connected to a conductive material or the like of the circuit board of the LSI wafer for driving. τ is specifically intended to be used as a conductive filler which is conductively incident on the conductive powder of the present invention. ❿ The conductive adhesive agent described above is preferably used as an anisotropic conductive adhesive which is disposed between two substrates on which a conductive substrate is formed and which is heated and then connected to the conductive substrate. . The anisotropic conductive adhesive contains the conductive particles of the present invention and an adhesive resin. The binder resin can be used without any particular limitation as long as it is insulative and can be used as a successor, and a thermoplastic resin or a thermosetting (tetra) grease can be used, and it is preferred to exhibit a function of heating by heating. The above-mentioned adhesive resin is, for example, a thermoplastic type, a thermosetting type, an ultraviolet curing type or the like. There are also so-called semi-thermosetting type, thermosetting type and ultraviolet type composite type which exhibit intermediate properties of a thermoplastic type and a thermosetting type. These adhesive resins can be appropriately selected in accordance with the surface characteristics, the use form, and the like of the circuit board to be adhered. It is particularly preferable that the binder resin is composed of a thermosetting resin because the material strength after the subsequent one is excellent. The adhesive resin' is specifically selected from the group consisting of ethylene-vinyl acetate copolymer, carboxy modified (carb xy pm 〇 f ethylene) copolymer, and isobutyl acryl. Pseudo) copolymer, polyamine, polyimine, polyester, polyethylene ether (p0lKinyl 21 201021054 ether), polyvinyl butyral (PVB), polyurethane, SBS block copolymer (sbs block copolymer), carboxyl modified SBS copolymer, SIS copolymer (SIS copolymer), SEBS copolymer, maleic acid modified SEBS copolymer, polybutylene rubber (p〇1 ybutadiene rubber) ), chloroprene rubber, carboxyl modified chloroprene rubber, styrene-butadiene rubber, isobutylene-isopentadiene (18 0 "6116" copolymer, acrylonitrile A polybutylene rubber (hereinafter referred to as ^^), carboxyl modified NBR, amine modified NBR, epoxy resin, epoxy resin (ep〇xy ® ester resin), acrylic resin, resin or One or more of Jushixi oxygen tree wax, etc. The composition obtained by the combination is prepared as a main component. Among the above, the thermoplastic resin is preferably styrene-butadiene rubber, SEBS or the like because of its excellent reworkability, and the thermosetting resin is preferably an epoxy resin. Among these, from the viewpoints of high adhesion, excellent heat resistance, excellent insulation, and low melt viscosity, which can be connected under low pressure, the epoxy resin is preferred. As the epoxy resin, as long as it is a polyvalent epoxy resin having two or more epoxy groups in one molecule, an epoxy tree generally used can be used. For specific examples, such as varnish resins such as novolac (novolac) and cresol (cres〇1 N〇v〇lac); bisphenol A, bisphenol F, bisphenol AD, resorcinol (res〇rcin), polyphenols such as tushydroxydiphenyl ether; ethylene glycol (ethylene glyC〇i), neopentyl glycol (ne〇pentyl, glycerin, dimethylolpropane) (trimethyl〇1叩叩(10)e), polypropylene 22 201021054 Polyols such as polyol glycol; ethylenediamine, triethylenetetramine Polyamine-based compound such as 1 ine); polyvalent carboxyl compound such as adipic acid, phthalic acid or isophthalic acid, and epichlorohydrin or Epoxypropyl φ (glycidyl) type epoxy resin obtained by the reaction of 2-methylepichlorohydrin (2-me1: hylepichlorohydrin), and dicyciopentadiene epoxide, Fat such as epoxidized butadiene dimer die P〇xide And a cycloaliphatic epoxy resin or the like. The above-mentioned materials may be used singly or in combination of two or more kinds thereof. The above-mentioned various kinds of the following resins are preferably used such that the impurities (Na, n, etc.) are reduced, and water-decomposable gas or the like is used. The high-purity product can prevent ion migration. The conductive particles of the present invention in the anisotropic conductive adhesive are used in the weight-retaining weight of the adhesive component, usually 0. H0 weight injury, preferably 0. 5 to 25 parts by weight, the amount of conductive particles used is 2 parts by weight, and the adhesion, melting viscosity, and the like are improved, and the connection is increased: by: suppressing the anisotropy of the contact electrical connection. It is sufficient to ensure that in addition to the above-mentioned conductive particles, it can be added within the range known in the art. In addition to the imparting agent, the auxiliary reaction, the anisotropic conductivity, and then the sword and the adhesive resin, The additive of the present technology, the addition amount of 9 can also be used in the present technology for other additives, exemplified by 23 201021054 agent, epoxy resin hardener, metal oxide, photoinitiator, sensitizer, hardener, sulfurization Agent Agents, heat-resistant additives, heat transfer enhancers, softeners, pigments, various couplants, metal passivators, etc. Examples of the viscous agent can be exemplified by rosin (sin), rosin derivatives, terpene resins ( Terpene resins), terpene-phenol resin, petroleum resin, coumarone-indene resin, styrene resin, isoprene resin, alkylphenol resins ), xylene resin, and the like. The co-reagent, that is, the crosslinking agent, may, for example, be a polyalcohol (p〇ly〇1), an isocyanate, a melamine resin, a urea resin, a urotropine, an amine, an acid anhydride, or the like. Peroxide and the like. The epoxy resin hardener is not particularly limited as long as it has two or more active hydrogens in one molecule. Specific examples of the particles include diethylene triamine, triethylenetetramine, metaphenylenediamine, and dicyandiamide (<11〇)^11(^31111(16). Polyamine-based compound such as polyamidoamine (卩〇1}^11^(1〇31^!16); phthalic anhydride, methylnadic anhydride, An organic acid anhydride such as a hexahydrophthalic anhydride or a pyromellitic anhydride; a varnish resin such as a varnish or a phenol varnish; and the like may be used alone or in combination of two or more. A latent hardener can also be used depending on the application, demand, etc. Examples of the latent hardener which can be used include, for example, imidazole, hydrazide, boron trifluoride-amine, 201021054. Compound, strontium salt (ph〇SPh〇niuffi salt, amine i] nide), polyamine salt, dicyandiamide, etc. and the above modified substances. Or use as a mixture of two or more. The conductive conductive adhesive is a manufacturing apparatus which is generally used between those having ordinary knowledge in the technical field to which the present invention pertains, and modulates the conductive particles and the adhesive particles of the present invention, and also uses a hardener as required. And various additives, etc., when the adhesive resin is a thermosetting resin φ, it is produced by mixing in an organic solvent; when the adhesive is a thermoplastic resin, the temperature is higher than the softening point, and specifically, it is preferably about 50 to 130 C. Further, it is preferably produced by melt-kneading at a temperature of about 60 to 110 ° C. The anisotropic conductive adhesive thus obtained can be used for coating or a film. [Examples] The present invention will be described in more detail by way of examples. However, the scope of the present invention is not limited to these examples. Φ [Examples 1 to 4] (1) Step A uses the particle diameter shown in Table 1, true A spheroidal styrene-cerium dioxide composite resin having a specific gravity of 1.1 (manufactured by Nippon Shokubai Co., Ltd., trade name: SOL 10STAR) is used as an anger material particle, and 4 〇g of this core material particle is cast while being mixed. Into 400 mL of a condii (ioner) aqueous solution ("CLEANER-CONDITIONER231" by Röhm and Haas Electronic Materials KK). The concentration of the tempering aqueous solution is 40 ml/L. Next, the liquid temperature at 60 °C. While applying ultrasonic waves, the mixture was mixed with 25 201021054 for 30 minutes to carry out surface modification and dispersion treatment of the core particles. The aqueous solution was filtered and subjected to a repulp water-washed core material particle to obtain a slurry of the second test. 200 ml of an aqueous solution of vaporized stannous solution was placed in the slurry. The degree of this aqueous solution is 5xl{r3mQl/L. The mixture was incubated for 5 minutes under a constant overflow to sensitize the surface of the rag particles to the tin ions. Next, the aqueous solution was filtered and washed once with water. Next, the core material particles were made into 400 ml of the mass material 'maintained at 6 Gt. - And use ultrasonic waves, face-to-face mixing slurry, and add 2 mL of 气·1 im〇i /l gasification fluid solution on one side. This pull-up type was maintained for 5 minutes, and an active treatment for capturing palladium ions on the surface of the core particles was carried out. Next, 20 g/L of sodium tartrate, 5.4 g/L of sodium hypophosphite, nickel sulfate hexahydrate of the concentration shown in Table 1, and a dispersing agent of the type and concentration shown in the above table were dissolved to form an aqueous solution, and the aqueous solution was dissolved. The formed 3 liter electrolytic bath was heated to enthalpy, and the core material particles of the structure were put into the electroless plating bath in the amounts shown in the same table, and the A step was started. In addition, the specific contents of the dispersing agent shown in Table 1 are shown in Table 2. After stirring for 5 minutes and confirming that the helium gas bubbles have stopped, the step A is ended. Lu (2) Step B uses a mixed aqueous solution of 30 0 mL of 224 g/L of nickel sulphate solution and 210 g/L of sodium hypophosphite and 8 〇g/L of sodium hydroxide by means of a quantitative pump. The above aqueous solution is continuously added to the slurry of the core material particles completed in the step a, respectively, and the electroless plating step is started. The addition rate was 2·5 mL/min. The specific conditions of this step are shown in Table 3. After adding the liquid, keep it at 7 (rc temperature, continue stirring 26 201021054 minutes. Next, filter the liquid, and the gentleman will clean the material for three times, v

100C的真空乾燥機作乾燥, 後M 導電性粒子。在實施例 皮骐的 所兀成的導電性粒子之掃描 子顯微鏡(SEM)的像示於篦彳阁 评描式電 性粒子中的鎳皮膜與突起部是成為連續體。 電 [實施例5〜23] 除了以表1及表3所示的條件進行人步驟及B步驟以 外,以與實施例1相同手法而完成導電性粒子。但是,實 施例19的B步驟中,鈽随# p、— 7鄉甲錢錄水溶液、與含次亞磷酸納及氯 氧化納的混合水溶液的添加量分別為說。另外,實施 例20的B步射,顧料料、與Μ亞射鈉及氨氧 化納的混合水溶液的添加量分職39QmL。另外,實施例 21〜23之硫酸錄水溶液、與含次亞鱗酸納及氨氧化納的混 合水溶液的添加量及低下速度分別為15〇、邮、驗; H1.9H/分鐘。如此,完成具有錄—碟合金皮膜 的導電性粒子。 [實施例24] 調製由l〇g/L的EDTA-4Na、l〇g/L的檸檬酸—2Na及 2.9g/L的氰化金鉀(以Au而言為2〇g/L)所構成的無電解 金鍍浴。將2公升的此金鍍液加熱至79〇c,一面攪拌此金 鍍液,一面添加10克之實施例2所完成的導電性粒子。藉 此在粒子的表面進行無電解電鍍處理,處理時間為2〇分 鐘。處理完成後,將液體過濾,將濾過物進行3次的再漿。 接下來以no°c的真空乾燥機作乾燥。如此—來,在鎳— 27 201021054 磷合金皮膜上施以鍍金層被覆處理。 [實施例25〜27] 調製由10g/L的EDTA—4Na、10g/L的檸檬酸一2Na及 20g/L的四氨鈀鹽酸鹽(Pd(NH3)4Cl2)溶液(以鈀而言為 2. Og/L)、lOOppm的羧甲基纖維素(分子量250000、醚化度 (etherification degree) 90)所構成的無電解鈀鍍浴。將 〇· 65公升(實施例25)、1· 3公升(實施例16)、2. 6公升(實 施例27)的此鈀鍍液加熱至7(TC ’ 一面攪拌此鈀鑛液,一 面添加10克之實施例2所完成的導電性粒子。藉此在粒子 的表面進行置換型的無電解電鍍處理’處理時間為6〇分 鐘。處理完成後,將液體過濾,將濾過物進行3次的再漿。 接下來以litre的真空乾燥機作乾燥。如此一來,在鎳— 磷合金皮膜上施以鍍鈀層被覆處理,在鈀皮膜中並未含磷。 [比較例1〜7] /17鄉及Β步驟 外’以與實施例!相同手法而完成具㈣—鱗合金皮膜合 導電性粒子。但是,比較例3的B步驟中,硫酸鍊水溶液 與含次亞魏鈉及氫氧化納的混合水溶液的添加量分別声 2氣。另外’比較例5〜6之硫酸錦水溶液、肖含次亞碟顔 納及氫氧化㈣混合水溶液的添加量及低下速度分心 38、120 0mL ; 1· 3、1〇 〇mi / 八# 如此,完成具有鎳1 合金皮膜的導電性粒子。在比較 ^ 之的像示於第2圖。1所完成的導電性㈣ [比較例8 ] 201021054 對於在比較例2製造的導電性粒子,施以與實施例24 相同的鍍金層被覆處理。 [物性評量] 分別測定·評量實施例及比較例所完成的導電性粒子 的粒徑、鎳皮膜的厚度、金皮膜的厚度、鈀皮膜的厚度、 表面狀態、鎳皮膜的密接性及導電性。另外,多加了金鍍 層的施作者,評量金皮膜的密接性;多加了鈀鍍層的施作 Ο 者,評量鈀皮膜的密接性。各物性的評量是根據下列方法 來進行。另外,突起部的高寬比、高寬比為i以上的突起 邛的比例、以及導電性粉體中一次粒子所佔的比例、導電 粒子的粒徑’則分別以上述的方法來測^。上述結果示於 表4及表5。 [鎳皮膜的厚度] 將導電性粒子浸潰於王水而溶解鎳皮膜,以ICP或化 學分析來分析皮膜成分,而從下式⑴、⑵計算出錄皮膜 響 的厚度。 A=[(r + t)3-r3]d,/r3d2 ⑴ A=W/(l〇〇-f) ⑵ 、式中,r為芯材粒子的半徑為鎳皮膜的厚度、 dl為鎳皮膜的比重、d2為芯材粒子的比重、w為含鎳的比例 (重量 [金皮膜•鈀皮膜的厚度] 將導電性粒子浸漬於王水而溶解金或鈀皮膜與鎳皮 瞑,以ICP或化學分析來分析皮膜成分。然後,而從以下 29 201021054 的(3)及(4)計算出金或鈀皮膜的厚度。 B=[(r+t + u)3-(r + t)3]d3/(r+t)3d4 (3) B=X(100-X) (4) 式中’u為金或鈀皮膜的厚度、d3為金或鈀皮膜的比 重、di為鍊品的比重、X為含金或把的比例(重量%)。在此 處,鎳品的比重心是使用公式來計算出來。比重是使用以 下的(5)的公式來計算出來。 d4=W/[(W/di)+(l〇〇-W)/d2] (5) 式中,d!為鎳皮膜的比重、&為芯材粒子的比重、w Θ 為含鎳的比例(重量%)。 [表面狀態] 使用SEM,將導電性粒子放大3〇〇〇〇倍,觀察1〇個視 野,計算出一個導電性粒子所具有的突起部個數的平均 值。10400個則紀錄為〇、10個以下則紀錄為△。另外,A 100C vacuum dryer was used for drying, followed by M conductive particles. The image of the scanning electron microscope (SEM) of the conductive particles formed in the skin of the example was shown to be a continuous body of the nickel film and the protrusions in the evaluation type electric particles. [Examples 5 to 23] Conductive particles were completed in the same manner as in Example 1 except that the human step and the B step were carried out under the conditions shown in Tables 1 and 3. However, in the step B of Example 19, the amount of addition of the aqueous solution of the #p, -7 township, and the mixed aqueous solution containing sodium hypophosphite and sodium oxychloride is said. Further, in the step B of Example 20, the amount of the mixed solution of the material and the mixed aqueous solution of sodium ytterbium and sodium oxyhydroxide was divided into 39 QmL. Further, the addition amount and the lowering speed of the aqueous solution of the sulfuric acid recorded in Examples 21 to 23 and the mixed aqueous solution containing sodium sub-sodium sulphate and sodium sulphate were respectively 15 Å, and the test was carried out; H1.9H/min. Thus, the conductive particles having the recording-disc alloy film were completed. [Example 24] Modification of EDTA-4Na of l〇g/L, citric acid-2Na of l〇g/L, and gold potassium cyanide of 2.9 g/L (2〇g/L in the case of Au) An electroless gold plating bath is constructed. Two liters of this gold plating solution was heated to 79 〇c, and 10 g of the conductive particles prepared in Example 2 were added while stirring the gold plating solution. Thereby, electroless plating treatment is performed on the surface of the particles, and the treatment time is 2 〇 minutes. After the treatment was completed, the liquid was filtered, and the filtrate was repulped three times. Next, it was dried by a vacuum dryer of no °c. In this way, the nickel-27 201021054 phosphor alloy coating is coated with a gold plating layer. [Examples 25 to 27] A solution of 10 g/L of EDTA-4Na, 10 g/L of citric acid-2Na and 20 g/L of tetraammine palladium hydrochloride (Pd(NH3)4Cl2) was prepared. 2. An electroless palladium plating bath composed of Og/L), 100 ppm of carboxymethylcellulose (having a molecular weight of 250,000 and an etherification degree of 90). 65 liters (Example 25), 1.3 liters (Example 16), and 2.6 liters (Example 27) of this palladium plating solution were heated to 7 (TC ' while stirring the palladium ore solution while adding 10 g of the conductive particles prepared in Example 2. The electroless plating treatment was performed on the surface of the particles, and the treatment time was 6 minutes. After the treatment was completed, the liquid was filtered, and the filtrate was subjected to 3 times. Next, it was dried by a vacuum dryer of litre. As a result, a palladium plating layer was applied on the nickel-phosphorus alloy film, and phosphorus was not contained in the palladium film. [Comparative Examples 1 to 7] /17 In the same way as the embodiment, the method of "fourth"-scale alloy film and conductive particles is completed. However, in the step B of Comparative Example 3, the aqueous solution of the sulfuric acid chain and the sub-containing sodium and sodium hydroxide are contained. The amount of the mixed aqueous solution added was 2 Hz. In addition, the addition amount of the aqueous solution of the sulfuric acid solution of Comparative Examples 5 to 6, the mixed aqueous solution of the sub-sub-disc and sodium hydroxide, and the low-speed distraction 38, 120 0 mL; 3, 1〇〇mi / 八# So, complete with nickel 1 alloy skin Conductive particles. The image of the comparison is shown in Fig. 2. Conductivity (1) completed in 1 [Comparative Example 8] 201021054 The same plating gold as in Example 24 was applied to the conductive particles produced in Comparative Example 2. The coating treatment was carried out. [Physical property evaluation] The particle diameter of the conductive particles, the thickness of the nickel film, the thickness of the gold film, the thickness of the palladium film, the surface state, and the nickel film were measured and evaluated in each of the examples and the comparative examples. Adhesiveness and electrical conductivity. In addition, the application of the gold plating layer was evaluated, and the adhesion of the gold film was evaluated. The adhesion of the palladium coating was evaluated by the application of the palladium coating. The evaluation of each physical property is based on the following. In addition, the ratio of the aspect ratio of the protrusions, the ratio of the protrusions 高 having an aspect ratio of i or more, the ratio of the primary particles in the conductive powder, and the particle diameter of the conductive particles are respectively described by the above method. The above results are shown in Tables 4 and 5. [Thickness of Nickel Film] The conductive particles are impregnated with aqua regia to dissolve the nickel film, and the film components are analyzed by ICP or chemical analysis, and the following formula (1), (2) Calculate the skin A=[(r + t)3-r3]d, /r3d2 (1) A=W/(l〇〇-f) (2) where r is the radius of the core particle and the thickness of the nickel film, Dl is the specific gravity of the nickel film, d2 is the specific gravity of the core material particles, and w is the ratio of nickel content (weight [thickness of gold film and palladium film]. The conductive particles are immersed in aqua regia to dissolve gold or palladium film and nickel barium. The composition of the film is analyzed by ICP or chemical analysis. Then, the thickness of the gold or palladium film is calculated from (3) and (4) of 29 201021054. B=[(r+t + u)3-(r + t)3]d3/(r+t)3d4 (3) B=X(100-X) (4) where 'u is the thickness of gold or palladium film, d3 is the specific gravity of gold or palladium film, di is chain The specific gravity of the product, X is the content of gold or the weight (% by weight). Here, the gravity of the nickel product is calculated using the formula. The specific gravity is calculated using the formula of (5) below. D4=W/[(W/di)+(l〇〇-W)/d2] (5) where d! is the specific gravity of the nickel film, & is the specific gravity of the core material particles, and w Θ is nickel-containing Proportion (% by weight). [Surface state] Using SEM, the conductive particles were magnified three times, and one field of view was observed, and the average value of the number of the protrusions of one conductive particle was calculated. 10,400 records are 〇, and 10 or less are recorded as △. In addition,

錄異常析A的情㈣紀錄為x。異常析^是指例如鎳未在芯 材粒子的表面析出而在液體中析出的情況等。 ^ [皮膜的密接性] …π…守电性粒子及90g、直徑lmln的氧化錯幸 置入lGGmL的燒杯’再加入1()mL的甲苯。以挽掉裝】 1〇分鐘之後’將氧化料拌子與漿料㈣並乾燥。使1 將乾燥後的導電性粒子放大讓倍,觀察1G個視里 算因攪拌所產生的剝離片的個數的平均值。剝離“ 不滿1G個貝丨紀錄為〇、1G〜3Q個則紀錄為△ 則紀錄為X。 30 201021054 [導電性] 將1 00份的環氣樹脂、150份的硬化劑、70份的甲笨 昆合’調製絕、緣性接I劑。冑15錢冑電性粒子混入此絕 緣性接著劑而完成膏狀物。使用塗佈棒(bar coater),將 此膏狀物塗佈於聚矽氧處理聚酯薄膜上並乾燥。使用完成 之塗層膜’在全面蒸鍍鋁的玻璃與已形成間距 (pitch)50Am的銅圖形之聚醯亞胺薄膜基板之間進行接 攀合。然後藉由測定電極間的導通電阻來評量導電性粒子的 導電性。評量是將電阻值2Ω以下者紀錄為〇、2 5Ω者則 紀錄為△、5Ω以上者則紀錄為,。另外,在表中一併紀錄 有無發生短路。 【表1】 Α步驟 芯材粒子 分- ----- MI 濃度 (ε/ΤΛ NiS〇4 (g/L) Ϊ 施 例 粒徑 (#m) 混入量 (g) 表面積的總和 (m2) 種類 1 5.0 15.0 16.3 A 5 η αγ. 2 3.0 9.0 16.3 A 5 U. 40 n 3 2.5 7.5 16.3 A 5 U. *iO Π AK 4 2.0 6 16.3 A U. 4D 0.45 5 2.5 7.5 16.3 B~ K 0.45 " 6 2.5 7.5 16.3 C ϋ -- 5 n V 2.5 7.5 16.3 D 5 U. rtJ Π AK 8 2.5 7.5 16.3 E 5 U. 40 Ω 9 2.5 7.5 16.3 F ~~~~5_ 0. 45 _10 2.5 7.5 16.3 5 π 11 2.5 7.5 16.3 H 5_ U. 0.45 12 2.5 7.5 16.3 5_ 0.45 13 2.5 7.5 16.3 1 14 2.5 7.5 16.3 A 10 U. 40 n AK lb 2.5 7.5 16.3 A 5_ u. ftJ 0. 23 16 2.5 7.5 16.3 ——--- A 3f) π AK IV 2.5 7.5 16.3 A U. 40 0.9 31 201021054 18 2.5 7.5 16.3 A 5 1.8 19 2.5 7.5 16.3 A 5 0.45 20 2.5 7.5 16.3 A 5 0.45 21 2.5 3.8 8.2 A 5 0.45 22 2.5 5.7 12.3 A 5 0.45 23 2.5 15 32.7 A 5 0.45 1 2.5 7.5 16.3 無 0 4.5 2 2.5 7.5 16.3 A 5 4.5 比 3 2.5 7.5 16.3 A 5 4.5 較 4 2.5 7.5 16.3 A 5 0 例 5 2.5 1.0 2.2 A 5 0.45 6 2.5 30 65.4 A 5 0.45 7 2.5 7.5 16.3 無 0 0.45Record the abnormal analysis of A (4) record as x. The abnormality analysis refers to, for example, a case where nickel is not precipitated on the surface of the core particle and precipitates in the liquid. ^ [Adhesiveness of the film] ... π... The oxidizing particles of 90 g and the diameter of lmln were placed in a beaker of lGGmL and 1 (1 mL) of toluene was further added. After the cartridge is removed, the oxidized material is mixed with the slurry (4) and dried. 1 The conductive particles after drying were magnified, and the average value of the number of peeling sheets produced by stirring in 1 G of observations was observed. Peeling "Unsatisfactory 1G bellows records as 〇, 1G~3Q records as △ and records as X. 30 201021054 [Electrical conductivity] 100 parts of epoxy resin, 150 parts of hardener, 70 parts of stupid Kunming's modulation of the edge and the edge of the agent. The 胄15 money 胄 electrical particles are mixed with the insulating adhesive to complete the paste. Using a bar coater, the paste is applied to the sputum. Oxygen-treated polyester film and dried. The finished coating film was used to climb between the fully-evaporated aluminum glass and the copper-imprinted polyimide film substrate having a pitch of 50 Am. The conductivity of the conductive particles is evaluated by measuring the on-resistance between the electrodes. The evaluation is as follows: those with a resistance value of 2 Ω or less are recorded as 〇, and those with a value of 2 Ω are recorded as Δ, and 5 Ω or more are recorded as . The first one records whether there is a short circuit. [Table 1] ΑStep core material particle distribution ---- ---- MI concentration (ε/ΤΛ NiS〇4 (g/L) Ϊ Example particle size (#m) Mixing amount ( g) sum of surface areas (m2) type 1 5.0 15.0 16.3 A 5 η αγ. 2 3.0 9.0 16.3 A 5 U. 40 n 3 2.5 7.5 16.3 A 5 U. *i O Π AK 4 2.0 6 16.3 A U. 4D 0.45 5 2.5 7.5 16.3 B~ K 0.45 " 6 2.5 7.5 16.3 C ϋ -- 5 n V 2.5 7.5 16.3 D 5 U. rtJ Π AK 8 2.5 7.5 16.3 E 5 U 40 Ω 9 2.5 7.5 16.3 F ~~~~5_ 0. 45 _10 2.5 7.5 16.3 5 π 11 2.5 7.5 16.3 H 5_ U. 0.45 12 2.5 7.5 16.3 5_ 0.45 13 2.5 7.5 16.3 1 14 2.5 7.5 16.3 A 10 U. 40 n AK lb 2.5 7.5 16.3 A 5_ u. ftJ 0. 23 16 2.5 7.5 16.3 ——--- A 3f) π AK IV 2.5 7.5 16.3 A U. 40 0.9 31 201021054 18 2.5 7.5 16.3 A 5 1.8 19 2.5 7.5 16.3 A 5 0.45 20 2.5 7.5 16.3 A 5 0.45 21 2.5 3.8 8.2 A 5 0.45 22 2.5 5.7 12.3 A 5 0.45 23 2.5 15 32.7 A 5 0.45 1 2.5 7.5 16.3 No 0 4.5 2 2.5 7.5 16.3 A 5 4.5 Ratio 3 2.5 7.5 16.3 A 5 4.5 vs. 4 2.5 7.5 16.3 A 5 0 Case 5 2.5 1.0 2.2 A 5 0.45 6 2.5 30 65.4 A 5 0.45 7 2.5 7.5 16.3 No 0 0.45

【表2】 A 聚乙二醇 B '聚乙二醇烴基醚 C 聚乙二醇烷基酚基醚 D 烷基二甲基羧基甲基醋酸甜菜鹼 E 烷基二甲基醋酸甜菜鹼 F 烷基二甲基胺基醋酸甜菜鹼 G 聚乙烯醇 H 聚乙烯吡咯酮 I 羥基乙基織維素 【表3】 B步驟[Table 2] A polyethylene glycol B 'polyethylene glycol alkyl ether C polyethylene glycol alkyl phenol ether D alkyl dimethyl carboxy methyl acetate betaine E alkyl dimethyl acetate betaine F alkane Glycidylaminoacetate betaine G polyvinyl alcohol H polyvinylpyrrolidone I hydroxyethyl woven vitamin [Table 3] Step B

Pr 每小時的鎳析出量 (nm) 實 1 5. 7-6. 2 49 施 2 5. 8-6.2 48 例 3 5. 7-6.1 49 4 5. 6-6.1 48 5 5. 6-6. 2 48.5 6 5. 6-6.1 48 32 201021054Pr Permeation of nickel per hour (nm) Real 1 5. 7-6. 2 49 Application 2 5. 8-6.2 48 Example 3 5. 7-6.1 49 4 5. 6-6.1 48 5 5. 6-6. 2 48.5 6 5. 6-6.1 48 32 201021054

7 5. 6-6. 2 48 8 5. 7-6. 3 48 9 5. 7-6. 2 48 10 5.7-6.2 48 11 5. 6-6. 3 48 12 5. 7-6. 3 48 13 5. 7-6.2 47.5 14 5. 6-6.1 48. 5 15 5. 7-6.2 48 16 5. 7-6. 5 30 17 5.5-6.2 48.5 18 5.3-6.2 48 19 5. 6-6. 2 48.5 20 5.7-6.2 47.5 21 5. 8-6. 3 46 22 5. 7-6. 2 48.5 23 5.7-6.2 47.5 1 4.2-6.1 47.5 2 4.2-6.2 48.5 比 3 4.1-6.3 47.5 較 4 5. 9-6. 3 47.5 例 5 5. 8-6.2 46 6 5. 8-6. 2 48 7 5. 5-6.1 47.5 ※pH的範圍是滴下開始到滴下終了為止的推移。 33 201021054 【二】 j 一次粒 |子的比 例(%) CD OO CT> LO CJ5 CO 〇i CO 0¾ ΙΛ σ> ΙΛ 〇> LO σ> LO CD CT> Od σ> 55 CO 〇d σ» CD 0¾ CO CD tn 03 σ» σ> OO CO σ> g CN1 σ> L〇 σ> CO 〇> LO σ> 05 突起部 |高寬比1 以上的比j 例(%) in in in LO § 03 CO 〇> 寸 § CO CO CO CO § in LO 5 C^I CO OO m 00 CO s CO § in L〇 in CO CQ ir> ΙΛ CO s 03 LO OO 呀 LT3 LO 1—( CO CNI T~H ΙΛ <NI OJ CO 〇 ϊ-H CO C>3 CO CO C<I c— O CO LO 1—H CO LT5 ΙΛ CO r-H m CSl r^ CO T—^ CO C<l CO CO CNI CO LO LO o 高1 (βΐπ) 0.232 0.202 〇 i—l o C<l CO Gf tn CM o 0.094 0. 082 0.091 0.130 0.133 o 0.124 0. 248 0.192 1 0.088 0.193 1 0.184 1 0.136 0.207 0.175 0.264 0.178 0. 224 0.213 0.244 1 0.245 ^ix W 0.160 0.164 (>3 12 O oa CO o CO (M o t—H c> 0. 085 0.075 0.074 0.112 0.108 0.095 丨 0.113 0.162 0.123 ! 0. 065 | 0.155 I 0.163 | 0.108 0.183 0.108 | 0.163 0.135 0.200 0.185 0.212 1 0.223 碟 碟 碡 碟 碟 碟 m 碟 碟 难 碟 雄 碟 m 碟 雄 碟 碟 磔 — 導電性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 錄皮膜的 密接性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 <3 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 椹越) 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 δ* p \o 1 鈀皮旗的 厚度 (nm) CD 〇 o o o ◦ O 〇 〇> o o CD o O 〇 〇 O o o C3 O o o cr> c=> CO s 金皮旗的厚度 (nm) I 〇 o 〇> o o o c> cr> o o o 〇 o o o o o C5 o 〇 o o o in CNI c? o o 鎳皮骐的厚度 (nm) I OO 05 CD Oi 〇0 05 CD σ» CD O) CD 05 CD 05 CO σϊ CO CJ5 CO 0¾ ΙΛ CT> CO cn g & CO 0¾ LO c— T--1—< OJ cs [>* C3> ir> 〇a LO LO Lft CD 00 CO 粒徑 (βΰί) Cvl ir: CO cc 卜 o. az (N oc CN OC OJ OC CN GC <N 〇0 C<1 〇0 CS] OO c<l oc <N OC CN 卜 (N t— CS1 卜 (N t'- Cs] oc <NI t— <N1 02 OJ 卜 03 00 CNJ 00 (NJ 00 Csl 卜 (N! 00 iNI OO CM* CS cn Ϊ ^ « LT > CC >卜 OC > cr Os CC i_n 4 »—H cc 卜 OC σ; c <>3 r—< <NI <N OJ OZ (N1 <N ir. CN CC CO C- Cvl 1_If._ 。蜣珑咖眾^±1-珠银«链刼^电麇··^ 。來坡一•眾slai-雄楔运璀刼Φ长蘧二* e^e 201021054 【表5】 粒徑 (私m) 鎳皮 膜的 厚度 (nm) 金皮膜 的厚度 (nm) 鈀皮膜 的厚度 (nm) 表面 狀態 鎳皮 膜的 密接 性 導 電 性 發生 短路 突起部 一次 粒子 的比 例(¾) 基部長 D(//m) 高 (^m) 高寬 比 高寬比 1以上 的比例 (%) 1 7.8 95 0 0 〇 X Λ 有 0. 250 〇. 151 0. 60 15 47 2 4.3 97 0 0 〇 X Λ 有 0. 265 〇. 138 0.52 12 68 比 3 3.6 73 0 0 〇 X Δ 有 0.213 〇. 148 0. 69 30 70 較 4 3.3 95 0 0 Δ X X 無 _*1 -*1 -*1 _*1 76 例 5 3.3 92 0 0 Δ X X 無 -*1 *1 78 6 3.4 96 0 0 X X - - _*2 _*2 76 7 5. 5 95 0 0 Δ X X 無 _*1 _*1 7fi 8 7.8 扪: 74 25 0 〇 X Δ 有 0.286 0.189 0.66 15 47 *2 :鎳異常析出,而無法成為製品 從表4及表5所不的結果明確得知,與以比較例所完 成的導電性粉體比較,很明顯地以各實施例所完成的導電 性粉體(本發明品)之突起部的高寬比較高、且一次粒子所 佔的比例較高。另外,與以比較例所完成的導電性粉體比 較’亦疋很明顯地以各實施例所完成的導電性粉體的導電 性較高、且鎳皮膜的密接性較高。 【圖式簡單說明】 第1圖為實施例3所完成的導電性粒子的SEM影像。 第2圖為比較例1所完成的導電性粒子的SEM影像。 【主要元件符號說明】 無 357 5. 6-6. 2 48 8 5. 7-6. 3 48 9 5. 7-6. 2 48 10 5.7-6.2 48 11 5. 6-6. 3 48 12 5. 7-6. 3 48 13 5. 7-6.2 47.5 14 5. 6-6.1 48. 5 15 5. 7-6.2 48 16 5. 7-6. 5 30 17 5.5-6.2 48.5 18 5.3-6.2 48 19 5. 6-6. 2 48.5 20 5.7-6.2 47.5 21 5. 8-6. 3 46 22 5. 7-6. 2 48.5 23 5.7-6.2 47.5 1 4.2-6.1 47.5 2 4.2-6.2 48.5 Ratio 3 4.1-6.3 47.5 4 4. -6. 3 47.5 Example 5 5. 8-6.2 46 6 5. 8-6. 2 48 7 5. 5-6.1 47.5 * The range of pH is the transition from the start of dripping to the end of dripping. 33 201021054 [2] j ratio of primary particles to sub-particles (%) CD OO CT> LO CJ5 CO 〇i CO 03⁄4 ΙΛ σ> ΙΛ 〇> LO σ> LO CD CT> Od σ> 55 CO 〇d σ» CD 03⁄4 CO CD tn 03 σ» σ> OO CO σ> g CN1 σ>L〇σ> CO 〇> LO σ> 05 protrusion|aspect ratio 1 or more ratio j case (%) in in LO § 03 CO 〇> §§ CO CO CO CO § in LO 5 C^I CO OO m 00 CO s CO § in L〇in CO CQ ir> ΙΛ CO s 03 LO OO 呀LT3 LO 1—( CO CNI T~H ΙΛ <NI OJ CO 〇ϊ-H CO C>3 CO CO C<I c- O CO LO 1—H CO LT5 ΙΛ CO rH m CSl r^ CO T—^ CO C<l CO CO CNI CO LO LO o High 1 (βΐπ) 0.232 0.202 〇i—lo C<l CO Gf tn CM o 0.094 0. 082 0.091 0.130 0.133 o 0.124 0. 248 0.192 1 0.088 0.193 1 0.184 1 0.136 0.207 0.175 0.264 0.178 0. 224 0.213 0.244 1 0.245 ^ix W 0.160 0.164 (>3 12 O oa CO o CO (M ot-H c> 0. 085 0.075 0.074 0.112 0.108 0.095 丨0.113 0.162 0.123 ! 0. 065 | 0.155 I 0.163 | 0.108 0.183 0.108 | 0.163 0.135 0.200 0.185 0.212 1 0.223 Discs, discs, discs, discs, discs, discs, discs, discs, discs, discs, discs - conductive recordings The adhesion of the film 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇<3 〇〇〇〇〇〇〇〇〇〇〇椹 )) 〇〇〇〇〇〇〇〇〇〇〇〇〇〇 〇〇〇〇〇〇〇〇〇〇〇δ* p \o 1 Thickness of palladium flag (nm) CD 〇ooo ◦ O 〇〇> oo CD o O 〇〇O oo C3 O oo cr>c=> CO s Thickness of gold flag (nm) I 〇o 〇> ooo c>cr> ooo 〇ooooo C5 o 〇ooo in CNI c? oo Thickness of nickel 骐 (nm) I OO 05 CD Oi 〇0 05 CD σ» CD O) CD 05 CD 05 CO σϊ CO CJ5 CO 03⁄4 ΙΛ CT> CO cn g & CO 03⁄4 LO c- T--1—< OJ cs [>* C3>ir> 〇a LO LO Lft CD 00 CO particle size (βΰί) Cvl ir: CO cc o. az (N oc CN OC OJ OC CN GC <N 〇0 C<1 〇0 CS] OO c<l oc <N OC CN (N t - C1) oc <NI t - < N1 02 OJ Bu 03 00 CNJ 00 (N! 00 is OO CM* CS cn Ϊ ^ « LT > CC > OC > cr Os CC i_n 4 »—H cc 卜 σ; c <>3 r—<<NI<N OJ OZ (N1 <N ir. CN CC CO C- Cvl 1_If._ .蜣珑 众 ^ ^ ± 1- bead silver «chain 刼 ^ electric 麇 · · ^.来坡一·众slai-xiong wedge transport 璀刼Φ蘧2* e^e 201021054 [Table 5] Particle size (private m) Thickness of nickel film (nm) Thickness of gold film (nm) Thickness of palladium film ( Nm) Surface state Nickel film adhesion Conductivity Short-circuited protrusion primary particle ratio (3⁄4) Base length D (//m) Height (^m) Aspect ratio Aspect ratio of 1 or more (%) 1 7.8 95 0 0 〇X Λ has 0. 250 〇. 151 0. 60 15 47 2 4.3 97 0 0 〇X Λ There are 0. 265 〇. 138 0.52 12 68 to 3 3.6 73 0 0 〇X Δ has 0.213 〇. 148 0. 69 30 70 compared to 4 3.3 95 0 0 Δ XX no _*1 -*1 -*1 _*1 76 Example 5 3.3 92 0 0 Δ XX None-*1 *1 78 6 3.4 96 0 0 XX - - _*2 _*2 76 7 5. 5 95 0 0 Δ XX No _*1 _*1 7fi 8 7.8 扪: 74 25 0 〇X Δ There is 0.286 0.189 0.66 15 47 *2 : Nickel is abnormally precipitated and cannot be As is clear from the results of Table 4 and Table 5, the projections of the conductive powder (the present invention) which were completed in each of the examples were clearly observed as compared with the conductive powders obtained in the comparative examples. High and wide, and primary particles A higher proportion. Further, in comparison with the conductive powder prepared in the comparative example, it was apparent that the conductive powder obtained in each of the examples had high conductivity and high adhesion of the nickel film. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an SEM image of conductive particles completed in Example 3. Fig. 2 is an SEM image of the conductive particles completed in Comparative Example 1. [Main component symbol description] None 35

Claims (1)

201021054 七、申請專利範圍: 1.-種導電性粉體’適用於在芯材粒子的表面形成有 錄或鎳口金皮膜之導電性粒子所構成的導電性粉體,其特 徵在於: 述導電陡粒子具有從該皮膜的表面突出、且與該皮 、成為連續體、高寬比“ speci:加沁)為1以上之複數個 突起部;201021054 VII. Patent application scope: 1.-Electrical powders are suitable for forming conductive powders composed of conductive particles of nickel or gold film on the surface of core particles, which are characterized by: The particles have a plurality of protrusions that protrude from the surface of the film and are one or more of the skin and the continuous body and have an aspect ratio "speci: plus"; 回寬比為1以上之該些突起部的數量比例為全部突 起部的數量的40%以上;以及 關於該導電性粉體,上述導電性粒子中,一次粒子所 佔的重量為該導電性粉體的重量之85重量%以上。 2.如申叫專利範圍第1項所述之導電性粉體,其中該 芯材粒子的平均粒徑為1〜3烊m。 •如申印專利範圍第^或2項所述之導電性粉髏,其 中以金或鈀被覆含有該些突起部的該皮膜的表面。The ratio of the number of the protrusions having a back-width ratio of 1 or more is 40% or more of the total number of the protrusions; and in the conductive powder, the weight of the primary particles in the conductive particles is the conductive powder The weight of the body is 85% by weight or more. 2. The conductive powder according to claim 1, wherein the core material particles have an average particle diameter of 1 to 3 μm. The conductive powder according to the above-mentioned item, wherein the surface of the film containing the protrusions is covered with gold or palladium. 4*種導電性材料’其含有如申請專利範圍第i至3 項任一項所述之導電性粉體與絕緣性樹脂。 .一種導電性粒子的製造方法,其特徵在於包含: A步驟,將含分散劑及鎳離子的無電解鍍浴與表面 有責金屬的芯材粒子混合,其中在該芯材粒子的表面形 錦初期薄膜層之時,相料1公升之㈣離子濃度調整 0.000 H.GG8莫爾/公升的該無電解鑛浴,使用表面積 和為卜15m2相當的量之該芯材粒子;以及 步驟將A步驟所完成之具有鎳初期薄膜層的該芯 36 201021054 材粒子、以及含有該分散劑的、性漿料維持在展現該分散 剩的分散效果的pfl值範圍,並經時性地添加使每小時的析 出量為25〜100ηπι之相當的量的鐵離子及還原劑而在該水 性漿枓中生成鎳的孕核粒子的㈣,將生成的孕核粒子附 著於該芯材粒子,^已时的孕核粒子為起點而使該孕 核粒子成長,而形成高寬比為i以上之突起部。 6.如申請專利範圍第5項所述之導電性粒子的製造方 ❹ 法,其+ A #驟的進行是使該鎳初期薄琪$的厚度成為 0. 1 Onm 〇 7.如申請專利範圍第5或6項所述之導電性粒子的製 造方法,其中使用非離子界面活性劑、兩性離子介面活性 劑或水溶性高分子來作為該分散劑。A conductive material of any one of the above-mentioned items of the present invention, which is a conductive material and an insulating resin. A method for producing conductive particles, comprising: a step of mixing an electroless plating bath containing a dispersing agent and nickel ions with a core material particle having a surface-dependent metal, wherein a surface of the core particle is shaped At the time of the initial film layer, the electroless mineral bath of 0.000 H.GG8 Mohr/liter is adjusted to a concentration of 1 liter of the phase material, and the core material particles having a surface area and an amount equivalent to 15 m2 are used; and the step A is performed. The finished core 36 201021054 material particles having the nickel initial film layer, and the slurry containing the dispersant are maintained in a range of pfl values exhibiting the dispersion remaining dispersion effect, and are added hour by hour. (4) the amount of iron ions and a reducing agent in an amount of 25 to 100 ηπ, and the generation of the nucleus particles of nickel in the aqueous pulp, and the generated nucleus particles are attached to the core material particles. The core particles are used as a starting point to grow the pronuclear particles, and a protrusion having an aspect ratio of i or more is formed. 6. The method of manufacturing the conductive particles according to claim 5, wherein the + A # step is performed so that the thickness of the initial nickel of the nickel is 0. 1 Onm 〇 7. If the patent application scope The method for producing conductive particles according to Item 5 or 6, wherein a nonionic surfactant, a zwitterionic surfactant or a water-soluble polymer is used as the dispersant. 3737
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