TW201003768A - Film type transfer material - Google Patents

Film type transfer material Download PDF

Info

Publication number
TW201003768A
TW201003768A TW098123263A TW98123263A TW201003768A TW 201003768 A TW201003768 A TW 201003768A TW 098123263 A TW098123263 A TW 098123263A TW 98123263 A TW98123263 A TW 98123263A TW 201003768 A TW201003768 A TW 201003768A
Authority
TW
Taiwan
Prior art keywords
film
transfer material
resin
type transfer
adhesion force
Prior art date
Application number
TW098123263A
Other languages
English (en)
Chinese (zh)
Inventor
Hee-Wan Moon
Byeong-Il Lee
Original Assignee
Kolon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kolon Inc filed Critical Kolon Inc
Publication of TW201003768A publication Critical patent/TW201003768A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW098123263A 2008-07-14 2009-07-09 Film type transfer material TW201003768A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080067931A KR20100007332A (ko) 2008-07-14 2008-07-14 필름형 광분해성 전사재료

Publications (1)

Publication Number Publication Date
TW201003768A true TW201003768A (en) 2010-01-16

Family

ID=41575269

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098123263A TW201003768A (en) 2008-07-14 2009-07-09 Film type transfer material

Country Status (4)

Country Link
JP (1) JP2010020321A (ja)
KR (1) KR20100007332A (ja)
CN (1) CN101630125A (ja)
TW (1) TW201003768A (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5600458B2 (ja) * 2010-03-30 2014-10-01 株式会社トッパンＴｄｋレーベル 焼成用転写型フィルム及び焼成体を備えるガラス板の製造方法
JP5741179B2 (ja) * 2011-04-20 2015-07-01 日立化成株式会社 感光性フィルム
KR20130035779A (ko) 2011-09-30 2013-04-09 코오롱인더스트리 주식회사 포지티브형 감광성 수지 조성물，이로부터 형성된 절연막 및 유기발광소자
WO2018070489A1 (ja) * 2016-10-14 2018-04-19 日立化成株式会社 感光性エレメント、半導体装置、及びレジストパターンの形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080166659A1 (en) * 2005-02-02 2008-07-10 Byoung-Kee Kim Positive Dry Film Photoresist and Composition For Preparing the Same

Also Published As

Publication number Publication date
JP2010020321A (ja) 2010-01-28
KR20100007332A (ko) 2010-01-22
CN101630125A (zh) 2010-01-20

Similar Documents

Publication Publication Date Title
JP4699482B2 (ja) ポジティブ型ドライフィルムフォトレジストの製造方法
TWI310884B (en) Positive dry film photoresist and composition for preparing the same
JP4699483B2 (ja) 表示装置用アレイ基板の製造方法
TWI355558B (ja)
TWI396945B (zh) 薄膜式可光降解之轉印材料
TW201003768A (en) Film type transfer material
JP5048754B2 (ja) ポジティブ型フォトレジスト用組成物およびこれから製造されたポジティブ型フォトレジストフィルム
KR20050031874A (ko) 토출 노즐식 도포법용 포지티브형 포토레지스트 조성물 및레지스트 패턴의 형성 방법
JP5054066B2 (ja) フィルム型光分解性転写材料
KR101324871B1 (ko) 필름형 광분해성 전사재료
JP2019194007A (ja) 感光性積層体及びその製造方法
KR101291935B1 (ko) 필름형 광분해성 전사재료
KR20100018340A (ko) 필름형 전사재료 슬릿팅 롤
KR20090127466A (ko) 필름형 광분해성 전사재료
TW202419496A (zh) 負型感光性樹脂組成物及乾膜光阻
KR101362179B1 (ko) 드라이 필름 포토레지스트의 제조방법
KR101305803B1 (ko) 다층구조의 필름형 감광성 전사재료
KR101374516B1 (ko) 다층구조의 필름형 감광성 전사재료를 이용한 미세회로 패턴 형성방법
KR101791265B1 (ko) 포지티브형 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴 형성방법
JP2022012846A (ja) ポジ型ドライフィルムレジスト
KR101325866B1 (ko) 필름형 감광성 전사재료
JPH09311470A (ja) レジスト除去液及びそれを用いた電子部品製造用基材の製造方法
JPH08339087A (ja) ネガ型レジスト組成物及びレジストパターン形成方法
JP2008107407A (ja) 非化学増幅主鎖分解型ポジ型レジスト組成物