TW200950010A - Universal substrate for semiconductor packages and the package - Google Patents

Universal substrate for semiconductor packages and the package Download PDF

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Publication number
TW200950010A
TW200950010A TW097119810A TW97119810A TW200950010A TW 200950010 A TW200950010 A TW 200950010A TW 097119810 A TW097119810 A TW 097119810A TW 97119810 A TW97119810 A TW 97119810A TW 200950010 A TW200950010 A TW 200950010A
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Taiwan
Prior art keywords
substrate
fingers
semiconductor package
opening
general
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TW097119810A
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Chinese (zh)
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TWI362090B (en
Inventor
Wen-Jeng Fan
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Powertech Technology Inc
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Priority to TW097119810A priority Critical patent/TWI362090B/en
Publication of TW200950010A publication Critical patent/TW200950010A/en
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Publication of TWI362090B publication Critical patent/TWI362090B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/2612Auxiliary members for layer connectors, e.g. spacers
    • H01L2224/26152Auxiliary members for layer connectors, e.g. spacers being formed on an item to be connected not being a semiconductor or solid-state body
    • H01L2224/26175Flow barriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/83385Shape, e.g. interlocking features

Landscapes

  • Wire Bonding (AREA)
  • Die Bonding (AREA)

Abstract

Disclosed are a universal substrate for semiconductor packages and the package. The universal substrate comprises a substrate base, two sets of original fingers and one set of redistribution fingers on the substrate base, and a solder resist formed on the substrate base. The redistribution fingers are located between the two sets of original fingers. The solder resist has an opening from which the redistribution fingers are exposed. A plurality of exhaust grooves are formed on the solder resist without penetrating the solder resist. The exhaust grooves connect the opening and extend toward the sides of the substrate base but not connecting to other openings from which the original fingers are exposed so as to form air channels to exhaust outward during chip attaching. This solves the problems of bubbles remaining in the opening and chip-attaching adhesive contaminating the original fingers when a large size chip is disposed. In one embodiment, traces connecting the distribution fingers can cross to be overlapped with but not exposed from the exhaust grooves such that the disposition flexibility of the exhaust grooves is increased.

Description

200950010 九、發明說明: 【發明所屬之技術領域】 本發明係有關於—種半導體裝置之基板,特別係有 關於一種半導體封裝之通用型基板及半導體封裝構造。 【先前技術】 在半導體裝置中,例如球栅陣列半導體封裝構造或 是卡片式半導體封裝構造等等,是利用基板以承載晶片 φ 並使基板之接指電性連接至晶片之銲墊以達成内部電 性連接。就一規格品而言,半導體封裝構造(特指記憶 卡)之尺寸是不可變動。為了提供具有不同記憶體容 量’會在基板上表面的不同位置增設至少一組重分配接 指’使基板具有通用性’可針對小尺寸之晶片進行封 裝’藉以減少基板製造成本。然而,在黏接大尺寸晶片 時,重分配接指將不被使用而被黏晶膠覆蓋,容易殘存 有風>/包’而谷易產生氣爆(p〇pC〇rn)現象。 參 請參閱第1A及1B圖所示,一種習知半導體封裝構 造包含一基板1 00、一晶片i j、一黏晶膠i 2、複數個 第一銲線13、複數個第二銲線14與一封膠體15。該基 板100係主要具有一基板本體11〇以及一防焊層13〇。 該基板本體110係具有一表面m,設有複數個第一組 接指1 2 1、複數個第二組接指丨22與複數個第三組接指 123 ’其中該些第二組接指122與該些第三組接指123 係為一般接指,位於該表面111之兩側邊緣,適用於電 性連接大尺寸晶片。該些第一組接指1 2 1係位於該些第 200950010 一組接指122與該些第三組接指123之間,作為重分配 接扎,適用於電性連接小尺寸晶片。該防焊層ι 3 〇係形 成於該表面111並具有複數個開口 131、132、133,以BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for a semiconductor device, and more particularly to a general-purpose substrate and a semiconductor package structure for a semiconductor package. [Prior Art] In a semiconductor device, for example, a ball grid array semiconductor package structure or a card type semiconductor package structure or the like, the substrate is used to carry the wafer φ and the fingers of the substrate are electrically connected to the pads of the wafer to achieve internal Electrical connection. For a specification, the size of the semiconductor package structure (specifically, the memory card) is not variable. In order to provide different memory capacities, at least one set of redistribution fingers can be added at different locations on the upper surface of the substrate to make the substrate versatile 'can be packaged for small-sized wafers' to reduce substrate manufacturing costs. However, when a large-sized wafer is bonded, the redistribution finger will not be used and covered by the adhesive, and it is easy to remain windy >/package' and the valley is prone to gas explosion (p〇pC〇rn). Referring to FIGS. 1A and 1B , a conventional semiconductor package structure includes a substrate 100 , a wafer ij , a die bond i 2 , a plurality of first bond wires 13 , and a plurality of second bond wires 14 . A gel 15 The substrate 100 mainly has a substrate body 11A and a solder resist layer 13A. The substrate body 110 has a surface m, and is provided with a plurality of first set of fingers 1 2 1 , a plurality of second set of fingers 22 and a plurality of third sets of fingers 123 ′ wherein the second set of fingers 122 and the third set of fingers 123 are generally fingers located on both sides of the surface 111, and are suitable for electrically connecting large-sized wafers. The first set of fingers 1 2 1 is located between the set of fingers 500122 and the third set of fingers 123 as a redistribution connection, and is suitable for electrically connecting small-sized wafers. The solder resist layer ι 3 is formed on the surface 111 and has a plurality of openings 131, 132, 133 to

分別顯露該些第一組接指121、該些第二組接指122與 該些第三組接指123。當該晶片n為大尺寸晶片時, “曰曰》11係覆蓋該些第一組接指i 2 i並利用該黏晶膠 12之黏接,使該晶片11設置於該基板100上。該些第 一銲線13係電性連接該晶片11至該基板100之該些第 二組接指122;該些第二銲線14係電性連接該晶片n 至I基板100之該些第二組接指123。該封膠體15係 形成於該基板100之該防焊層130上,以密封該晶片 11、該些第一銲線13與該些第二銲線14。請參閱第1B 圖所示,該黏晶膠12係黏著該基板100之該防焊層130 與該晶片11之一背面,並填入該開口 131。由於該防 焊層130之該開口 131係為封閉開口且被該晶片η覆 蓋(如第1Α圖所不),使得在黏晶過程中殘留氣體無法 由該開口⑴向外排出,會在該黏晶膠12中存有氣泡 (如第1Β圖所示),導致在後續製程中或使用時產生 氣爆(popcorn,或稱爆米花)現象。 為了避免在黏晶時產生氣泡殘留的問題,可使用防 焊層開口為相互連通之基板作為晶片承載件。有人提出 另一種習知半導體封裝構造,揭示在中華民國專利證書 號數第1281733號「半導體封裝件及其基板結構」,雖 然其具有避免^包殘留之功效,但黏晶膠會擴散至位於 7 200950010 基板兩側之接指,易有黏晶溢膠而污染接指以及基板線 路外露導致被電錄之問題。 ,另一種習知半導體封裝 21、一黏晶膠22、複數 請參閱第2A及2B圖所示 構造包含一基板200、一晶片 個第一銲線23、複數個第二銲線24與一封膠體25。該 基板200係主要具有一基板本體21〇、複數個第—組接 指22卜複數個第二組接指222、複數個第三組接指The first group of fingers 121, the second group of fingers 122 and the third group of fingers 123 are respectively exposed. When the wafer n is a large-sized wafer, the "11" covers the first set of fingers i 2 i and is bonded to the substrate 100 by using the adhesive 12 to be disposed on the substrate 100. The first bonding wires 13 are electrically connected to the second group of fingers 122 of the substrate 100; the second bonding wires 14 are electrically connected to the second to the second substrate 100 The sealing body 15 is formed on the solder resist layer 130 of the substrate 100 to seal the wafer 11, the first bonding wires 13 and the second bonding wires 14. See Figure 1B. As shown, the adhesive 12 adheres to the back side of the solder resist layer 130 of the substrate 100 and the back surface of the wafer 11. The opening 131 of the solder resist layer 130 is closed and is closed. The wafer η is covered (as shown in FIG. 1 ), so that residual gas cannot be discharged outward from the opening (1) during the die bonding process, and bubbles may be present in the adhesive 12 (as shown in FIG. 1 ). This leads to the phenomenon of popcorn (popcorn) in the subsequent process or during use. In order to avoid the problem of bubble residue during the die bonding, A substrate in which the solder resist openings are interconnected is used as a wafer carrier. Another conventional semiconductor package structure has been proposed, which is disclosed in the Republic of China Patent No. 1281733 "Semiconductor Package and Substrate Structure", although it has been avoided. ^The effect of the residue of the package, but the adhesive will spread to the fingers on the sides of the 7 200950010 substrate, which is prone to sticking out of the glue and contaminating the fingers and the substrate line is exposed to cause the problem of being recorded. Another conventional semiconductor package 21, a die bond adhesive 22, and a plurality of structures shown in FIGS. 2A and 2B include a substrate 200, a wafer first bonding wire 23, a plurality of second bonding wires 24, and a Colloid 25. The substrate 200 mainly has a substrate body 21〇, a plurality of first-group fingers 22, a plurality of second group fingers 222, and a plurality of third group fingers.

以及一防焊層23 0。該些第一組接指22〗、該些第二組 接指222與該些第三組接指223皆設於該基板本體 之一表面211。其中作為重分配接指之該些第一組接指 221係位於該些第二組接指222與該些第三組接指 之間。該防焊層230係形成於該表面2 1 1並具有複數個 開口 231、23 2與233,以分別顯露該些第一組接指221、 該些第二組接指222與該些第三組接指223。該防焊層 230更具有複數個延伸開口 235,其係由中央之開口 23丄 向外延伸並連通至周邊開口 232或233。利用該黏晶膠 22之黏接’以使該晶片21設置於該基板2〇〇上。當該 晶片2 1係為大尺寸晶片時,會使該晶片2 1覆蓋該開口 23 1及該些第一組接指22丨。該些第一銲線23係電性連 接該晶片21至該基板200之該些第二組接指222 ;該 些第一鲜線24係電性連接該晶片21至該基板2〇〇之該 些第二組接指223。該封膠體25係形成於該基板200 之該防焊層230,以密封該晶片21、該些第一銲線23 與該些第二鮮線24。請參閱第2A及2B圖所示,該黏 200950010 晶膠22係填入該開口 231並利用該些延伸開口⑶使 可能殘留於該開口 231的氣泡排出。然而,在黏晶過程 中,在受到高溫與壓力下該黏晶膠22具有流動性,該 黏晶膠22會沿著該些延伸開口…往該些周邊開口叫 ,、233之方向流動而產生溢膠22八,進而污染至該此第 一組接指222與該些第三組接指223(如g 2Β圖所示), 甚至導致該些第-銲線23或該些第二銲線^之一端益 2黏於該些第二組接指222或該些第三組接指223。 ρ該些第一組接指221、該些第二組接指222與該此 第三組接指223上係應電鍵形成有一電鑛層28〇。 、此外’然為使該些第一組接指221具有引指位置重 二配的功效’該基20 0必須更包含複數個連接該些第 -組接指221與該些第二組接指222之線路25〇。由於 該些延伸開口 235係貫穿該防烊層23〇,一旦該些線路 250與該些延伸開σ 235交錯便會產生線路外露,電鍍 形成該電鍍層28〇時會同時形成在線路25〇的外露區 段。這樣除了會有電鍍浪費的問題之外,也會有排氣阻 塞的現象,導致該些延伸開口 235的排氣功能失效。 【發明内容】And a solder mask layer 230. The first set of fingers 22, the second set of fingers 222 and the third set of fingers 223 are all disposed on a surface 211 of the substrate body. The first set of fingers 221 as the redistribution fingers are located between the second set of fingers 222 and the third set of fingers. The solder resist layer 230 is formed on the surface 21 and has a plurality of openings 231, 23 2 and 233 for respectively exposing the first set of fingers 221, the second set of fingers 222 and the third Group finger 223. The solder resist layer 230 further has a plurality of extension openings 235 extending outwardly from the central opening 23丄 and communicating to the peripheral opening 232 or 233. The bonding of the adhesive 22 is performed so that the wafer 21 is placed on the substrate 2. When the wafer 21 is a large-sized wafer, the wafer 21 covers the opening 23 1 and the first set of fingers 22 丨. The first bonding wires 23 are electrically connected to the second group of fingers 222 of the substrate 21 to the substrate 200. The first fresh wires 24 are electrically connected to the wafer 21 to the substrate 2 These second sets of fingers 223. The sealant 25 is formed on the solder resist layer 230 of the substrate 200 to seal the wafer 21, the first bonding wires 23 and the second fresh wires 24. Referring to Figures 2A and 2B, the adhesive 200950010 crystal glue 22 is filled into the opening 231 and the air bubbles remaining in the opening 231 are discharged by the extension openings (3). However, in the process of the die-bonding process, the adhesive glue 22 has fluidity under high temperature and pressure, and the adhesive glue 22 flows along the extended openings... The overflow glue 22 is further contaminated to the first set of fingers 222 and the third set of fingers 223 (as shown in g 2 Β), and even causes the first wire bond wires 23 or the second wire bond wires ^One end benefit 2 sticks to the second set of fingers 222 or the third set of fingers 223. ρ The first group of fingers 221, the second group of fingers 222 and the third group of fingers 223 are electrically connected to form an electric ore layer 28〇. In addition, the 'first set of fingers 221 have the effect of the index position re-matching'. The base 20 0 must further include a plurality of connections of the first-group fingers 221 and the second group of fingers. The line of 222 is 25 inches. Since the extension openings 235 extend through the anti-snagging layer 23, once the lines 250 are interlaced with the extensions σ 235, the lines are exposed, and the plating layer 28 is formed at the same time as the lines 25〇. Exposed section. In addition to the problem of electroplating waste, there is also a phenomenon of exhaust gas clogging, which causes the exhaust function of the extension openings 235 to fail. [Summary of the Invention]

有鑒於此,本發明之主要目的係在於提供一種半導 體封裝之通用型基板及半導體封裝構造,能在黏晶過程 中,提供往外排出的無阻塞且不溢膠的氣體通道,以避 免氣泡殘留的問題,並能有效解決傳統半導體封裝構造 I黏晶過程中產生溢膠的問題。 200950010 本發明的目的及解決其技術問題是採用以下技術方 案來實現的。依據本發明所揭示之一種半導體封裝之通 用型基板,主要包含一基板本體、複數個第一組接指、 複數個第二組接指、複數個第三組接指以及一防焊層。 該基板本體係具有一表面。該些第一組接指、該些第二 組接指與該些第三組接指係皆設置於該基板本體之該 表面。其中,該些第一組接指係位於該些第二組接指與 該些第三組接指之間。該防焊層係形成於該基板本體之 該表面,該防焊層係具有一第一開口 、一第二開口與一 第三開口,以分別顯露該些第一組接指、該些第二組接指與 該些第三組接指。其中,複數個第一排氣槽係形成於該 防焊層之一顯露表面但不貫穿該防焊層,該些第一排氣 槽係連接該第一開口並往該基板本體之該表面之側邊 延伸但不連通到該第二開口與該第三開口。 本發明的目的及解決其技術問題還可採用以下技術 ❹ 措施進一步實現。 在前述之通用型基板中,可另包含複數個線路,其 係形成於該基板本體之該表面並連接該些第一組接指 與該些第二組接指,該防焊層更覆蓋該些線路。 在前述之通用型基板中,該些第一排氣槽與該些線 路係可為錯位不重疊。 在前述之通用型基板中,該些第一排氣槽之一底面 係可不高於該些線路。 在前述之通用型基板中,該些第一排氣槽之一底面 10 200950010 係可高於該些線路。 在前述之通用型基板中,至少一之該些第一排氣槽 係可與至少一之該些線路係交錯重疊但不顯露該些線 路。 在前述之通用型基板中,該些第一排氣槽之該些延 伸端係可包含複數個停止在該防焊層内之封閉槽端。 在前述之通用型基板中,至少一連通槽係可形成於 該防焊層之該顯露表面並連通該些第一排氣槽,以構成 〇 網狀通道。 在前述之通用型基板中,該些相鄰第一排氣槽之延 伸端係可互連為u形。 在前述之通用型基板中,該基板本體之該表面係可 具有一第一邊緣、一第二邊緣以及一第三邊緣,該第二 邊緣與該第三邊緣係為平行,該第一邊緣係連接該第二 邊緣與該第三邊緣,其中該些第二組接指係排列於該基 _ 板本體之該表面之該第二邊緣,.該些第三組接指係排列 於該基板本體之該表面之該第三邊緣,該些第一組接指 係可為該些第二組接指之重分配接指而排列於該基板 本體之該表面之中央。 在前述之通用型基板中,至少一第二排氣槽,其係 可連接該第一開口並往該基板本體之該表面之該第一 邊緣延伸。 在前述之通用型基板中,至少一第三排氣槽,其係 可連接該第一開口並往該基板本體之該表面之一第四 11 200950010 邊緣延伸。 在前述之通用型其^ 又基板中,該第二開口與該第 係可為分別鄰近於該笛 * 4、通第二邊緣與該第三邊緣之 周邊開口。 在前述之通用型其k丄 ^ 暴板中,該第二開口與該第i 可為分別連通到該篦_ 第一邊緣與該第三邊緣之開In view of the above, the main object of the present invention is to provide a general-purpose substrate and a semiconductor package structure for a semiconductor package, which can provide a non-blocking and non-overflowing gas passage that is discharged outward during the die-bonding process to avoid bubble residue. The problem can effectively solve the problem of the overflow of glue in the traditional semiconductor package structure I. 200950010 The object of the present invention and solving the technical problems thereof are achieved by the following technical solutions. A general-purpose substrate for a semiconductor package according to the present invention comprises a substrate body, a plurality of first set of fingers, a plurality of second sets of fingers, a plurality of third sets of fingers, and a solder mask. The substrate system has a surface. The first set of fingers, the second set of fingers and the third set of finger joints are disposed on the surface of the substrate body. The first set of fingers are located between the second set of fingers and the third set of fingers. The solder resist layer is formed on the surface of the substrate body, the solder resist layer has a first opening, a second opening and a third opening to respectively expose the first set of fingers and the second The group finger refers to the third group. Wherein, the plurality of first exhaust slots are formed on one of the exposed surfaces of the solder resist layer but do not penetrate the solder resist layer, and the first exhaust slots are connected to the first opening and to the surface of the substrate body The side extends but does not communicate to the second opening and the third opening. The object of the present invention and solving the technical problems thereof can be further realized by the following techniques 措施 measures. In the above-mentioned general-purpose substrate, a plurality of wires may be further formed on the surface of the substrate body and connected to the first group of fingers and the second group of fingers, and the solder resist layer covers the same Some lines. In the above-mentioned general-purpose substrate, the first exhaust grooves and the line systems may be misaligned and do not overlap. In the above-mentioned general-purpose substrate, one of the first exhaust grooves may have a bottom surface not higher than the lines. In the above-mentioned general-purpose substrate, one of the first exhaust grooves may have a bottom surface 10 200950010 higher than the lines. In the above-mentioned general-purpose substrate, at least one of the first exhaust slots may be overlapped with at least one of the circuit lines without revealing the lines. In the above-mentioned general-purpose substrate, the extended ends of the first exhaust grooves may include a plurality of closed groove ends stopped in the solder resist layer. In the above-mentioned general-purpose substrate, at least one communication groove may be formed on the exposed surface of the solder resist layer and communicate with the first exhaust grooves to constitute a mesh-shaped channel. In the above-described general-purpose substrate, the extended ends of the adjacent first exhaust grooves may be interconnected in a u shape. In the above general-purpose substrate, the surface of the substrate body may have a first edge, a second edge, and a third edge, the second edge being parallel to the third edge, the first edge system Connecting the second edge and the third edge, wherein the second set of fingers are arranged on the second edge of the surface of the base body. The third set of fingers are arranged on the substrate body The third edge of the surface, the first set of fingers may be arranged in the center of the surface of the substrate body for the redistribution fingers of the second set of fingers. In the above general-purpose substrate, at least one second exhaust groove is connectable to the first opening and extends toward the first edge of the surface of the substrate body. In the above-mentioned general-purpose substrate, at least one third exhaust groove is connectable to the first opening and extends toward the edge of one of the surfaces of the substrate body, the fourth 11 200950010. In the above-mentioned general-purpose substrate, the second opening and the second portion may be adjacent to the periphery of the flute 4, the second edge and the third edge, respectively. In the above-mentioned universal type, the second opening and the ith may be respectively connected to the first edge and the third edge.

在前述之通用型基板 溢膠儲存槽,其係連接 端。 中,該防焊層係更具有 至該些第一排氣槽之該 在前述之通用型基板中 射方式形成。 該些第一排氣槽係In the above-mentioned general-purpose substrate overflow storage tank, it is a connection end. The solder resist layer is formed in the above-described general-purpose substrate in such a manner that the first exhaust grooves are formed in the above-described manner. The first exhaust duct system

發月還揭不-種使用前述的通用型基板承 T晶片之半導體封獎 才反 構化’主要包含前述的通 日日片、一黏晶膠、複數個第一銲線以及複 銲線。該晶片係設置於該通用型基板上並覆蓋 組接指,該晶片係具有複數個第一鋅墊與複數 銲墊。該黏晶膠係黏接該晶片之一背面與該通用 之該防焊層,該黏晶膠係更填入該第一開口以及 T排氣槽。該些第一銲線係電性連接該晶片之該 銲墊至該通用型基板之該些第二組接指。該些第 係電性連接該晶片之該些第二銲墊至該通用型 該些第三組接指。 本發明還揭不另一種使用前述的通用型基板 三開口 封閉型 L開口係 放型周 複數個 些延伸 可以雷 載大尺 用型基 數個第 該些第 個第二 型基板 該些第 些第一 一銲線 基板之 承栽小 12 200950010 尺 板 二 第 該 ❷ 線 之 通 〇 二 寸晶片之半導體封裝構造,主要包含前述的通用型基 、一晶片、一黏晶膠、複數個笫一銲線以及複數個第 銲線。該晶片係設置於該通用型基板上並位於該些第 紐接指與該些第三組接指之間,該晶片係具有複數個 一銲墊與複數個第二銲墊。該黏晶膠係黏接該晶片之 背面與該通用型基板之該防焊層,該黏晶膠係不填入 第一開口。該些第一銲線係電性連接該晶片之該些第 銲墊至該通用型基板之該些第一組接指。該些第二銲 係電性連接該晶片之該些第二銲墊至該通用型基板 該些第三組接指。 由以上技術方案可以看出’本發明之半導體封裝之 用型基板及半導體封裝構造,有以下優點與功效: 、利用通用型基板黏晶表面形成有不貫穿防焊層之排 氣槽,能在黏晶過程中,提供氣體往外排出的通 道’以避免氣泡殘留的問題。 藉由防焊層表面之排氣槽能不顯露連接重分配接指 (即第一組接指)的線路,以減少電鍍面積以降低製 此外,可以允許線 以增加排氣槽的配 造成本’並避免排氣槽被阻塞。 路不外露地與排氣槽交錯重疊, 置彈性。 藉由排氣槽之延伸端以限制黏晶溢膠之區域It is also revealed that the semiconductor package of the above-mentioned general-purpose substrate-based T-chip is deconstructed' mainly including the aforementioned Japanese-Japanese film, a viscous paste, a plurality of first bonding wires, and a re-bonding wire. The wafer is disposed on the universal substrate and covers the assembly fingers. The wafer has a plurality of first zinc pads and a plurality of pads. The adhesive is adhered to the back side of the wafer and the common solder resist layer, and the adhesive glue is further filled into the first opening and the T exhaust groove. The first bonding wires are electrically connected to the pads of the wafer to the second set of fingers of the universal substrate. The plurality of electrodes are electrically connected to the second pads of the wafer to the third type of fingers of the universal type. The present invention also discloses that the above-mentioned general-purpose substrate three-opening type L-opening type has a plurality of extensions which can be used for the large-scale type of the first type of the second type substrate. The welding of the substrate of the wire-bonding substrate 12 200950010 The second-inch chip of the semiconductor package structure of the two-inch wafer, mainly including the above-mentioned general-purpose base, a wafer, a die-bonding glue, a plurality of welding Line and a plurality of second weld lines. The wafer is disposed on the universal substrate and between the plurality of contacts and the third set of contacts, the wafer having a plurality of pads and a plurality of second pads. The adhesive is adhered to the back surface of the wafer and the solder resist layer of the universal substrate, and the adhesive is not filled in the first opening. The first bonding wires are electrically connected to the first pads of the wafer to the first group of fingers of the universal substrate. The second soldering pads are electrically connected to the second pads of the wafer to the third type of fingers of the universal substrate. It can be seen from the above technical solutions that the substrate for semiconductor package and the semiconductor package structure of the present invention have the following advantages and effects: The use of a general-purpose substrate on the surface of the die bond to form a vent groove that does not penetrate the solder resist layer can be During the die-bonding process, a channel for the gas to be discharged is provided to avoid the problem of residual bubbles. The venting groove on the surface of the solder resist layer can not reveal the line connecting the redistributing fingers (ie, the first group of fingers) to reduce the plating area to reduce the system. In addition, the line can be allowed to increase the distribution of the venting groove. 'And avoid the venting groove being blocked. The road is not overlapped with the exhaust groove and is elastic. By limiting the extended end of the venting groove to limit the area of the viscous gel

w…π 區域及羽F米L 槽不連通至防焊層周邊開口’能避免在黏設大尺寸 晶片時因黏晶溢膠而污染至_般接指(即第二组接 指與第三組接指)’有效解決傳統半導體封裝構造 13 200950010 在黏晶過程中產生溢膠的問題。 四、藉由第一組接指、第二組接指與第三組接指之設置 位置,能使通用型基板適用於不同尺寸夕曰u 、, 、J 曰曰片,以 節省基板之製造成本。 五、利用線路係連接第一組接指與第二組接指,使小尺 寸晶片可直接藉由第一組接指達到與通用型基板The w...π area and the feather F-meter L-slot are not connected to the periphery of the solder-proof layer' to avoid contamination of the large-size wafer due to the adhesion of the glue to the _-like finger (ie the second set of fingers and the third The assembly finger refers to 'effectively solve the problem of the conventional semiconductor package structure 13 200950010 in the process of the adhesive crystal. 4. By using the first set of fingers, the second set of fingers and the third set of fingers, the universal substrate can be applied to different sizes of U, u, and J to save the substrate. cost. 5. The first set of fingers and the second set of fingers are connected by a line system, so that the small-sized wafer can be directly connected to the general-purpose substrate by the first set of fingers.

之電性互連,而不需打線至第二組接指,藉以縮短 鲜線長度。 【實施方式】 依據本發明之第一具體實施例,一種半導體封裝之 通用型基板舉例說明於第3A圖之表面示意圖、第 圖之截面示意圖以及第3C圖之立體示意圖'該通用型 基板300主要包含一基板本體31〇、複數個第一組接指 321、複數個第二組接指322、複數個第三組接指w 以及-防焊層33〇。請參閱帛3A圖所示,該基板本體 3Π)係具有-表面311’以作為設置晶片之承載面。該 表面3"係可具有-第-邊、緣312、一第二邊緣313、 —第三邊緣314以及—第四邊緣%。在本實施例中, 該第二邊緣3 13與該第三邊緣3 14係互為平行,該第一 邊緣312與該第四邊緣315係互為平行,該第一邊緣 312係連接該第二邊緣313與該第三邊緣314。該第四 邊緣3丨5亦連接該第二邊緣313與該第三邊緣314。 凊參閱第3A ®所*,該些第—組接指321、該些第 二組接指322與該些第三組接指323係皆設置於該基板 14 200950010 本體310之該表面3"。惟應理解的是,太路 組數不以圖式中的三組為 發明的接指 計加以_ # Ί m Α 11 ‘、實際基板之電性設 冲加u增s又或調整。其中,該些第 η ^ η - μ ^ ^ 、接扣3 21係位於 及二第一組接扣322與該些第三組接 實施例中,該些第二組接_ 之間。在本 ,丑钱知322與該些第三 係一般接指,該些第一組接指321 ,接寺曰 係為電性連接該4b第 二組接指3 22之重分配接指。 一 这二第一組接指 ❹ 排列於該表面3 1 1之中央F祕 ' 干央&域。該些第二組接指322俜 可排列於該基板本體31〇係 ^ 〇也 之該表面311之該第二邊緣 313。該些第二組接指323係可嫌丨 > β + 係了排列於該基板本體310 之該表面311之該第三邊緣314。 第—組接指32卜 該些第二組接指322與該些第三組 饮相係可為打線 接一e bonding pad),第一組接指321、該此第 -組接指322與該些第三組接指323之材質係可為銅。 在本實施例中,該些第一組接指321、該些第二板接指 322與該些第三組接指323之表面係可電鍍有—電鍍層曰 380,用以增加半導體封裳中與銲線電性連接的仕合 力。該電鑛層380之材質係可選用於銀、錄金、錫、錄 鈀金、錫鉛、錫鉍之其中之—。 請參閱第3A、3B以及3C圖所示,該防焊層^”係 形成於該基板本體310之該表面311,該防焊層33〇係 具有一第一開口 331,以顯露該些第—組接指321。如 第3A圖所示,該防焊層33 0係更具有一第二開口 332 與一第三開口 333,以分別顯露該些第二組接指322與 15 200950010 該些第三組接指323。其中該第二開口 332與該第三開 口 3 3 3係可為封閉開口或開放缺口。在本實施例中,該 第二開口 3 3 2與該第三開口 3 3 3係為分別鄰近於該第二 邊緣3 1 3與該第三邊緣3 1 4之封閉型周邊開口。該防焊 層330係可選自於覆蓋層(cover iayer)或焊罩層(s〇ider mask)之其中之一。該防焊層33 0的形成方法可為膜壓 合或是先印刷再經曝光顯影產生圖案 ❹ 凊再參閱第3A與3B圖所示,複數個第一排氣槽340 係形成於該防焊層330之一顯露表面334但不貫穿該防 焊層330,該些第一排氣槽340係連接該第一開口 33 J 並往該基板本體310之該表面311之側邊(即該第二邊 緣313與該第三邊緣314)延伸但不連通到用以顯露該 些第二組接指322之該第二開口 332與用以顯露該些第 二組接指32;3之該第三開口 333。通常但非限定地,該 些第—排氣槽340係可利用雷射方式形成,以便於控制 _ 該些第—排氣槽340之形成深度不致於貫穿該防焊層 330 ’以避免顯露該些線路350。如第3A圖所示,該些 第—排氣槽340係不連通至該第二開口 332與該第三開 口 333 ’以避免黏晶溢膠污染到該些第二組接指322與 該些第二組接指3 2 3。在本實施例中,該些第一排氣槽 40係可為長條形。該些第一排氣槽340之—端係連接 ~第 開口 3 3 1之較長側。該些第一排氣槽3 4 〇之該些 延伸端341係超出一大尺寸晶片3〇之覆蓋區域,以供 後續點晶過程中氣體可由該些第一排氣槽34〇向外排 16 <0 200950010 出而不會殘留在大尺寸晶片30下方。更具體地,該些 第一排氣槽340之該些延伸端341係可包含複數個停止 在該防焊層330内之封閉槽端,以限制黏晶溢膠區域。 此外,該通用型基板300可另包含複數個線路35〇, 、係形成於5亥基板本體310之該表面311並連接該些第 一組接指321與該些第二組接指322,該防焊層33〇更 覆蓋該些線路350,故該些第一組接指321可作為該些 ❹ 第—組接指322的重分配接指。如第3B圖所示,該些 線路3 5 0、3亥些第一組接指3 2 1、該些第二組接指3 2 2、 與該些第二組接指323可為同一層線路層。因此,除了 大尺寸晶片可藉由該些第二組接指322達到與該通用 型基板300之電性互連,小尺寸晶片可直接藉由該些第 —組接指32 1達到與該通用型基板3〇〇之電性互連,更 可藉以縮短銲線長度,故該通用型基板3〇〇可適用於不 同尺寸之晶片,以節省基板之製造成本。此外,由於該 ® 些線路350係被該防焊層330覆蓋,故該些線路35〇不 會顯露於該些第一排氣槽34〇也不會在該些第一排氣 槽340内形成該電鍍層38〇,不僅可減少電鍍面積以降 低成本,並能避免該些第—排氣槽34〇被阻塞。 如第3 A圖所示,在本實施例中,該些第—排氣槽 340與該些線路35〇係可為錯位不重疊故可以增加該 些第一排氣槽3 40的形成深度,也不會顯露該些線路 350。例如,如第3B圖所示,該些第一排氣槽34〇之一 底面342係可不高於該些線路35〇,能使黏晶過程中產 17 ❹ 200950010 生的氣體更順利往外排出。更具體而言,至少一第 氣槽360係可連接該第一開口 331並往該基板本截 之該表面311之該第一邊緣312延伸,以增加黏晶 排氣效果。該第二排氣槽360連接該第一開口 331 端係位於該第一開口 331鄰近該第一邊緣312的 侧’該第一排氣槽360的另一端可連接到該第一 312。至少一第二排氣槽370係可連接該第一開口 並往該基板本體310之該表面311之該第四邊緣3 伸。 前述的通用型基板3 00係可運用於承載大尺寸 並組成為一半導體封裝構造,例如記憶卡、球栅陣 裝構造(BGA)或是平面陣列封裝構造(LGA) ^該通 基板300在設置一大尺寸晶片之後,係例舉說明 4A圖之表面示意圖。—種包含該通用型基板300 尺寸晶片之半導體封裝構造,係例舉說明於第4B 截面示意圖。 該半導體封裝構造主人义 要包含前述的通用型 300、-大尺寸晶片30、一黏晶膠41、複數個第一 42以及複數個第二銲線43。該大尺寸晶片3〇係設 該通用型基板300上,並具古 私丄 _ ^ ^ t具有一較大的記憶體容量 大尺寸晶片30係具有複數袖曾 m 双1固第一銲墊31與複數個 銲墊32,其係可形成於該大 /八尺寸晶片30之一主動 並作為該大尺寸晶片3 〇之粗/(. <對外電極。在黏晶之後 置於該通用型基板300上的兮丄〇丄 衫箱 工的該大尺寸晶片30係覆 二排 :310 時之 的一 較短 邊緣 33 1 15延 晶片 列封 用型 於第 與大 圖之 基板 銲線 置於 。該 第二 © 33 ,設 蓋該 18 200950010 些第一組接指321與該第一開口 331,該些第一銲墊31 係鄰近該些第二組接指322,該些第二銲墊32係鄰近 該些第三組接指323。該些第一排氣槽340之該些延伸 端3 4 1係延伸至該大尺寸晶片3 0之外。通常該黏晶膠 4 1之材質係可選用環氧樹脂或其它在加熱下可流動的 黏著材料。該大尺寸晶片3 0的設置係利用該黏晶膠4 1 黏接該大尺寸晶片30之一背面34與該通用型基板300 ^ 之該防焊層3 3 0,而該黏晶膠4 1係更填入該第一開口 33 1以及該些第一排氣槽340内,以增加黏晶強度。 該些第一銲線42係電性連接該大尺寸晶片3 0之該 些第一銲墊31至該通用型基板300之該些第二組接指 322。該些第二銲線43係電性連接該大尺寸晶片30之 該些第二銲墊32至該通用型基板3 00之該些第三組接 指 323。 如第4B圖所示,該半導體封裝構造可另包含一封膠 φ 體44,其係形成於該通用型基板300上以密封該大尺 寸晶片30、該些第一銲線42與該些第二銲線43,其中 該黏晶膠4 1係填入該些第一排氣槽340在該大尺寸晶 片30下的局部區域,該封膠體44則填入該些第一排氣 槽340之剩餘區域。 在黏晶過程中,該大尺寸晶片3 0係往該通用型基板 3 00下壓以擠壓尚未固化且具有流動性之該黏晶膠 4 1,氣體可由該些第一排氣槽340向外排出以避免氣泡 殘留在該第一開口 3 3 1内,並可藉由該黏晶膠4 1之填 19 200950010 入該些第一排氣槽340以增加該通用型基板3〇〇之黏著 效果。該些第一排氣槽340之該些延伸端341係能阻擋 該黏晶膠41流動到該第二開口 332與該第三開口 333, 故能避免該些第二組接指322與該些第三組接指323被 該黏晶膠41的溢膠污染。 前述的通用型基板300係可運用於承載小尺寸晶片 並組成為一半導體封裝構造。該通用型基板3 〇〇在設置 e —小尺十晶片之後係例舉說明於第5A圖之表面示意 圖。一種包含該通用型基板300與小尺寸晶片之半導體 封裝構造係例舉說明於第5B圖之截面示意圖。 該半導體封裝構造主要包含前述的通用塑基板 3 0 〇、一小尺寸晶片5 〇、一黏晶膠6 J、複數個第一銲線 6 2以及複數個第二銲線6 3。該小尺寸晶片5 〇係設置於 該通用塑基板300上,並具有一較小的記憶體容量,約 為前述大尺寸晶片30的一半尺寸。該小尺寸晶片5〇係 ® 位於該些第一組接指3 2 1與該些第三組接指3 2 3之間’ 該小尺寸晶片50係具有複數個第一銲墊51與複數個第 二銲墊52,其係可形成於該小尺寸晶片5〇之一主動面 5 3。在黏晶之後,設置於該通用型基板3 〇〇上的該小尺 寸晶片5 0係不覆蓋該些第一組接指3 2丨與該第一開口 331 ’該些第一銲墊51係鄰近該些第一組接指321,該 些第二銲墊52係鄰近該些第三組接指323。 請參閱第5 B圖所示’該黏晶膠61係黏接該小尺寸 晶片50之一背面54與該通用型基板3〇〇之該防焊層 20 200950010 330’該黏晶膠61係不填入該第一開口 331。該些第一 銲線62係電性連接該小尺寸晶片5〇之該些第一銲势 51至該通用型基板300之該些第一組接指321。該些第 二銲線63係電性連接該小尺寸晶片50之該些第二銲塾 52至該通用型基板300之該些第三組接指323。 如第5B圖所示,一封膠體64係形成於該通用型基 板300上以密封該小尺寸晶片50、該些第一銲線62與 ❹ 該些第一知線63’其中該黏晶膠61係填入該些第一排 氣槽340在該小尺寸晶片50下的局部區域,該封膠體 64則填入該些第一排氣槽340之剩餘區域,該封膠體 64更填入該第一開口 331。 如第5B圖所示,較佳地,該半導體封裝構造可另包 含一虛晶片70,其尺寸係可概等於該小尺寸晶片5〇之 尺寸。該虛晶片70係設置於該通用型基板3〇〇上並位 於該些第一組接指321與該些第二組接指322之間,使 〇 在封膠過程中達到模流平衡。 依據本發明之第二具體實施例,另一種半導體封裝 之通用型基板舉例說明於第6入圖之基板表面示意圖及 第6B圖之截面示意圖。該通用型基板4〇〇之基本架構 係與第一具體實施例相同,相同元件係以相同圖號表示 之,並不再贅述。該通用型基板4〇〇主要元件為該基板 本體3 1 〇該些第一組接指3 2 1、該些第二組接指3 2 2、 該些第三組接指^ 9 ^Electrical interconnection, without the need to wire to the second set of fingers, thereby shortening the length of the fresh line. [Embodiment] According to a first embodiment of the present invention, a general-purpose substrate of a semiconductor package is illustrated in a schematic view of a surface of FIG. 3A, a schematic cross-sectional view of the same, and a perspective view of FIG. 3C. The invention includes a substrate body 31〇, a plurality of first set of fingers 321, a plurality of second sets of fingers 322, a plurality of third sets of fingers w and a solder mask layer 33〇. Referring to Figure 3A, the substrate body 3 has a surface 311' as a bearing surface on which the wafer is placed. The surface 3" can have a - edge, edge 312, a second edge 313, a third edge 314, and a fourth edge %. In this embodiment, the second edge 3 13 and the third edge 314 are parallel to each other, and the first edge 312 and the fourth edge 315 are parallel to each other, and the first edge 312 is connected to the second edge Edge 313 and the third edge 314. The fourth edge 3丨5 is also connected to the second edge 313 and the third edge 314. Referring to the 3A®, the first set of fingers 321, the second set of fingers 322 and the third set of fingers 323 are disposed on the surface of the substrate 14 200950010 body 310. However, it should be understood that the number of tailu groups is not exemplified by the three groups in the figure _ # Ί m Α 11 ‘, the electrical design of the actual substrate is increased by s or adjusted. The first η ^ η - μ ^ ^ and the buckle 3 21 are located between the second set of buckles 322 and the third set of connected embodiments, and the second sets are connected to each other. In the present, the ugly money 322 and the third system generally refer to the first group of fingers 321 , the temple is electrically connected to the 4b second group of fingers 3 22 heavy distribution fingers. One of the two first sets of fingers 排列 is arranged in the center of the surface 3 1 1 'the central & The second set of fingers 322 can be arranged on the second edge 313 of the surface 311 of the substrate body 31. The second set of fingers 323 are arbitrarily > β + arranged on the third edge 314 of the surface 311 of the substrate body 310. The first group of fingers 322 and the third group of fingers 322 may be an e bonding pad, the first group of fingers 321 , the first group of fingers 322 and The materials of the third set of fingers 323 may be copper. In this embodiment, the surface of the first set of fingers 321 , the second plate fingers 322 and the third set of fingers 323 may be plated with a plating layer 380 for adding semiconductor sealing products. In the middle of the electrical connection with the wire bonding force. The material of the electric ore layer 380 can be selected for use in silver, gold, tin, palladium, tin, lead and tin. Referring to FIGS. 3A, 3B, and 3C, the solder resist layer is formed on the surface 311 of the substrate body 310. The solder resist layer 33 has a first opening 331 to reveal the first surface. The contact pin 321 has a second opening 332 and a third opening 333 as shown in FIG. 3A to respectively expose the second set of fingers 322 and 15 200950010. The third opening 332 and the third opening 3 3 3 may be a closed opening or an open notch. In this embodiment, the second opening 3 3 2 and the third opening 3 3 3 The closed perimeter openings are respectively adjacent to the second edge 3 1 3 and the third edge 3 1 4. The solder resist layer 330 can be selected from a cover iayer or a solder mask layer (s〇ider) One of the masks may be formed by film pressing or printing and then developing by exposure to develop a pattern. 凊 Referring to Figures 3A and 3B, a plurality of first exhaust slots are shown. 340 is formed on one exposed surface 334 of the solder resist layer 330 but does not penetrate the solder resist layer 330, and the first exhaust slots 340 are connected to the first open And extending to the side of the surface 311 of the substrate body 310 (ie, the second edge 313 and the third edge 314) but not communicating to the second opening for exposing the second set of fingers 322 332 and the third opening 333 for revealing the second set of fingers 32; 3. Typically, but not limited to, the first exhaust slots 340 can be formed by laser to facilitate control The first exhaust groove 340 is formed so as not to penetrate the solder resist layer 330' to avoid exposing the lines 350. As shown in FIG. 3A, the first exhaust grooves 340 are not connected to the second opening 332. And the third opening 333' to prevent the adhesion of the adhesive to the second set of fingers 322 and the second set of fingers 3 2 3 . In the embodiment, the first exhaust slots 40 The length of the first exhaust groove 340 is connected to the longer side of the first opening 3 3 1 . The extended ends 341 of the first exhaust grooves 3 4 are beyond a large one. The coverage area of the size wafer 3〇, for the gas in the subsequent spotting process, the gas may be discharged from the first exhaust grooves 34 to the outside of the circle <0 200950010 without The plurality of extended ends 341 of the first exhaust grooves 340 may include a plurality of closed groove ends stopped in the solder resist layer 330 to limit the adhesion of the glue. In addition, the general-purpose substrate 300 may further include a plurality of wires 35 〇 formed on the surface 311 of the substrate substrate 310 and connected to the first group of fingers 321 and the second group of fingers 322 . The solder resist layer 33 further covers the lines 350. Therefore, the first group of fingers 321 can serve as the redistribution fingers of the plurality of fingers 322. As shown in FIG. 3B, the lines 305, 3, the first group of fingers 3 2 1 , the second group of fingers 3 2 2, and the second group of fingers 323 may be the same layer. Line layer. Therefore, in addition to the large-size wafer, the second type of fingers 322 can be electrically connected to the universal substrate 300, and the small-sized wafer can be directly realized by the first-group fingers 32 1 . The electrical interconnection of the substrate 3 can further shorten the length of the bonding wire, so the general-purpose substrate 3 can be applied to wafers of different sizes to save the manufacturing cost of the substrate. In addition, since the lines 350 are covered by the solder resist layer 330, the lines 35 are not exposed to the first exhaust grooves 34 and are not formed in the first exhaust grooves 340. The plating layer 38〇 not only reduces the plating area to reduce the cost, but also prevents the first exhaust grooves 34 from being blocked. As shown in FIG. 3A, in the embodiment, the first exhaust grooves 340 and the lines 35 may be misaligned and overlap, so that the formation depth of the first exhaust grooves 340 may be increased. These lines 350 are also not revealed. For example, as shown in Fig. 3B, one of the bottom surfaces 342 of the first exhaust grooves 34 may be no higher than the lines 35, so that the gas produced in the process of the die-bonding process can be discharged more smoothly. More specifically, at least one air channel 360 is connectable to the first opening 331 and extends toward the first edge 312 of the surface 311 of the substrate to increase the viscous venting effect. The second exhaust slot 360 is connected to the first opening 331 at a side of the first opening 331 adjacent to the first edge 312. The other end of the first exhaust slot 360 is connectable to the first 312. At least one second exhaust slot 370 is connectable to the first opening and extends toward the fourth edge 3 of the surface 311 of the substrate body 310. The above-mentioned general-purpose substrate 300 can be used to carry a large size and composed of a semiconductor package structure, such as a memory card, a ball grid array structure (BGA) or a planar array package structure (LGA). After a large size wafer, a schematic diagram of the surface of Figure 4A is illustrated. A semiconductor package structure including the general-purpose substrate 300-size wafer is exemplified in a 4B cross-sectional view. The semiconductor package structure is intended to include the above-described general-purpose type 300, the large-sized wafer 30, a die bond 41, a plurality of first portions 42, and a plurality of second bonding wires 43. The large-sized wafer 3 is mounted on the universal substrate 300, and has a large memory capacity. The large-sized wafer 30 has a plurality of sleeves and a double-tied first pad 31. And a plurality of pads 32, which may be formed on one of the large/eight-size wafers 30, and as the bulk of the large-sized wafers 3/(.), the external electrodes are placed on the general-purpose substrate after the die-bonding The large-sized wafer 30 of the trousers on the 300 is covered by two rows: a shorter edge of 310. The extended wafer is sealed with a substrate bonding wire of the type shown in the first and larger drawings. The second contact 33 is provided with the first set of fingers 321 and the first opening 331. The first pads 31 are adjacent to the second set of fingers 322, and the second pads 32 The extension ends 314 of the first venting grooves 340 extend beyond the large-sized wafer 30. Generally, the material of the adhesive 4 1 is Epoxy resin or other adhesive material that can flow under heating is used. The setting of the large-size wafer 30 is made by bonding the adhesive glue 4 1 The back surface 34 of one of the wafers 30 and the solder resist layer 300 of the general-purpose substrate 300 ^, and the adhesive glue 4 1 is further filled into the first opening 33 1 and the first exhaust grooves 340 The first bonding wires 42 are electrically connected to the first pads 31 of the large-sized wafers 30 to the second groups of fingers 322 of the universal substrate 300. The second bonding wire 43 is electrically connected to the second pads 32 of the large-sized wafer 30 to the third group of fingers 323 of the universal substrate 300. As shown in FIG. 4B, the semiconductor package structure An adhesive φ body 44 may be further formed on the general-purpose substrate 300 to seal the large-sized wafer 30, the first bonding wires 42 and the second bonding wires 43, wherein the bonding adhesive 4 1 is filled in a partial area of the first exhaust groove 340 under the large-sized wafer 30, and the sealant 44 is filled in the remaining area of the first exhaust grooves 340. In the die-bonding process, the large The size wafer 30 is pressed down to the general-purpose substrate 300 to press the viscous gel 4 1 which is not cured and has fluidity, and the gas may be directed to the first exhaust grooves 340 Discharging to prevent air bubbles from remaining in the first opening 313, and filling the first venting grooves 340 by filling the adhesive 19 1 into the first venting groove 340 to increase the adhesion of the universal substrate 3 The extension ends 341 of the first exhaust grooves 340 can block the flow of the adhesive 41 to the second opening 332 and the third opening 333, so that the second set of fingers 322 can be avoided. The third set of fingers 323 are contaminated by the glue of the adhesive 41. The aforementioned general-purpose substrate 300 can be used to carry small-sized wafers and be composed into a semiconductor package structure. The general-purpose substrate 3 is exemplified in the surface of Fig. 5A after the e-small-scale wafer is disposed. A semiconductor package structure including the general-purpose substrate 300 and a small-sized wafer is exemplified in a cross-sectional view taken in Fig. 5B. The semiconductor package structure mainly comprises the above-mentioned general plastic substrate 30 〇, a small-sized wafer 5 〇, a viscous gel 6 J, a plurality of first bonding wires 6 2 and a plurality of second bonding wires 63. The small-sized wafer 5 is disposed on the general-purpose plastic substrate 300 and has a small memory capacity of about half the size of the aforementioned large-sized wafer 30. The small-sized wafer 5 is located between the first set of fingers 3 2 1 and the third set of fingers 3 2 3 'The small-sized wafer 50 has a plurality of first pads 51 and a plurality of The second pad 52 is formed on one of the active surfaces 53 of the small-sized wafer 5 . After the die bonding, the small-sized wafers 50 disposed on the general-purpose substrate 3 不 do not cover the first set of fingers 3 2 丨 and the first openings 331 ′ the first pads 51 Adjacent to the first set of fingers 321 , the second pads 52 are adjacent to the third set of fingers 323 . Referring to FIG. 5B, the adhesive layer 61 is adhered to the back surface 54 of the small-sized wafer 50 and the solder resist layer 20 of the general-purpose substrate 3 200950010 330. The first opening 331 is filled in. The first bonding wires 62 are electrically connected to the first soldering potentials 51 of the small-sized wafers 5 to the first group of fingers 321 of the universal substrate 300. The second bonding wires 63 are electrically connected to the second bonding pads 52 of the small-sized wafer 50 to the third group of fingers 323 of the universal substrate 300. As shown in FIG. 5B, a glue 64 is formed on the universal substrate 300 to seal the small-sized wafer 50, the first bonding wires 62, and the first first wires 63'. 61 is filled in a partial area of the first venting groove 340 under the small-sized wafer 50, and the sealing body 64 is filled in the remaining area of the first venting grooves 340, and the sealing body 64 is further filled in the The first opening 331. As shown in Fig. 5B, preferably, the semiconductor package structure may further comprise a dummy wafer 70 having a size substantially equal to the size of the small-sized wafer. The dummy wafer 70 is disposed on the universal substrate 3A and located between the first set of fingers 321 and the second set of fingers 322 to achieve mold flow balance during the sealing process. According to a second embodiment of the present invention, a general-purpose substrate of another semiconductor package is illustrated in a schematic view of the surface of the substrate in FIG. 6 and a schematic cross-sectional view of FIG. 6B. The basic structure of the general-purpose substrate 4 is the same as that of the first embodiment, and the same components are denoted by the same reference numerals and will not be described again. The main component of the universal substrate 4 is the substrate body 3 1 , the first set of fingers 3 2 1 , the second set of fingers 3 2 2, and the third set of fingers ^ 9 ^

_ 知323以及該防焊層33 0。請參閱第6B 圖所示,該4b篦一紐杜 —弟組接指321係位於該些第二組接指 21 200950010 322與該些第三組接指323之間。該防焊層33〇之該第 一開口 331係顯露該些第一組接指321。該防焊層 另具有一第二開口 332與一第三開口 333,以分別顯露該些 第二組接指322與該些第三組接指323。在本實施例 中,該第二開口 332與該第三開口 333係為分別連通到該 第二邊緣313與該第三邊緣314之開放型周邊缺口。如 同第一實施例這般,該些第一排氣槽34〇係形成於該防 ❹ 焊層330之顯露表面334但不貫穿該防焊層330,該歧 第一排氣槽3 40係連接該第一開口 3 3丨並往該基板本體 310之該表面311之侧邊(即該第二邊緣313與該第三邊 緣314)延伸但不連通到該第二開口 332與該第三開口 333 ° 如第6A圖所示,至少一連通槽49〇係可形成於該防 悍層330之該顯露表面334並連通該些第一排氣槽 340’以構成網狀通道,故可互通排氣。 Φ 如第6B圖所示,該通用型基板400另包含之該些線 路350係形成於該基板本體31〇之該表面311並連接該 些第一組接指321與該些第二組接指322,該防焊層330 更覆蓋該些線路3 5 0。在本實施例中,該些第一排氣槽 340之一底面442係可高於該些線路350。因此,至少 一之該些第一排氣槽340係可與至少一之該些線路35〇 係交錯重疊亦不會顯露該些線路35〇,能增加該些第一 排氣槽340的配置彈性。在本實施例中,該些第一排氣 槽340之其中至少一個係可完全重疊在一線路35〇之 22 200950010 上。 依據本發明之第三具體實施例,另一種半導體封裴 之通用型基板舉例說明於第7圖之基板表面示意圖。該 通用型基板500之基本架構係大致與第一具體實施例 相同,相同元件以相同圖號表示之,並不再贅述。該通 用型基扳500之主要元件為該基板本體31〇、該些第一 組接指321、該些第二組接指322、該些第三組接指 ❹ 以及該防焊層3 3 0。該防焊層3 3 〇之該第一開口 3 3 i係 顯露該些第一組接指321,該防焊層33〇之該第二開口 332係顯露該些第二組接指322,該防焊層33〇之該第 二開口 333係顯露該些第三組接指323。同樣地,該些 第一排氣槽340係形成於該防焊層33〇之顯露表面但不 貫穿該防焊層3 3 0,該些第一排氣槽34〇係連接該第一 開口 33 1並往該基板本體3丨〇之該表面3丨丨之側邊(即 該第二邊緣313與該第三邊緣314)延伸但不連通到該 ^ 第二開口 332與該第三開口 333。在本實施例中,該些 相鄰第一排氣槽340之延伸端541係可互連為u形以 形成溢膠回流通道。如第7圖所示’該通用型基板5〇〇 另包含之該些線路350係被該防焊層33〇覆蓋。在本實 施例中,其中一第一排氣槽34〇係可部分重疊在該些線 路350之上。 如第8圖所示,一第一具體實施例之變化例中,該 防焊層330係更具有複數個溢膠儲存槽3 3 5,其係連接 至該些第一排氣槽340之該些延伸端341。該些溢膠儲 23 200950010 存槽335係可貫穿該防焊層33〇,或者該些溢膠儲存槽 335可不貫穿該防焊層33〇。該些溢膝儲存槽335的形 狀係可為圓形或矩形。在一具體實施例中,該些溢膠儲 存槽335係可為貫穿該防焊層330之虛置開口。在黏晶 過程中,即使溢膠超出該些延伸端341可阻擂之範圍, 仍可藉由該些溢醪儲存槽3 3 5防止溢膠範圍持續擴大。 此外,本發明尚可應用到一般的封裝基板,其防焊 φ 層同時具有中央開口與周邊開口,而中央開口完全形成 於晶片覆蓋區内,利用複數個形成於防焊層之排氣槽不 貫穿該防焊層並且連接該中央開口並往該基板本體之 該表面之側邊延伸但不連通到該周邊開口,可以解決中 央開口内積存氣泡與黏晶膠溢膠污染到周邊開口的問 題。 以上所述’僅是本發明的較佳實施例而已,並非對 本發明作任何形弍上的限制,本發明技術方案範圍當依 ® 所附申請專利範圍為準。任何熟悉本專業的技術人員可 利用上述揭示的技術内容作出些許更動或修飾為等同 變化的等效實施例’但凡是未脫離本發明技術方案的内 容,依據本發明的技術實質對以上實施例所作的任何簡 單修改、等同變化與修飾’均仍屬於本發明技術方案的 範圍内。 【圖式簡單說明】 第1A與iB圖.為一種1知半導體封裝構造透視封膝 體之基板表面示意圖與截面示意圖。 24 200950010 第2A與2B圖:為另一種習知半導體封裝構造透視封 膠體之基板表面示意圖與截面示意圖。 第3A、3B與3C圖:為依據本發明第一具體實施例的 一種半導體封裝的通用型基板之表面示意 圖、截面示意圖以及立體示意圖。 第4A圖:為依據本發明第一具體實施例的一種半導體 封裝的通用型基板在設置一大尺寸晶片之後 之表面示意圖。 第4B圖:為依據本發明第一具體實施例的一種包含通 用型基板與大尺寸晶片之半導體封裝構造之 截面示意圖。 第5A圖:為依據本發明第一具體實施例的一種半導體 封裝的通用型基板在設置一小尺寸晶片與一 虛晶片之後之表面不意圖。 第5B圖:為依據本發明第一具體實施例的一種包含通 φ 用型基板、小尺寸晶片與虛晶片之半導體封裝 構造之截面示意圖。 第6A與6B圖:為依據本發明第二具體實施例的一種 半導體封裝的通用型基板之表面示意圖與截 面示意圖。 第7圖:為依據本發明第三具體實施例的另一種半導體 封裝的通用型基板之表面示意圖。 第8圖:為依據本發明第四具體實施例的另一種半導體 封裝的通用型基板之表面示意圖。 25 200950010 【主要元件符號說明】_ 323 and the solder resist layer 33 0. Referring to FIG. 6B, the 4b 篦 纽 杜 — 321 321 321 is located between the second set of fingers 21 200950010 322 and the third set of fingers 323. The first opening 331 of the solder resist layer 33 exposes the first set of fingers 321 . The solder resist layer further has a second opening 332 and a third opening 333 for respectively exposing the second set of fingers 322 and the third set of fingers 323. In this embodiment, the second opening 332 and the third opening 333 are respectively connected to the open peripheral notches of the second edge 313 and the third edge 314. As in the first embodiment, the first exhaust slots 34 are formed on the exposed surface 334 of the solder resist layer 330 but do not penetrate the solder resist layer 330. The first exhaust slots 34 are connected. The first opening 3 3 延伸 extends to the side of the surface 311 of the substrate body 310 (ie, the second edge 313 and the third edge 314 ) but does not communicate with the second opening 332 and the third opening 333 . As shown in FIG. 6A, at least one communication groove 49 can be formed on the exposed surface 334 of the anti-snagging layer 330 and communicates with the first exhaust grooves 340' to form a mesh channel, so that the exhaust can be exhausted. . Φ, as shown in FIG. 6B, the circuit 350 is further formed on the surface 311 of the substrate body 31 and connects the first set of fingers 321 and the second set of fingers. 322, the solder resist layer 330 further covers the lines 350. In this embodiment, one of the bottom surfaces 442 of the first exhaust slots 340 can be higher than the lines 350. Therefore, at least one of the first exhaust slots 340 can be interlaced with at least one of the lines 35 and the lines 35 are not exposed, and the configuration flexibility of the first exhaust slots 340 can be increased. . In this embodiment, at least one of the first exhaust slots 340 may be completely overlapped on a line 35〇200950010. In accordance with a third embodiment of the present invention, another semiconductor packaged universal substrate is illustrated in the schematic view of the substrate surface of Figure 7. The basic structure of the general-purpose substrate 500 is substantially the same as that of the first embodiment, and the same components are denoted by the same reference numerals and will not be described again. The main components of the universal base plate 500 are the substrate body 31, the first set of fingers 321, the second set of fingers 322, the third set of fingers, and the solder resist layer 3 3 0 . The first opening 3 3 i of the solder resist layer 3 3 exposes the first set of fingers 321 , and the second opening 332 of the solder resist layer 33 exposes the second set of fingers 322 . The second opening 333 of the solder resist layer 33 exposes the third set of fingers 323. Similarly, the first exhaust slots 340 are formed on the exposed surface of the solder resist layer 33 but do not penetrate the solder resist layer 310, and the first exhaust slots 34 are connected to the first opening 33. 1 and extending to the side of the surface 3 of the substrate body 3 (ie, the second edge 313 and the third edge 314) but not to the second opening 332 and the third opening 333. In this embodiment, the extended ends 541 of the adjacent first exhaust slots 340 are interconnected in a u-shape to form an overflow return passage. As shown in Fig. 7, the common substrate 5 is further covered by the solder resist layer 33. In this embodiment, a first exhaust slot 34 may partially overlap the lines 350. As shown in FIG. 8 , in a variation of the first embodiment, the solder resist layer 330 further has a plurality of overflow storage tanks 335 , which are connected to the first exhaust slots 340 . Some extension ends 341. The overflow reservoirs 23 200950010 reservoirs 335 may extend through the solder mask layer 33 or the overfill reservoirs 335 may not extend through the solder mask layer 33. The shape of the overflow knee storage tank 335 may be circular or rectangular. In a specific embodiment, the overflow storage tanks 335 can be dummy openings extending through the solder resist layer 330. In the process of the viscous crystal, even if the overflowing glue exceeds the range in which the extending ends 341 can be blocked, the overflowing range can be prevented from continuing to expand by the overflow storage tanks 335. In addition, the present invention is applicable to a general package substrate, wherein the solder resist φ layer has both a central opening and a peripheral opening, and the central opening is completely formed in the wafer covering area, and a plurality of vent grooves formed in the solder resist layer are not used. Through the solder resist layer and connecting the central opening and extending to the side of the surface of the substrate body but not communicating to the peripheral opening, the problem of accumulation of bubbles and adhesive glue overflowing into the peripheral opening in the central opening can be solved. The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. The scope of the present invention is defined by the scope of the appended claims. Any person skilled in the art can make some modifications or modifications to the equivalent embodiment by using the technical content disclosed above. However, without departing from the technical solution of the present invention, the above embodiments are made according to the technical essence of the present invention. Any simple modifications, equivalent changes and modifications are still within the scope of the technical solutions of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1A and FIG. 1B are schematic diagrams showing the surface of a substrate and a cross-sectional view of a substrate in a perspective view of a semiconductor package structure. 24 200950010 Figures 2A and 2B: Schematic and cross-sectional views of a substrate surface of another conventional semiconductor package structure. 3A, 3B, and 3C are schematic, cross-sectional, and perspective views of a general-purpose substrate of a semiconductor package in accordance with a first embodiment of the present invention. Fig. 4A is a schematic view showing the surface of a general-purpose substrate of a semiconductor package in accordance with a first embodiment of the present invention after a large-sized wafer is disposed. Fig. 4B is a schematic cross-sectional view showing a semiconductor package structure including a general-purpose substrate and a large-sized wafer in accordance with a first embodiment of the present invention. Fig. 5A is a view showing the surface of a general-purpose substrate of a semiconductor package in accordance with a first embodiment of the present invention after a small-sized wafer and a dummy wafer are disposed. Fig. 5B is a schematic cross-sectional view showing a semiconductor package structure including a substrate for a φ, a small-sized wafer, and a dummy wafer in accordance with a first embodiment of the present invention. 6A and 6B are schematic cross-sectional views and cross-sectional views showing a general-purpose substrate of a semiconductor package in accordance with a second embodiment of the present invention. Figure 7 is a schematic view showing the surface of a general-purpose substrate of another semiconductor package in accordance with a third embodiment of the present invention. Figure 8 is a schematic view showing the surface of a general-purpose substrate of another semiconductor package in accordance with a fourth embodiment of the present invention. 25 200950010 [Main component symbol description]

11 晶片 12 黏晶膠 12A 13 第一銲線 14 第二銲線 15 21 晶片 22 黏晶膠 22A 23 第一銲線 24 第二銲線 25 30 大尺寸晶片 3 1 第一銲墊 32 33 主動面 34 背面 41 黏晶膠 42 第一銲線 43 44 封膠體 50 小尺寸晶片 51 第一銲墊 52 53 主動面 54 背面 61 黏晶膠 62 第一銲線 63 64 封膠體 70 虛晶片 100 基板 110 基板本體 111 表面 121 第一組接指 122 第二組接指 123 130 防焊層 131 開口 132 133 開口 200 基板 210 基板本體 211 表面 221 第一組接指 222 第二組接指 223 230 防焊層 231 開口 232 233 開口 235 延伸開口 250 線路 280 電鍍層 第三組接指 開口 第三組接指 開口 氣泡 封膠體 溢膠 封膠體 第二銲墊 第二銲線 第二銲墊 第二銲線 26 200950010 300 通用型基板 310 基板本體 311 表面 312 第一邊緣 313 第二邊緣 3 14 第三邊緣 315 第四邊緣 321 第一組接指 322 第二組接指 323 第三組接指 330 防焊層 331 第一開口 332 第二開口 333 第三開口 334 顯露表面 335 溢膠儲存槽 340 第一排氣槽 341 延伸端 342 底面 350 線路 360 第二排氣槽 370 第三排氣槽 380 電鍍層 400 通用型基板 442 底面 490 連通槽 500 通用型基板 541 延伸端 參 2711 wafer 12 adhesive 12A 13 first bonding wire 14 second bonding wire 15 21 wafer 22 adhesive bonding 22A 23 first bonding wire 24 second bonding wire 25 30 large size wafer 3 1 first bonding pad 32 33 active surface 34 Back 41 Adhesive 42 First wire 43 44 Seal 50 Small size wafer 51 First pad 52 53 Active side 54 Back 61 Adhesive 62 First wire 63 64 Encapsulant 70 Virtual wafer 100 Substrate 110 Substrate Body 111 surface 121 first set of fingers 122 second set of fingers 123 130 solder resist layer 131 opening 132 133 opening 200 substrate 210 substrate body 211 surface 221 first set of fingers 222 second set of fingers 223 230 solder mask 231 Opening 232 233 opening 235 extension opening 250 line 280 plating layer third group finger opening third group finger opening bubble sealing body overflow rubber sealing body second bonding pad second bonding wire second bonding pad second bonding wire 26 200950010 300 Universal substrate 310 substrate body 311 surface 312 first edge 313 second edge 3 14 third edge 315 fourth edge 321 first set of fingers 322 second set of fingers 323 third Contact 330 solder resist layer 331 first opening 332 second opening 333 third opening 334 exposed surface 335 overflow storage tank 340 first exhaust slot 341 extended end 342 bottom surface 350 line 360 second exhaust slot 370 third exhaust Slot 380 Plating layer 400 Universal substrate 442 Bottom surface 490 Connecting groove 500 Universal substrate 541 Extended end reference 27

Claims (1)

200950010 十、申請專利範圍: 1、一種半導體封裝之通用型基板,包含: 一基板本體’係具有一表面; 複數個第-組接指,係設置於該基板本體之該表面; 複數個第二組接指,係設置於該基板本體之該表面; 複數個第二組接指,係設置於該基板本體之該表面,其 中該些第一組接指係位於該些第二組接指與該些第三組 _ 接指之間;以及 一防烊層,係形成於該基板本體之該表面,該防焊層係 具有第一開口、一第二開口與一第三開口,以分別顯 露該些第一組接指、該些第二組接指與該些第三組接指; 其中,複數個第一排氣槽係形成於該防焊層之一顯露表 面但不貫穿該防焊層,該些第一排氣槽係連接該第一開 口並往該基板本體之該表面之側邊延伸但不連通到該第 一開口與該第三開口。 ® 2、如申請專利範圍第1項所述之半導體封裝之通用型基 板,另包含複數個線路’其係形成於該基板本體之該表 面並連接該些第一組接指與該些第二組接指,該防焊層 更覆蓋該些線路。 3、 如申請專利範圍第2項所述之半導體封裝之通用型基 板’其中該些第一排氣槽與該些線路係為錯位不重疊。 4、 如申請專利範圍第3項所述之半導體封裝之通用型基 板’其中該些第一排氣槽之一底面係不高於該些線路。 5、 如申請專利範圍第2項所述之半導體封裝之通用型基 28 200950010 板’其中該些第—排氣槽之一底面係高於該些線路。 6、 如申請專利範圍第5項所述之半導體封裝之通用型基 板,其中至少一之該些第一排氣槽係與至少一之該些線 路交錯重疊但不顯露該些線路。 7、 如申請專利範圍第i項所述之半導體封裝之通用型基 板,其中該些第-排氣槽之該些延伸端係包含複數個停 止在該防谭層内之封閉槽端。 ❹8、如巾料利範圍第1項所述之半導體職之通用型基 板其中至v一連通槽係形成於該防焊層之該顯露表面 並連通該些第一排氣槽,以構成網狀通道。 9、 如申請專利範㈣丨項所述之半導體封裝之通用型基 板其中該些相鄰第一排氣槽之延伸端係互連為u形。 10、 如宇請專利範圍第2項所述之半導體封裝之通用型基 板,其中該基板本體之該表面係具有一第一邊緣、一第 二邊緣以及-第三邊,緣’該第二邊緣與該第三邊緣係為 ® 平行,該第一邊緣係連接該第二邊緣與該第三邊緣,其 中該些第二組接指係排列於該基板本體之該表面之該第 二邊緣,該些第三組接指係排列於該基板本體之該表面 之該第二邊緣,該些第一組接指係為該些第二組接指之 重分配接指而排列於該基板本體之該表面之中央。 11、 如申請專利範圍第10項所述之半導體封裝之通用型基 板,其中至少一第二排氣槽,其係連接該第一開口並往 該基板本體之該表面之該第一邊緣延伸。 12、 如申請專利範圍第11項所述之半導體封裝之通用型基 29 200950010 板’其中至少一第三排氣槽,其係連接該第一開口並往 該基板本體之該表面之一第四邊緣延伸。 13、 如申請專利範圍第1〇項所述之半導體封裝之通用型基 板,其中該第二開口與該第三開口係為分別鄰近於 該第二邊緣與該第三邊緣之封閉型周邊開口。200950010 X. Patent Application Range: 1. A general-purpose substrate for a semiconductor package, comprising: a substrate body having a surface; a plurality of first-group fingers disposed on the surface of the substrate body; The plurality of fingers are disposed on the surface of the substrate body, and the plurality of second fingers are disposed on the surface of the substrate body, wherein the first group of fingers are located in the second group of fingers Between the third group of _ fingers; and a tamper-proof layer formed on the surface of the substrate body, the solder resist layer has a first opening, a second opening and a third opening to respectively reveal The first set of fingers, the second set of fingers and the third set of fingers; wherein the plurality of first exhaust slots are formed on one of the solder resist layers exposed surface but not through the solder resist And a first exhaust groove connecting the first opening and extending to a side of the surface of the substrate body but not communicating to the first opening and the third opening. 2. The general-purpose substrate of the semiconductor package of claim 1, further comprising a plurality of lines formed on the surface of the substrate body and connecting the first set of fingers and the second In the group, the solder mask further covers the lines. 3. The general-purpose substrate of the semiconductor package of claim 2, wherein the first exhaust grooves and the circuit lines are misaligned and do not overlap. 4. The general-purpose substrate of the semiconductor package of claim 3, wherein one of the first exhaust grooves has a bottom surface not higher than the lines. 5. The general-purpose base of the semiconductor package of claim 2, wherein the bottom surface of one of the first venting grooves is higher than the lines. 6. The universal package of the semiconductor package of claim 5, wherein at least one of the first exhaust slots overlaps at least one of the lines but does not reveal the lines. 7. The general-purpose substrate of the semiconductor package of claim i, wherein the extension ends of the first venting grooves comprise a plurality of closed groove ends stopped in the anti-tank layer. ❹ 8. The general-purpose substrate of the semiconductor device according to item 1 of the scope of the invention, wherein the v-connecting groove is formed on the exposed surface of the solder resist layer and communicates with the first exhaust grooves to form a mesh aisle. 9. The general-purpose substrate of the semiconductor package of claim 4, wherein the extended ends of the adjacent first exhaust grooves are interconnected in a u-shape. 10. The general-purpose substrate of the semiconductor package of claim 2, wherein the surface of the substrate body has a first edge, a second edge, and a third edge, the second edge Parallel to the third edge system, the first edge is connected to the second edge and the third edge, wherein the second set of fingers are arranged on the second edge of the surface of the substrate body, The third set of fingers are arranged on the second edge of the surface of the substrate body, and the first set of fingers are arranged on the substrate body by the redistribution fingers of the second set of fingers The center of the surface. 11. The universal package of the semiconductor package of claim 10, wherein at least one second venting groove is coupled to the first opening and extends toward the first edge of the surface of the substrate body. 12. The general-purpose base 29 200950010 board of the semiconductor package of claim 11, wherein at least one third exhaust slot is connected to the first opening and to the fourth surface of the substrate body. The edge extends. 13. The general-purpose substrate of the semiconductor package of claim 1, wherein the second opening and the third opening are closed peripheral openings adjacent to the second edge and the third edge, respectively. 14、 如申請專利範圍第1〇項所述之半導體封裝之通用型基 板,其中該第二開口與該第三開口係為分別連通到該 第一邊緣與該第三邊緣之開放型周邊缺口。 15如申请專利範圍第1項所述之半導體封裝之通用型基 板,其中該防烊層係更具有複數個溢膠儲存槽,其係連 接至該些第一排氣槽之該些延伸端。 16如申请專利範圍第丨項所述之半導體封裝之通用型基 板,其中該些第一排氣槽係以雷射方式形成。 17、-種半導體封裝構造,包含如中請專利範圍第1項所 述之半導體封裝之通用型基板,該半導體封裝構造更包 含: :晶片,係設置於該通用型基板上並覆蓋該些第一組接 曰該曰曰片係'具有複數個第一鲜塾與複數個第二鲜塾; 一黏晶膠 防焊層, 氣槽; ,係黏接該晶片之—背面與該通用型基板之該 該黏晶膠係更填入該第一開口以及該些第一排 複數個第一銲線, 該通用型基板之該 複數個第二銲線, 係電性連接該晶片之該些第一銲墊 些第二組接指;以及 係電性連接該晶片之該些第二銲墊 至 至 30 200950010 該通用型基板之該些第三組接指。 18、 如申請專利範圍第17項所述之半導體封裝構造,其中 該些第一排氣槽之該些延伸端係延伸至該晶片之外。 19、 如申請專利範圍第17項所述之半導體封裝構造,另包 含一封膠體,其係形成於該通用型基板上以密封該晶 片、該些第一銲線與該些第二銲線,其中該黏晶膠係填 入s亥些第一排氣槽在該晶片下的局部區域,該封膠體則 _ 填入該些第一排氣槽之剩餘區域。 20、 如申請專利範圍第17項所述之半導體封裝構造,其中 该通用型基板另包含複數個線路,其係形成於該基板本 體之該表面並連接該些第一組接指與該些第二組接指, 該防焊層更覆蓋該些線路。 21、 一種半導體封裝構造,包含如申請專利範圍第i項所 述之半導體封裝之通用型基板,該半導體封裝構造更包 含: | 一晶片’係設置於該通用型基板上並位於該些第一組接 才曰與該些第三組接指之間,該晶片係具有複數個第一銲 墊與複數個第二銲墊; 黏晶膠’係黏接該晶片之一背面與該通用型基板之該 防知層’該黏晶膠係不填入該第一開口; 複數個第一銲線,係電性連接該晶片之該些第一銲墊至 該通用型基板之該些第一組接指;以及 複數個第二銲線’係電性連接該晶片之該些第二銲墊至 該通用型基板之該些第三組接指。 31 200950010 22 2314. The general-purpose substrate of the semiconductor package of claim 1, wherein the second opening and the third opening are open perimeter notches respectively communicating to the first edge and the third edge. The general-purpose substrate of the semiconductor package of claim 1, wherein the anti-corrosion layer further comprises a plurality of overflow storage tanks connected to the extension ends of the first exhaust grooves. The general-purpose substrate of the semiconductor package of claim 1, wherein the first exhaust grooves are formed in a laser manner. A semiconductor package structure comprising the general-purpose substrate of the semiconductor package according to claim 1, wherein the semiconductor package structure further comprises: a wafer disposed on the general-purpose substrate and covering the plurality of a set of the cymbal system 'having a plurality of first fresh sorghum and a plurality of second fresh sputum; a viscous glue solder resist layer, a gas groove; affixing the wafer to the back surface and the universal substrate The viscous gel is further filled into the first opening and the first plurality of first bonding wires, and the plurality of second bonding wires of the universal substrate are electrically connected to the first of the wafers a second set of fingers; and electrically connecting the second pads of the wafer to the third set of fingers of the universal substrate of 30 200950010. 18. The semiconductor package structure of claim 17, wherein the extended ends of the first exhaust slots extend beyond the wafer. 19. The semiconductor package structure of claim 17, further comprising a gel formed on the universal substrate to seal the wafer, the first bonding wires and the second bonding wires. Wherein the adhesive glue is filled in a partial area of the first exhaust groove under the wafer, and the sealant is filled into the remaining area of the first exhaust grooves. The semiconductor package structure of claim 17, wherein the general-purpose substrate further comprises a plurality of wires formed on the surface of the substrate body and connecting the first set of fingers and the first The two sets of fingers, the solder mask further covers the lines. A semiconductor package structure comprising the general-purpose substrate of the semiconductor package according to claim i, wherein the semiconductor package structure further comprises: a wafer is disposed on the general-purpose substrate and located at the first Between the assembly and the third set of fingers, the wafer has a plurality of first pads and a plurality of second pads; the adhesive is attached to the back surface of the wafer and the universal substrate The anti-knowledge layer 'the adhesive layer is not filled in the first opening; the plurality of first bonding wires are electrically connected to the first pads of the wafer to the first groups of the universal substrate And a plurality of second bonding wires ' electrically connecting the second pads of the wafer to the third group of fingers of the universal substrate. 31 200950010 22 23 24 含㈣21項所述之半㈣封裝構造,另包 片、m ?係形成於胃通用㉟基板上以密封該晶 入該線與該些第:銲線’其中該黏晶膠係填 ^ 氣槽在該晶片下的局部區域,該封膠體則 填入該些第一排名拖 氣槽之剩餘區域,該封膠體更填入該第 R3 τ-» ^ 二申二專利範圍第22項所述之半導體封裝構造,另包 虛日日片^係、設置於該通用㉝基板上並位於該些第 一組接指與該些第二組接指之間。 如申明專利範圍第21項所述之半導體封裝構造,其中 該通用型基板另包含複數個線路,其係形成於該基板本 體之該表面並連接該些第一組接指與該些第二組接指, 該防焊層更覆蓋該些線路。 25、一種基板,包含: 一基板本體,係具有一表面;24 containing (4) the half (four) package structure described in item 21, another package piece, m? system formed on the stomach common 35 substrate to seal the crystal into the line and the first: the welding wire 'where the adhesive crystal is filled The groove is in a partial area under the wafer, and the sealant is filled in the remaining area of the first ranking tow groove, and the sealant is further filled in the R3 τ-» ^2, claim 2, claim 22 The semiconductor package structure is further disposed on the universal 33 substrate and located between the first set of fingers and the second set of fingers. The semiconductor package structure of claim 21, wherein the general-purpose substrate further comprises a plurality of wires formed on the surface of the substrate body and connecting the first set of fingers and the second groups The solder mask further covers the lines. 25. A substrate comprising: a substrate body having a surface; 複數個接指,係設置於該基板本體之該表面;以及 一防焊層,係形成於該基板本體之該表面,該防焊層係 具有一中央開口與至少一周邊開口,以顯露該些接指; 其中,複數個排氣槽係形成於該防焊層之一顯露表面但 不貫穿該防焊層,該些排氣槽係連接該中央開口並往該 基板本體之該表面之側邊延伸但不連通到該周邊開口。 26、如申請專利範圍第25項所述之基板,其中該些排氣槽 之該些延伸端係包含複數個停止在該防焊層内之封閉槽 端。 32 200950010 27、如申請專利範圍笛 圍第25項所述之基板’其中至少-連通 …"於該防谭層之該顯露表面並連通該些排氣槽, 以構成網狀通道。 申明專利範圍第25項所述之基板,其中該些相鄰第 一排氣槽之延伸端係 互連為U形。 29、如中請專利範圍第^項所述之基板,其中該防焊層係 更具有複數個溢膠儲存槽,其係連接至該些第一排氣槽 ❹ 之該些延伸端。 、a plurality of fingers disposed on the surface of the substrate body; and a solder resist layer formed on the surface of the substrate body, the solder resist layer having a central opening and at least one peripheral opening to expose the plurality of contacts The plurality of exhaust slots are formed on one of the exposed surfaces of the solder resist layer but do not penetrate the solder resist layer, and the exhaust slots are connected to the central opening and to the side of the surface of the substrate body Extending but not communicating to the peripheral opening. The substrate of claim 25, wherein the extension ends of the venting grooves comprise a plurality of closed groove ends that are stopped in the solder resist layer. 32 200950010 27. The substrate of claim 25, wherein at least - connected to the exposed surface of the anti-tank layer and communicates with the venting grooves to form a mesh channel. The substrate of claim 25, wherein the extended ends of the adjacent first venting grooves are U-shaped. The substrate of claim 4, wherein the solder resist layer further comprises a plurality of overflow storage tanks connected to the extension ends of the first exhaust slots. , 3333
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108615715A (en) * 2018-07-11 2018-10-02 日月光半导体(昆山)有限公司 Semiconductor package and lead frame strip used by same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108615715A (en) * 2018-07-11 2018-10-02 日月光半导体(昆山)有限公司 Semiconductor package and lead frame strip used by same

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