TW200949237A - Substrate processing system, inspection apparatus and inspection method - Google Patents
Substrate processing system, inspection apparatus and inspection method Download PDFInfo
- Publication number
- TW200949237A TW200949237A TW098100739A TW98100739A TW200949237A TW 200949237 A TW200949237 A TW 200949237A TW 098100739 A TW098100739 A TW 098100739A TW 98100739 A TW98100739 A TW 98100739A TW 200949237 A TW200949237 A TW 200949237A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- inspection
- imaging
- inspected
- image
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Signal Processing (AREA)
- Computer Hardware Design (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Optics & Photonics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Liquid Crystal (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008133604A JP2009281835A (ja) | 2008-05-21 | 2008-05-21 | 基板処理システム、検査装置および検査方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200949237A true TW200949237A (en) | 2009-12-01 |
Family
ID=41452442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW098100739A TW200949237A (en) | 2008-05-21 | 2009-01-09 | Substrate processing system, inspection apparatus and inspection method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2009281835A (ko) |
KR (1) | KR101010497B1 (ko) |
TW (1) | TW200949237A (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104634781A (zh) * | 2015-02-07 | 2015-05-20 | 石河子大学 | 脱绒棉种加工生产线在线检测装置 |
JP2016156777A (ja) * | 2015-02-26 | 2016-09-01 | 住友電気工業株式会社 | 分光測定装置 |
WO2023008144A1 (ja) | 2021-07-27 | 2023-02-02 | コニカミノルタ株式会社 | 表示体、データ処理装置、データ処理方法及びプログラム |
WO2023008146A1 (ja) | 2021-07-27 | 2023-02-02 | コニカミノルタ株式会社 | 撮影条件調整装置、撮影条件調整方法及びプログラム |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000009436A (ja) * | 1998-06-19 | 2000-01-14 | Sumitomo Electric Ind Ltd | 円筒断面の偏肉測定装置及び測定方法 |
JP2001305075A (ja) * | 2000-04-21 | 2001-10-31 | Sharp Corp | 外観検査装置 |
JP2003243295A (ja) * | 2002-02-20 | 2003-08-29 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2005024271A (ja) * | 2003-06-30 | 2005-01-27 | Olympus Corp | 撮像制御方法及び基板検査装置 |
KR100838656B1 (ko) * | 2006-04-03 | 2008-06-16 | (주)쎄미시스코 | 유리기판의 품질 검사장치 |
JP2008014650A (ja) * | 2006-07-03 | 2008-01-24 | Olympus Corp | 表面欠陥検査装置 |
-
2008
- 2008-05-21 JP JP2008133604A patent/JP2009281835A/ja not_active Abandoned
-
2009
- 2009-01-09 TW TW098100739A patent/TW200949237A/zh unknown
- 2009-02-13 KR KR1020090011809A patent/KR101010497B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2009281835A (ja) | 2009-12-03 |
KR20090121188A (ko) | 2009-11-25 |
KR101010497B1 (ko) | 2011-01-21 |
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