TW200936789A - Cr-mn-b-based sputtering target material for producing substrate film in magnetic recording medium, and thin film produced using the same - Google Patents

Cr-mn-b-based sputtering target material for producing substrate film in magnetic recording medium, and thin film produced using the same Download PDF

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Publication number
TW200936789A
TW200936789A TW097136873A TW97136873A TW200936789A TW 200936789 A TW200936789 A TW 200936789A TW 097136873 A TW097136873 A TW 097136873A TW 97136873 A TW97136873 A TW 97136873A TW 200936789 A TW200936789 A TW 200936789A
Authority
TW
Taiwan
Prior art keywords
sputtering target
magnetic recording
film
recording medium
remaining part
Prior art date
Application number
TW097136873A
Other languages
English (en)
Chinese (zh)
Inventor
Toshiyuki Sawada
Atsushi Kishida
Akihiko Yanagitani
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of TW200936789A publication Critical patent/TW200936789A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/045—Alloys based on refractory metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7373—Non-magnetic single underlayer comprising chromium
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C2202/00—Physical properties
    • C22C2202/02—Magnetic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
TW097136873A 2007-09-25 2008-09-25 Cr-mn-b-based sputtering target material for producing substrate film in magnetic recording medium, and thin film produced using the same TW200936789A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007247181A JP2009079235A (ja) 2007-09-25 2007-09-25 磁気記録媒体における下地膜製造用Ｃｒ−Ｍｎ−Ｂ系スパッタリングターゲット材およびこれを用いて製造した薄膜

Publications (1)

Publication Number Publication Date
TW200936789A true TW200936789A (en) 2009-09-01

Family

ID=40511284

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097136873A TW200936789A (en) 2007-09-25 2008-09-25 Cr-mn-b-based sputtering target material for producing substrate film in magnetic recording medium, and thin film produced using the same

Country Status (3)

Country Link
JP (1) JP2009079235A (ja)
TW (1) TW200936789A (ja)
WO (1) WO2009041399A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2544495B (en) 2015-11-17 2018-12-05 Nexeon Ltd Surface modified electrochemically active material
WO2017085497A1 (en) 2015-11-17 2017-05-26 Nexeon Limited Functionalised electrochemically active material and method of functionalisation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3884932B2 (ja) * 2001-09-07 2007-02-21 株式会社日立グローバルストレージテクノロジーズ 磁気記録媒体及び磁気記憶装置
JP2003338027A (ja) * 2002-05-20 2003-11-28 Fuji Electric Co Ltd 磁気記録媒体
JP2004234718A (ja) * 2003-01-28 2004-08-19 Fuji Electric Device Technology Co Ltd 磁気記録媒体
JP3962415B2 (ja) * 2004-08-16 2007-08-22 昭和電工株式会社 磁気記録媒体および磁気記録再生装置
JP2006089776A (ja) * 2004-09-21 2006-04-06 Hitachi Metals Ltd Ｃｒ−Ｍｎ合金スパッタリング用ターゲット材

Also Published As

Publication number Publication date
WO2009041399A1 (ja) 2009-04-02
JP2009079235A (ja) 2009-04-16

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