TW200932362A - Positioning-type mask - Google Patents
Positioning-type mask Download PDFInfo
- Publication number
- TW200932362A TW200932362A TW97102193A TW97102193A TW200932362A TW 200932362 A TW200932362 A TW 200932362A TW 97102193 A TW97102193 A TW 97102193A TW 97102193 A TW97102193 A TW 97102193A TW 200932362 A TW200932362 A TW 200932362A
- Authority
- TW
- Taiwan
- Prior art keywords
- positioning
- mask
- thin plate
- substrate
- area
- Prior art date
Links
- 239000000463 material Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 11
- 238000002955 isolation Methods 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 10
- 238000007740 vapor deposition Methods 0.000 abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 10
- 238000000151 deposition Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
Landscapes
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW97102193A TW200932362A (en) | 2008-01-21 | 2008-01-21 | Positioning-type mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW97102193A TW200932362A (en) | 2008-01-21 | 2008-01-21 | Positioning-type mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200932362A true TW200932362A (en) | 2009-08-01 |
| TWI362228B TWI362228B (https=) | 2012-04-11 |
Family
ID=44865565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97102193A TW200932362A (en) | 2008-01-21 | 2008-01-21 | Positioning-type mask |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200932362A (https=) |
-
2008
- 2008-01-21 TW TW97102193A patent/TW200932362A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TWI362228B (https=) | 2012-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6035548B2 (ja) | 蒸着マスク | |
| TWI721170B (zh) | 蔽蔭遮罩沉積系統及其方法 | |
| JP7097821B2 (ja) | シャドーマスク堆積システム及びその方法 | |
| KR20140090267A (ko) | 증착 마스크, 증착 마스크 장치의 제조 방법, 및 유기 반도체 소자의 제조 방법 | |
| JP2015214741A (ja) | 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法 | |
| CN105358732A (zh) | 成膜掩模和成膜掩模的制造方法 | |
| CN107653436A (zh) | 掩膜板及其制作方法、蒸镀方法 | |
| WO2018223695A1 (zh) | 蒸镀掩膜板、套装蒸镀掩膜板、蒸镀系统和对位测试方法 | |
| CN104611668A (zh) | 用于掩膜板的框架和掩膜板 | |
| JP4335865B2 (ja) | シャドウマスクパターンの形成方法 | |
| WO2014069049A1 (ja) | 成膜マスク | |
| JP2015017308A (ja) | 蒸着マスク、樹脂層付き金属マスク、および有機半導体素子の製造方法 | |
| KR102830440B1 (ko) | 새도우 마스크 제조 방법 | |
| TW200539741A (en) | Mask, method of manufacturing the same, method of forming thin film pattern, method of manufacturing electro-optical device and electronic equipment | |
| JP6330377B2 (ja) | 基板付蒸着マスク装置の製造方法、基板付蒸着マスクおよびレジストパターン付基板 | |
| CN108374147A (zh) | 掩模组件的制造方法 | |
| KR102794838B1 (ko) | 새도우 마스크 제조 방법 및 새도우 마스크 | |
| TW200932362A (en) | Positioning-type mask | |
| CN104988458A (zh) | 一种带锥角开口掩模板的制作方法 | |
| JP2004152704A (ja) | 有機エレクトロルミネッセンス素子の製造方法 | |
| JP5271063B2 (ja) | マイクロヒーター、その製造方法、及びマイクロヒーターを利用したパターン形成方法 | |
| CN101497984A (zh) | 定位式掩模 | |
| JP2019173181A (ja) | 基板付蒸着マスク | |
| KR102936417B1 (ko) | 새도우 마스크 제조 방법 | |
| JP6330389B2 (ja) | 基板付蒸着マスク装置の製造方法および基板付蒸着マスク |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |