TW200835796A - Vapor-deposition apparatus - Google Patents

Vapor-deposition apparatus Download PDF

Info

Publication number
TW200835796A
TW200835796A TW096136640A TW96136640A TW200835796A TW 200835796 A TW200835796 A TW 200835796A TW 096136640 A TW096136640 A TW 096136640A TW 96136640 A TW96136640 A TW 96136640A TW 200835796 A TW200835796 A TW 200835796A
Authority
TW
Taiwan
Prior art keywords
vapor
vapor deposition
film forming
chamber
forming material
Prior art date
Application number
TW096136640A
Other languages
English (en)
Chinese (zh)
Inventor
Shingo Watanabe
Yuji Ono
Koyu Hasegawa
Masahiro Ogawa
Kouichi Honda
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200835796A publication Critical patent/TW200835796A/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K41/00—Spindle sealings
    • F16K41/10—Spindle sealings with diaphragm, e.g. shaped as bellows or tube
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW096136640A 2006-09-29 2007-09-29 Vapor-deposition apparatus TW200835796A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006269085A JP5173175B2 (ja) 2006-09-29 2006-09-29 蒸着装置

Publications (1)

Publication Number Publication Date
TW200835796A true TW200835796A (en) 2008-09-01

Family

ID=39268526

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096136640A TW200835796A (en) 2006-09-29 2007-09-29 Vapor-deposition apparatus

Country Status (6)

Country Link
US (1) US20100071623A1 (https=)
JP (1) JP5173175B2 (https=)
KR (1) KR101075130B1 (https=)
DE (1) DE112007002217T5 (https=)
TW (1) TW200835796A (https=)
WO (1) WO2008041671A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103805947A (zh) * 2012-11-09 2014-05-21 东京毅力科创株式会社 成膜装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5020650B2 (ja) * 2007-02-01 2012-09-05 東京エレクトロン株式会社 蒸着装置、蒸着方法および蒸着装置の製造方法
JP4847496B2 (ja) * 2008-07-29 2011-12-28 東京エレクトロン株式会社 蒸着源ユニット、蒸着方法、蒸着源ユニットの制御装置および成膜装置
EP2168644B1 (en) * 2008-09-29 2014-11-05 Applied Materials, Inc. Evaporator for organic materials and method for evaporating organic materials
DE112009002374T5 (de) * 2008-09-30 2012-11-29 Tokyo Electron Ltd. Abscheidevorrichtung, Abscheideverfahren sowie Speichermedium mit hierin gespeichertem Programm
DE102010041380A1 (de) 2009-09-25 2011-04-28 Von Ardenne Anlagentechnik Gmbh Verdampfereinrichtung für eine Beschichtungsanlage
JP5452178B2 (ja) * 2009-11-12 2014-03-26 株式会社日立ハイテクノロジーズ 真空蒸着装置、真空蒸着方法、および、有機ｅｌ表示装置の製造方法
JP5473675B2 (ja) * 2010-03-01 2014-04-16 株式会社アルバック 薄膜形成装置
US20160281212A1 (en) 2015-03-24 2016-09-29 Siva Power, Inc. Thermal management of evaporation sources
US10593967B2 (en) * 2016-06-30 2020-03-17 Honeywell International Inc. Modulated thermal conductance thermal enclosure
KR102609612B1 (ko) * 2018-07-30 2023-12-05 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3671484D1 (de) * 1985-08-01 1990-06-28 American Cyanamid Co Sprudelzylindervorrichtung.
JP3734239B2 (ja) 1999-04-02 2006-01-11 キヤノン株式会社 有機膜真空蒸着用マスク再生方法及び装置
JP2002322556A (ja) 2001-02-21 2002-11-08 Semiconductor Energy Lab Co Ltd 成膜方法及び成膜装置
JP3705237B2 (ja) * 2001-09-05 2005-10-12 ソニー株式会社 有機電界発光素子を用いた表示装置の製造システムおよび製造方法
JP2004059992A (ja) * 2002-07-29 2004-02-26 Sony Corp 有機薄膜形成装置
JP4013859B2 (ja) * 2003-07-17 2007-11-28 富士電機ホールディングス株式会社 有機薄膜の製造装置
JP2005203248A (ja) * 2004-01-16 2005-07-28 Sony Corp 蒸着方法及び蒸着装置
US7364772B2 (en) 2004-03-22 2008-04-29 Eastman Kodak Company Method for coating an organic layer onto a substrate in a vacuum chamber
JP2006104497A (ja) * 2004-10-01 2006-04-20 Hitachi Zosen Corp 蒸着装置
JP4535908B2 (ja) * 2005-03-14 2010-09-01 日立造船株式会社 蒸着装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103805947A (zh) * 2012-11-09 2014-05-21 东京毅力科创株式会社 成膜装置

Also Published As

Publication number Publication date
US20100071623A1 (en) 2010-03-25
JP5173175B2 (ja) 2013-03-27
DE112007002217T5 (de) 2009-09-10
KR20090045356A (ko) 2009-05-07
JP2008088489A (ja) 2008-04-17
WO2008041671A1 (fr) 2008-04-10
KR101075130B1 (ko) 2011-10-19

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