TW200832054A - Dye-containing resist composition containing photoacid generator and cyclohexadiene type oximesulfonate compound - Google Patents

Dye-containing resist composition containing photoacid generator and cyclohexadiene type oximesulfonate compound Download PDF

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Publication number
TW200832054A
TW200832054A TW96134314A TW96134314A TW200832054A TW 200832054 A TW200832054 A TW 200832054A TW 96134314 A TW96134314 A TW 96134314A TW 96134314 A TW96134314 A TW 96134314A TW 200832054 A TW200832054 A TW 200832054A
Authority
TW
Taiwan
Prior art keywords
group
carbon atoms
compound
dye
photoresist composition
Prior art date
Application number
TW96134314A
Other languages
English (en)
Chinese (zh)
Inventor
Hideo Suzuki
Tomoe Miyazawa
Takamasa Kikuchi
Original Assignee
Nissan Chemical Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Ind Ltd filed Critical Nissan Chemical Ind Ltd
Publication of TW200832054A publication Critical patent/TW200832054A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/63—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C255/64—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton with the nitrogen atoms further bound to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW96134314A 2006-09-13 2007-09-13 Dye-containing resist composition containing photoacid generator and cyclohexadiene type oximesulfonate compound TW200832054A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006248443A JP2009282052A (ja) 2006-09-13 2006-09-13 光酸発生剤を含む染料含有レジスト組成物及びシクロヘキサジエン系オキシムスルホネート化合物

Publications (1)

Publication Number Publication Date
TW200832054A true TW200832054A (en) 2008-08-01

Family

ID=39183792

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96134314A TW200832054A (en) 2006-09-13 2007-09-13 Dye-containing resist composition containing photoacid generator and cyclohexadiene type oximesulfonate compound

Country Status (3)

Country Link
JP (1) JP2009282052A (fr)
TW (1) TW200832054A (fr)
WO (1) WO2008032736A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6123302B2 (ja) * 2013-01-15 2017-05-10 住友ベークライト株式会社 化学増幅型のネガ型フォトレジスト用樹脂組成物、硬化物および電子装置
JP6307989B2 (ja) * 2014-04-02 2018-04-11 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
JP4000473B2 (ja) * 2002-08-09 2007-10-31 信越化学工業株式会社 化学増幅ポジ型レジスト材料用の光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法
JP4924813B2 (ja) * 2004-10-29 2012-04-25 日産化学工業株式会社 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター
JP4384585B2 (ja) * 2004-11-05 2009-12-16 富士フイルム株式会社 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法

Also Published As

Publication number Publication date
WO2008032736A1 (fr) 2008-03-20
JP2009282052A (ja) 2009-12-03

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