TW200817836A - Photosensitive resin composition, bump for control of liquid crystal alignment using the same and method for forming bump for control of liquid crystal alignment - Google Patents

Photosensitive resin composition, bump for control of liquid crystal alignment using the same and method for forming bump for control of liquid crystal alignment Download PDF

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Publication number
TW200817836A
TW200817836A TW096121575A TW96121575A TW200817836A TW 200817836 A TW200817836 A TW 200817836A TW 096121575 A TW096121575 A TW 096121575A TW 96121575 A TW96121575 A TW 96121575A TW 200817836 A TW200817836 A TW 200817836A
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
resin composition
liquid crystal
pigment
bump
Prior art date
Application number
TW096121575A
Other languages
English (en)
Chinese (zh)
Inventor
Kiyoshi Uchikawa
Yasuhide Ohuchi
Hiroyuki Ohnishi
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200817836A publication Critical patent/TW200817836A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Crystal (AREA)
TW096121575A 2006-06-22 2007-06-14 Photosensitive resin composition, bump for control of liquid crystal alignment using the same and method for forming bump for control of liquid crystal alignment TW200817836A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006172876A JP2008003321A (ja) 2006-06-22 2006-06-22 感光性樹脂組成物、これを用いた液晶配向制御用バンプ、および液晶配向制御用バンプ形成方法

Publications (1)

Publication Number Publication Date
TW200817836A true TW200817836A (en) 2008-04-16

Family

ID=38991663

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096121575A TW200817836A (en) 2006-06-22 2007-06-14 Photosensitive resin composition, bump for control of liquid crystal alignment using the same and method for forming bump for control of liquid crystal alignment

Country Status (4)

Country Link
JP (1) JP2008003321A (ja)
KR (1) KR100878795B1 (ja)
CN (1) CN101093356A (ja)
TW (1) TW200817836A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101115787B1 (ko) * 2008-05-15 2012-03-09 코오롱인더스트리 주식회사 광분해성 전사재료, 이로부터 형성되는 절연막 및 유기발광소자
CN102062970A (zh) * 2010-12-25 2011-05-18 福建华映显示科技有限公司 彩色滤光板

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003177530A (ja) 2001-12-13 2003-06-27 Sumitomo Chem Co Ltd 感光性組成物
JP2003177529A (ja) * 2001-12-13 2003-06-27 Sumitomo Chem Co Ltd 感光性組成物
WO2005008338A1 (ja) * 2003-07-17 2005-01-27 Hitachi Chemical Co., Ltd. ネガ型感光性樹脂組成物及びネガ型感光性エレメント
KR20050069024A (ko) * 2003-12-30 2005-07-05 주식회사 코오롱 칼라 필터용 감광성 착색 수지 조성물 및 이에 사용되는안료 분산액

Also Published As

Publication number Publication date
KR20070121543A (ko) 2007-12-27
KR100878795B1 (ko) 2009-01-14
CN101093356A (zh) 2007-12-26
JP2008003321A (ja) 2008-01-10

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