CN101093356A - 感光性树脂组合物、液晶取向控制用凸块及其形成方法 - Google Patents

感光性树脂组合物、液晶取向控制用凸块及其形成方法 Download PDF

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Publication number
CN101093356A
CN101093356A CNA2007101125199A CN200710112519A CN101093356A CN 101093356 A CN101093356 A CN 101093356A CN A2007101125199 A CNA2007101125199 A CN A2007101125199A CN 200710112519 A CN200710112519 A CN 200710112519A CN 101093356 A CN101093356 A CN 101093356A
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CN
China
Prior art keywords
liquid crystal
photosensitive polymer
polymer combination
pigment
control cam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007101125199A
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English (en)
Chinese (zh)
Inventor
内河喜代司
大内康秀
大西启之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of CN101093356A publication Critical patent/CN101093356A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Crystal (AREA)
CNA2007101125199A 2006-06-22 2007-06-19 感光性树脂组合物、液晶取向控制用凸块及其形成方法 Pending CN101093356A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP172876/2006 2006-06-22
JP2006172876A JP2008003321A (ja) 2006-06-22 2006-06-22 感光性樹脂組成物、これを用いた液晶配向制御用バンプ、および液晶配向制御用バンプ形成方法

Publications (1)

Publication Number Publication Date
CN101093356A true CN101093356A (zh) 2007-12-26

Family

ID=38991663

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007101125199A Pending CN101093356A (zh) 2006-06-22 2007-06-19 感光性树脂组合物、液晶取向控制用凸块及其形成方法

Country Status (4)

Country Link
JP (1) JP2008003321A (ja)
KR (1) KR100878795B1 (ja)
CN (1) CN101093356A (ja)
TW (1) TW200817836A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102062970A (zh) * 2010-12-25 2011-05-18 福建华映显示科技有限公司 彩色滤光板
CN101581883B (zh) * 2008-05-15 2013-06-19 可隆股份有限公司 正型光阻、绝缘层及有机发光二极管

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003177529A (ja) * 2001-12-13 2003-06-27 Sumitomo Chem Co Ltd 感光性組成物
JP2003177530A (ja) 2001-12-13 2003-06-27 Sumitomo Chem Co Ltd 感光性組成物
JP4207043B2 (ja) * 2003-07-17 2009-01-14 日立化成工業株式会社 ネガ型感光性樹脂組成物及びネガ型感光性エレメント
KR20050069024A (ko) * 2003-12-30 2005-07-05 주식회사 코오롱 칼라 필터용 감광성 착색 수지 조성물 및 이에 사용되는안료 분산액

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101581883B (zh) * 2008-05-15 2013-06-19 可隆股份有限公司 正型光阻、绝缘层及有机发光二极管
CN102062970A (zh) * 2010-12-25 2011-05-18 福建华映显示科技有限公司 彩色滤光板

Also Published As

Publication number Publication date
KR20070121543A (ko) 2007-12-27
JP2008003321A (ja) 2008-01-10
TW200817836A (en) 2008-04-16
KR100878795B1 (ko) 2009-01-14

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WD01 Invention patent application deemed withdrawn after publication

Open date: 20071226