TW200815917A - Photosensitive resin composition suitable for alkali development - Google Patents

Photosensitive resin composition suitable for alkali development Download PDF

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Publication number
TW200815917A
TW200815917A TW95136041A TW95136041A TW200815917A TW 200815917 A TW200815917 A TW 200815917A TW 95136041 A TW95136041 A TW 95136041A TW 95136041 A TW95136041 A TW 95136041A TW 200815917 A TW200815917 A TW 200815917A
Authority
TW
Taiwan
Prior art keywords
resin
group
photosensitive resin
carboxyl group
alkali
Prior art date
Application number
TW95136041A
Other languages
English (en)
Chinese (zh)
Other versions
TWI331700B (enrdf_load_stackoverflow
Inventor
Kazunori Nishio
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Priority to TW95136041A priority Critical patent/TW200815917A/zh
Publication of TW200815917A publication Critical patent/TW200815917A/zh
Application granted granted Critical
Publication of TWI331700B publication Critical patent/TWI331700B/zh

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  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
TW95136041A 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development TW200815917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95136041A TW200815917A (en) 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95136041A TW200815917A (en) 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development

Publications (2)

Publication Number Publication Date
TW200815917A true TW200815917A (en) 2008-04-01
TWI331700B TWI331700B (enrdf_load_stackoverflow) 2010-10-11

Family

ID=44768955

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95136041A TW200815917A (en) 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development

Country Status (1)

Country Link
TW (1) TW200815917A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI421300B (zh) * 2009-03-23 2014-01-01 Taiyo Holdings Co Ltd A hardened resin composition, a dry film thereof, and a printed circuit board
CN108333869A (zh) * 2017-01-20 2018-07-27 Jsr株式会社 感光性组合物、硬化膜及其制造方法、以及显示元件、发光元件及光接收元件

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI421300B (zh) * 2009-03-23 2014-01-01 Taiyo Holdings Co Ltd A hardened resin composition, a dry film thereof, and a printed circuit board
CN108333869A (zh) * 2017-01-20 2018-07-27 Jsr株式会社 感光性组合物、硬化膜及其制造方法、以及显示元件、发光元件及光接收元件
CN108333869B (zh) * 2017-01-20 2023-07-18 Jsr株式会社 感光性组合物、硬化膜及其制造方法、以及显示元件、发光元件及光接收元件

Also Published As

Publication number Publication date
TWI331700B (enrdf_load_stackoverflow) 2010-10-11

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