TWI331700B - - Google Patents

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Publication number
TWI331700B
TWI331700B TW95136041A TW95136041A TWI331700B TW I331700 B TWI331700 B TW I331700B TW 95136041 A TW95136041 A TW 95136041A TW 95136041 A TW95136041 A TW 95136041A TW I331700 B TWI331700 B TW I331700B
Authority
TW
Taiwan
Prior art keywords
carboxyl group
photosensitive resin
group
compound
alkali
Prior art date
Application number
TW95136041A
Other languages
English (en)
Chinese (zh)
Other versions
TW200815917A (en
Inventor
Kazunori Nishio
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Priority to TW95136041A priority Critical patent/TW200815917A/zh
Publication of TW200815917A publication Critical patent/TW200815917A/zh
Application granted granted Critical
Publication of TWI331700B publication Critical patent/TWI331700B/zh

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  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
TW95136041A 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development TW200815917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95136041A TW200815917A (en) 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95136041A TW200815917A (en) 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development

Publications (2)

Publication Number Publication Date
TW200815917A TW200815917A (en) 2008-04-01
TWI331700B true TWI331700B (enrdf_load_stackoverflow) 2010-10-11

Family

ID=44768955

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95136041A TW200815917A (en) 2006-09-28 2006-09-28 Photosensitive resin composition suitable for alkali development

Country Status (1)

Country Link
TW (1) TW200815917A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5377021B2 (ja) * 2009-03-23 2013-12-25 太陽ホールディングス株式会社 硬化性樹脂組成物、それを用いたドライフィルム及びプリント配線板
KR102517695B1 (ko) * 2017-01-20 2023-04-03 제이에스알 가부시끼가이샤 감광성 조성물, 경화막 및 그의 제조 방법, 그리고 표시 소자, 발광 소자 및 수광 소자

Also Published As

Publication number Publication date
TW200815917A (en) 2008-04-01

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