TW200805006A - Base plate exposure device and base plate exposure method - Google Patents
Base plate exposure device and base plate exposure method Download PDFInfo
- Publication number
- TW200805006A TW200805006A TW96104086A TW96104086A TW200805006A TW 200805006 A TW200805006 A TW 200805006A TW 96104086 A TW96104086 A TW 96104086A TW 96104086 A TW96104086 A TW 96104086A TW 200805006 A TW200805006 A TW 200805006A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- exposure
- photographing
- mask
- integrated
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 280
- 238000003384 imaging method Methods 0.000 claims abstract description 29
- 230000003287 optical effect Effects 0.000 claims abstract description 25
- 238000005286 illumination Methods 0.000 claims description 22
- 238000012546 transfer Methods 0.000 claims description 13
- 230000013011 mating Effects 0.000 claims description 2
- 230000010354 integration Effects 0.000 description 19
- 238000001179 sorption measurement Methods 0.000 description 7
- 230000032258 transport Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 235000021438 curry Nutrition 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006044453A JP4764201B2 (ja) | 2006-02-21 | 2006-02-21 | 基板露光装置および基板露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200805006A true TW200805006A (en) | 2008-01-16 |
| TWI362572B TWI362572B (enrdf_load_stackoverflow) | 2012-04-21 |
Family
ID=38547641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96104086A TW200805006A (en) | 2006-02-21 | 2007-02-05 | Base plate exposure device and base plate exposure method |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4764201B2 (enrdf_load_stackoverflow) |
| CN (1) | CN100578363C (enrdf_load_stackoverflow) |
| TW (1) | TW200805006A (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5288477B2 (ja) * | 2009-04-01 | 2013-09-11 | 三菱電機株式会社 | 露光装置 |
| CN102768475A (zh) * | 2012-07-26 | 2012-11-07 | 四川聚能核技术工程有限公司 | 曝光机对位修复系统及方法 |
| JP6207843B2 (ja) * | 2013-02-25 | 2017-10-04 | 株式会社Ｓｃｒｅｅｎホールディングス | アライメント装置およびアライメント方法 |
| JP6066764B2 (ja) * | 2013-02-25 | 2017-01-25 | 株式会社Ｓｃｒｅｅｎホールディングス | パターン形成装置およびパターン形成方法 |
| JP6178090B2 (ja) * | 2013-03-27 | 2017-08-09 | 株式会社Ｓｃｒｅｅｎホールディングス | パターン形成方法およびパターン形成装置 |
| CN107443883A (zh) * | 2013-02-25 | 2017-12-08 | 斯克林集团公司 | 对准装置及对准方法 |
| CN105895734B (zh) * | 2016-02-22 | 2017-07-28 | 常州天合光能有限公司 | 刻蚀图案套印高精度对位方法及装置 |
| KR102792328B1 (ko) * | 2019-12-18 | 2025-04-04 | 캐논 톡키 가부시키가이샤 | 얼라인먼트 시스템, 성막장치, 얼라인먼트 방법, 성막방법, 전자 디바이스의 제조방법 및 컴퓨터 프로그램 기록매체 |
| CN111352312B (zh) * | 2020-04-29 | 2021-09-07 | 中国科学院光电技术研究所 | 一种多功能光刻装置 |
| CN115881600A (zh) * | 2021-09-30 | 2023-03-31 | 芝浦机械电子装置株式会社 | 铺贴装置 |
| CN114265287A (zh) * | 2022-02-07 | 2022-04-01 | 广东科视光学技术股份有限公司 | 一种单面数字光刻系统 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01106428A (ja) * | 1987-10-19 | 1989-04-24 | Nec Corp | マスクとウエハのプリアライメント方法 |
| JP2887281B2 (ja) * | 1993-03-11 | 1999-04-26 | 大日本スクリーン製造株式会社 | 近接露光装置 |
| JP3231246B2 (ja) * | 1996-08-13 | 2001-11-19 | 株式会社アドテックエンジニアリング | 露光装置 |
| JP2002072447A (ja) * | 2000-09-05 | 2002-03-12 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
| JP2004031798A (ja) * | 2002-06-27 | 2004-01-29 | Orc Mfg Co Ltd | マスクとワークとの位置合わせ方法、および投影露光装置 |
| JP4234964B2 (ja) * | 2002-09-10 | 2009-03-04 | 株式会社オーク製作所 | 露光装置 |
| JP2004281983A (ja) * | 2003-03-19 | 2004-10-07 | Toray Ind Inc | 位置決め装置および位置決め方法並びに塗布装置および塗布方法 |
| JP4214085B2 (ja) * | 2004-06-01 | 2009-01-28 | 株式会社オーク製作所 | マスクフレーム搬送装置、および露光装置 |
| JP2006093604A (ja) * | 2004-09-27 | 2006-04-06 | Nsk Ltd | 近接露光装置 |
| JP2006323268A (ja) * | 2005-05-20 | 2006-11-30 | Nsk Ltd | 露光装置 |
-
2006
- 2006-02-21 JP JP2006044453A patent/JP4764201B2/ja not_active Expired - Fee Related
-
2007
- 2007-02-05 TW TW96104086A patent/TW200805006A/zh not_active IP Right Cessation
- 2007-02-16 CN CN200710078862A patent/CN100578363C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TWI362572B (enrdf_load_stackoverflow) | 2012-04-21 |
| CN101025575A (zh) | 2007-08-29 |
| JP2007225727A (ja) | 2007-09-06 |
| CN100578363C (zh) | 2010-01-06 |
| JP4764201B2 (ja) | 2011-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |