TW200800478A - Electrostatic chuck - Google Patents
Electrostatic chuck Download PDFInfo
- Publication number
- TW200800478A TW200800478A TW096110483A TW96110483A TW200800478A TW 200800478 A TW200800478 A TW 200800478A TW 096110483 A TW096110483 A TW 096110483A TW 96110483 A TW96110483 A TW 96110483A TW 200800478 A TW200800478 A TW 200800478A
- Authority
- TW
- Taiwan
- Prior art keywords
- electrostatic chuck
- dielectric layer
- elastic layer
- electrostatic
- item
- Prior art date
Links
Classifications
-
- H10P72/722—
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
-
- H10P72/7616—
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006090717 | 2006-03-29 | ||
| JP2006341355A JP4808149B2 (ja) | 2006-03-29 | 2006-12-19 | 静電チャック |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200800478A true TW200800478A (en) | 2008-01-01 |
Family
ID=38765131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096110483A TW200800478A (en) | 2006-03-29 | 2007-03-27 | Electrostatic chuck |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4808149B2 (enExample) |
| KR (1) | KR20070098566A (enExample) |
| TW (1) | TW200800478A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI560803B (en) * | 2014-06-13 | 2016-12-01 | Mobile electrostatic chuck and manufacturing method of the same | |
| CN110228787A (zh) * | 2018-03-05 | 2019-09-13 | 夏普株式会社 | Mems元件及微型物体的操控方法 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010182866A (ja) * | 2009-02-05 | 2010-08-19 | Nikon Corp | 静電吸着保持装置、露光装置、露光方法及びデバイスの製造方法 |
| JP5846186B2 (ja) * | 2010-01-29 | 2016-01-20 | 住友大阪セメント株式会社 | 静電チャック装置および静電チャック装置の製造方法 |
| DE102015210736B3 (de) | 2015-06-11 | 2016-10-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung mit folie zum elektrostatischen koppeln eines substrats mit einem substratträger |
| JP6642170B2 (ja) * | 2016-03-23 | 2020-02-05 | 住友大阪セメント株式会社 | 静電チャック装置及びその製造方法 |
| JP6808979B2 (ja) * | 2016-06-01 | 2021-01-06 | 株式会社リコー | 入力素子及び入力装置 |
| KR102093991B1 (ko) * | 2018-08-31 | 2020-04-23 | 이지스코 주식회사 | 고무 탄성체 다이아프램 타입 정전척 및 그 제조방법 |
| KR102292501B1 (ko) * | 2019-01-24 | 2021-08-23 | 김순훈 | 정전척 |
| JP7128534B2 (ja) * | 2020-05-26 | 2022-08-31 | Aiメカテック株式会社 | 基板組立装置及び基板組立方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0422153A (ja) * | 1990-05-17 | 1992-01-27 | Tokyo Electron Ltd | 静電吸着装置 |
| JP3805134B2 (ja) * | 1999-05-25 | 2006-08-02 | 東陶機器株式会社 | 絶縁性基板吸着用静電チャック |
| JP3599634B2 (ja) * | 2000-04-10 | 2004-12-08 | 信越化学工業株式会社 | イオン注入機用静電チャック |
| JP4684222B2 (ja) * | 2004-03-19 | 2011-05-18 | 株式会社クリエイティブ テクノロジー | 双極型静電チャック |
-
2006
- 2006-12-19 JP JP2006341355A patent/JP4808149B2/ja active Active
-
2007
- 2007-03-26 KR KR1020070029275A patent/KR20070098566A/ko not_active Ceased
- 2007-03-27 TW TW096110483A patent/TW200800478A/zh unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI560803B (en) * | 2014-06-13 | 2016-12-01 | Mobile electrostatic chuck and manufacturing method of the same | |
| CN110228787A (zh) * | 2018-03-05 | 2019-09-13 | 夏普株式会社 | Mems元件及微型物体的操控方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070098566A (ko) | 2007-10-05 |
| JP2007294852A (ja) | 2007-11-08 |
| JP4808149B2 (ja) | 2011-11-02 |
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