TW200743151A - Method for achieving uniform chemical machnical polishing in integrated circuit manufacturing - Google Patents
Method for achieving uniform chemical machnical polishing in integrated circuit manufacturingInfo
- Publication number
- TW200743151A TW200743151A TW096113916A TW96113916A TW200743151A TW 200743151 A TW200743151 A TW 200743151A TW 096113916 A TW096113916 A TW 096113916A TW 96113916 A TW96113916 A TW 96113916A TW 200743151 A TW200743151 A TW 200743151A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- integrated circuit
- circuit manufacturing
- machnical
- polishing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/7684—Smoothing; Planarisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
- H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/431,255 US20070264827A1 (en) | 2006-05-09 | 2006-05-09 | Method for achieving uniform chemical mechanical polishing in integrated circuit manufacturing |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200743151A true TW200743151A (en) | 2007-11-16 |
Family
ID=38685677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096113916A TW200743151A (en) | 2006-05-09 | 2007-04-20 | Method for achieving uniform chemical machnical polishing in integrated circuit manufacturing |
Country Status (3)
Country | Link |
---|---|
US (1) | US20070264827A1 (zh) |
CN (1) | CN101071786A (zh) |
TW (1) | TW200743151A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI456646B (zh) * | 2011-04-06 | 2014-10-11 | Nanya Technology Corp | 晶圓平坦化製程 |
TWI769771B (zh) * | 2021-04-01 | 2022-07-01 | 華邦電子股份有限公司 | 半導體結構及其形成方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007041207B4 (de) * | 2007-08-31 | 2015-05-21 | Globalfoundries Dresden Module One Limited Liability Company & Co. Kg | CMOS-Bauelement mit Gateisolationsschichten mit unterschiedlicher Art und Dicke und Verfahren zur Herstellung |
US20110014726A1 (en) * | 2009-07-20 | 2011-01-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of forming shallow trench isolation structure |
SG10201606566SA (en) * | 2010-09-08 | 2016-09-29 | Basf Se | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films |
US20130171824A1 (en) * | 2010-09-08 | 2013-07-04 | Basf Se | Process for chemically mechanically polishing substrates containing silicon oxide dielectric films and polysilicon and/or silicon nitride films |
CN102751187B (zh) * | 2011-04-20 | 2015-11-25 | 中芯国际集成电路制造(上海)有限公司 | 抛光方法以及栅极的形成方法 |
CN105336697B (zh) * | 2014-06-30 | 2019-04-19 | 上海格易电子有限公司 | 一种制造快闪存储器的方法 |
CN111081709B (zh) * | 2018-10-22 | 2022-07-22 | 华邦电子股份有限公司 | 非易失性存储器装置的制造方法 |
CN113223956A (zh) * | 2021-04-28 | 2021-08-06 | 华虹半导体(无锡)有限公司 | Cmp研磨方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5923993A (en) * | 1997-12-17 | 1999-07-13 | Advanced Micro Devices | Method for fabricating dishing free shallow isolation trenches |
US6162368A (en) * | 1998-06-13 | 2000-12-19 | Applied Materials, Inc. | Technique for chemical mechanical polishing silicon |
US6863593B1 (en) * | 1998-11-02 | 2005-03-08 | Applied Materials, Inc. | Chemical mechanical polishing a substrate having a filler layer and a stop layer |
TWI296006B (zh) * | 2000-02-09 | 2008-04-21 | Jsr Corp | |
US6548399B1 (en) * | 2001-11-20 | 2003-04-15 | Intel Corporation | Method of forming a semiconductor device using a carbon doped oxide layer to control the chemical mechanical polishing of a dielectric layer |
US7510974B2 (en) * | 2006-05-05 | 2009-03-31 | United Microelectronics Corp. | CMP process |
-
2006
- 2006-05-09 US US11/431,255 patent/US20070264827A1/en not_active Abandoned
-
2007
- 2007-04-20 TW TW096113916A patent/TW200743151A/zh unknown
- 2007-04-29 CN CNA2007101068552A patent/CN101071786A/zh active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI456646B (zh) * | 2011-04-06 | 2014-10-11 | Nanya Technology Corp | 晶圓平坦化製程 |
US8871103B2 (en) | 2011-04-06 | 2014-10-28 | Nanya Technology Corp. | Process of planarizing a wafer with a large step height and/or surface area features |
TWI769771B (zh) * | 2021-04-01 | 2022-07-01 | 華邦電子股份有限公司 | 半導體結構及其形成方法 |
Also Published As
Publication number | Publication date |
---|---|
US20070264827A1 (en) | 2007-11-15 |
CN101071786A (zh) | 2007-11-14 |
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