TW200740550A - Stage apparatus - Google Patents

Stage apparatus

Info

Publication number
TW200740550A
TW200740550A TW096107018A TW96107018A TW200740550A TW 200740550 A TW200740550 A TW 200740550A TW 096107018 A TW096107018 A TW 096107018A TW 96107018 A TW96107018 A TW 96107018A TW 200740550 A TW200740550 A TW 200740550A
Authority
TW
Taiwan
Prior art keywords
stage
theta
pivot shaft
moving
bearing
Prior art date
Application number
TW096107018A
Other languages
English (en)
Other versions
TWI457193B (zh
Inventor
Yasuo Minami
Kazuya Hioki
Original Assignee
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries filed Critical Sumitomo Heavy Industries
Publication of TW200740550A publication Critical patent/TW200740550A/zh
Application granted granted Critical
Publication of TWI457193B publication Critical patent/TWI457193B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Machine Tool Units (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096107018A 2006-03-02 2007-03-01 Stage device TWI457193B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006056722 2006-03-02

Publications (2)

Publication Number Publication Date
TW200740550A true TW200740550A (en) 2007-11-01
TWI457193B TWI457193B (zh) 2014-10-21

Family

ID=38689086

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107018A TWI457193B (zh) 2006-03-02 2007-03-01 Stage device

Country Status (3)

Country Link
KR (1) KR101087529B1 (zh)
CN (1) CN101030551B (zh)
TW (1) TWI457193B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI498187B (zh) * 2008-12-31 2015-09-01 Electro Scient Ind Inc 整體平台定位系統和方法
TWI821323B (zh) * 2018-08-30 2023-11-11 日商住友重機械工業股份有限公司 載台裝置

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101503128B (zh) * 2008-02-04 2010-12-22 北京京东方光电科技有限公司 装载箱和装卸系统
CN101290808B (zh) * 2008-06-06 2010-04-14 华中科技大学 一种三自由度超精密微动工作台
JP5026455B2 (ja) * 2009-03-18 2012-09-12 住友重機械工業株式会社 Ｘｙステージ装置、半導体検査装置、及び半導体露光装置
CN101898683B (zh) * 2010-03-05 2012-07-04 东莞宏威数码机械有限公司 移动式旋转装载机构
CN102563330B (zh) * 2010-12-30 2016-07-06 上海微电子装备有限公司 工件台安全保护装置
CN103730400B (zh) * 2012-10-16 2016-06-29 沈阳芯源微电子设备有限公司 一种多尺寸晶圆对中装置
KR101403458B1 (ko) * 2012-11-13 2014-06-30 삼성디스플레이 주식회사 기판 이송 장치 및 기판 처리 장치
JP5776812B1 (ja) * 2014-04-01 2015-09-09 日本精工株式会社 テーブル装置、及び搬送装置
WO2017062134A1 (en) * 2015-10-04 2017-04-13 Applied Materials, Inc. Small thermal mass pressurized chamber
JP6723642B2 (ja) * 2016-05-16 2020-07-15 住友重機械工業株式会社 ステージ装置
DE102016123362B3 (de) * 2016-12-02 2018-03-08 Asm Assembly Systems Gmbh & Co. Kg Bestückmaschine mit einer Verschiebevorrichtung zum Verschieben einer Aufnahmevorrichtung für einen Träger mit Bestückmedium und ein Verfahren zum Bestücken
CN107958859B (zh) * 2017-11-30 2023-08-15 扬州虹扬科技发展有限公司 一种摆动装置
WO2021095327A1 (ja) * 2019-11-12 2021-05-20 パナソニックＩｐマネジメント株式会社 位置決め装置
KR102134789B1 (ko) * 2019-11-14 2020-07-16 시너스텍 주식회사 로테이트 유닛
CN112268549A (zh) * 2020-10-14 2021-01-26 温州职业技术学院 一种信息技术的可调影像测试装置
CN112104097B (zh) * 2020-11-18 2021-04-27 深圳赫兹创新技术有限公司 一种无线充电线圈组件及无线电能传输装置
WO2023101215A1 (ko) * 2021-11-30 2023-06-08 주식회사 프로텍 마이크로 led 칩 전사 장치

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0618007B2 (ja) * 1984-11-07 1994-03-09 株式会社日立製作所 非接触駆動形平面移動台
JPH0839375A (ja) * 1994-07-27 1996-02-13 Mitsutoyo Corp テーブル装置
US5894173A (en) * 1996-11-27 1999-04-13 Texas Instruments Incorporated Stress relief matrix for integrated circuit packaging
JP3438131B2 (ja) * 1998-11-24 2003-08-18 住友重機械工業株式会社 Ｘ−ｙステージ装置
TWI233535B (en) * 1999-04-19 2005-06-01 Asml Netherlands Bv Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
JP4475483B2 (ja) * 2000-06-14 2010-06-09 住友重機械工業株式会社 ＸＹθステージ装置及びその制御方法
JP4814438B2 (ja) * 2001-05-02 2011-11-16 日本トムソン株式会社 リニアモータを内蔵したステージ装置
JP2003022960A (ja) * 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
JP3940277B2 (ja) * 2001-07-13 2007-07-04 住友重機械工業株式会社 ステージ装置
JP2004072076A (ja) * 2002-06-10 2004-03-04 Nikon Corp 露光装置及びステージ装置、並びにデバイス製造方法
TWI239607B (en) * 2002-12-13 2005-09-11 Sanyo Electric Co Method for making a semiconductor device
JP4335704B2 (ja) * 2003-03-28 2009-09-30 住友重機械工業株式会社 Ｘ−ｙステージ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI498187B (zh) * 2008-12-31 2015-09-01 Electro Scient Ind Inc 整體平台定位系統和方法
TWI821323B (zh) * 2018-08-30 2023-11-11 日商住友重機械工業股份有限公司 載台裝置

Also Published As

Publication number Publication date
CN101030551B (zh) 2012-05-30
TWI457193B (zh) 2014-10-21
KR20070090803A (ko) 2007-09-06
KR101087529B1 (ko) 2011-11-28
CN101030551A (zh) 2007-09-05

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees