TW200732469A - Cleanser for slit coater, slit coater for manufacturing display device and manufacturing method for display device - Google Patents

Cleanser for slit coater, slit coater for manufacturing display device and manufacturing method for display device

Info

Publication number
TW200732469A
TW200732469A TW096102706A TW96102706A TW200732469A TW 200732469 A TW200732469 A TW 200732469A TW 096102706 A TW096102706 A TW 096102706A TW 96102706 A TW96102706 A TW 96102706A TW 200732469 A TW200732469 A TW 200732469A
Authority
TW
Taiwan
Prior art keywords
display device
manufacturing
slit coater
cleanser
amount
Prior art date
Application number
TW096102706A
Other languages
English (en)
Inventor
Gug-Rae Jo
Byoung-Joo Kim
Yi-Seop Shim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of TW200732469A publication Critical patent/TW200732469A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Emergency Medicine (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
TW096102706A 2006-02-13 2007-01-24 Cleanser for slit coater, slit coater for manufacturing display device and manufacturing method for display device TW200732469A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060013590A KR20070081572A (ko) 2006-02-13 2006-02-13 슬릿 코터 세정제, 표시장치 제조용 슬릿 코터 및표시장치의 제조방법

Publications (1)

Publication Number Publication Date
TW200732469A true TW200732469A (en) 2007-09-01

Family

ID=38495296

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102706A TW200732469A (en) 2006-02-13 2007-01-24 Cleanser for slit coater, slit coater for manufacturing display device and manufacturing method for display device

Country Status (5)

Country Link
US (1) US20080039359A1 (zh)
JP (1) JP2007217689A (zh)
KR (1) KR20070081572A (zh)
CN (2) CN101824370A (zh)
TW (1) TW200732469A (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101020910B1 (ko) * 2008-12-24 2011-03-09 엘지이노텍 주식회사 반도체 발광소자 및 그 제조방법
CN110412837A (zh) * 2018-04-28 2019-11-05 上海微电子装备（集团）股份有限公司 喷洒装置、显影系统和显影方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5221592A (en) * 1992-03-06 1993-06-22 Hoechst Celanese Corporation Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
JP3248781B2 (ja) * 1993-06-28 2002-01-21 東京応化工業株式会社 レジスト洗浄除去用溶剤及びそれを使用する電子部品製造用基材の製造方法
JPH10186680A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd リンス液
JPH10316997A (ja) * 1997-05-15 1998-12-02 Mitsubishi Rayon Co Ltd 工業装置に付着した残存物の洗浄方法
JP3978255B2 (ja) * 1997-06-24 2007-09-19 Ａｚエレクトロニックマテリアルズ株式会社 リソグラフィー用洗浄剤
JP2000193818A (ja) * 1998-12-28 2000-07-14 Canon Inc 塗布方法および装置
KR100308422B1 (ko) * 1999-04-15 2001-09-26 주식회사 동진쎄미켐 스핀-온-글라스 및 감광성 수지 제거용 씬너 조성물
KR100434485B1 (ko) * 1999-10-08 2004-06-05 삼성전자주식회사 포토레지스트 스트립퍼 조성물 및 이를 이용한 포토레지스트 스트립 방법
KR20030011480A (ko) * 2001-08-03 2003-02-11 주식회사 덕성 포토레지스트용 박리액 조성물
KR100474098B1 (ko) * 2001-09-12 2005-03-07 주식회사 덕성 감광성수지 세정용 시너 조성물
KR100483846B1 (ko) * 2002-10-15 2005-04-19 삼성전자주식회사 신너 조성물 및 이를 사용한 포토레지스트의 스트립핑 방법
US6682876B2 (en) * 2001-12-14 2004-01-27 Samsung Electronics Co., Ltd. Thinner composition and method of stripping a photoresist using the same
KR100926308B1 (ko) * 2003-04-23 2009-11-12 삼성전자주식회사 세정 유닛, 이를 갖는 코팅 장치 및 방법
TWI276929B (en) * 2003-12-16 2007-03-21 Showa Denko Kk Photosensitive composition remover
TWI383271B (zh) * 2004-03-03 2013-01-21 Daicel Chem 微影後之洗淨步驟用洗淨劑及沖洗液
KR101176101B1 (ko) * 2004-06-18 2012-08-22 후지필름 가부시키가이샤 착색 감광성 수지 조성물, 착색 감광성 수지 조성물의 도포막, 감광성 수지 전사 재료, 감광성 수지층의 형성방법, 컬러필터, 컬러필터의 제조방법 및 액정표시장치
KR100669866B1 (ko) * 2004-12-06 2007-01-16 삼성전자주식회사 포토레지스트 제거용 조성물, 이를 이용한 포토레지스트의 제거 방법 및 반도체 장치의 제조 방법

Also Published As

Publication number Publication date
JP2007217689A (ja) 2007-08-30
CN101020869B (zh) 2010-11-24
CN101824370A (zh) 2010-09-08
US20080039359A1 (en) 2008-02-14
KR20070081572A (ko) 2007-08-17
CN101020869A (zh) 2007-08-22

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