TW200728520A - Method and device for removing conductive metal oxide thin film - Google Patents

Method and device for removing conductive metal oxide thin film

Info

Publication number
TW200728520A
TW200728520A TW095127967A TW95127967A TW200728520A TW 200728520 A TW200728520 A TW 200728520A TW 095127967 A TW095127967 A TW 095127967A TW 95127967 A TW95127967 A TW 95127967A TW 200728520 A TW200728520 A TW 200728520A
Authority
TW
Taiwan
Prior art keywords
metal oxide
conductive metal
thin film
oxide thin
electrode
Prior art date
Application number
TW095127967A
Other languages
English (en)
Chinese (zh)
Inventor
Hiroyuki Daiku
Tetsuya Inoue
Original Assignee
Hitachi Shipbuilding Eng Co
Hitz Hi Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Shipbuilding Eng Co, Hitz Hi Technology Corp filed Critical Hitachi Shipbuilding Eng Co
Publication of TW200728520A publication Critical patent/TW200728520A/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00Electrolytic cleaning, degreasing, pickling or descaling
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/32After-treatment
    • C03C2218/328Partly or completely removing a coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Weting (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Surface Treatment Of Glass (AREA)
  • Manufacturing Of Printed Wiring (AREA)
TW095127967A 2005-08-01 2006-07-31 Method and device for removing conductive metal oxide thin film TW200728520A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005223089 2005-08-01

Publications (1)

Publication Number Publication Date
TW200728520A true TW200728520A (en) 2007-08-01

Family

ID=37708734

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095127967A TW200728520A (en) 2005-08-01 2006-07-31 Method and device for removing conductive metal oxide thin film

Country Status (5)

Country Link
JP (1) JP5129569B2 (ja)
KR (1) KR101308505B1 (ja)
CN (1) CN101233088B (ja)
TW (1) TW200728520A (ja)
WO (1) WO2007015454A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4966751B2 (ja) * 2007-06-06 2012-07-04 日立造船株式会社 導電性金属酸化物薄膜の除去方法及び装置
DE102010046372A1 (de) * 2010-09-24 2012-03-29 Oerlikon Trading Ag, Trübbach Verfahren zum Entschichten von Werkstücken
KR101769612B1 (ko) 2010-12-10 2017-08-21 삼성디스플레이 주식회사 기판 평탄화 방법
TR201902731A2 (tr) * 2019-02-23 2020-09-21 Aydeşki̇n Mustafa Elektrik iletken kaplamalı low-e camlardan kaplama uzaklaştırma yöntemi

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2538500B2 (ja) * 1993-05-17 1996-09-25 西山ステンレスケミカル株式会社 液晶パネル用ガラス板の再生方法
JPH0986968A (ja) * 1995-09-29 1997-03-31 Sumitomo Chem Co Ltd クロム遮光層を有するカラーフィルター用ガラス基板の再生方法
FR2821862B1 (fr) * 2001-03-07 2003-11-14 Saint Gobain Procede de gravure de couches deposees sur des substrats transparents du type substrat verrier
FR2831708B1 (fr) * 2001-10-29 2004-01-30 Thomson Licensing Sa Procede et dispositif pour decaper une couche mince conductrice deposee sur une plaque isolante, de maniere a y former un reseau d'electrodes

Also Published As

Publication number Publication date
JP5129569B2 (ja) 2013-01-30
KR101308505B1 (ko) 2013-09-17
JPWO2007015454A1 (ja) 2009-02-19
CN101233088A (zh) 2008-07-30
KR20080034140A (ko) 2008-04-18
CN101233088B (zh) 2012-03-28
WO2007015454A1 (ja) 2007-02-08

Similar Documents

Publication Publication Date Title
DE69608579D1 (de) Elektrolytisches verfahren zur reinigung von elektrisch leitenden oberflächen
HK1084423A1 (en) Device and method for electrolytically treating electrically insulated structures
WO2003030223A3 (en) Substrate processing apparatus and method
DE60011125D1 (de) Verfahren und vorrichtung zur reinigung und/oder beschichtung von metalloberflächen mittels elektroplasma-technologie
EP1286382A3 (en) Atmospheric pressure plasma treatment apparatus and method
MY146651A (en) Method and device for electrolytically increasing the thickness of an electrically conductive pattern on a dielectric substrate, as well as dielectric substrate
TW200629309A (en) Solid electrolytic capacitors and process for fabricating same
NZ596309A (en) Apparatus and method for reduction of a solid feedstock
TW200728520A (en) Method and device for removing conductive metal oxide thin film
WO2006027612A3 (en) Improved electro-deoxidation method, apparatus and product
TW200600618A (en) Electrolytic processing apparatus and electrolytic processing method
CN1892936B (zh) 降低铝电解电容器用电极箔漏电流的化成方法
EP1298747A3 (en) Method and apparatus for producing fuel cell electrodes
EA200600774A1 (ru) Электрохимическое восстановление оксидов металлов
EP2045366B1 (en) Method for vacuum-compression micro-plasma oxidation and device for carrying out said method
ATE340279T1 (de) Verfahren zur herstellung von beschichteten streckmetallen und verwendung solcher metalle als stromableiter in elektrochemischen bauelementen
AR121638A1 (es) Método para el tratamiento de un sustrato metálico para la preparación de electrodos
AU2003249927A1 (en) Device and method for monitoring an electrolytic process
CN112154229B (zh) 阳极氧化装置、阳极氧化方法及阳极氧化装置的阴极的制造方法
ATE527398T1 (de) Zelle zur elektrogewinnung von metallen mit elektrolytreiniger
CN103911645A (zh) 一种镁合金阳极氧化方法
WO2005033371A3 (en) Apparatus and method for treatment of metal surfaces by inorganic electrophoretic passivation
DE102019003597A1 (de) Verfahren und Anlage zum Plasmapolieren
TW200602519A (en) Electrolytic plating apparatus
MXPA05004854A (es) Metodo para la obtencion de una buena superficie de contacto en una barra colectora de celda de electrolisis, y barra colectora.