TW200725168A - Mask blanks, and method of producing a transfer mask - Google Patents

Mask blanks, and method of producing a transfer mask

Info

Publication number
TW200725168A
TW200725168A TW095138659A TW95138659A TW200725168A TW 200725168 A TW200725168 A TW 200725168A TW 095138659 A TW095138659 A TW 095138659A TW 95138659 A TW95138659 A TW 95138659A TW 200725168 A TW200725168 A TW 200725168A
Authority
TW
Taiwan
Prior art keywords
light
mask
etching
film
resist film
Prior art date
Application number
TW095138659A
Other languages
English (en)
Chinese (zh)
Inventor
Megumi Takeuchi
Masahiro Hashimoto
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200725168A publication Critical patent/TW200725168A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
TW095138659A 2005-10-20 2006-10-20 Mask blanks, and method of producing a transfer mask TW200725168A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005305292A JP2007114451A (ja) 2005-10-20 2005-10-20 マスクブランクス、および転写マスクの製造方法

Publications (1)

Publication Number Publication Date
TW200725168A true TW200725168A (en) 2007-07-01

Family

ID=37962547

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095138659A TW200725168A (en) 2005-10-20 2006-10-20 Mask blanks, and method of producing a transfer mask

Country Status (3)

Country Link
JP (1) JP2007114451A (ja)
TW (1) TW200725168A (ja)
WO (1) WO2007046454A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI572972B (zh) * 2008-03-31 2017-03-01 Ｈｏｙａ股份有限公司 空白光罩、光罩及半導體積體電路之製造方法
TWI610124B (zh) * 2011-05-19 2018-01-01 Ｈｏｙａ股份有限公司 空白光罩用基板、空白光罩、反射型空白光罩、轉印光罩、反射型光罩以及該等之製造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5201813B2 (ja) * 2006-09-15 2013-06-05 Ｈｏｙａ株式会社 マスクブランク及びマスクの製造方法
US7955516B2 (en) * 2006-11-02 2011-06-07 Applied Materials, Inc. Etching of nano-imprint templates using an etch reactor
JP2008304689A (ja) * 2007-06-07 2008-12-18 Toppan Printing Co Ltd パターン形成方法、インプリントモールド、フォトマスク
JP2011123426A (ja) * 2009-12-14 2011-06-23 Toppan Printing Co Ltd フォトマスクブランク及びフォトマスクの製造方法
JP6944255B2 (ja) * 2017-03-14 2021-10-06 Hoya株式会社 転写用マスクの製造方法、および半導体デバイスの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61268028A (ja) * 1985-04-08 1986-11-27 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ホトレジスト中にマスク像を現像する方法
JP2932488B2 (ja) * 1989-03-16 1999-08-09 ソニー株式会社 ドライエッチング方法
JP2593611B2 (ja) * 1991-06-11 1997-03-26 エイ・ティ・アンド・ティ・コーポレーション リソグラフィーエッチング方法
JP4780264B2 (ja) * 2001-05-16 2011-09-28 信越化学工業株式会社 クロム系フォトマスクの形成方法
JP4020242B2 (ja) * 2001-09-28 2007-12-12 Ｈｏｙａ株式会社 マスクブランク、及びマスク
JP2003177549A (ja) * 2001-12-07 2003-06-27 Fujitsu Ltd パターン形成方法、薄膜磁気ヘッドの製造方法、及び薄膜磁気ヘッド

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI572972B (zh) * 2008-03-31 2017-03-01 Ｈｏｙａ股份有限公司 空白光罩、光罩及半導體積體電路之製造方法
TWI610124B (zh) * 2011-05-19 2018-01-01 Ｈｏｙａ股份有限公司 空白光罩用基板、空白光罩、反射型空白光罩、轉印光罩、反射型光罩以及該等之製造方法

Also Published As

Publication number Publication date
WO2007046454A1 (ja) 2007-04-26
JP2007114451A (ja) 2007-05-10

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