TW200722937A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200722937A
TW200722937A TW095145942A TW95145942A TW200722937A TW 200722937 A TW200722937 A TW 200722937A TW 095145942 A TW095145942 A TW 095145942A TW 95145942 A TW95145942 A TW 95145942A TW 200722937 A TW200722937 A TW 200722937A
Authority
TW
Taiwan
Prior art keywords
air
sidewall
supply port
exposure chamber
support frame
Prior art date
Application number
TW095145942A
Other languages
Chinese (zh)
Other versions
TWI366744B (en
Inventor
Masahiko Funayama
Shinichiro Mizuguchi
Masaru Ise
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200722937A publication Critical patent/TW200722937A/en
Application granted granted Critical
Publication of TWI366744B publication Critical patent/TWI366744B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

To provide an exposure apparatus that appropriately controls a blowing state of air to a mask film and a substrate, and appropriately sets the fluid environment of air blown to a mask film and a substrate in an exposure chamber. The exposure apparatus 1 is equipped with: a supply port 3 on one sidewall in an exposure chamber R2 for supplying air at a preliminarily set temperature and humidity along a face of a support frame 31 in an irradiation side; a sidewall discharge port 5 disposed below the supply port for discharging air from between the support frame and a mount table 30 and from the exposure chamber; a blow direction changing means 4 disposed on the other sidewall of the exposure chamber for changing the blowing direction of the air supplied from the supply port to pass through between the support frame and the mount table and to direct toward the sidewall discharge port; and a temperature and humidity controlling means 2 receiving the air discharged from the sidewall discharge port through a filter, controlling the air to the preliminarily set temperature and humidity and sending the air to the supply port.
TW095145942A 2005-12-14 2006-12-08 Exposure apparatus TW200722937A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005361107A JP4472626B2 (en) 2005-12-14 2005-12-14 Exposure equipment

Publications (2)

Publication Number Publication Date
TW200722937A true TW200722937A (en) 2007-06-16
TWI366744B TWI366744B (en) 2012-06-21

Family

ID=38165654

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095145942A TW200722937A (en) 2005-12-14 2006-12-08 Exposure apparatus

Country Status (3)

Country Link
JP (1) JP4472626B2 (en)
CN (1) CN100495217C (en)
TW (1) TW200722937A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036290A1 (en) 2007-12-19 2009-06-22 Asml Netherlands Bv Lithographic apparatus.
CN101276150B (en) * 2008-03-21 2010-06-02 上海微电子装备有限公司 Stepping repeat exposure device
JP5290063B2 (en) * 2009-06-17 2013-09-18 株式会社日立ハイテクノロジーズ Proximity exposure apparatus, substrate temperature control method for proximity exposure apparatus, and method for manufacturing display panel substrate
CN102231047B (en) * 2011-06-23 2016-09-14 上海华虹宏力半导体制造有限公司 UV-curing equipment and UV-curing equipment alarm method
JP2015034846A (en) * 2013-08-07 2015-02-19 株式会社清和光学製作所 Vertical type film exposure apparatus

Also Published As

Publication number Publication date
TWI366744B (en) 2012-06-21
CN100495217C (en) 2009-06-03
JP2007163904A (en) 2007-06-28
JP4472626B2 (en) 2010-06-02
CN1983038A (en) 2007-06-20

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees