TW200722937A - Exposure apparatus - Google Patents
Exposure apparatusInfo
- Publication number
- TW200722937A TW200722937A TW095145942A TW95145942A TW200722937A TW 200722937 A TW200722937 A TW 200722937A TW 095145942 A TW095145942 A TW 095145942A TW 95145942 A TW95145942 A TW 95145942A TW 200722937 A TW200722937 A TW 200722937A
- Authority
- TW
- Taiwan
- Prior art keywords
- air
- sidewall
- supply port
- exposure chamber
- support frame
- Prior art date
Links
- 238000007664 blowing Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000007599 discharging Methods 0.000 abstract 1
- 239000012530 fluid Substances 0.000 abstract 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
To provide an exposure apparatus that appropriately controls a blowing state of air to a mask film and a substrate, and appropriately sets the fluid environment of air blown to a mask film and a substrate in an exposure chamber. The exposure apparatus 1 is equipped with: a supply port 3 on one sidewall in an exposure chamber R2 for supplying air at a preliminarily set temperature and humidity along a face of a support frame 31 in an irradiation side; a sidewall discharge port 5 disposed below the supply port for discharging air from between the support frame and a mount table 30 and from the exposure chamber; a blow direction changing means 4 disposed on the other sidewall of the exposure chamber for changing the blowing direction of the air supplied from the supply port to pass through between the support frame and the mount table and to direct toward the sidewall discharge port; and a temperature and humidity controlling means 2 receiving the air discharged from the sidewall discharge port through a filter, controlling the air to the preliminarily set temperature and humidity and sending the air to the supply port.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005361107A JP4472626B2 (en) | 2005-12-14 | 2005-12-14 | Exposure equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200722937A true TW200722937A (en) | 2007-06-16 |
TWI366744B TWI366744B (en) | 2012-06-21 |
Family
ID=38165654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095145942A TW200722937A (en) | 2005-12-14 | 2006-12-08 | Exposure apparatus |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4472626B2 (en) |
CN (1) | CN100495217C (en) |
TW (1) | TW200722937A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1036290A1 (en) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Lithographic apparatus. |
CN101276150B (en) * | 2008-03-21 | 2010-06-02 | 上海微电子装备有限公司 | Stepping repeat exposure device |
JP5290063B2 (en) * | 2009-06-17 | 2013-09-18 | 株式会社日立ハイテクノロジーズ | Proximity exposure apparatus, substrate temperature control method for proximity exposure apparatus, and method for manufacturing display panel substrate |
CN102231047B (en) * | 2011-06-23 | 2016-09-14 | 上海华虹宏力半导体制造有限公司 | UV-curing equipment and UV-curing equipment alarm method |
JP2015034846A (en) * | 2013-08-07 | 2015-02-19 | 株式会社清和光学製作所 | Vertical type film exposure apparatus |
JP7386742B2 (en) * | 2020-03-24 | 2023-11-27 | 株式会社Screenホールディングス | exposure equipment |
-
2005
- 2005-12-14 JP JP2005361107A patent/JP4472626B2/en not_active Expired - Fee Related
-
2006
- 2006-12-08 TW TW095145942A patent/TW200722937A/en not_active IP Right Cessation
- 2006-12-14 CN CNB2006101670896A patent/CN100495217C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN100495217C (en) | 2009-06-03 |
JP2007163904A (en) | 2007-06-28 |
JP4472626B2 (en) | 2010-06-02 |
CN1983038A (en) | 2007-06-20 |
TWI366744B (en) | 2012-06-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |