CN1983038A - Exposure device - Google Patents
Exposure device Download PDFInfo
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- CN1983038A CN1983038A CN 200610167089 CN200610167089A CN1983038A CN 1983038 A CN1983038 A CN 1983038A CN 200610167089 CN200610167089 CN 200610167089 CN 200610167089 A CN200610167089 A CN 200610167089A CN 1983038 A CN1983038 A CN 1983038A
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- air
- mentioned
- exposure
- light shield
- supply port
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- 239000012530 fluid Substances 0.000 abstract description 2
- 238000007664 blowing Methods 0.000 abstract 2
- 239000003570 air Substances 0.000 description 177
- 239000010408 film Substances 0.000 description 70
- 230000007246 mechanism Effects 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 10
- 238000007667 floating Methods 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000011514 reflex Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
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- 238000005286 illumination Methods 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention provides an exposure apparatus that appropriately controls a blowing state of air to a mask film and a substrate, and appropriately sets the fluid environment of air blown to a mask film and a substrate in an exposure chamber. The exposure apparatus 1 is equipped with: a supply port 3 on one sidewall in an exposure chamber R2 for supplying air at a preliminarily set temperature and humidity along a face of a support frame 31 in an irradiation side; a sidewall discharge port 5 disposed below the supply port for discharging air from between the support frame and a mount table 30 and from the exposure chamber; a blow direction changing means 4 disposed on the other sidewall of the exposure chamber for at least changing the blowing direction of the air supplied from the supply port to pass through between the support frame and the mount table and to direct toward the sidewall discharge port; and a temperature and humidity controlling means 2 receiving the air discharged from the sidewall discharge port through a filter, controlling the air to the preliminarily set temperature and humidity and sending the air to the supply port.
Description
Technical field
The present invention relates to a kind ofly, particularly relate to the good exposure device of air circulation environment in a kind of exposure room via the exposure device of light shield film to base plate exposure.
Background technology
In known technology, the substrate that uses at exposure device is the thickness that approximately has only 0.05mm that for example is used for electronic circuit board, and its circuit pattern also develops towards the direction of granular.And, in the operation of exposure device action, under the state of light shield that forms circuit pattern and substrate driving fit, comprise the ultraviolet light of set wavelength by irradiation, correctly the circuit pattern with the light shield film is exposed on the substrate.
At this, the structure of known exposure device is described with reference to Fig. 7.
Fig. 7 is the side view in the exposure room of known exposure device.As shown in Figure 7, exposure device 50 mainly comprise the exposure desk 51 of mounting substrate w, at the maintenance frame 52 that keeps light shield M towards a side of this exposure desk 51, have above this maintenances frame 52 via not shown catoptrics system and shine the optical system 53 of the light source that comprises ultraviolet light, cooling air be delivered to the wind pushing mechanism 54 of substrate W and light shield M side.
In exposure device 50, be that both the cooling air of fixed temperature was delivered to light shield M and substrate W by wind pushing mechanism 54 with temperature treatment, can prevent substrate W and light shield M thus when illuminated rayed, owing to the heat that it produced is extended.
So known exposure device, for example No. 3099841 communique of Jap.P. is disclosed.
Yet, in the wind pushing mechanism of known exposure device, exist following problem.
In known exposure device, because irradiation light and the light shield film that is influenced by heat easily and compare the different substrate of degree that is influenced by heat owing to irradiation light with the light shield film, be air, directly be cooled from the wind pushing mechanism air-supply with the temperature and the humidity of the same terms.Therefore, in the exposure device of the circuit pattern that requires granular, can't be corresponding based on the adjustment of the flexible state of the temperature of light shield film and substrate and humidity.
And the top of light shield film is cooled via light-passing board, is directly blown and be subjected to air influence in the below.Therefore, the flexible ventilation state that influences the light shield film becomes inappropriate, in the exposure device of the circuit pattern that requires granular, and can't be corresponding and wish to improve.
And, in known exposure device, though the air that will implement temperature humidity management by wind pushing mechanism blow to exposure room owing to only consider the structure of air-supply side, the environment that the air of considering air-supply is discharged in the exposure room.Therefore, developing to the substrate of circuit pattern granular, the situation that can't take a breath effectively and be detained owing to the air that warms at the light of exposure room internal radiation etc. is also arranged, and it is inconvenient adjusting the influence that flexible state is produced by the heat of light shield film and substrate.
Summary of the invention
Given this, the object of the present invention is to provide a kind of exposure device, the ventilation state for the air of light shield film and substrate is reached suitably, and make the fluid environment of the air of exposure room interior focusing cover film and substrate air-supply reach suitable.
Exposure device of the present invention has an exposure room, take in the mounting table of mounting substrate and the support frame of supporting the light shield film, make aforesaid substrate and above-mentioned light shield film butt or approaching, irradiation comprises the ultraviolet light of set wavelength, and in the exposure device to the aforesaid substrate exposure, comprise on the sidewall of being located in the above-mentioned exposure room, along the face of the rayed side that becomes above-mentioned support frame and supply with the supply port of the air of preset temperature and humidity, be located at the below of above-mentioned supply port, by the air sent here between above-mentioned support frame and the above-mentioned mounting table and discharge the side wall surface escape hole that the air in the above-mentioned exposure room is used, the air supply direction of the air of being located at another sidewall of above-mentioned exposure room and will sending here from above-mentioned supply port changes at least by between above-mentioned support frame and the mounting table and towards the air supply direction change device of above-mentioned side wall surface escape hole, be located at outside the above-mentioned exposure room, when the air of discharging from above-mentioned side wall surface escape hole is entered through filtrator, be adjusted to default temperature and humidity and be delivered to the temperature humidity adjusting gear of above-mentioned supply port.
In the exposure device of so constructing, from the air of supply port supply preset temperature and humidity, along light-struck side of the support frame of supporting the light shield film, the sidewall in exposure room is blown to another sidewall.Then, when air comes from the supply port air-supply, change to towards supporting between frame and the mounting table by the direction of the air supply direction change device that is disposed at another sidewall in the exposure room, this air guide side wall surface escape hole with air.And the air of discharging from the side wall surface escape hole reclaims via filtrator, is adjusted to default temperature humidity by the temperature humidity adjusting gear, is supplied in the exposure room once again from supply port.
In addition, in the exposure device of the present invention, the air supply direction change device comprise air suction inlet, from this suction inlet suck air rotating vane, drive the drive unit of this rotating vane rotation and the air outlet that will send to above-mentioned side wall surface escape hole via above-mentioned rotating vane inhaled air.
The exposure device of structure like this, along the air of sending here above of supporting frame, the drive unit via the air supply direction change device is entered from suction inlet forcibly by rotating vane, send forcibly between support frame and mounting table from air outlet, discharge from the side wall surface escape hole.
And, in the exposure device of the present invention, above-mentioned air supply direction change device be included in accept the air of being supplied with on the position of above-mentioned supply port and change the change plate of direction and guide this air and will along this change air that plate carries between above-mentioned support frame and the mounting table towards the derivation plate of above-mentioned side wall surface escape hole.
So the exposure device of constructing along supporting the air that frame is sent here above to be guided along this change plate by the change plate, is sent and is discharged from the side wall surface escape hole between support frame and mounting table from deriving plate.
In addition, exposure device of the present invention also comprises an exhaust ground, is located at least a portion of the face that is provided with in the above-mentioned exposure room that above-mentioned mounting table is set, and this exhaust ground has a plurality of vent ports, discharges the air of above-mentioned exposure room.
In the exposure device of so constructing, for reaching minimum via the air supply direction change device to the influence of the stream of the air of side wall surface escape hole from supply port, for can't be with the air in the air of air supply direction change device change direction or the exposure room that can't reclaim from the wall escape hole, outside the vent port discharger that face is set.
According to exposure device of the present invention, can reach excellent results shown below.
Exposure device will be supplied to the upper face side of light shield film by the air that the temperature humidity adjusting gear is adjusted from supply port, suitably adjust its temperature and humidity for the light shield film that heat influenced that the irradiation that is subjected to most because of light produces, when suppressing light shield film flexible, be delivered to the air of supporting between frame and the mounting table by the air supply direction change device, substrate and light shield film are adjusted temperature and humidity.
Therefore, exposure device is by keeping the circulation of air in exposure room, and can suitably control the heat that irradiation produced because of light the flexible of the light shield film of Different Effects and substrate arranged, can be corresponding to the exposure operation of circuit pattern granular.
Exposure device can be sent between support frame and mounting table by means of the air supply direction change device attracts forcibly from the air that supply port is carried, owing to the interior temperature of adjustment exposure room and the air of humidity are positively circulated, can corresponding make the exposure operation of circuit pattern granular keep stable.
The air that exposure device can be carried from supply port is by means of the change plate the simply constructed air supply direction change device and derive plate and change air supply direction and send between frame and the mounting table to supporting, owing to the interior temperature of adjustment exposure room and the air of humidity are positively circulated, can corresponding make the exposure operation of circuit pattern granular keep stable.
The air that exposure device can be carried from the supply port of light shield film, send between support frame and mounting table by the air supply direction change device, the interior temperature of adjustment exposure room and the air of humidity are positively circulated, and, keep the stream that is formed at light shield film ambient air and the air that can get rid of delay because the air below will flowing into from the exhaust ground of vent port with the face of setting carries out exhaust.Therefore exposure device can corresponding make the exposure operation of circuit pattern granular keep stable.
Description of drawings
Fig. 1 is the sectional view that removes a part of first embodiment of exposure device of the present invention.
Fig. 2 is the stereographic map of the interior air-flow of the exposure room of exposure device of the present invention.
Fig. 3 a, 3b are in the exposure device of the present invention, the side view of supply port configuration.
Fig. 4 a, 4b are respectively in second embodiment of exposure device of the present invention, the stereographic map and the sectional view of the part that removes exposure device of the alternate manner of air supply direction change device.
Fig. 5 is the side view of alternate manner of the air supply direction change device of exposure device of the present invention.
Fig. 6 is the sectional view of the part that removes exposure device of the 3rd embodiment of exposure device of the present invention.
Fig. 7 is the synoptic diagram of the structure of known exposure device.
Label declaration
1,1A～exposure device; 2～aircondition; 2a, 2b～conduit; 3～supply port; 3a～air cleaning filter; 4～circulator; 4a～housing; 4b～suction inlet; 4c～rotating vane; 4d～air outlet; The 4e-CD-ROM drive motor; 4f～bearing; 5～side wall surface escape hole; 5a～air cleaning filter; The 6-framework; 6a～wall; 7～exhaust ground; 7a～vent port; 10～light source; 11～mercury arc lamp; 12～condenser; 14～wind deflector; The 14a-twisted plate; 14b～derivation plate; 20～optical system; 21～the first level crossings; 22～fly's-eye lens; 23～the second level crossings; 24～concave mirror; 25～shield mechanism; 30～mounting table; 31～light shield frame; 40～air outlet; 44～wind deflector; 44a～twisted plate; 44b～derivation plate; 44c, 44d～adjustment part; 44e～support sector; 45～wind guide plate; M～light shield film; R1～light source chamber; R2～exposure room; W～substrate.
Embodiment
Then, for the best mode of exposure device of the present invention, be described in detail with reference to suitable accompanying drawing.
Fig. 1 is all schematic side cut-open views that remove the part of exposure device.Fig. 2 is the stereographic map of the interior air flow of the exposure room of exposure device.
As shown in Figure 1, exposure device 1 in framework 6, possess light source 10, optical system 20, mounting table 30, air supply port 3, the circulator 4 as the air supply direction change device, side wall surface escape hole 5, have the exhaust ground 7 of vent port 7a.This framework 6 is separated into light source chamber R1 and exposure room R2.
And in exposure device 1, aircondition 2 is configured to be adjacent to framework 6.This aircondition 2 has the function as the temperature humidity adjusting gear, will enter air in the exposure room R2 via side wall surface escape hole 5, after being adjusted to set temperature and humidity, returns exposure room R2 via conduit 2a again.
In the present embodiment, optical system 20 is made of first level crossing 21, fly's-eye lens 22, second level crossing 23, concave mirror 24.In this optical system 20, first level crossing 21, fly's-eye lens 22, second level crossing 23, concave mirror 24 are configured to make from the light of light source 10 irradiations and do suitable reflection and penetrate, after the default light path of the light process of light source 10 irradiations, arrive the light shield film M that is disposed in the exposure room R2.
Fly's-eye lens 22 is the assortments in length and breadth of a plurality of convex lens, is disposed in the light path between first level crossing 21 and second level crossing 23, and the light of first level crossing, 21 reflections is exposed on second level crossing 23 with identical Illumination Distribution.In first level crossing, 21 sides of fly's-eye lens 22, be provided with the light of blocking first level crossing 21 reflections, with the shield mechanism 25 of control towards wafer (substrate) W irradiation.
Mounting table 30 possesses makes substrate W integrate the function that moves, on mounting surface, can integrate and move in parallel direction directions X, Y direction, and on the θ of Z-axis direction, integrate in the rotation, for substrate W being connected to light shield film M and can moving in vertical direction.
Directly over the mounting table 30, dispose the light shield frame 31 of the support frame of the light shield film M that supports formation desired circuit pattern.
Aircondition 2 is located at outside the exposure room R2, and air is adjusted to set temperature humidity.This aircondition 2 will be adjusted to both air of fixed temperature and humidity and be supplied to supply port 3 in the exposure room R2 described later, and supply port 3 is connected with conduit 2a, 2b with side walls escape hole 5, after the air of discharging from the side wall surface escape hole 5 that is arranged in the exposure room R2 described later reclaims, adjust temperature and humidity once again and supply with.This aircondition 2 portion within it possesses not the temperature adjusting mechanism and the humidity adjusting mechanism of icon.
The air that supply port 3 is adjusted aircondition 2 excess temperatures and humidity is above the light shield frame 31 of support light shield M and supply with.Then, by the air of supplying with from this supply port 3, in exposure room R2, through above the light shield frame 31 (becoming the face of rayed side), be formed up to the stream of other sidewall of exposure room R2 from this supply port 3.
At the peristome of supply port 3, be provided with air cleaning filter 3a.Air cleaning filter 3a is the floating material of absorption dust etc. and the paper filter removed as used herein, preferably volatile matter such as adsorbent particles or silicon dioxide and siloxane and the HEPA filtrator removed, or middle performance filtrator.
And at this, supply port 3 forms the width corresponding to the useful area (pattern forms area) of the light shield film M that is supported by light shield frame 31, and the state of being arranged to tilt and towards light shield frame 31.
At this, supply port 3 forms horizontal wide, has than the wideer width in zone that forms pattern, and the air of supplying with from supply port 3 can all be covered on the pattern that forms light shield film M.
The pitch angle of this supply port 3, shown in Fig. 3 a, preferably the air of Gong Geiing is blown above light shield 31 to the tilt angle theta 1 of circulator 4 sides.At this, when the upper face side of light shield frame 31 during as reference field, tilt angle theta 1 is the above scopes of following 45 degree of 90 degree with respect to this reference field preferably.That is, the air supply direction of the air of supplying with from supply port 3 with respect to reference field be parallel to 45 degree be the scope of its air-supply.This supply port 3 forms from supply port 3 stream till the circulator 4 above light shield frame 31 by the air of supplying with.
As shown in Figure 2, circulator 4 changes are from the moving direction of the next air of supply port 3 air-supplies.
Particularly, when supplying with from supply port 3, the air of the upper face side by the light shield frame after by the space between light shield frame 31 and the mounting table 30, arrives the side wall surface escape hole 5 of the downside that is positioned at supply port 3, and changes the moving direction of air.At this, the moving direction of the air by the space between light shield frame 31 and the mounting table 30 is parallel direction with respect to the mounting surface of mounting table 30 preferably.
In other words, circulator 4 in the wall of the framework 6 that constitutes exposure device 1, be positioned at the wall that supply port 3 is set be the wall of opposition side, promptly be located at and be provided with the wall wall in opposite directions of supply port 3.
And, at suction inlet 4b and air outlet 4d, air cleaning filter 3a same as described above can be installed also.This circulator 4 forms from another sidewall of exposure room R2 by between light shield frame 31 and the mounting table 30 and towards the air flow circuit of side wall surface escape hole 5.
Side wall surface escape hole 5 is used to discharge the air in the exposure room R2, and discharges the air of sending here from circulator 4.This side wall surface escape hole 5 is positioned at the below of supply port 3, is arranged to towards the space between mounting table 30 and the light shield frame 31, makes the air that passes through the space between mounting table 30 and the light shield frame 31 from circulator 4 discharges, is discharged from effectively.
And, at the peristome of this side wall surface escape hole 5, preferably be provided with air cleaning filter 5a same as described above.
In the present embodiment, form the air-flow of discharging in the exposure room R2, by the space between mounting table 30 and the light shield frame 31, positively form air-flow to side wall surface escape hole 5 from circulator 4 by this side wall surface escape hole 5.
This side wall surface escape hole 5 forms transverse width corresponding to the useful area of light shield film M, and is arranged to respect to the said reference face state of vertical (being 90 degree).
In other words, as can be seen from Figure 2, side wall surface escape hole 5 forms the width identical with supply port 3, and the width in zone of pattern that cans be compared to formation light shield film M most is also wide.
And shown in Fig. 3 b, side wall surface escape hole 5 preferably is configured in from the position that the aperture position of supply port 3 retreats, diminishes for the influence of the air-flow of supplying with from supply port.
That is, side wall surface escape hole 5 preferably is positioned at the rear side of the air supply direction of the air of supplying with from supply port 3.
In addition, shown in Fig. 3 b, side wall surface escape hole 5 is preferably disposed on the scope opposite with the angle of inclination of supply port 3.That is, side wall surface escape hole 5 is that preferably the scope from 90 degree to 135 degree tilts and is provided with respect to the scope of said reference face from 45 degree to 135 degree.If surpass from 45 degree to the scope of 135 degree, can't may be again the reason that produces the sinuous flow in the stream suitably towards exhausr port for air from circulator 4.
With reference to Fig. 1, the exhaust ground 7 with vent port 7a is that the air in the exposure room R2 is discharged the outer device of exposure room R2, by exposure room R2 and the outer draught head enforcement exhaust of exposure room.Vent port 7a is used for air in the exposure room R2 is discharged, and can't be expelled to outside the exposure room R2 from the air that side wall surface escape hole 5 is discharged in the air of the main device of self-loopa in the future 4.
By so constructing, can prevent that the air of not discharging from side wall surface escape hole 5 from hindering from supply port 3 through the air-flow of circulators 4 towards side wall surface 5.
This vent port 7a forms mesh-shape or stamped metal shape on the ground that mounting table 30 is set, be formed at this ground at least a portion or whole.
And above-mentioned each inscape is set in the framework 6 of light source chamber R1 and exposure room R2.Light source chamber R1 is airtight case shape space.Exposure room R2 is the space that the substrate W that moves into and take out of that side wall surface has a not shown enforcement substrate W takes out of the case shape of inlet.And, the open area ratio substrate W of vent port 7a to take out of inlet area also wide.
The action of exposure device then, is described.
In exposure device 1, at first, use the Handling device of not shown handle etc., with substrate W carrying and mounting on mounting table 30.
Then, the mounting table 30 of mounting substrate W is risen,, make substrate W remain on the state of approaching or butt for the light shield film M that is supported by light shield frame 31.
In exposure device 1, when substrate W began to move into, the air that is adjusted to preset temperature and humidity by aircondition 2 was supplied in the exposure room R2 from supply port 3, and, the air of supplying with from supply port 3 changes direct of travels by circulator 4, arrives side wall surface escape hole 5 and afterwards discharges.
That is, as shown in Figure 1, the air of supplying with from supply port 3 forms air-flow (stream), after arrival circulator 4 sides, passes through to arrive side wall surface escape hole 5 between light shield frame 31 and the mounting table 30 by means of circulator 4 above light shield frame 31.
At this if the air flow circuit of table side (upside) that flows through light shield film M for toward the road, the air flow circuit that flows through the inboard (downside) of light shield film M is multiple road, then forms to clip light shield film M and be positioned at air-flow (stream) up and down toward the Lu Yufu road.
Thus, flow through the upper face side of the air on past road,, make the temperature humidity of light shield film M keep certain, flow through air side below light shield film M on multiple road, the temperature humidity of light shield film M is kept necessarily through light-passing board from light shield film M.
And when substrate W mounting was on mounting table 30, the air that flows through multiple road made the temperature humidity of substrate W keep certain.
In exposure device 1, when start, will be from the irradiates light of light source 10, the process particular optical is 20, becomes the ultraviolet irradiation light that comprises set wavelength, and exposes on light shield film M and the substrate W.At this, when irradiates light shone, the assembly of light shield film M, light shield frame 31, light-passing board, substrate W etc. was owing to illuminated rayed is generated heat.Particularly, be positioned near the assembly the concave mirror 24, be easy to show the state that is influenced by this heat.
Yet, judge that from Fig. 1 light shield M is owing to be positioned at than concave mirror 24 also near the position of substrate W, it is often also big than substrate W to generate heat.And for substrate W, irradiates light generally is to shine once, is subjected to hot influence during exposure operation for once, for light shield film M, owing to be used to shine the plural pieces substrate, is the influence that repeatedly is subjected to heat during exposure operation.
At this, in exposure device 1, by adjusting temperature humidity by air-flow up and down, when exposure, will be suppressed to minimum, and the temperature humidity of air is reacted to light shield film M to the influence of the heat of light shield film M effect at light shield film M.
Promptly, when supplying with from supply port 3, formed toward the road by air by the upper face side of light shield film M, and when discharging from circulator 4, by the formed multiple road of the air in the space between light shield frame 31 and the mounting table 30, air is directly blown over light shield film M, when exposure is suppressed to Min. to the influence of the heat of light shield film M effect.
In addition, form air,, flow through toward the air on road and adjust temperature, the humidity of light shield film M upside, and adjust temperature, the humidity of light shield film M downside via light-passing board owing to be adjusted to set temperature, humidity respectively toward the Lu Yufu road.
In the exposure device 1, the stream that air is reciprocal is owing to equate approximately that with the air influence that inner face is supplied with the flexible state that can keep light shield film M is to good equilibrium state to the surface of light shield film M.
In other words, in the exposure device 1 of present embodiment, by being positioned at the air of light shield film M stream (toward the Lu Yufu road) up and down, owing to be adjusted to set temperature, humidity, states such as the temperature of light shield film M and humidity also reach the air on multiple road by means of passing through past road, and maintain temperature desired, humidity.As a result, exposure device in the top and bottom of light shield film M, owing to can not produce temperature difference and psychrometric difference, can suppress light shield film M in the different situation of state of stretching up and down as is known.
In addition, shown in Figure 2, owing to form the stream of air, the stream from volatile matter such as the silicon dioxide of sensing optical activity resin bed volatilization and siloxane and the floating material that floats on dust in the exposure room R2 etc. along air moves, and escape hole 5 is expelled to outside the exposure room R2 from the side.And, under the situation that escape hole 5 is not discharged from the side, can be expelled to outside the exposure room R2 from the vent port 7a on ground.
And, can prevent to be attached to the surface of concave mirror 24 and light shield film M etc. from volatile matter such as the silicon dioxide of photo-sensitive resin volatilization and siloxane and the floating material that floats on dust in the exposure room R2 etc.
And owing to be provided with air cleaning filter 3a at supply port 3, the air that is supplied to exposure room R2 from supply port 3 is by air cleaning filter 3a and peace and quiet.Then, because this peace and quiet air can pass through along light shield frame 31, light shield film M, substrate W and mounting table 30, can prevent effectively that floating material such as dust is attached on the light shield frame 31.
And, because the air of adjusting temperature and humidity by aircondition 2 is supplied in the exposure room R2, in exposure room R2, particularly temperature and the humidity around the light shield film M can be remained on set temperature and humidity.
Therefore, exposure device 1 can be dealt with the exposure of circuit pattern of granular of the condition strictness of temperature and humidity.
And at this, aircondition 2 is supplied with and for example temperature is controlled at 22～23 ℃, humidity and is controlled at 55～60% air.In addition, for example the air supply velocity from supply port 3 is 1.5m/sec, the air supply velocity of sending from circulator 4 by the time be 1.5m/sec.
And though more than Shuo Ming exposure device 1 is to be that example is done explanation with circulator 4 as the air supply direction change device, structure as described in Figure 4 also can.
Fig. 4 a, 4b are stereographic map and the sectional view that the part with exposure device of the another way of expression air supply direction change device removes.And in the following description, in the illustrated structure, components identical gives identical label and omits its explanation.
As shown in Figure 4, wind deflector 14 (air-supply change device) is watched the formation bending from section, makes the air by light shield film M upside pass through the downside of light shield film M and towards side wall surface escape hole 5, comprise twisted plate 14a and derivation plate 14b.The twisted plate 14a of this wind deflector 14 is the functions as the change plate of change air direct of travel.And, derive plate 14b and adjust air-flow, making by the downside of light shield M towards the air-flow of side wall surface escape hole 5 is parallel with respect to light shield film M.
At this, the length of the Width of this wind deflector 14 forms roomy shape, the air of supplying with from wind deflector 14 be covered in the pattern that forms light shield film M the zone below, preferably have the big width of width than the zone that forms pattern.
This wind deflector 14 best its twisted plate 14a and derivation plate 14b are integrally formed continuously, in addition, twisted plate 14a and the derivation plate 14b for preparing are individually made up and formation wind deflector 14.
The twisted plate 14a of wind deflector 14 receives the air of sending here along light shield frame 31 from supply port 3, and imports and exports plate 14b side on than the high position of light shield frame 31 upper surfaces.This derivation plate 14a preferably includes flexure plane, can make the flat board as the change plate tilt to set angle.
Derivation plate 14b forms roomy shape corresponding to the area of the pattern of light shield film M, will transmit between mounting table 30 and light shield film 31 along the air of twisted plate 14a conveying.This derivation plate 14b is disposed at than the high position of the upper surface of mounting table 30 and than between the low position of the lower surface of light shield film 31.
So the wind deflector 14 of structure will be from the air of supply port 3 when light shield frame 31 be carried, and air is delivered to along twisted plate 14a and derived plate 14b side, air can be delivered between mounting table 30 and the light shield frame 31 by means of deriving plate 14b.
And wind deflector 14 can be a structure as shown in Figure 5.Fig. 5 is the side view of the alternate manner of air supply direction change device.
As shown in Figure 5, wind deflector 44 comprise twisted plate 44a as the change plate of the direct of travel of change air, adjust along this twisted plate 44a and the derivation plate 44b of the air-flow that comes, for adjusting twisted plate 44a and deriving adjustment part 44c, the 44d that angle (angle is set) is set of plate 44b and support twisted plate 44a and the 44e of support sector that derives plate 44b via this adjustment part 44c, 44d.
At this, it is identical with above-mentioned derivation plate 14b to derive plate 44a, and the adjustment air-flow makes by being parallel towards the air-flow of side wall surface escape hole 5 with respect to light shield film M between light shield film M and the mounting table 30.And the 44e of support sector has the installation portion 44f of the internal face in framework of being installed on 6.
So the wind deflector 44 of structure unclamps adjustment part 44c, 44d and adjusts twisted plate 44a, derives the angle that is provided with of plate 44b, and locks adjustment part 44c, 44d again, and with twisted plate 44a, derive plate 44b and be positioned on the set position.As shown in Figure 5, (suitably the circulator 4 of permutation graph 2 and with reference to) is when exposure device 1 start, when air is carried in the top from supply port 3 along light shield frame 31, twisted plate 44a along wind deflector 44 is directed to derivation plate 44b with air, and 44b is delivered to air between light shield frame 31 and the mounting table 30 by this derivation plate.At this moment, wind deflector 44 owing to can freely adjust twisted plate 44a and derive the angle that is provided with of plate 44b, is reached easily and is safeguarded or setting.
In other words, because the angle that is provided with of wind deflector 44 is altered to desirable angle, can quite fine adjust direct of travel by the air of light shield film M downside.
In addition, exposure device of the present invention can be exposure device 1A shown in Figure 6.
Fig. 6 is the sectional view that removes the part of exposure device.And in the illustrated structure, identical construction gives identical label and omits its explanation.
In this exposure device 1A, be provided with air outlet 40 on the top of framework 6.
This air outlet 40 is connected in aircondition 2 via conduit 2c, supplies with from aircondition 2 and is adjusted to both air of fixed temperature, humidity.Then, air outlet 40 be disposed at concave mirror 24 near, the air sent from air outlet 40 is moved along the concave surface of concave mirror 24.
On this air-supply path, supply with peace and quiet air for concave surface along concave mirror 24, have the air cleaning filter 42 identical with above-mentioned structure.This air cleaning filter 42 is arranged at the opening surface of air outlet 40 at this.This air outlet 40 has set angle, be arranged at concave mirror 24 near, and be not overlapped in from the light path of second level crossing 23 towards the light of concave mirror 24 reflection.
Wind guide plate 45 is curved plate, forms the width identical with concave mirror 24.
This wind guide plate 45 is adjusted the direct of travel of air, the air of sending from air outlet 40 moves along the concave surface of concave mirror 24, is vented to outside the exposure room R2 from vent port 7a described later etc.
In this example, wind guide plate 45 is positioned at respect to air outlet 40 and clips concave mirror 24 and in opposite directions the position, and is located at than concave mirror 24 more on the position of below.
In other words, be located at the downstream of the direct of travel of the air of sending from air outlet 40.And this wind guide plate 45 preferably uses not shown fixedly tool to be fixed on the wall of exposure room R2.
At this, in this example,, also the shape of the wall 6a of exposure room R2 can be formed the curved surface shape though wind guide plate 45 is arranged on the wall of exposure room R2, gas flow smooth ground is flow through.
So the exposure device 1A of structure makes the air sent from air outlet 40 move and arrive wind guide plate 45 along the concave surface of concave mirror 24.And, the air of arrival wind guide plate 45, by wind guide plate 45, its direct of travel is towards circulator 4.
As a result, the air that arrives circulator 4 changes direct of travel by means of circulator, in through the space between mounting table 30 and the light shield frame 31, is expelled to the outside of exposure device 1A via sidewall escape hole 5.
On the other hand,, do not cross circulator 4, be vented to the outside of exposure device 1A from vent port 7a by the air of circulator change direct of travel.
Therefore, in exposure device 1A, volatile substance from the silicon dioxide of photoresist volatilization and siloxane etc., and in exposure room R2 floating floating material, by means of the air that in exposure device 1A, circulates, from the outside that ground vent port 7a that mounting table 30 is set and side wall surface exhaust opening 5 are expelled to exposure room R2 (exposure device 1A).
Therefore, can prevent from the volatile substance of the silicon dioxide of photoresist volatilization and siloxane etc. and among exposure room R2 floating floating material be attached to the surface of concave mirror 24 and light shield film M etc.
In addition, exposure device 1A keep from supply port 3 to circulator 4 with the state of the stream of side wall surface escape hole 5 under, form from the stream of air outlet 40 via 45 air-supplies of wind guide plate.Therefore, among the exposure device 1A, the air of exposure room R2 can be in recurrent state and can not flow the temperature humidity of may command concave mirror 24, light shield film M and substrate W with being detained, particularly can make the flexible in stable condition of light shield M, can reach the requirement of granular circuit pattern.
In the exposure device 1A of like this structure, preferably in exposure room R2, do not produce the degree of sinuous flow from the air supply velocity of the air of air outlet 40 air-supplies, be 1.5m/sec for example at this at air outlet 40, when passing through wind guide plate 45, be 1.2m/sec
In addition, the control of wind speed etc. is undertaken by not shown operation valve.And the air-supply in exposure room R2 is often carried out in exposure operation.
And by wind guide plate 45 is set, the air of the concave surface by concave mirror 24 impacts the wall of exposure room R2 and can prevent to produce sinuous flow in exposure room R2.And, can prevent the interior phenomenon that air trapping takes place of exposure room R2.So, by making flowing of air level and smooth, volatile substance etc. can be discharged from exposure room R2 effectively, keep temperature and humidity in the exposure room R2 simultaneously effectively.
Claims (4)
1. exposure device, has an exposure room, take in the mounting table of mounting substrate and the support frame of supporting the light shield film in inside, make aforesaid substrate and above-mentioned light shield film butt or approaching, irradiation comprises the ultraviolet light of set wavelength, and in the exposure device to the aforesaid substrate exposure, comprising:
Be located on the sidewall in the above-mentioned exposure room, supply with the supply port of the air of preset temperature and humidity along the face of the rayed side that becomes above-mentioned support frame;
Be located at the below of above-mentioned supply port, by the air sent here between above-mentioned support frame and the above-mentioned mounting table and discharge the side wall surface escape hole that the air in the above-mentioned exposure room is used;
The air supply direction of the air of being located at another sidewall of above-mentioned exposure room and will sending here from above-mentioned supply port changes at least by between above-mentioned support frame and the mounting table and towards the air supply direction change device of above-mentioned side wall surface escape hole; And
Be located at outside the above-mentioned exposure room, when the air of discharging from above-mentioned side wall surface escape hole is entered through filtrator, be adjusted to default temperature and humidity and be delivered to the temperature humidity adjusting gear of above-mentioned supply port.
2. exposure device as claimed in claim 1, wherein above-mentioned air supply direction change device comprises:
The suction inlet of air;
Suck the rotating vane of air from this suction inlet;
Drive the drive unit of this rotating vane rotation; And
The air outlet that to send to above-mentioned side wall surface escape hole via above-mentioned rotating vane inhaled air.
3. exposure device as claimed in claim 1, wherein above-mentioned air supply direction change device comprises:
On the position of above-mentioned supply port, accept the air of being supplied with and changing the change plate of direction; And
Guide this air and will along this change air that plate carries between above-mentioned support frame and the mounting table towards the derivation plate of above-mentioned side wall surface escape hole.
4. exposure device as claimed in claim 1, it also comprises an exhaust ground, is located at least a portion of the face that is provided with in the above-mentioned exposure room that above-mentioned mounting table is set, this exhaust ground has a plurality of vent ports, discharges the air of above-mentioned exposure room.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005361107A JP4472626B2 (en) | 2005-12-14 | 2005-12-14 | Exposure equipment |
| JP2005361107 | 2005-12-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1983038A true CN1983038A (en) | 2007-06-20 |
| CN100495217C CN100495217C (en) | 2009-06-03 |
Family
ID=38165654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006101670896A Expired - Fee Related CN100495217C (en) | 2005-12-14 | 2006-12-14 | Exposure device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4472626B2 (en) |
| CN (1) | CN100495217C (en) |
| TW (1) | TW200722937A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101276150B (en) * | 2008-03-21 | 2010-06-02 | 上海微电子装备有限公司 | Stepping repeat exposure device |
| CN101930181A (en) * | 2009-06-17 | 2010-12-29 | 株式会社日立高科技 | Proximity exposure apparatus, method for controlling substrate temperature and method of manufacturing panel substrate |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1036290A1 (en) | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Lithographic apparatus. |
| CN102231047B (en) * | 2011-06-23 | 2016-09-14 | 上海华虹宏力半导体制造有限公司 | UV-curing equipment and UV-curing equipment alarm method |
| JP2015034846A (en) * | 2013-08-07 | 2015-02-19 | 株式会社清和光学製作所 | Vertical type film exposure apparatus |
| JP7386742B2 (en) * | 2020-03-24 | 2023-11-27 | 株式会社Ｓｃｒｅｅｎホールディングス | exposure equipment |
-
2005
- 2005-12-14 JP JP2005361107A patent/JP4472626B2/en not_active Expired - Fee Related
-
2006
- 2006-12-08 TW TW095145942A patent/TW200722937A/en not_active IP Right Cessation
- 2006-12-14 CN CNB2006101670896A patent/CN100495217C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101276150B (en) * | 2008-03-21 | 2010-06-02 | 上海微电子装备有限公司 | Stepping repeat exposure device |
| CN101930181A (en) * | 2009-06-17 | 2010-12-29 | 株式会社日立高科技 | Proximity exposure apparatus, method for controlling substrate temperature and method of manufacturing panel substrate |
| CN101930181B (en) * | 2009-06-17 | 2012-11-07 | 株式会社日立高科技 | Proximity exposure apparatus, method for controlling substrate temperature and method of manufacturing panel substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200722937A (en) | 2007-06-16 |
| JP4472626B2 (en) | 2010-06-02 |
| JP2007163904A (en) | 2007-06-28 |
| CN100495217C (en) | 2009-06-03 |
| TWI366744B (en) | 2012-06-21 |
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