CN100533274C - Exposure device - Google Patents
Exposure device Download PDFInfo
- Publication number
- CN100533274C CN100533274C CNB2005100758299A CN200510075829A CN100533274C CN 100533274 C CN100533274 C CN 100533274C CN B2005100758299 A CNB2005100758299 A CN B2005100758299A CN 200510075829 A CN200510075829 A CN 200510075829A CN 100533274 C CN100533274 C CN 100533274C
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- Prior art keywords
- mentioned
- fly
- eye lens
- light source
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001816 cooling Methods 0.000 claims abstract description 18
- 239000012535 impurity Substances 0.000 claims description 9
- 230000008676 import Effects 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 8
- 239000011347 resin Substances 0.000 abstract description 6
- 229920005989 resin Polymers 0.000 abstract description 6
- 230000001678 irradiating effect Effects 0.000 abstract 3
- 238000005192 partition Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 19
- 238000005286 illumination Methods 0.000 description 9
- 239000000428 dust Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000037452 priming Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 206010018612 Gonorrhoea Diseases 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Images
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
This invention provides an exposure apparatus which prevents the surface of a fly-eye lens from being contaminated with volatile materials mainly from a photosensitive resin in a simple structure. The exposure apparatus 1 is equipped with: a light source chamber 2 having a light source 21, a reflection mirror 41 and a fly-eye lens 42; and an exposure chamber 3 segmented by a partition plate 6 from the light source chamber 2. The apparatus is provided with a chassis 7 to house the fly-eye lens 42 and with a temperature control unit 51 to blow cooling air to the fly-eye lens 42 housed in the chassis 7. The chassis 7 has apertures 71, 72 formed in the positions corresponding to the paths of incident light and exiting light of irradiating light emitting from the light source 21 with respect to the fly-eye lens 42, an air supply port 73 formed in the position crossing the aperture direction of the apertures 71, 72 and connected to the temperature control unit 51, and an exhausting port 74 formed in the position opposing the air supply port 73. The partition plate 6 is provided with a translucent member 61 which transmits the irradiating light in the position corresponding to the optical path of the irradiating light.
Description
Technical field
The present invention relates to the exposure device on the substrate that a kind of circuit pattern that is used for mask is exposed to printed circuit board (PCB) etc.
Background technology
In exposure device; the light that light source shone is via fly's-eye lens (fly-eye lens), by the optical system that optics constituted of a plurality of reflective mirrors etc.; with the circuit pattern that is formed on the mask; expose, be developed on the substrate that has applied protective seam (photosensitive resin), make printed circuit board (PCB) etc.
Generally speaking, though the surface-coated antireflection film that covered of optics, this tunicle is because poor heat resistance and easily affected by environment.For example, well-known, it is first-class that the volatile substance that is coated on the distillation that the protective seam (photosensitive resin) of substrate produces when chemical change is attached to the employed fly's-eye lens of exposure device.And, particularly float easy surface attached near the fly's-eye lens the light source because of the dust convection current of light source heating priming reaction.
Particularly, the fly's-eye lens unit in the existing exposure device comprises: two fly's-eye lenses that are installed on metal frame respectively; And be installed on and these two fly's-eye lenses locational pedestal in opposite directions etc.This fly's-eye lens unit is installed on the housing of exposure device.That is, because fly's-eye lens is independently installed in enclosure interior (with the state that roughly exposes), surrounding environment and housing are not isolated certainly.That is, the cross-ventilation of enclosure interior also directly refluxes at fly's-eye lens.The protective seam that is coated on the substrate reacts because of the exposure rayed, and its part distils and sneaked in the air of enclosure interior convection current, and it is the known fact that is recorded in list of references (patent documentation 1) that this composition is sneaked into this situation.
[patent documentation 1] spy open flat 11-202498 communique (paragraph 0033～0039, Fig. 3)
Yet, if volatile substance is in the increase of adhering on fly's-eye lens surface, its surface gonorrhoea that can become, the transmittance of fly's-eye lens can reduce, therefore, can cause the illumination of real estate to reduce or the generation uneven illumination, have problems such as time shutter prolongation, conditions of exposure reduction.
Particularly, the luminous energy that fly's-eye lens will send from light source bulb is assembled and is become high-energy, therefore reaches the suitable easy quickening temperature of reaction about 300 degree.That is, in the prior art, therefore the situation that fly's-eye lens has volatile substance to adhere to easily exists the problem that causes above-mentioned conditions of exposure to reduce easily.
As the invention of this fly's-eye lens of protection, known have above-mentioned list of references (patent documentation 1), but its complex structure exists the maintenance operation of fly's-eye lens not good, problems such as heat eliminating medium price height.
Summary of the invention
Therefore, the present invention provides a kind of exposure device for addressing the above problem, and it prevents the pollution on the surface of the fly's-eye lens that causes because of photosensitive resin (volatile substance) with simple structure.
For solving above-mentioned problem, one of the present invention's exposure device possesses: the light source chamber with light source, catoptron and fly's-eye lens; And the exposure room of separating with light source chamber via demarcation strip, it is characterized in that possessing: the housing of accommodating above-mentioned fly's-eye lens; And air-supply arrangement, cooling air is delivered to the above-mentioned fly's-eye lens that is contained in the above-mentioned housing.Above-mentioned housing has: peristome, be formed at from the irradiates light of above-mentioned light source with respect to the input path of above-mentioned fly's-eye lens and penetrate on the corresponding position of light path; Air intake opening is formed on the position with the opening direction quadrature of this peristome, and links above-mentioned air-supply arrangement; And exhausr port, be formed at this air intake opening position in opposite directions on.On above-mentioned demarcation strip, on the position corresponding, be provided with the light transparent member that above-mentioned irradiates light is seen through with the light path of above-mentioned irradiates light.
Exposure device one of according to the present invention by being arranged at the light transparent member of demarcation strip, is guaranteed the light path of the irradiates light that light source sends, and, be separated out exposure room and light source chamber.And, irrelevant with the fly's-eye lens whether irradiates light of light source is injected or penetrated in the housing, be supplied in fly's-eye lens from the cooling air of air-supply arrangement via the air intake opening of housing, discharge from exhausr port.And air intake opening and exhausr port are arranged in opposite directions the position, and the air-supply path in the housing forms a linearity thus.
The present invention's two exposure device, on the basis of the described exposure device of one of the present invention, it is characterized in that above-mentioned air-supply arrangement imports the gas of delivering to above-mentioned housing from the outside of above-mentioned exposure room and light source chamber, in the air-supply path of above-mentioned air intake opening, be provided with impurity and remove filtrator.
Two exposure device according to the present invention is owing to deliver in the above-mentioned housing surface that is attached to fly's-eye lens so can prevent to fly at the dust circulation of light source chamber with the gas of the outside of exposure room and light source chamber.
And, because being set, impurity removes filtrator in the air-supply path that arrives air intake opening, thus can remove the impurity that is included in the gas, and be delivered in the housing.And, removing filtrator as impurity, can enumerate as HEPA filtrator, ulpa filter and chemical filter etc.
The present invention's three exposure device on the basis of one of the present invention or two described exposure devices, is characterized in that above-mentioned light transparent member releasably is located on the above-mentioned demarcation strip from above-mentioned exposure room side.
Three exposure device according to the present invention, because light transparent member releasably is located on the demarcation strip from the exposure room side, so, be attached at volatile substance under the situation of exposure room side of this light transparent member, light transparent member can be pulled down from the exposure room side of area of space broad and be cleaned or change.
Effect of the present invention is:
Exposure device one of according to the present invention can prevent that photosensitive resin (volatile substance) is attached to the surface of fly's-eye lens.Its result can prevent uneven illumination, illumination reduction etc., can carry out high-precision exposure, simultaneously, fly's-eye lens is done minimal maintenance, can alleviate significantly to safeguard related labour.And, because volatile substance only is attached to light transparent member, therefore, only carry out the replacing or the maintenance of light transparent member, can implement high-precision exposure.
And, can in housing, not form delay, dust can be discharged to outside the housing.And, because housing only has air intake opening and exhausr port on position in opposite directions, can adopt simple structure.
In addition,, therefore be not subject to the influence of light source heating, can keep lens peculiarity well because cooling air is delivered in the housing.Particularly, can prevent because of the heat priming reaction of light source and the surface that is attached to fly's-eye lens because of the showy dust of convection current.And, because light transparent member only is provided with one on demarcation strip, so, required minimal light transparent member only is installed on the light path of the irradiates light that light source sends.
Two exposure device according to the present invention, the dust that can prevent to fly at light source chamber is attached to the surface of fly's-eye lens.Its result can prevent uneven illumination, illumination reduction etc., and reach high-precision exposure.
Three exposure device according to the present invention because light transparent member releasably is provided with from the exposure room side, so can carry out the operations such as replacing of light transparent member from the exposure room side of area of space broad, can easily be handled light transparent member.
Description of drawings
Fig. 1 is the one-piece construction planimetric map of the exposure device of expression present embodiment.
Fig. 2 is an exposure device shown in Figure 1 cut-open view along the A-A line.
Fig. 3 is the part sectional block diagram of the light source chamber seen from the exposure room side.
Fig. 4 is the part sectional block diagram of expression light source chamber inner structure.
Fig. 5 is the side sectional view of light source chamber.
Symbol description
1～exposure device;
2～light source chamber;
3～exposure room;
5～cavity;
6～dividing plate (demarcation strip);
7～housing;
21～light source;
31～face exposure chamber;
32～workpiece counter-rotating portion;
33～back-exposure chamber;
41～reflective mirror (catoptron);
42～fly's-eye lens;
51～temperature adjustment unit (air-supply arrangement);
61～light transparent member;
71,72～peristome;
73～air intake opening;
73a～impurity is removed filtrator;
74～exhausr port;
M～mask;
W～workpiece (substrate).
Embodiment
Then, with reference to suitable accompanying drawing embodiments of the present invention are elaborated.Fig. 1 is the one-piece construction planimetric map of the exposure device of present embodiment.Fig. 2 is an exposure device shown in Figure 1 cut-open view along the A-A line.Fig. 3 is the part sectional block diagram of the light source chamber seen from the exposure room side.
As shown in Figure 1, exposure device 1 mainly possesses in cavity (chamber) 5: light source chamber 2; Irradiates light is done the process chamber of exposure to substrate, and promptly exposure room 3; And be disposed at from light source 21 to exposure room optical system (reflective mirror 41 etc. are with reference to Fig. 2) on 3 the illumination path.Be provided with temperature adjustment unit 51 (air-supply arrangement) at cavity 5 via the pipeline that is mounted thereon portion (duct) 52.By this temperature adjustment unit 51, cooling air can be supplied in the cavity 5 and discharge, therefore, can in cavity 5, guarantee certain air-supply path, simultaneously, can make to keep certain temperature in the cavity 5.In this air-supply path,, therefore can prevent that volatile substance is attached to the surface of this reflective mirror 44 owing to blow over the surface of reflective mirror 44 described later.
And this temperature adjustment unit 51 imports from will the blow gas of usefulness of light source chamber 2 and exposure room 3.
As shown in Figure 1, exposure room 3 comprises: the face exposure chamber of being exposed in the surface of workpiece W (substrate) (with reference to Fig. 2) 31; The back-exposure chamber 33 that back of work is exposed; And be arranged at workpiece counter-rotating portion 32 between face exposure chamber 31 and the back-exposure chamber 33.Workpiece W is at first moved into face exposure chamber 31, after the enforcement face exposure, by 32 counter-rotatings of workpiece counter-rotating portion, moves into back-exposure chamber 33 again and implements back-exposure, is made into printed circuit board (PCB) then.And, because face exposure chamber 31 and back-exposure chamber 33 are the identical form of the composition, below, explanation done at the structure of face exposure chamber 31 (following only be called " exposure room 3 ").
As shown in Figure 2, the inside of face exposure chamber 31 possesses: the plummer 34 of workpiece W movably in order to integrate operation; With the mask frame 35 of this plummer 34 in the face of the supporting mask M of setting; Reflective mirror (mirror) 44 via the mask M that is supported on this mask frame 35, makes light from light source become directional light and reflects on workpiece W; And reflective mirror 43, the light that light source chamber 2 sides are sent here reflexes to this reflective mirror 44.
And the rear side (left side among the figure) in face exposure chamber 31 is provided with light source chamber 2, and this light source chamber 2 has radiation source 21 and a pair of fly's-eye lens 42 described later that is used for workpiece W exposure.And as shown in Figure 3, face exposure chamber 31 is separated out each chamber with light source chamber 2 via dividing plate 6 (demarcation strip).
As shown in Figure 2, as the light source 21 that is disposed at light source chamber 2, the mercury vapor lamp of lighting by arc discharge for example is set, on the illumination path of the workpiece W from this light source 21 to above-mentioned face exposure chamber 31, be equipped with the optical system that is constituted by shutter (shutter) 22, reflective mirror 41, fly's-eye lens 42 and a plurality of reflective mirror (catoptron).Herein, optical system comprises: reflection is from the reflective mirror 41 (catoptron) of the light of light source 21; A pair of fly's-eye lens 42 has convergence from the light of reflective mirror 41 function as secondary souce; And adjust from the angle of the light of fly's-eye lens 42 and make the above-mentioned reflective mirror 43,44 of its reflection.And, between reflective mirror 41 and fly's-eye lens 42, be provided with shutter 22.Light source 21 is often lighted, and controls the irradiation of irradiates light by the switching of control shutter 22, can carry out exposure operation easily.And in this optical system, reflective mirror 41 and fly's-eye lens 42 are disposed in the light source chamber 2, other optics, and promptly reflective mirror 43,44 is like preceding described being disposed in the face exposure chamber 31.The light that light source 21 is sent is radiated on the mask M that is formed with circuit pattern equably via the optical system transmission, and this circuit pattern is exposed on the workpiece W.And in the inside of exposure room 3, because the heat of exposure operation etc., it is known can floating from the volatile substance that is coated in protective seam on the workpiece W etc.
Fig. 4 is the part sectional block diagram of the inner structure of expression light source chamber.Fig. 5 is the side sectional view of light source chamber.
As shown in Figure 4, in the optical system, fly's-eye lens 42 is contained in the housing 7 that is fixed on dividing plate 6.Housing 7 is rectangular box-shaped, in the input path relative with the fly's-eye lens 42 of irradiates light and penetrate on the light path, is formed with peristome 71,72 (with reference to Fig. 2).Whereby, can guarantee light path by the irradiates light in the housing 7.
Again, as shown in Figure 5, be formed with at housing 7: air intake opening 73 is formed on the position with the opening direction quadrature of peristome 71,72 (with reference to Fig. 2); And exhausr port 74, be formed at this air intake opening 73 position in opposite directions on.In order to transport the cooling air from above-mentioned temperature adjustment unit 51, linking on air intake opening 73 has air inlet with pipeline 53, on exhausr port 74, link have with the exhaust of the external communications of light source chamber 2 with pipeline 54.Temperature adjustment unit 51 is delivered to cooling air in the housing 7 with pipeline 53 via air inlet, can do direct cooling to the surface of the fly's-eye lens 42 in the housing 7.In this housing 7,,, can not form delay in inside so the air-supply path in the housing 7 forms a linearity because air intake opening 73 disposes in opposite directions with exhausr port 74.And in the air-supply path of air intake opening 73 (in this, air intake opening 73), the impurity that is provided with HEPA filtrator for example etc. is removed filtrator.Whereby, in housing 7, owing to send into the cooling air of having removed impurity, therefore the cooling air of cleaning blows on the fly's-eye lens 42.And owing to carry cooling air towards fly's-eye lens 42 in housing 7, therefore, the internal face of this housing 7 becomes guiding face, can supply with a certain amount of cooling air under the situation of the heat affecting that is not subjected to light source 21 constantly.
And, to shown in Figure 4, on dividing plate 6, with from the corresponding position of the light path of the light of exposure room 3 sides irradiation, in other words, on the part relative, be provided with the light transparent member 61 of quartz glass for example etc. with the peristome 71 of housing 7 as Fig. 2.Light transparent member 61 releasably is installed with via the installing frame of being located on the dividing plate 6 62.Whereby, fly's-eye lens 42 is isolated (with reference to Fig. 2,3) via light transparent member 61 with face exposure chamber 31.Therefore, 31 volatile substances that produce can not invaded light source chamber 2 sides in the face exposure chamber, can prevent that it is attached to the surface of fly's-eye lens 42.And, on this light transparent member 61, also can make light transparent member 61 can not be exposed to showy volatile substance by blowing nitrogen.
Effect to the exposure device 1 of said structure describes.
Exposure device 1 will by opening shutter 22, via fly's-eye lens 42, light transparent member 61, reflective mirror 43,44, expose on the mask M from the irradiates light of light source 21 by reflective mirror 41 reflection, and the circuit pattern that will be formed at mask M is exposed on the workpiece W.At this moment, by exposure operation, the meetings such as protective seam that are coated on the workpiece W produce volatile substance.
And, in exposure device 1, in housing 7, cooling air is sent into via air intake opening 73 from temperature adjustment unit 51, blow over the surface of fly's-eye lens 42, and discharge from exhausr port 74.
As mentioned above, in the exposure device 1 of present embodiment, can obtain following effect.
Fly's-eye lens 42 is disposed in the light source chamber of separating with dividing plate 6 and exposure room 32, on dividing plate 6, because light transparent member 61 is arranged on the light path of irradiates light, the volatile substance that the photosensitive resin of exposure room 3 produces can not invaded light source chamber 2, can prevent that volatile substance is attached on the surface of fly's-eye lens 42.
And fly's-eye lens 42 is contained in the housing 7, and fly's-eye lens 42 in the housing 7 is delivered to cooling air in temperature adjustment unit 51.Because the air intake opening 73 of housing 7 and exhausr port 74 are arranged in opposite directions the position, so the air-supply path of housing 7 forms a linearity.Therefore, in housing 7, can not form delay, can prevent that volatile substance is attached to the surface of fly's-eye lens 42, simultaneously, because housing 7 only has the locational air intake opening 73 and exhausr port 74 that is arranged in opposite directions, so can prevent adhering to of volatile substance with simple structure.And, air intake opening 73 and exhausr port 74 form the orthogonal thereto opening of opening direction with peristome 71,72, be thus connected in the air inlet of air intake opening 73 and exhausr port 74 and can not hinder illumination path with pipeline 54, also realized simple structure in this with pipeline 53 and exhaust.
And, because cooling air is often blown on the surface of fly's-eye lens 42, so the temperature of fly's-eye lens 42 also can remain in suitable temperature.
And, owing to carry cooling air, be not subject to the influence of light source 21 heatings, can keep the lens peculiarity of fly's-eye lens 42 well.Particularly, can prevent because of the heat priming reaction of light source and the surface that is attached to fly's-eye lens 42 because of the showy dust of convection current.And, a light transparent member 61 only is set on dividing plate 6, so, required minimal light transparent member only is set on the light path of the irradiates light that light source sends, can obtain preferred form.
Because the gas of exposure room 3 and light source chamber 2 outsides is supplied in the housing 7, be attached to the surface of fly's-eye lens 42 so can not produce the dust circulation that flies in the light source chamber 2.And, on the air intake opening 73 of housing 7, removing filtrator 73a owing to be provided with impurity, therefore can often the cooling air that cleans be delivered in the housing 7.
In addition, releasably is provided with owing to isolate the light transparent member 61 of light source chamber 2 and exposure room 3, so, be attached at volatile substance under the situation of exposure room 3 sides of this light transparent member 61, light transparent member 61 can be pulled down and clean or replacing.
More than, though describe at embodiments of the present invention, the present invention is not limited to above-mentioned embodiment.
In the present embodiment, though describe at double-side exposal device, certain single face exposure device, mechanically carry out the automatic exposure unit of moving into, integrate, expose, taking out of of workpiece, operator carries out the semi-automatic exposure device of moving into, taking out of of workpiece, and vertical exposure device of processing in vertical direction with respect to the projecting plane of workpiece also can, do not limit the form of exposure device.
Claims (3)
1. an exposure device possesses: the light source chamber with light source, catoptron and fly's-eye lens; And the exposure room of separating with this light source chamber via demarcation strip, it is characterized in that possessing:
Accommodate the housing of above-mentioned fly's-eye lens;
And air-supply arrangement, cooling air is delivered to the fly's-eye lens that is contained in the above-mentioned housing;
Above-mentioned housing has: peristome, be formed at from the irradiates light of above-mentioned light source with respect to the input path of above-mentioned fly's-eye lens and penetrate on the corresponding position of light path; Air intake opening is formed on the position with the opening direction quadrature of this peristome, and links above-mentioned air-supply arrangement; And exhausr port, be formed at this air intake opening position in opposite directions on, thereby in above-mentioned housing, form the air-supply path of a linearity;
On above-mentioned demarcation strip, on the position corresponding, be provided with the light transparent member that above-mentioned irradiates light is seen through with the light path of above-mentioned irradiates light.
2. exposure device as claimed in claim 1, it is characterized in that, above-mentioned air-supply arrangement imports the gas of delivering to above-mentioned housing from the outside of above-mentioned exposure room and light source chamber, on the air-supply path in the above-mentioned air-supply arrangement of above-mentioned air intake opening, is provided with impurity and removes filtrator.
3. exposure device as claimed in claim 1 or 2 is characterized in that, above-mentioned light transparent member releasably is located on the above-mentioned demarcation strip from above-mentioned exposure room side.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004159485 | 2004-05-28 | ||
| JP2004159485A JP2005338603A (en) | 2004-05-28 | 2004-05-28 | Exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1702556A CN1702556A (en) | 2005-11-30 |
| CN100533274C true CN100533274C (en) | 2009-08-26 |
Family
ID=35492247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100758299A Expired - Fee Related CN100533274C (en) | 2004-05-28 | 2005-05-27 | Exposure device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2005338603A (en) |
| CN (1) | CN100533274C (en) |
| TW (1) | TWI279651B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105045041A (en) * | 2014-04-17 | 2015-11-11 | 株式会社菲尔光学 | Led light source exposure device |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080073596A1 (en) * | 2006-08-24 | 2008-03-27 | Asml Netherlands B.V. | Lithographic apparatus and method |
| JP2011107572A (en) * | 2009-11-20 | 2011-06-02 | Hitachi High-Technologies Corp | Proximity exposure apparatus, method for protecting optical component of proximity exposure apparatus, and method for manufacturing display panel substrate |
| JP5644101B2 (en) * | 2009-12-22 | 2014-12-24 | 株式会社ブイ・テクノロジー | Exposure equipment |
| CN103364077B (en) * | 2012-03-28 | 2016-06-29 | 睿励科学仪器（上海）有限公司 | For the temperature-controlled process of optical gauge and equipment and optical gauge |
| CN109719396A (en) * | 2017-10-27 | 2019-05-07 | 湖北天利来科技发展有限公司 | A kind of mailbox door-plate pattern exposure machine |
-
2004
- 2004-05-28 JP JP2004159485A patent/JP2005338603A/en active Pending
-
2005
- 2005-02-15 TW TW94104288A patent/TWI279651B/en not_active IP Right Cessation
- 2005-05-27 CN CNB2005100758299A patent/CN100533274C/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105045041A (en) * | 2014-04-17 | 2015-11-11 | 株式会社菲尔光学 | Led light source exposure device |
| CN105045041B (en) * | 2014-04-17 | 2017-06-23 | 株式会社菲尔光学 | Led light source exposure device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI279651B (en) | 2007-04-21 |
| TW200538857A (en) | 2005-12-01 |
| JP2005338603A (en) | 2005-12-08 |
| CN1702556A (en) | 2005-11-30 |
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