JP4472626B2 - Exposure equipment - Google Patents

Description

  The present invention relates to an exposure apparatus that exposes a substrate through a mask film, and more particularly to an exposure apparatus that excels in an air circulation environment in an exposure chamber.

  Conventionally, as a substrate used in an exposure apparatus, for example, a thin substrate of about 0.05 mm for an electronic circuit substrate is used, and the circuit pattern is also shifted in the direction of miniaturization. In the exposure apparatus, the circuit pattern of the mask film is accurately applied to the substrate by irradiating the mask film on which the circuit pattern is formed and the substrate in close contact with light including ultraviolet rays having a predetermined wavelength. Exposure is performed.

  Here, a conventional configuration of the exposure apparatus will be described with reference to FIG. FIG. 7 is a side view schematically showing an exposure chamber of a conventional exposure apparatus. As shown in FIG. 7, the exposure apparatus 50 includes an exposure table 51 on which the substrate W is placed, a holding frame 52 that holds the mask film M on the side facing the exposure table 51, and an upper side of the holding frame 52. It mainly includes an optical system 53 having a light source that irradiates light including ultraviolet rays of a predetermined wavelength via a reflection optical system (not shown), and a blower mechanism 54 that blows cooling air to the substrate W and the mask film M side.

In the exposure apparatus 50, since the cooling air whose temperature is controlled by the air blowing mechanism 54 is blown to the mask film M and the substrate W, the exposure device 50 is extended by heat when the substrate W and the mask film M are irradiated with light. I try to prevent that.
Japanese Patent No. 3099841 (paragraphs 0011 and 0012, FIG. 1)

However, the blower mechanism in the conventional exposure apparatus has the following problems.
In a conventional exposure apparatus, a mask film that is easily affected by heat by being irradiated with light, and a substrate that is different in the influence of heat by light irradiation as compared to the mask film, have the same conditions of temperature and Humidity air is blown directly from the blower mechanism. Therefore, the adjustment of the expansion / contraction state of the mask film and the substrate depending on the temperature and humidity cannot be handled by an exposure apparatus that requires a miniaturized circuit pattern. In addition, the upper surface of the mask film is cooled via the translucent plate, and the lower surface is directly blown to be affected by air. For this reason, the air blowing state that affects the expansion and contraction of the mask film becomes inadequate, and an exposure apparatus that requires a miniaturized circuit pattern cannot cope with it, and an improvement has been desired.

  Further, in the conventional exposure apparatus, air whose temperature and humidity are controlled by the air blowing mechanism is blown into the exposure chamber, but only the configuration on the air blowing side is considered, so the blown air is discharged from the exposure chamber. The environment up to is not considered. For this reason, in a substrate where circuit pattern miniaturization has progressed, the air heated by the light irradiated in the exposure chamber may stay without being efficiently ventilated, and the state of expansion and contraction due to the heat of the mask film and the substrate may occur. It was difficult to adjust the impact.

  The present invention has been devised in view of the above-described problems, and makes the air blowing state for the mask film and the substrate appropriate, and makes the fluid environment of the air blown to the mask film and the substrate appropriate in the exposure chamber. An object of the present invention is to provide an exposure apparatus capable of performing the above.

  In order to solve the above-mentioned problem, an exposure apparatus according to claim 1 includes an exposure chamber that houses therein a mounting table for mounting a substrate and a support frame that supports the mask film, and the substrate and the mask film are provided. In an exposure apparatus that exposes the substrate by abutting or approaching and irradiating light containing ultraviolet light of a predetermined wavelength, provided on one side wall of the exposure chamber, along a surface that is on the light irradiation side of the support frame, A supply port for supplying air at a preset temperature and humidity, and an air provided below the supply port and sent between the support frame and the mounting table, and air in the exposure chamber A side wall surface discharge port for discharging air and an air blowing direction provided on the other side wall of the exposure chamber and sent from the supply port pass at least between the support frame and the mounting table. The air blowing direction changing means for changing the air flow toward the side wall surface discharge port, and the air discharged from the side wall surface discharge port provided outside the exposure chamber through a filter, and set in advance at a predetermined temperature and humidity And a temperature / humidity adjusting means for feeding to the supply port after adjustment.

  In the exposure apparatus configured in this way, air having a preset temperature and humidity supplied from the supply port is placed in the exposure chamber along the light-irradiated surface of the support frame supporting the mask film. Air is blown from the side wall toward the other side wall. When air is blown from the supply port, the air direction is changed between the support frame and the mounting table by the blowing direction changing means arranged on the other side wall of the exposure chamber, and the air is moved to the side wall surface. Guide to the outlet. Further, the air discharged from the side wall surface outlet is collected through a filter, adjusted to a preset temperature and humidity by the temperature and humidity adjusting means, and supplied again from the supply port into the exposure chamber.

  In the exposure apparatus according to claim 2, the air blowing direction changing means includes an air suction port, a rotating blade for sucking air from the suction port, a driving unit for rotating the rotating blade, and the rotating blade. And an air blowing port for sending out the air sucked in toward the side wall surface discharge port.

  In the exposure apparatus configured as described above, the air sent along the upper surface of the support frame is forcibly taken in from the suction port by the rotating blades that rotate via the driving unit of the blowing direction changing unit. Is forcibly sent out between the support frame and the mounting table and discharged from the side wall surface outlet.

  The exposure apparatus according to claim 3, wherein the air blowing direction changing means receives the air supplied at a position facing the supply port and changes the direction, and the air sent along the changing plate is the support. A lead-out plate that guides the air is provided so as to go from the space between the frame and the mounting table toward the side wall surface outlet.

  In the exposure apparatus configured as described above, the air sent along the upper surface of the support frame is guided along the change plate by the change plate, and is directed from the lead-out plate between the support frame and the mounting table. It is sent out and discharged from the side wall surface outlet.

  An exposure apparatus according to claim 4 is provided with an exhaust floor surface provided on at least a part of an installation surface in the exposure chamber where the mounting table is installed, and having a plurality of exhaust holes for exhausting air from the exposure chamber. It was.

  In the exposure apparatus configured in this way, the air that could not be completely changed in direction by the air blowing change means while minimizing the influence on the air flow path from the supply port to the side wall surface outlet through the air blowing direction changing means. Alternatively, the air in the exposure chamber that could not be recovered from the side wall surface outlet is exhausted out of the apparatus through the exhaust hole on the installation surface.

The exposure apparatus according to the present invention has excellent effects as described below.
The exposure apparatus supplies the air adjusted by the temperature and humidity adjusting means to the upper surface side of the mask film from the supply port, and adjusts the appropriate temperature and humidity for the mask film that is most affected by the heat due to light irradiation. Then, the expansion and contraction of the mask film is suppressed, and the temperature and humidity are adjusted with respect to the substrate and the mask film by the air blown between the support frame and the mounting table by the blowing direction changing means.
Therefore, the exposure apparatus can maintain the circulation of air in the exposure chamber so that the expansion and contraction of the mask film and the substrate, which have different effects of heat due to light irradiation, can be properly controlled, and the circuit pattern can be used for fine exposure work. Can respond.

  The exposure apparatus adjusts the temperature and humidity in the exposure chamber by forcibly sucking the air sent from the supply port by the blowing direction changing means and sending it out between the support frame and the mounting table. Since air circulation is ensured, the circuit pattern can stably cope with fine exposure work.

  By exposing the air sent from the supply port to the space between the support frame and the mounting table by changing the air blowing direction by the change plate and the lead-out plate, which are air blowing direction changing means having a simple configuration. Since the air circulation with the temperature and humidity adjusted in the exposure chamber is performed, the circuit pattern can cope with fine exposure work.

  The exposure apparatus circulates air whose temperature and humidity are adjusted in the exposure chamber by sending the air sent from the mask film supply port toward the space between the support frame and the mounting table by the blowing direction changing means. And the air flowing downward from the exhaust floor surface having the exhaust holes on the installation surface is exhausted, so that the air flow path formed around the mask film is maintained and extra air stays Can be eliminated. Therefore, the exposure apparatus can stably cope with an exposure operation with a fine circuit pattern.

Next, the best mode of the exposure apparatus according to the present invention will be described in detail with reference to the drawings as appropriate.
FIG. 1 is a side sectional view schematically showing the whole of the exposure apparatus with a part cut away, and FIG. 2 is a perspective view schematically showing the flow of air in the exposure chamber of the exposure apparatus.

  As shown in FIG. 1, the exposure apparatus 1 includes a light source 10, an optical system 20, a mounting table 30, an air supply port 3, a circulator 4 as a blowing direction changing unit, and a side wall surface discharge port 5. And an exhaust floor 7 having an exhaust hole 7a. The housing 6 is partitioned into a light source chamber R1 and an exposure chamber R2. Further, the exposure apparatus 1 is provided with an air conditioner 2 as temperature / humidity adjusting means for adjusting the air discharged outside the exposure chamber R2 through the side wall surface outlet 5 adjacent to the housing 6 and circulating it to the supply port 3. It has.

  The light source 10 includes, for example, a mercury short arc lamp 11 and a condenser mirror 12. The mercury short arc lamp 11 irradiates light including ultraviolet rays having a predetermined wavelength, and the substrate W is opened and closed by opening and closing the shutter mechanism 25 using the shutter mechanism 25 which is always turned on during the exposure operation and installed in the optical path as a pseudo light source. Is irradiating light. The condensing mirror 12 reflects the light irradiated from the mercury short arc lamp 11 and condenses it toward the first flat mirror 21 side described later.

  Here, the optical system 20 includes a first plane mirror 21, a fly-eye lens 22, a second plane mirror 23, and a concave mirror 24, and is arranged so that light is reflected through a preset optical path. . The first plane mirror 21 is a plate-like mirror, for example, a cold mirror. The first plane mirror 21 is disposed immediately above the light source 10 so as to reflect light from the light source 10 in a predetermined direction.

  The fly-eye lens 22 is formed by arranging a plurality of convex lenses vertically and horizontally, and the first plane mirror 21 and the second plane mirror 21 irradiate the light reflected by the first plane mirror 21 to the second plane mirror 23 with a uniform illuminance distribution. It is arranged in the optical path between the plane mirror 23. On the first plane mirror 21 side of the fly-eye lens 22, a shutter mechanism 25 that blocks the light reflected by the first plane mirror 21 and controls the irradiation to the workpiece (substrate) W is disposed.

  The concave mirror 24 is a mirror having a parabolic curved surface, and reflects the reflected light from the second plane mirror 23 to the mask film M as parallel light, and is, for example, a collimation mirror. The concave mirror 24 is disposed immediately above the mounting table 30 to be described later in a state facing the mask film M so as to irradiate the light reflected by the second plane mirror 23 as parallel light to the mask film M to be described later. . In the optical system 20 described above, the first plane mirror 21 and the fly-eye lens 22 are installed in the light source chamber R1. The second plane mirror 23 and the concave mirror 24 are installed in the exposure chamber R2.

The mounting table 30 has a function of aligning and moving the substrate W, can be aligned and moved in the X direction and the Y direction in the parallel direction on the mounting surface, and can be aligned and rotated in the θ direction around the vertical axis. In order to bring the substrate W into contact with the mask film M, the substrate W can be moved in the vertical direction. A mask frame 31, which is a support frame for supporting the mask film M on which a desired circuit pattern is formed, is disposed immediately above the mounting table 30.

  The air conditioner 2 is provided outside the exposure chamber R2, and adjusts air to a predetermined temperature and humidity. The air conditioner 2 supplies air adjusted to a preset temperature and humidity to a supply port 3 disposed in an exposure chamber R2 described later, and a side wall surface discharge port disposed in an exposure chamber R2 described later. The supply port 3 and the side wall surface discharge port 5 are connected by ducts 2a and 2b so that the air discharged from 5 is collected and supplied again with the temperature and humidity adjusted. The air conditioner 2 includes a temperature adjustment mechanism and a humidity adjustment mechanism (not shown) therein.

  The supply port 3 is for supplying the air whose temperature and humidity are adjusted by the air conditioner 2 along the upper surface of the mask frame 31 supporting the mask film M. The air supplied from the supply port 3 forms a flow path from the supply port 3 to the upper surface of the mask frame 31 (the surface on the light irradiation side) and the other side wall of the exposure chamber R2 in the exposure chamber R2. Has been. The supply port 3 has an air purification filter 3a installed in the opening. The air purification filter 3a used here is a paper filter that adsorbs and removes suspended matters such as dust and dust, and preferably HEPA filter that adsorbs and removes fine particles or volatile substances such as silicon dioxide and siloxane. Or a medium performance filter.

  Here, the supply port 3 is formed in a width corresponding to the effective area (pattern formation region) of the mask film M supported by the mask frame 31 and is inclined so as to face the mask frame 31. Is provided. As shown in FIG. 3A, the inclination angle of the supply port 3 is preferably an inclination angle θ1 at which the supplied air is blown to the circulator 4 side along the upper surface of the mask frame 31, When the upper surface side of the mask frame 31 is used as a reference plane, the inclination angle θ1 is preferably in the range of 90 degrees or less and 45 degrees or more with respect to the reference plane. That is, it is a range in which the air supplied from the supply port 3 is blown so that the air blowing direction is parallel or 45 degrees to the reference plane. The supply port 3 forms a flow path from the supply port 3 to the circulator 4 along the upper surface of the mask frame 31 by the supplied air.

  As shown in FIG. 2, the circulator 4 changes the blowing direction of the air blown from the supply port 3 from between the mask frame 31 and the mounting table 30 toward the side wall surface discharge port 5. . The circulator 4 is provided on the other wall surface of the exposure chamber R2 opposite to the position where the supply port 3 is installed. Here, the circulator 4 is installed at a position facing the supply port 3 and the side wall surface discharge port 5. . The circulator 4 sucks air from a case 4a installed on the other wall surface of the exposure chamber R2 and a suction port 4b provided on one surface side of the case 4a, and air from a blower port 4d provided on the other surface side of the case 4a. , A drive motor 4e that rotationally drives the rotary wing 4c, and a bearing 4f that rotatably supports the rotary wing 4c that is rotated by the drive motor 4e.

  The same air purification filter 3a as described above may be attached to the suction port 4b and the air blowing port 4d. The circulator 4 forms an air flow path from the other side wall of the exposure chamber R2 to the side wall surface outlet 5 through the space between the mask frame 31 and the mounting table 30.

  The side wall surface outlet 5 is for discharging air in the exposure chamber R2 and for discharging air blown from the circulator 4. This side wall surface discharge port 5 is installed below the supply port 3 at a position facing the mounting table 30 and the mask frame 31, and here the same air purification filter 5a as described above is provided in the opening. It is installed. The side wall surface discharge port 5 forms a flow for discharging the air in the exposure chamber R2, thereby ensuring the formation of a flow path from the circulator 4.

  The side wall surface outlet 5 is formed to have a lateral width corresponding to the effective area of the mask film M, and is set to be perpendicular (90 degrees) to the reference surface. As shown in FIG. 3B, the side wall surface outlet 5 is configured to be disposed at a position retreating from the opening position of the supply port 3 with respect to the flow of air supplied from the supply port. The effect can be reduced, which is desirable. Further, as shown in FIG. 3B, the side wall surface discharge port 5 may be installed in a range of an inclination angle opposite to the supply port 3. That is, the side wall surface outlet 5 may be installed in a state where it is inclined from 45 degrees to 135 degrees, more preferably from 90 degrees to 135 degrees with respect to the reference plane. If the tilt angle is out of the range of 45 degrees to 135 degrees, the direction of the exhaust port surface is not appropriate for the air from the circulator 4, and there is a possibility of disturbing the flow of the flow path.

  The exhaust floor 7 provided with the exhaust holes 7a exhausts the air in the exposure chamber R2 to the outside of the exposure chamber R2, and exhausts it by the pressure difference between the exposure chamber R2 and the outside of the exposure chamber. Further, the exhaust hole 7 a is blown by the circulator 4, and the air flow that has not been discharged from the side wall surface discharge port does not affect the flow path formed by the supply port 3, the circulator 4, and the side wall surface discharge port 5. As described above, the air in the exposure chamber R2 is discharged. The exhaust hole 7a is formed in a mesh shape or a punching metal shape on the floor surface on which the mounting table 30 is installed, and is formed in at least a part or all of the floor surface.

Each component described above is installed in a housing 6 partitioned into a light source chamber R1 and an exposure chamber R2. The light source chamber R1 is a sealed box-shaped space. The exposure chamber R2 is a box-shaped space having a substrate W loading / unloading port (not shown) for loading and unloading the substrate W on the side wall surface. The opening area of the exhaust hole 7a is set wider than the substrate W carry-in / out area .

Next, the operation of the exposure apparatus will be described.
The exposure apparatus 1 transports and places the substrate W on the placement table 30 by means of transport means such as a handler (not shown), and the placement table 30 on which the substrate W is placed rises to the mask frame 31. An operation is performed to bring the substrate W close to or in contact with the supported mask film M. When the exposure apparatus 1 starts to carry in the substrate W, air adjusted to a preset temperature and humidity from the air conditioner 2 is supplied from the supply port 3 into the exposure chamber R2, and air is supplied from the circulator 4 to the exposure apparatus R2. The direction of is changed and is discharged from the side wall surface discharge port 5.

  That is, the air supplied from the supply port 3 is sent to the circulator 4 side along the upper surface of the mask frame 31, and the circulator 4 flows between the mask frame 31 and the mounting table 30 to the side wall surface discharge port. A path, that is, a path in which air reciprocates between the front and back of the mask film M, is formed. At this time, the air passes through the translucent plate on the upper surface side of the mask film from the upper surface side of the mask film M to the flow path serving as the forward path, and further from the lower surface of the mask film M to the flow path serving as the return path. It works to keep the temperature and humidity of the mask film M constant. Note that the air acts to keep the temperature and humidity constant for the substrate W when the substrate W is placed on the placement table by a flow path serving as a return path.

  Since the exposure apparatus 1 irradiates light including ultraviolet rays of a predetermined wavelength from the light source 10 to the mask film M and the substrate W through the optical system 20 during operation, Heat is applied to the member irradiated with light, such as the mask film M, the mask frame 31, the translucent plate, and the substrate W. In particular, the member closer to the concave mirror 24 is more likely to be affected by the heat. Become. Therefore, the mask film M is always greatly affected by heat as compared with the substrate W, and further, the substrate W is only affected by the heat of light irradiation by one exposure operation, while being repeated many times. It will be affected by heat from light.

  Therefore, the exposure apparatus 1 minimizes the influence of heat by the reciprocating flow path of air whose temperature and humidity are adjusted with respect to the mask film M, and does not directly blow air to the mask film M. In the forward path, the temperature and humidity of the air are reflected on the mask film M by the air flow path once sent to the other side wall in the exposure chamber R2 and redirected by the circulator 4 in the return path through the translucent plate. I am letting.

  The exposure apparatus 1 is formed so that the reciprocal flow path of air is substantially the same under the influence of air supplied to the front and back of the mask film M, so that the stretched state of the mask film M can be balanced. Can be maintained.

  In addition, since an air flow path is formed as shown in FIG. 2, volatile substances such as silicon dioxide and siloxane volatilized from the photosensitive resin layer and suspended matters such as dust and dust floating in the exposure chamber R2 are caused by air. It is discharged out of the exposure chamber R <b> 2 from the floor surface exhaust hole 7 a on which the mounting table 30 is installed or from the side wall surface discharge port 5. Therefore, volatile substances such as silicon dioxide and siloxane that volatilize from the photosensitive resin layer and floating substances such as dust and dust floating in the exposure chamber R2 can be prevented from adhering to the surface of the concave mirror 24, the mask film M, and the like.

  Further, since the air purification filter 3 a is provided in the air blowing path, the air blowing port 4 d blows clean air that has passed through the air purification filter 3 a along the mask frame 31, the mask film M, the substrate W, and the mounting table 30. Since it can do, it can prevent more effectively that floating matters, such as dust and dust, adhere. Furthermore, by supplying the air whose temperature and humidity are controlled by the air conditioner 2 into the exposure chamber R2, the temperature and humidity in the exposure chamber R2, particularly around the mask film M, can be kept constant. Therefore, the exposure apparatus 1 can meet the demand for a miniaturized circuit pattern. Here, as an example, the air conditioner 2 supplies air whose temperature is controlled to 22 to 23 ° C. and humidity is controlled to 55 to 60%. Moreover, as an example, the blowing speed from the supply port 3 is 1.5 m / sec, and the blowing speed sent from the circulator 4 is 1.5 m / sec when passing.

  The exposure apparatus 1 described above has been described by taking the circulator 4 as an example of the air blowing direction changing means, but may be configured as shown in FIG. FIGS. 4A and 4B are a perspective view and a side sectional view schematically showing another form of the blowing direction changing means with a part of the exposure apparatus cut away. In addition, in the structure already demonstrated, the same thing attaches the same code | symbol and abbreviate | omits description.

As shown in FIG. 4, the air guide plate 14 as the air blowing change means is formed in a lateral width corresponding to the pattern region of the mask film M, and includes a curved plate 14 a and a lead-out plate 14 b as change plates. The air guide plate 14 may be formed such that the curved plate 14a and the lead-out plate 14b are integrally formed continuously, or the curved plate 14a and the lead-out plate 14b may be formed independently.
The curved plate 14a of the air guide plate 14 is for receiving air sent from the supply port 3 along the mask frame 31 at a position higher than the upper surface of the mask frame 31, and guiding it to the outlet plate 14b side. . The curved plate 14a preferably has a curved surface, but it may be formed by inclining a flat plate as a change plate at a predetermined angle.

  The lead-out plate 14b is formed to have a lateral width corresponding to the pattern area of the mask film M, and is used to send air sent along the curved plate 14a between the mounting table 30 and the mask frame 31. is there. The lead-out plate 14 b is disposed at a position higher than the upper surface of the mounting table 30 and between a position lower than the lower surface of the mask frame 31.

  When the air guide plate 14 configured as described above is blown along the mask frame 31 from the supply port 3, the air is sent along the curved plate 14 a to the outlet plate 14 b side, and is mounted by the outlet plate 14 b. Air can be blown between the mounting table 30 and the mask frame 31.

The air guide plate 14 may be configured as shown in FIG. FIG. 5 is a side view schematically showing another form of the blowing direction changing means.
As shown in FIG. 5, the air guide plate 44 is capable of blowing the curved plate 44 a as the change plate and the air that comes along the curved plate 44 a toward the space between the mask frame 31 and the mounting table 30. The guiding plate 44b, the adjusting portions 44c and 44d for adjusting the installation angle of the curved plate 44a and the leading plate 44b, and the support portion 44e that supports the curved plate 44a and the leading plate 44b via the adjusting portions 44c and 44d. And. The support portion 44e has an attachment portion 44f that is attached to the inner wall surface in the housing 6.

  The air guide plate 44 configured in this manner loosens the adjusting portions 44c and 44d to adjust the installation angle of the curved plate 44a and the lead-out plate 44b, and tightens the adjusting portions 44c and 44d again to return the curved plate 44a and the lead-out plate to a predetermined position. The plate 44b is positioned. As shown in FIG. 5, when the exposure apparatus 1 is activated (refer to replacing the circulator 4 in FIG. 2 as appropriate), air is sent from the supply port 3 along the upper surface of the mask frame 31. The air is led to the lead-out plate 44b along the curved plate 44a, and the air is sent out between the mask frame 31 and the mounting table 30 by the lead-out plate 44b. At this time, since the installation angle of the air guide plate 44 with the curved plate 44a and the lead-out plate 44b can be freely adjusted, maintenance or setting is facilitated.

Further, the exposure apparatus 1A may be configured as shown in FIG. FIG. 6 is a side sectional view schematically showing the whole of the exposure apparatus with a part thereof cut away. In addition, the already demonstrated structure attaches | subjects the same code | symbol and abbreviate | omits description.
The air outlet 40 is disposed in the vicinity of the concave mirror 24 so as to blow air adjusted to a temperature and humidity set in advance by the air conditioner 2 along the concave surface of the concave mirror 24 via the duct 2c. In order to supply clean air along the concave surface of the concave mirror 24, an air purification filter 42 having the same configuration as described above is provided in the air flow path. Here, the air purification filter 42 is provided on the opening surface of the air blowing port 40. The air outlet 40 has a predetermined angle so that it can be installed near the concave mirror 24 without overlapping the optical path of light reflected from the second plane mirror 23 toward the concave mirror 24.

  The wind guide plate 45 is a curved plate and is formed to have the same width or more as the concave mirror 24. This wind guide plate 45 is below the concave mirror 24 so that the air that has been blown from the air outlet 40 and passed through the concave surface of the concave mirror 24 is exhausted from the exhaust hole 7a described later to the outside of the exposure chamber R2, It is provided on the wall surface of the exposure chamber R <b> 2 located in the so-called leeward facing the air blowing port 40 through the concave mirror 24. In addition to mounting the wind guide plate 45 on the wall surface of the exposure chamber R2, the wall surface 6a of the exposure chamber R2 may be formed in a curved surface so that the air flow is smooth.

  1 A of exposure apparatuses comprised in this way will be sent to the wind guide board 45 side further along the concave surface of the concave mirror 24, if air is ventilated from the ventilation port 40, and the direction is changed by the circulator 4, and the mounting table 30 is changed. And is sent out between the mask frames 31. Or the air from the ventilation port 40 passes the circulator 4, and is exhausted out of the apparatus from the exhaust hole 7a. For this reason, in the exposure apparatus 1A, volatile substances such as silicon dioxide and siloxane volatilized from the photosensitive resin layer and floating matters such as dust and dust floating in the exposure chamber R2 are air-flowed on the floor surface on which the mounting table 30 is installed. The exhaust hole 7a or the side wall surface outlet 5 is discharged out of the exposure chamber R2. Therefore, volatile substances such as silicon dioxide and siloxane that volatilize from the photosensitive resin layer and floating substances such as dust and dust floating in the exposure chamber R2 can be prevented from adhering to the surface of the concave mirror 24, the mask film M, and the like.

  The exposure apparatus 1 </ b> A can form a flow path that blows air from the air supply port 40 through the wind guide plate 45 while maintaining the air flow path from the supply port 3 to the circulator 4 and the side wall surface discharge port 5. Therefore, the exposure apparatus 1A flows without stagnation of the air circulation in the exposure chamber R2, controls the temperature and humidity of the concave mirror 24, the mask film M, and the substrate W, and in particular stabilizes the expansion / contraction state of the mask film M. Therefore, it is possible to meet the demand for miniaturized circuit patterns.

  In the exposure apparatus 1 </ b> A configured as described above, it is desirable that the blowing speed of the air blown from the blower opening 40 is such that turbulence is not generated in the exposure chamber R <b> 2. 5 m / sec, and 1.2 m / sec when passing through the wind guide plate 45. Moreover, control of wind speed etc. is performed with the control valve which is not shown in figure. Note that the air blowing into the exposure chamber R2 is always performed during the operation of the exposure apparatus.

  Furthermore, by providing the wind guide plate 45, it is possible to prevent air that has passed through the concave surface of the concave mirror 24 from colliding with the wall surface of the exposure chamber R2 and generating turbulent flow in the exposure chamber R2. In addition, it is possible to prevent the occurrence of snowdrift in the exposure chamber R2. Thus, by smoothing the air flow, volatile substances and the like can be efficiently discharged from the exposure chamber R2, and the temperature and humidity in the exposure chamber R2 can be efficiently maintained.

1 is a side sectional view schematically showing an entire exposure apparatus according to a first embodiment of the present invention with a part cut away. It is a perspective view which shows typically the flow of the air in the exposure chamber of the exposure apparatus which concerns on this invention. (A), (b) It is a side view which shows typically arrangement | positioning of a supply port in the exposure apparatus which concerns on this invention. It is 2nd Embodiment of the exposure apparatus which concerns on this invention, Comprising: (a), (b) is the perspective view and side sectional view which show notch part of exposure apparatus typically, and shows other forms of a ventilation direction change means. is there. It is a side view which shows typically the other form of the ventilation change means of the exposure apparatus of this invention. FIG. 5 is a side sectional view schematically showing the whole exposure apparatus according to a third embodiment of the present invention, with a part of the exposure apparatus cut away. It is a schematic diagram which shows typically the structure of the conventional exposure apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1,1A Exposure apparatus 2 Air conditioner 2a, 2b, 2c Duct 3 Supply port 3a Air purification filter 4 Circulator 4a Case 4b Suction port 4c Rotary blade 4d Blower port 4e Drive motor 5 Side wall surface discharge port 5a Air purification filter 6 Case 6a Wall surface 7 Exhaust floor 7a Exhaust hole 10 Light source 11 Mercury short arc lamp 12 Condensing mirror 14 Air guide plate 14a Curved plate 14b Deriving plate 20 Optical system 21 First plane mirror 22 Fly eye lens 23 Second plane mirror 24 Concave mirror 25 Shutter mechanism 30 Mounted Mounting table 31 Support frame 40 Air outlet 42 Air purification filter 44 Air guide plate 44a Curved plate 44b Derivation plate 44c Adjustment unit 44e Support unit 44f Mounting portion 45 Air guide plate M Mask film M Mask R1 Light source chamber R2 Exposure chamber W Substrate

Claims (4)

An exposure chamber that houses therein a mounting table on which a substrate is mounted and a support frame that supports a mask film is provided. The substrate and the mask film are brought into contact with or in proximity to each other, and light including ultraviolet rays of a predetermined wavelength is irradiated. In the exposure apparatus that exposes the substrate,
A supply port that is provided on one side wall of the exposure chamber and supplies air having a preset temperature and humidity along a surface on the light irradiation side of the support frame;
Side wall surface discharge port for discharging air that is provided below the supply port and sent between the support frame and the mounting table, and air in the exposure chamber,
The air blowing direction that is provided on the other side wall of the exposure chamber and that is sent from the supply port passes through at least the space between the support frame and the mounting table toward the side wall surface discharge port. A blowing direction changing means for changing,
A temperature / humidity adjusting unit provided outside the exposure chamber and taking in air discharged from the side wall surface outlet through a filter and adjusting the temperature and humidity to a preset temperature and sending it to the supply port;
An exposure apparatus comprising:   The air blowing direction changing means includes an air suction port, a rotating blade for sucking air from the suction port, a driving unit for rotating the rotating blade, and air sucked through the rotating blade. The exposure apparatus according to claim 1, further comprising an air outlet that sends out toward the discharge port.   The blowing direction changing means receives the air supplied at a position facing the supply port and changes the direction, and the air sent along the changing plate from between the support frame and the mounting table. The exposure apparatus according to claim 1, further comprising a lead-out plate that guides the air toward the side discharge port.   2. The exhaust floor according to claim 1, further comprising an exhaust floor provided on at least a part of an installation surface in the exposure chamber on which the mounting table is installed, and having a plurality of exhaust holes for exhausting air from the exposure chamber. Exposure equipment.

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