JP2003098678A - Light source system for aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light source system for an aligner which can irradiate a substrate with light corresponding to the kind of a process and the characteristics of photosensing agent applied on a substrate at the process, in spite of a simple constitution, and also, which can be efficiently manufactured at a low cost. SOLUTION: The light source system is provided with a light emitting means equipped with several light emitting elements which are discretely and two- dimensionally arranged so as to uniformly expose all over the exposure table with an integrated exposure amount by relatively moving the light emitting means and the exposure table in a 1st direction, an optical system for guiding the luminous flux emitted from the light emitting means to the exposure table, and a 1st driving means for driving the optical system in a direction nearly vertical to the exposure table between the light emitting means and the exposure table, when the optical system is arranged by the 1st driving means in a prescribed position between the light emitting means and the exposure table, the luminous flux emitted from the light source becomes the parallel luminous flux through the optical system, and when the optical system is arranged in a position other than the prescribed position, the luminous flux emitted from the light source becomes a diffused luminous flux through the optical system.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus used for exposing a circuit pattern drawn on a mask onto a substrate,
In particular, it relates to a light source system for irradiating the substrate with light.

[0002]

2. Description of the Related Art Conventionally, an exposure apparatus has exposed a circuit pattern or the like on a substrate fixed to an exposure table by light emitted from a light source section equipped with an ultrahigh pressure mercury lamp.

For example, in a circuit pattern exposure process, an exposure apparatus equipped with a light source system for irradiating a substrate to which a positive photosensitive material having high resolution is applied with parallel light capable of exposure with higher resolution (hereinafter, An exposure apparatus equipped with a light source system for irradiating divergent light that can also expose the inner wall of the through hole with respect to a substrate that is exposed by a parallel light irradiation type exposure apparatus) and is coated with a liquid negative photosensitive agent , Which is referred to as a divergent light irradiation type exposure apparatus). Further, in the solder resist exposure step performed after the circuit pattern exposure step, since the solder resist has low sensitivity to light, a divergent light irradiation type exposure apparatus that emits divergent light having a light intensity higher than that of parallel light is used. Used a lot.

As described above, in a series of substrate manufacturing steps, either the parallel light irradiation type or the divergent light irradiation type is selected depending on the type of the step and the characteristics of the photosensitizer applied to the substrate during the step. Exposure equipment has been selected and is being used. Therefore, it is necessary to prepare two different types of exposure apparatuses, that is, a parallel light irradiation type and a divergent light irradiation type, even though the apparatus is used for common processing of exposing a photosensitive agent or the like. Therefore, it is difficult to unify the manufacturing line of the exposure apparatus, and the manufacturing cost and the manufacturing period are increased, and the manufacturing inefficiency is pointed out. In particular, the conventional parallel light irradiation type exposure apparatus is very expensive because the light source system needs to have a very large and complicated structure in order to convert the light emitted from the ultra-high pressure mercury lamp into parallel light. I will end up.

[0005]

SUMMARY OF THE INVENTION In view of the above-mentioned problems of the prior art, the present invention provides a light source that has a simple structure and that is suitable for the type of process and the characteristics of the photosensitizer applied to the substrate during the process. An object of the present invention is to provide a light source system for an exposure apparatus that can be irradiated and can be manufactured inexpensively and efficiently.

[0006]

To achieve the above object, the present invention relates to a light source system for an exposure apparatus which exposes a predetermined pattern drawn on a mask onto a substrate placed on an exposure table. . The light source system includes a plurality of light emitting elements that are two-dimensionally arrayed discretely so that the light source system can be exposed in a uniform integrated exposure amount over the entire exposure table by moving relative to the exposure table in a first direction. Means, an optical system for guiding the light flux emitted from the light emitting means to the exposure table, and a first driving means for driving the optical system between the light emitting means and the exposure table in a direction substantially perpendicular to the exposure table. Then, when the optical system is arranged at a predetermined position between the light emitting means and the exposure table by the first driving means, the light beam emitted from the light source is made into a parallel light beam and is made a divergent light beam at a position other than the predetermined position. It is characterized by

By changing the arrangement of the optical system as described above, it becomes possible to easily generate the parallel light flux and the divergent light flux with one exposure apparatus. That is, the exposure apparatus equipped with the light source system according to the present invention can emit light corresponding to the type of process and the characteristics of the photosensitizer applied to the substrate during the process, and can be manufactured inexpensively and efficiently. can do.

By using a light emitting element instead of the ultra high pressure mercury lamp, the above optical system can be made extremely compact. Here, the light emitting element itself has the following advantages. First, since a stable amount of light can be emitted immediately after lighting, lighting can be controlled as necessary. That is, it is possible to significantly reduce power consumption as compared with an ultra-high pressure mercury lamp that needs to be constantly lit. Further, since the light emitting element has a long life, it is possible to reduce the burden on the user regarding the replacement of the light source.

If the above optical system is composed of one flat plate having a plurality of convex lenses arranged corresponding to the arrangement of a plurality of light emitting elements, it can be manufactured very simply and at low cost.

In the above light source system, if the optical system is arranged at a position where the distance from the light emitting element to the convex lens is substantially equal to the focal length of the convex lens, it becomes possible to generate a parallel light beam and make it enter the exposure table. If the optical system is arranged at a position other than the above, it is possible to generate a divergent light beam and make it enter the exposure table. In particular, if the convex lens is placed at a position where the distance from the light emitting element to the convex lens is longer than the focal length of the convex lens, the outer portion of the light emitted from the light emitting element, that is, the portion where the light intensity is extremely weak is incident on the convex lens. Since it is not guided to the exposure table, it is possible to perform exposure with a more uniform integrated exposure amount.

Further, the light source system includes light flux shaping means for shaping each light flux emitted from the plurality of light emitting elements and transmitted through the optical system into a predetermined cross-sectional shape in a plane parallel to the exposure table. It is desirable to further include a second drive unit that drives the light flux shaping unit between the optical system and the exposure table in a direction substantially perpendicular to the exposure table. By making the cross section of the light beam into a predetermined shape by the light beam shaping means, an irradiation region where the light intensity is weak in one light beam (a region irradiated by the vicinity of the outer extension of the light beam) is complemented by an irradiation region of another adjacent light beam. Therefore, it becomes possible to perform exposure with a more uniform integrated exposure amount.

The light flux shaping means is preferably a single flat plate having a plurality of openings arranged corresponding to the arrangement of the light emitting elements. The shape of the opening differs depending on the shape of the light flux cross section, and may be, for example, a circular shape or a trapezoidal shape.

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of an exposure apparatus according to the present invention will be described below. FIG. 1 is an enlarged perspective view of the vicinity of the light source unit 1 and the exposure table 2 of the exposure apparatus 100 of the embodiment. 2 is a top view of the vicinity of the exposure table 2, and FIG. 3 is the exposure table 2.
It is a side view of the vicinity. The exposure apparatus 100 of the embodiment is an apparatus for exposing the circuit pattern drawn on the mask M onto the substrate S. In this exposure apparatus 100, the mask M and the substrate S are exposed with a slight distance (10 μm to 20 μm). The proximity method is used. In each figure, the X direction (and the opposite direction to the X direction) is the direction (first direction) in which the light source unit 1 and the exposure table 2 relatively move, that is, the exposure apparatus 1.
00 is the scanning direction. The Y direction is a direction (second direction) orthogonal to the X direction on the exposed surface (exposed surface) of the substrate. The Z direction is a direction orthogonal to the surface to be exposed, that is, a straight traveling direction of light emitted from the light source unit 1.

As shown in FIGS. 1 to 3, the exposure apparatus 10
0 is a light source unit 1 (shown by a chain double-dashed line in FIG. 1), an exposure table 2,
It is provided with a first motor 3, a first rail 4, a first driver 5, a pair of rails (second rails) 6, a first ball screw 7a, a table drive motor 7b, a base 8 and a mask holder portion 9.

The light source unit 1 moves in the X direction along the first rail 4 by the drive of the first motor 3. The first motor 3 is controlled by the control unit 10 via the first driver 5. Here, the maximum width in the Y direction exposed by the light emitted from the light source unit 1 is configured to be sufficiently longer than the maximum length in the Y direction of the substrate S that can be exposed by the exposure apparatus 100. That is, the light source unit 1 moves in parallel in the X direction, so that the entire exposed surface of the substrate S of any size is exposed.

The exposure table 2 on which the substrate S is placed is a base 8
It is provided above. The exposure table 2 is in a state in which it can be driven in the X direction by rotating the first ball screw 7a by the table drive motor 7b while the lower surface thereof is guided along the second rail 6 extending in the X direction. .

The mask M shown by the hatched portion in each figure is held by the mask holder portion 9. Specifically, the mask holder portion 9 has a concave cross-sectional shape as shown in FIG. 3, and the mask M is placed in the concave portion. The mask M placed in the recess has an X adjustment mechanism 9 for positioning in the X direction.
A pair of Y adjustment mechanisms 9b for positioning in the a and Y directions
Fixed in place by. Specifically, each adjustment mechanism 9a, 9b is provided with an L-shaped mask support member (painted in the figure), and each mask support member is X,
Alternatively, the mask M is positioned by driving in the Y direction. It should be noted that if the driving amounts of the pair of Y adjustment mechanisms 9b are made to differ during positioning, the mask M is moved to the X position.
It can also be rotated in the -Y plane. Since the mask holder unit 9 is attached to the exposure table 2 by the Z-axis base 9c, the exposure table 2 is not scanned during scanning (exposure operation).
Together with this, it moves relative to the X direction. Further, the mask holder portion 9 is in a state of being vertically movable in the Z direction by the vertical movement mechanism 9d.

In the previous step, the substrate S coated with the photosensitive material on its surface is exposed by the exposure apparatus 100 via a transport path (not shown).
And is placed and fixed on the exposure table 2. that time,
The X and Y adjusting mechanisms 9a and 9b described above perform relative positioning of the mask M with respect to the substrate S. At this time, the mask holder portion 9 is raised in the direction opposite to the Z direction (that is, the light source portion 1 direction) by the elevating mechanism 9d to a height that does not hinder the movement of the substrate S. Then, when the substrate S is positioned and fixed to the exposure table 2, the mask holder portion 9 is moved by the elevating mechanism 9d in the Z direction (that is, the exposure table 2) until the distance between the mask M and the substrate S becomes about 10 μm to 20 μm. Direction).

Next, the light source system according to the present invention will be described in detail. FIG. 4 is a sectional view of the light source unit 1 taken along the XZ plane. As shown in FIG. 4, the light source unit 1 constituting the main part of the light source system includes a plurality of light emitting elements 12 mounted on a printed circuit board 11, a lens panel 13 having a plurality of convex lenses 13a, and a plurality of openings. The aperture panel 14 is formed with an aperture panel 14a, a lens panel drive unit 15, and an aperture panel drive unit 16. The light source unit 1 is
A cooling fan 17 is also provided in order to avoid an internal temperature rise. In the present embodiment, an ultraviolet LED that emits light in the ultraviolet region, which has the highest sensitivity for the photosensitive material applied to the substrate S
Is used as the light emitting element 12.

FIG. 5 is a view showing the arrangement of the ultraviolet LEDs 12 of the light source section 1. Here, the exposure apparatus 100, in order to accurately print the circuit pattern on the substrate during the exposure period,
It is necessary to expose the entire surface of the substrate S to be exposed with a uniform integrated exposure amount. Therefore, when attention is paid to the X direction, the plurality of ultraviolet LEDs 12 are arranged along a line segment extending in the third direction inclined by a predetermined angle with respect to the X direction in the XY plane. Here, the ultraviolet LEDs 12 arranged along the line segment extending in the third direction have the same deviation amount in the Y direction from the other adjacent ultraviolet LEDs 12. Also, ultraviolet L
Focusing on the Y direction, a plurality of EDs 12 and convex lenses 13a are arranged at equal intervals on a line segment parallel to the Y direction. That is, the ultraviolet LED 12 and the convex lens 13a
Are two-dimensionally arranged on a plane (substantially parallelogrammatic) defined by the Y direction and the third direction.

Further, in order to avoid the generation of an unexposed area due to the displacement of the ultraviolet LEDs 12, the light source unit 1 is arranged on the surface to be exposed by the light emitted from each ultraviolet LED 12 arranged in the third direction. The X-direction loci of the spots formed in 1 are arranged in contact with each other or partially overlapped in the Y-direction. By arranging as described above, if the light source unit 1 is scanned in the X direction, the entire exposed surface of the substrate S can be exposed with a uniform integrated exposure amount throughout.

Each convex lens 13a shown in FIG.
The mask M converts the light emitted from the ED 12 into a predetermined luminous flux.
It is an optical system that leads to. Each convex lens 13a is formed on the lens panel 13 so that when the lens panel 13 is attached to the lens panel drive unit 15, the convex lens 13a is arranged at a position corresponding to the arrangement position of each ultraviolet LED 12. That is, the convex lenses 13a are formed in an array as shown in FIG.

Further, each opening 14a has a corresponding convex lens 13a.
The cross-sectional shape of the light beam that has passed through is shaped into a predetermined shape corresponding to the shape of the opening. By shaping the light flux by each opening 14a, the irradiation area of each light flux on the exposed surface is adjusted. Specifically, each opening 14a is complemented by an irradiation region of another light flux adjacent to an irradiation region where the light intensity of a specific light flux is weak (a region irradiated by the vicinity of the outer extending portion of the light flux), and thus on the exposed surface. Then, the light flux is shaped into a predetermined shape such that a uniform amount of light is incident at any place. The predetermined shape includes, for example, a circular shape, a square shape, a hexagonal shape, and a trapezoidal shape. Like each convex lens 13a, each opening 14a is also formed so that when the opening panel 14 is attached to the opening panel drive unit 16, the opening 14a is arranged at a position corresponding to the arrangement position of each ultraviolet LED 12.

As shown in FIG. 4, the lens panel driving section 1
5 has a second motor 15a and a second ball screw 15b, and the opening panel drive section 16 includes a third motor 16a,
It has a third ball screw 16b. Lens panel 13
Is driven by the lens panel driving unit 15 and the aperture panel 1
4 is movable by the opening panel drive unit 16 along the ball screws 15b and 16b, that is, in the Z direction. The light source unit 1 changes the arrangement position by moving the lens panel 13 and the opening panel 14 in the Z direction as necessary, thereby making the light emitted from the ultraviolet LED 12 a parallel light beam or a divergent light beam. .

FIG. 6 is a block diagram showing control of the light source system of the embodiment. Light flux setting unit 1 of exposure apparatus 100
The control unit 10 drives and controls the lens panel driving unit 15 and the aperture panel driving unit 16 as necessary based on the data regarding the irradiation light set by 8. Specifically, the control unit 10 drives the second motor 15a and the third motor 16a via a driver (not shown) to move the panels 13 and 14 to a position where the light flux corresponding to the setting information is incident on the exposed surface. It is moved along each ball screw 15b, 16b. Here, the light flux setting unit 18 may be configured to set the data regarding the irradiation light based on the information that the user selects and inputs a desired light flux, or the information automatically transmitted from the previous step ( For example, a mode may be used in which the data regarding the irradiation light is set based on the type of the photosensitive agent applied to the substrate S).

FIG. 7 shows the state of each member in the light source section 1 according to the type of light to be radiated, and FIG. 7A shows the state when radiating a parallel light beam.
(B) and (C) respectively show states in the case of irradiating a divergent light flux.

As shown in FIG. 7A, the light flux setting section 18
When the parallel light flux is set, the lens panel 13 is arranged at a position where the distance between the ultraviolet LED 12 and the convex lens 13a is substantially equal to the focal length of the convex lens 13a under the control of the control unit 10. In this state, each convex lens 13a
Has a function as a collimator lens, so the light flux emitted from the ultraviolet LED 12 becomes a parallel light flux and is emitted from the convex lens 13a. The parallel light flux is suitable for exposing the substrate S coated with the positive photosensitive agent. Further, during irradiation of the parallel light flux, the irradiation area of each light flux incident on the exposed surface does not change regardless of the position of the opening 14a. Therefore, the aperture panel 14 does not have to be moved during the irradiation of the parallel light flux.

As shown in FIG. 7B, the light flux setting section 18
When the divergent light flux is set by the lens panel 13
Under the control of the control unit 10, is the ultraviolet LED 12 and the convex lens 1
It is arranged at a predetermined position such that the distance from the convex lens 13a is shorter than the focal length of the convex lens 13a. As a result, each ultraviolet L
The light emitted from the ED 12 passes through the convex lens 13 and then becomes a divergent light beam to enter the surface to be exposed. The divergent light flux is suitable for exposing the substrate S coated with the negative photosensitizer. It should be noted that the divergent luminous flux changes the irradiation area of each luminous flux incident on the surface to be exposed, depending on where the aperture 14a is arranged between the convex lens 13a and the exposure table 2 (strictly speaking, the mask M). Become. Specifically, the opening 14a
Is provided in the vicinity of the convex lens 13a, the irradiation area of the specific light beam becomes wide, and if the opening 14a is arranged at a position far from the convex lens, the irradiation area of the specific light beam becomes narrow. Therefore, at the time of irradiating the divergent light flux, the aperture panel 14 is also appropriately moved so that the irradiation area most suitable for the exposure process can be obtained.

Similarly, when the divergent light flux is set by the light flux setting unit 18, as shown in FIG.
The lens panel 13 is placed at a predetermined position where the distance between the convex lens 13a and the convex lens 13a is longer than the focal length of the convex lens 13a.
It is also possible to generate a divergent light flux by arranging. When the divergent light flux is generated in this way, only the vicinity of the center of the light flux having a high light intensity can be extracted and made incident on the exposed surface. However, the light flux converges once after passing through the lens panel 13 and before entering the exposure table 2. Therefore, compared with the state in which the lens panel 13 is arranged as shown in FIG. Becomes narrower. In the case of the arrangement shown in FIG. 7C, the opening panel 1
4 is disposed closer to the exposure table 2 than the convergence position of the light emitted from the ultraviolet LED 12.

At the time of exposure, first, the substrate S coated with a predetermined photosensitive material is conveyed to the exposure apparatus 100 from the previous step. The transported substrate S is placed and fixed on the exposure table 2 while being positioned relative to the mask M. Then, the light source unit 1 and the exposure table 2 (that is, the substrate S in a state where the light source unit is made to emit light).
And the mask M) are relatively moved in the X direction. As described above, since the light emitted from the light source unit 1 is a light flux corresponding to the predetermined photosensitive agent applied to the substrate S, the substrate S is uniform and has no gap over the entire surface to be exposed. It is exposed with various integrated exposure amounts.

The above is the embodiment of the present invention. The present invention is not limited to these embodiments, and various modifications can be made without departing from the spirit of the present invention.

In the above embodiment, the exposure apparatus 100 has been described for the sake of convenience in the case of being used in the circuit pattern exposure process, but the exposure apparatus 1 equipped with the light source system of the present invention.
00 can also be used for the solder resist exposure step. When used in the solder resist exposure process,
Since the sensitivity of the solder resist to light is low, the aperture panel 14 is used to obtain a divergent light beam having a light intensity higher than that of parallel light.
It is desirable to set the aperture panel 14 at the light converging position and irradiate it in FIG. 7C so as not to limit the light flux.

Further, even if the cross section of the light flux is not formed into a predetermined shape, if the light is exposed in a state where the integrated exposure amount is substantially uniform at any place on the surface to be exposed, the light source system includes the light flux shaping means. It is also possible to adopt a simple configuration in which the opening panel 14 and the opening panel drive section 16 are not provided.

In the above embodiment, the ultraviolet LED 12 which emits the ultraviolet light having the highest sensitivity of the photosensitizer is used as the light source. However, like a semiconductor element, a lamp element or plasma (by discharge) that can be controlled on and off at high speed is used. It is also possible to use (emission) etc. as a light emitting element.

In the above embodiment, for the sake of convenience, the substrate S
I explained assuming an exposure device that exposes only one side of
The present invention can also be applied to a double-sided exposure device. The present invention can also be applied to an apparatus that performs exposure by a method other than the proximity method as in the above embodiment, for example, a contact method.

[0036]

As described above, the exposure apparatus equipped with the light source system of the present invention is configured not only to perform the circuit pattern exposure step, but also to selectively irradiate the parallel light flux and the divergent light flux. It can also be used in the solder resist exposure process. Particularly in the circuit pattern exposure step, light corresponding to the photosensitive agent applied to the substrate can be irradiated. As described above, since the exposure apparatus can be commonly used for any exposure step and any substrate coated with any photosensitizer, the exposure apparatus can be manufactured very efficiently in a single manufacturing line.

Further, in the conventional circuit pattern exposure process, two types of devices, a parallel light irradiation type exposure device for the positive photosensitive material and a divergent light irradiation type exposure device for the negative photosensitive material, were required. According to the present invention, since one exposure apparatus can be used, it is possible to save space in the substrate manufacturing factory.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of an exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a top view showing the vicinity of the exposure table of the exposure apparatus of the embodiment of the present invention.

FIG. 3 is a side view showing the vicinity of the exposure table of the exposure apparatus of the embodiment of the present invention.

FIG. 4 is a sectional view of a light source section of the exposure apparatus of the embodiment.

FIG. 5 is a diagram showing an array of light emitting elements of the embodiment.

FIG. 6 is a block diagram showing control of the light source system of the embodiment.

FIG. 7 (A) shows an arrangement state of each member in the light source section during irradiation of a parallel light beam, and FIGS. 7 (B) and 7 (C) show an arrangement state of each member in the light source section during irradiation of a divergent light beam. Represents

[Explanation of symbols]

1 light source 2 exposure table 10 Control unit 12 UV LED 13 lens panel 13a convex lens 14 Opening panel 14a opening 15 Lens panel drive 16 Aperture panel drive 100 exposure equipment

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Ishibashi Otomo             2-36 Maeno-cho, Itabashi-ku, Tokyo Asahikou             Gaku Kogyo Co., Ltd. F-term (reference) 2H097 AB05 CA12 LA09                 5F046 BA02 CA09 CB12 CB22 DA01

Claims (8)

[Claims] 1. A light source system for an exposure apparatus, which exposes a predetermined pattern drawn on a mask onto a substrate placed on the exposure table, wherein the light source system is moved relative to the exposure table in a first direction. A light emitting unit having a plurality of light emitting elements discretely two-dimensionally arrayed so as to perform exposure with a uniform integrated exposure amount over the entire exposure table; and a light beam emitted from the light emitting section is guided to the exposure table. An optical system, and a first drive unit for driving the optical system between the light emitting unit and the exposure table in a direction substantially perpendicular to the exposure table,
When the optical system is arranged at a predetermined position between the light emitting means and the exposure table by the first driving means, the light beam emitted from the light source is made into a parallel light beam, and the predetermined position is set. Other than the above, it is a light source system for an exposure apparatus, which uses a divergent light flux. 2. The light source system for an exposure apparatus according to claim 1, wherein the optical system is a single flat plate having a plurality of convex lenses arranged corresponding to the array of the plurality of light emitting elements. A light source system for an exposure apparatus, which is characterized in that 3. The light source system for an exposure apparatus according to claim 2, wherein the predetermined position is a position where a distance from the light emitting element to the convex lens is substantially equal to a focal length of the convex lens. Light source system for exposure equipment. 4. The light source system for an exposure apparatus according to claim 1, wherein each of the light beams emitted from the plurality of light emitting elements and transmitted through the optical system is a cross section in a plane parallel to the exposure table. A light-flux shaping means for shaping the light-beam into a predetermined shape; and a second driving means for driving the light-flux shaping means between the optical system and the exposure table in a direction substantially perpendicular to the exposure table. A light source system for an exposure apparatus, which is characterized by: 5. The light source system for an exposure apparatus according to claim 4, wherein the light flux shaping unit has a plurality of openings arranged corresponding to the array of the light emitting elements and having the same shape as the predetermined shape. A light source system for an exposure apparatus, which is a single flat plate. 6. The light source system for an exposure apparatus according to claim 1, wherein the plurality of light emitting elements are arranged at a predetermined interval in a second direction orthogonal to the first direction. Individually arranged, and in a plane defined by the first and second directions, a plurality is arranged at predetermined intervals in a third direction inclined by a predetermined angle with respect to the first direction. Characteristic light source system for exposure equipment. 7. The light source system in the exposure apparatus according to claim 1, wherein the light emitting element is an ultraviolet LED that emits light in the ultraviolet region. system. 8. An exposure apparatus which exposes a predetermined pattern drawn on a mask onto a substrate placed on an exposure table, wherein the light source system according to claim 1. Setting means for setting whether the light flux emitted from the system is a divergent light flux or a parallel light flux, control means for driving and controlling the light source system according to the setting of the setting means, and the light source system during the exposure period. An exposure apparatus, comprising: a scanning unit that relatively moves the exposure table along a first direction.