JP2003337428A - Exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an inexpensive exposure device which appropriately and quickly exposes a line-shaped (stripe pattern, etc.), exposure pattern and has a simplified configuration. <P>SOLUTION: Optical systems 36 and 38 emit luminous fluxes modulated by a means 42 for entirely collectively modulating light quantity in the exposure device 34 in line shapes, and line-shaped exposure parts 24 set so as to be arranged toward the relatively scanning direction of a medium 20 to be exposed can be sequentially exposed. Since the line-shaped exposure pattern 24 can be appropriately and quickly exposed and the luminous fluxes are sent to the optical systems 36 and 38 after being modulated by the means 42 for entirely collectively modulating the light quantity and are emitted on the medium 20 to be exposed in the line shapes, the configuration of the means for modulating the light quantity can be simplified to provide the inexpensive exposure device 34. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure device that exposes a photosensitive material with a light beam modulated by a light modulator that is driven and controlled in accordance with image data.

[0002]

2. Description of the Related Art Heretofore, various exposure apparatuses have been proposed which use a spatial light modulator such as a digital micromirror device (DMD) to perform image exposure with a light beam modulated according to image data. .

This DMD is a mirror device in which a large number of micromirrors whose reflecting surfaces change in angle according to a control signal are two-dimensionally arranged on a semiconductor substrate such as silicon.

In an exposure apparatus using such a DMD, a unit unit of a multi-channel drawing element as illustrated in FIG. 12 is arranged in a row (single or a plurality of rows) without a gap corresponding to the width of the exposure surface. It is configured to be placed.

The unit unit of the multi-channel drawing element in this exposure apparatus collimates the laser light emitted from the light source of the laser light (not shown) of the illumination optical system 10 with the lens system (optical system) and then the illumination optical system. The light is reflected by the DMD 12 arranged at the substantially focal position of 10, and is imaged on the exposure surface 16 (the exposure surface of the photosensitive material or the like) through the imaging lens system (optical system) 14.

In this exposure apparatus, a control signal generated according to image data to be exposed is a multi-channel optical modulator in each unit unit of multi-channel drawing elements arranged in a line without a plurality of gaps. D
Each of the micromirrors of the MD 12 is turned on / off by a control device (not shown) to change the reflection direction of the laser light, and the modulated light beam is applied to the exposure surface 16 to irradiate the exposure surface 16 in the width direction (main scanning direction). Direction crossing)
While the image exposure process is performed over the entire width of, the exposure device and the exposure surface 16 are relatively moved in the main scanning direction, so that the image exposure process is performed on the entire exposure surface 16.

[0007]

The exposure apparatus as described above is used for printing plates (PS plates, flexographic plates, screen plates, etc.), electronic materials (resist films for printed boards, resist films for display boards, etc.), etc. It may be used in the process of drawing a line-shaped pattern in the manufacturing process of.

When the pattern to be drawn by the exposure apparatus is a simple line shape (striped pattern or the like) as described above, a continuous emission light source in each unit unit of a multi-channel drawing element arranged in a line without a plurality of gaps. All the micromirrors of the DMD 12, which is a multi-channel optical modulator that modulates light, are modulated by controlling the laser light reflection direction entirely by performing similar on / off control by a controller (not shown). The exposure device 16 and the exposure surface 16 are irradiated with a beam to expose the exposure surface 16 in a line shape over the entire width of the exposure surface 16 in the width direction (direction intersecting the main scanning direction). By relatively moving and in the main scanning direction, an image exposure process for drawing lines in parallel is performed on the entire exposure surface 16.

Therefore, when the pattern drawn by the exposure apparatus is a simple line pattern (such as a striped pattern), the DM is a multi-channel optical modulator that modulates a continuous light source.
A fine and complicated expensive element dividing structure and a driving circuit for individually moving a large number of micromirrors that are multi-channels for light modulation are wasteful.

That is, in the exposure apparatus equipped with the DMD 12 which is a conventional multi-channel optical modulator, a high function for independently moving a large number of micro-mirrors which are multi-channels for optical modulation is not used. However, there is a problem in that it is not preferable in terms of increasing the drawing speed, reducing the power consumption of the exposure apparatus, and reducing the cost of the exposure apparatus, as well as the waste of the configuration.

In consideration of the above points, it is an object of the present invention to newly provide an inexpensive exposure apparatus which can appropriately and quickly expose a line-shaped (striped pattern or the like) exposure pattern. And

[0012]

An exposure apparatus according to a first aspect of the present invention irradiates a light flux modulated by a means for collectively modulating the light quantity in a line form from an optical system,
It is characterized in that line-shaped exposure portions set to be lined up in the relative scanning direction of the medium to be exposed are sequentially exposed.

With the above-described structure, the light flux modulated by the means for collectively modulating the amount of light in the exposure apparatus is linearly irradiated onto the medium to be exposed in a line form for exposure. After performing relative scanning between the medium to be exposed and the exposure device, the operation of exposing the light flux modulated by the means for collectively modulating the light amount in the exposure device in a line form from the optical system is repeated. Since the line-shaped exposure portion is sequentially exposed, the line-shaped exposure pattern can be appropriately and quickly exposed, and the light flux is modulated by the means that collectively modulates the light quantity and then the light flux is transmitted to the optical system. Since the light is sent and irradiated linearly, the structure of the means for modulating the light quantity can be simplified and an inexpensive exposure apparatus can be provided.

In the exposure apparatus according to the second aspect of the present invention, the light source whose emission is controlled by the modulator, the light guide member into which the luminous flux emitted by the light source is introduced, and the light guide member are dispersed evenly. A lens system which receives the light flux and irradiates the light flux so as to focus the light flux on the surface of the medium to be exposed so as to perform an exposure operation.

With the above structure, the light flux modulated by the light source controlled by the modulator is introduced into the light guide member, and the light flux averagely dispersed by the light guide member is exposed by the lens system. The exposure is performed by linearly irradiating the surface of the substrate so that the medium to be exposed and the exposure apparatus are relatively scanned, and then the linear exposure is again performed to expose the linearly exposed portion. Since the light is sequentially exposed, a line-shaped exposure pattern can be appropriately and quickly exposed, and the light flux is modulated by a light source whose emission is controlled by a modulator, and then introduced into a light guide member to be linearly formed from the lens system. Since the irradiation is performed, the structure of the means for modulating the light quantity by omitting the light modulation element can be simplified and an inexpensive exposure apparatus can be provided.

According to a third aspect of the present invention, in an exposure apparatus, a spatial light modulating means for modulating a light beam emitted from a light source and irradiating the light beam to a light guide member, and a light beam dispersed evenly by the light guide member are received. And a lens system that irradiates the surface of the medium to be exposed so that the light beam is condensed in a line shape to perform an exposure operation.

With the above arrangement, the light flux emitted from the light source is modulated by the spatial light modulator and introduced into the light guide member, and the light flux averagely dispersed by the light guide member is converted by the lens system. The operation is performed by irradiating the surface of the medium to be exposed so that the light is condensed in a line shape, the medium to be exposed and the exposure device are relatively scanned, and then the operation of irradiating and exposing the line again is repeated to form a line shape. Since the exposed portions of are sequentially exposed, the line-shaped exposure pattern can be appropriately and quickly exposed, and the structure in which the light flux emitted from the light source is modulated by the spatial light modulation means and applied to the light guide member is simplified. , It is possible to provide an inexpensive exposure apparatus.

According to a fourth aspect of the present invention, in the exposure apparatus according to any one of the first to third aspects, the exposure process is performed in a state where a mask is arranged in the vicinity of the medium to be exposed. It is characterized in that the portion exposed on the exposure medium is limited to a linear shape corresponding to the shape of the portion of the mask which transmits light to improve the resolution.

With the above-mentioned structure, the operation of the exposure apparatus according to any one of claims 1 to 3,
In addition to the effect, the line-shaped exposed portion on the medium to be exposed is limited to the shape of the light-transmitting portion formed on the mask to have an appropriate shape. The resolution can be improved.

In the exposure apparatus according to a fifth aspect of the present invention, the light emission is controlled by means for collectively modulating the light quantity, and the multimode semiconductor laser light sources arranged in a line and the multimode semiconductor are arranged. And a lens system that linearly irradiates a medium to be exposed with a laser beam emitted from a laser light source.

With the above-described structure, the plurality of multi-mode semiconductor laser light sources arranged in a line are collectively controlled to emit light by means for modulating the light quantity, and arranged in a line. A laser beam emitted from a plurality of multi-mode semiconductor laser light sources is irradiated by a lens system so as to be focused in a line on the medium to be exposed and exposed, and the medium to be exposed and the exposure device are relatively scanned, By repeating the operation of irradiating and exposing in a line shape again to sequentially expose the line-shaped exposed portion, the line-shaped exposure pattern can be appropriately and quickly exposed, and a plurality of line-shaped exposure patterns can be arranged. (EN) It is possible to provide a low-priced exposure apparatus by simplifying the configuration for controlling light emission by means of a device that modulates the amount of light as a whole of mode semiconductor laser light sources.

[0022]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An exposure apparatus according to a first embodiment of the present invention will be described with reference to FIGS. This exposure apparatus is used to manufacture a color filter for a flat panel display, as illustrated in FIG.
A flat plate material that is a medium to be exposed (here, as a photosensitive material on a glass epoxy copper plated substrate, Fuji Film Arch D
A laminate of RF (about 40 mJ / cm ² ), a glass plate having a light-sensitive material layer, a plastic plate having a light-sensitive material layer, a film, or the like can be used as an exposure target) 20 in a line shape, K line 22, R line 24, K line 22, G line 26, K line 22,
The B line 28 and the K line 22 are configured so as to be applicable to a manufacturing apparatus for sequentially exposing and forming.

As shown in FIG. 1, the manufacturing apparatus provided with the exposure apparatus according to the present embodiment has, for example, a length 510 in the width direction (direction orthogonal to the relative scanning direction which is the main scanning direction).
A flat stage 30 for adsorbing and holding a sheet-shaped flat plate material (medium to be exposed) 20 formed in mm to the surface is provided. The stage 30 has, for example, a length of 620 mm in the width direction (direction orthogonal to the relative scanning direction which is the main scanning direction).
And A head movement operation device 32 is arranged on one side portion (the side portion on the left side in FIG. 1) of the stage 30.

An exposure device (exposure head) 34 is mounted on the head movement operation device 32 so as to be reciprocally operable along the relative scanning direction (direction of arrow A in FIG. 1).

In this manufacturing apparatus, with respect to the flat plate material 20 as the medium to be exposed which is stopped on the stage 30,
Although the exposure device 34 performs the scanning operation to perform the exposure processing, the flat plate material 20 as the medium to be exposed may perform the scanning operation to perform the exposure processing with respect to the exposure device 34 which is stopped. Further, both the exposure device 34 and the flat plate material 20 as the medium to be exposed may be configured to relatively scan to perform the exposure process. In short, any configuration may be adopted as long as both the exposure device 34 and the flat plate member 20 as the medium to be exposed are relatively scanned.

Further, since this manufacturing apparatus is suitable for constructing the exposure apparatus 34 as a line head, the flat plate material 2
Since the stage 30 does not need to be configured with high precision for sub-scanning 0, the configuration can be simplified.

The head moving operation device 32 is configured to be capable of finely reciprocatingly operating the exposure device 34 in the relative scanning direction by being driven and controlled by the control section.

As shown in FIG. 2, the exposure apparatus 34 emits light emitted from a light source box 40 whose emission is controlled by a modulation circuit 42 as a modulating means which constitutes means for collectively modulating the light quantity. Is introduced into the light guide member 36 of the lens system (optical system) by the optical fiber 44, and the light that is uniformly dispersed by the light guide member 36 is guided to the cylindrical lens 38, and the cylindrical lens 38 causes the light on the surface of the flat plate member 20. It is configured such that the light is condensed in a line shape and the exposure operation is performed.

In the exposure apparatus 34 illustrated in FIG. 2, the light guide member 36 has a width of 1 mm, a height of 8 mm and a length of 510 m.
It is formed in a prismatic shape of m or more. The light guide member 36 scatters light on each side surface portion except the right end portion toward the light incident surface in FIG. 2 and the side surface (the lower side surface in the drawing) facing the cylindrical lens 38 which is the light emitting surface. Configure on the reflective surface.

The light-scattering / reflecting surface of the light guide member 36 is formed by forming the surface of the light guide member 36 into a frosted glass shape and processing it into a mirror surface. As a result, the light guide member 36 diffuses the light beam incident from the light incident surface thereof by the light scattering reflection surface, thereby making the light emitting surface opposed to the cylindrical lens 38 dispersed in a uniform manner. To the cylindrical lens 38.

This cylindrical lens 38 has a diameter of 1
It is formed in a cylindrical shape of 0 mm. The cylindrical lens 38 configured in this way allows the light emitted from the light guide member 36 to travel on the surface of the flat plate member 20 in the width (length in the scanning direction) 30.
The light is condensed in a line shape having a predetermined length of μm.

A lens system (optical system) of the exposure device 34
Is not only configured to combine the light guide member 36 and the cylindrical lens 38 to collect light in a straight line segment shape, but is also a straight line segment shape, a linear shape having a bent portion, or an entire curve. The light flux may be condensed into a linear shape having a curved portion, or a linear shape (referred to as a linear shape in the present specification) in which linear portions, bent portions or curved portions are selectively combined.

The light source box 40 for constituting a light source for irradiating the lens system (optical system) of the exposure device 34 with a light beam,
A device for collecting a large number of semiconductor lasers (eg, GaN-based semiconductor laser LD) having a wavelength of 405 nm and an output of 30 mW and irradiating the laser beam having an output of 30 W into the light guide member 36 through the optical fiber 44 from the light incident surface. Constitute.

The light source of the exposure device 34 is a light source obtained by fiber-combining a semiconductor laser LD such as GaN, a wavelength conversion light source such as THG of a solid laser such as a YAG laser, or a mercury lamp, a metal halide lamp, a xenon lamp, a fluorescent lamp. , Etc. gas light emission, fluorescent light source,
Or fluorescent display tube, fluorescent LED, plasma display tube, F
A light source that collects a plurality of micro light emitting elements such as ED, or LE
A light source that collects the light emitted from a solid-state light-emitting element such as D or EL can be used.

Further, the light source box 40 is a modulation that constitutes a means for collectively modulating the light quantity by collectively switching the ON operation of irradiating the laser beam and the OFF operation of stopping the irradiation of the laser beam. It is configured to be controlled by the modulation circuit 42 as a means.

For this reason, the modulation circuit 42 as a modulation means, which constitutes a means for collectively modulating the light quantity, directly turns on / off the current supplied to a large number of semiconductor lasers mounted in the light source box 40. By controlling
The control operation for modulating the laser beam emitted from the light source box 40 is executed.

The exposure device 34 includes a light guide member 36.
A light incident surface may be provided at both ends in the longitudinal direction (direction orthogonal to the scanning direction), and the laser beams may be made to be incident in synchronization from the light incident surfaces at both ends.

In the exposure apparatus 34 constructed as illustrated in FIG. 2, the light source box 40 is controlled by the control operation of the modulation circuit 42 which constitutes means for collectively modulating the light quantity.
The laser beam emitted in the above is introduced into the light guide member 36 through the optical fiber 44, and the light flux averagely diffused by the light guide member 36 is linearly condensed by the cylindrical lens 38, and the flat plate member 20 is predetermined. The operation of irradiating the position and exposing in a line shape is executed.

In this exposure apparatus 34, the spatial light modulator is composed of an assembly of micromirrors to modulate the angle of each mirror.
A device (DMD) or the like may be used, or a reflective liquid crystal or a transmissive liquid crystal may be used.

The exposure device 34 can be constructed as illustrated in FIG.

In the exposure apparatus 34 illustrated in FIG. 3, the spatial light modulating means constituting a means for collectively modulating the light quantity on the optical path from the light source box 40 to the light incident surface of the light guide member 36. The angle variable mirror 48, which is driven and controlled by the modulation circuit 42, is arranged. That is,
The modulation circuit 42 is configured to execute control for changing and adjusting the angular position of the variable angle mirror 48.

In the exposure apparatus 34 illustrated in FIG. 3, the laser beam emitted from the light source box 40 and condensed by the lens 46 is used as a spatial light modulating means which constitutes means for collectively modulating the light quantity. The modulation circuit 42 changes the angle to a predetermined angle position for ON operation, and the light is reflected by the angle variable mirror 48 that is drive-controlled to be set so that the light is incident from the light incident surface into the light guide member 36. It is configured to be switchable.

In this exposure apparatus 34, the exposure apparatus 3
Since it is not necessary to increase the resolution in the longitudinal direction of 4, the optical system only needs to be accurate in the scanning direction, and the configuration of the optical system itself can be simplified.

In this exposure apparatus 34, when the laser beam is irradiated into the light guide member 36, the light beam, which is uniformly diffused by the laser beam in the light guide member 36, is linearly condensed by the cylindrical lens 38, The operation of irradiating a predetermined position on the flat plate member 20 and exposing it in a line shape is executed.

Further, in the exposure apparatus 34 illustrated in FIG. 3, the laser beam emitted from the light source box 40 and condensed by the lens 46 is used as a spatial light modulating means which constitutes a means for collectively modulating the light quantity. 0FF in the modulation circuit 42 of
A state in which the light cannot be radiated into the light guide member 36 by being reflected by the angle variable mirror 48 that is drive-controlled so as to be adjusted and set to a predetermined angle position for operation and radiated in a direction away from the light incident surface. It is configured to be switchable to.

In a state where the laser beam cannot be irradiated into the light guide member 36 of the exposure device 34, since the laser beam does not reach the cylindrical lens 38, the linear exposure operation on the flat plate member 20 is not performed.

Since the configuration, action, and effect of the exposure apparatus 34 illustrated in FIG. 3 other than those described above are the same as those of the exposure apparatus 34 illustrated in FIG. 2, the description thereof will be omitted.

The exposure device 34 can be constructed as illustrated in FIG.

In the exposure apparatus 34 illustrated in FIG. 4, the light emitted from the light source box 40, the emission of which is controlled by the modulation circuit 42 which constitutes a means for collectively modulating the light quantity, is converted into a lens system by the optical fiber 44. The light introduced into the (optical system) light guide member 36 is guided to the cylindrical lens 38 evenly dispersed by the light guide member 36, and is linearly condensed on the surface of the flat plate member 20 by the cylindrical lens 38. The two elements that perform the exposure operation are linearly arranged.

In the exposure apparatus 34 illustrated in FIG. 4, the one on the left side of the drawing has a short exposure length. The one with a short exposure length on the left side of the drawing can be used for applications such as exposing and drawing a positioning mark which is a preliminary mark.

In the exposure apparatus 34 illustrated in FIG. 4, the exposure process is performed with the mask 50 placed on the flat plate material 20, so that the line shape having a width (length in the scanning direction) of 20 μm and a predetermined length is formed. Exposure process.

This mask 50 is constructed by providing a sheet-like material which is opaque and light-shielding with a line-shaped light-transmitting portion 52 (opening or the like) on the flat plate member 20.

When the mask 50 is provided with a portion 52 having a width (length in the scanning direction) of 20 μm and transmitting a linear light having a predetermined length, the mask 50 is used as the flat plate material 20.
The portion 52 that transmits the light is set at a position that matches the focal point of the cylindrical lens 38, and the portion 52 of the mask 50 that transmits the light has a width (length in the scanning direction) from the cylindrical lens 38 of the exposure device 34. ) 30 μm
By irradiating a laser beam condensed in a linear shape of a predetermined length, only the portion having the shape of the light transmitting portion 52 can be exposed on the surface of the flat plate member 20.

Therefore, when the mask 50 is used,
Only the linear portion having a width (length in the scanning direction) of 20 μm, which is narrower than the width (length in the scanning direction) of 30 μm of the light condensed in a line by the cylindrical lens 38, is used as the flat plate member 20.
The exposure width of the line-shaped exposed portion formed on the flat plate member 20 can be reduced by exposing the flat plate member 20 to the upper portion.

That is, by disposing the mask 50 in the vicinity of the flat plate material 20 which is the medium to be exposed of the exposure device 34, the light irradiation shape of the exposure device 34 in the scanning direction is changed to the shape of the portion 52 which transmits light. It can be correspondingly limited.

As a result, in this manufacturing apparatus, the resolution of the exposure device 34 in the scanning direction can be improved.

Although not shown, the light-transmitting portion 52 formed on the mask 50 is divided into a plurality of parts in the longitudinal direction of the line so that a part of the light-transmitting portion 52 is closed. When the light transmitting portion 52 is formed so as to be opened intermittently, a single light guide member 36 and the cylindrical lens 38 are used to expose a stripe on the flat plate member 20 that is the exposed surface. Since the pattern-shaped exposure portion can be formed so as to be partially interrupted in the lengthwise direction of the line shape, it can be formed by dividing the stripe-shaped exposure pattern into a plurality of groups. It will be possible.

Since the configuration, operation, and effect of the exposure apparatus 34 illustrated in FIG. 4 other than those described above are the same as those of the exposure apparatus 34 illustrated in FIG. 2 described above, description thereof will be omitted.

The exposure device 34 has a function of collectively modulating the light amount as a whole of the exposure device 34 when performing an exposure process on an exposure pattern in which such line-shaped exposure portions are arranged in parallel. If this is done, the exposure process can be performed properly, so that waste in the configuration can be reduced, the drawing speed can be increased, the power consumption and cost of the exposure apparatus can be reduced, and the configuration of the light modulator can be simplified to reduce the cost of the exposure apparatus. Can be realized.

That is, the exposure device 34 linearly collects the light flux whose light amount is collectively modulated from the light source system by the lens system (optical system) including the light guide member 36 and the cylindrical lens 38. Since the exposure process can be executed,
Unlike the multi-channel exposure element, it is not necessary to divide the modulation element into multi-channels, and therefore, the configuration of the light modulation means is significantly larger than the configuration in which the light amount is modulated by the multi-channel exposure element method. This simplifies and makes it possible to manufacture this light modulating means at low cost.

Further, the light modulating means is turned on to irradiate the light flux.
When the control is performed by the switching operation between the operation and the 0FF operation for stopping the irradiation of the light flux, the modulation element can be omitted, and thus the configuration of the exposure apparatus 34 can be further simplified and an inexpensive product can be obtained. Can be provided.

As shown in FIG. 1, in a manufacturing apparatus equipped with an exposure device for exposing and forming a color filter of a flat panel display, the controller drives and controls the head movement operating device 32 and the exposure device 34. The structure of the color filter is formed by exposing the flat plate member 20 placed on the stage 30 with the exposure pattern as shown in FIG.

The control unit of this manufacturing apparatus has a CPU (central processing unit) 54, and when a work command from a user is input to this CPU 54 from an input device (not shown), the control operation is started. .

The CPU 54 determines the control contents such as the laser energy level according to the working conditions such as the conveying speed of the exposure device 34 input by the user.
The setting value such as the level of laser energy suitable for the working condition is read from the table 56 which records the relationship between the recording condition and the head feed speed stored in the memory connected to the.

Next, the CPU 54 outputs a control signal for controlling the exposure device 34 based on the set value such as the level of the laser energy read from the table 56.
It is transmitted to the recording power setting circuit 58 connected to 54. The recording power setting circuit 58 transmits a control signal including a set value regarding laser energy to the recording laser driver 60.

The recording laser driver 60 sends a control signal to the light source box 40 to drive the light source box 40 and execute control to emit a laser beam.

Further, the CPU 54 outputs a control signal for controlling the exposure device 34 based on the set value such as the level of the laser energy read from the table 56.
Main scanning driver 6 for exposure device 34 connected to
Transfer to 2.

Main scan driver 62 for the exposure device 34
Sends a control signal for moving the exposure device 34 to the head movement operation device 32 to execute control for transporting the exposure device 34 in the main scanning direction. At the same time, the main scanning driver 62 for the exposure device 34 sends a control signal to the recording synchronization signal generation circuit 6
Send to 4.

In the recording synchronization signal generation circuit 64, a synchronization signal is added to the control signal generated by the main scanning driver 62 for the exposure device 34, and the control signal is transmitted to the modulation element driver 66.

The modulation element driver 66 reads the recording information of the drawing pattern (exposure pattern) from the recording data 68 in which the information input by the user to another CPU (not shown) is stored in the memory, and the drawing pattern is read. Drawing on the flat plate member 20 as shown in FIG. 6 by controlling the modulation circuit 42 that constitutes a unit that collectively modulates the light amount in the exposure device 34 based on the recording information of the (exposure pattern). An operation of irradiating a light flux of a laser with a pattern (exposure pattern) to perform exposure is performed.

Next, the operation and operation of the manufacturing apparatus provided with the exposure device for exposing and forming the color filter of the flat panel display illustrated in FIG. 1 configured as described above will be described.

When the user's command is input to the CPU 54, the manufacturing apparatus equipped with the exposure device for exposing and forming the color filter of this flat panel display automatically controls the exposure device based on the command. Then, the operation of manufacturing the color filter is performed.

In the operation of manufacturing this spacer, the CPU
By controlling the driving of the exposure device 34 by the control unit including 54, the surface of the flat plate material 20 is exposed in a line shape having a width of 45 μm as shown in FIG.
4 (the same applies to the G line 26 or the B line 28) is formed by a predetermined number of exposures at a predetermined interval of 105 μm.

In the operation of manufacturing the spacer, as shown in FIG. 6, the control unit including the CPU 54 causes the exposure device 34 to operate.
The control signal of ON / 0FF as shown in the figure is sent to the modulation circuit 42 constituting the means for collectively modulating the light quantity for drive control. Then, the exposure device 34 linearly exposes the flat plate member 20 with a light amount integrated value as shown in FIG.

At this time, since the light source light amount distribution on the flat plate member 20 (medium) is 24 W / m, the total light amount for the line-shaped exposed portion having a width of 30 μm is 12 W. Further, the time required for exposing and scanning the line-shaped portion having a width of 30 μm is 0.75 μsec, and the predetermined interval 105
The time required for the exposure device 34 to move the portion of μm is 1.75 μsec.

In the manufacturing apparatus provided with the exposure device for exposing and forming the color filters of the flat panel display shown in FIG. 1, since the exposure device 34 corresponds to the entire width of the flat plate member 20, it is possible to perform one scanning operation. , Flat plate material 2
An exposure pattern of a plurality of color filters formed in parallel with a linear shape as illustrated in FIG.

In a manufacturing apparatus equipped with an exposure device for exposing and forming the color filters of this flat panel display, as shown in FIG. 7, for example, R lines 24 groups are formed on the flat plate material 20, and then G lines are formed. 26 groups are formed, then 28 groups of B lines are formed, and the width between them is 5 μ.
A group of K lines 22 is formed in each of the gaps of m to form a color filter as a part of which is shown in FIG. 7 as a whole.
In this manufacturing apparatus, the K line 22 group may be formed first, the R line 24 group may be formed, the G line 26 group may be formed, and then the B line 28 group may be formed.

Further, in this manufacturing apparatus, the K line 22 is first formed, then the R line 24 is formed, then the G line 26 is formed, and then the B line 28 is formed. , May be formed as a whole as shown in FIG. In this case, the K line 22 is the other R line 24,
Even if the width is narrower than that of the G line 26 and the B line 28, it is possible to digitally position the position to be exposed by the exposure device in this manufacturing apparatus and perform the exposure processing at an accurate position.

Here, for example, as shown in FIG. 11, the exposure apparatus 3 in the manufacturing apparatus provided with the exposure apparatus for exposing and forming the color filter of the flat panel display.
4 is half the width of the flat plate material 20 (exposure width 26 of the exposure device 34).
0 mm), the flat plate material 2 is first
An exposure device 34 is formed by forming half a line-shaped exposure subgroup of an exposure pattern as illustrated in FIG.
Is moved in the direction of arrow B, and then half the line-shaped exposure sub-groups of the exposure pattern as illustrated in FIG.
It is possible to complete a line-shaped exposure portion group for a color filter of a flat panel display having an exposure pattern as illustrated in FIG. 5 over the entire surface of the flat plate member 20.

That is, in the manufacturing apparatus including the exposure apparatus illustrated in FIG. 11, the exposure apparatus 34 is configured to be able to expose a part of the predetermined width of the flat plate material 20 which is the medium to be exposed to be exposed. Therefore, after the operation of the first exposure scanning by the exposure device 34 is completed, the exposure device 3
4 is moved in the longitudinal direction by a predetermined distance, and the same scanning as in the first scanning is performed again (the scanning direction may be reversed, or the exposure device 34 is once returned to the initial position and then scanned in the positive direction for exposure). By repeating the above-described processing, the linear exposure pattern is formed over the entire predetermined exposure width of the flat plate material 20 as the medium to be exposed by the second or more scanning operation.

Further, the structure of the manufacturing apparatus equipped with the exposure device for forming the linear pattern shown in FIGS. 1 and 11 is such that the plate for printing the linear pattern (PS plate, flexo plate, screen plate) is used. Etc.) or electronic materials (resist film for printed boards, resist film for display boards, etc.)
It is suitable to be used for forming (drawing) by exposing to.

Next, a second embodiment of the exposure apparatus of the present invention will be described with reference to FIGS. The exposure apparatus according to the second embodiment has a narrow exposure area,
An ordinary matrix exposure head is used to perform an exposure process on a linear exposure pattern.

This exposure apparatus is used to manufacture a color filter for a flat panel display. The K line 22, the R line 24, the K line 22, the G line 26, the K line 22, and the B line are linear on the surface of the flat plate material 20. 28,
It is configured so that it can be used in a manufacturing apparatus for sequentially exposing and forming the K line 22.

In this exposure apparatus, as shown in FIG. 8, LD7, which is a multimode semiconductor laser with an output of 100 mW, is used.
0s are arranged in a line at intervals of 10 mm, and the laser beam emitted from the LD 70, which is each of these multimode semiconductor lasers, is irradiated in a line by the lens system (optical system) 72 corresponding to each LD 70. .

This lens system (optical system) 72 is, for example,
With the cylindrical lens, the laser beam emitted from the LD 70 can be linearly irradiated. In this case, the beam diameter is from 50 μm to 100 μm.
μm. Further, the lens system 72 can be configured to be capable of linearly irradiating the laser beam emitted from the LD 70 with, for example, an aspherical cylindrical lens, a toric lens, or an aspherical toric lens.

When an aspherical toric lens is used as the lens system (optical system) 72, the beam diameter can be reduced to about 10 μm. This lens system (optical system)
When an aspherical toric lens is used as 72, as shown in FIGS. 9 and 10, it is possible to irradiate the laser beam emitted from the LD 70, which is a multimode semiconductor laser, in a narrow line shape having a predetermined length. Can be

In this exposure apparatus, as shown in FIG. 8, the LD 70, which is a plurality of multi-mode semiconductor lasers arranged in parallel in a line, is collectively operated by a control device (not shown) to form the flat plate material 2.
ON / 0FF with a predetermined timing corresponding to 0 operation position
The exposure process is executed by controlling the operation.

Since the configuration, operation, and effect of the second embodiment other than those described above are the same as those of the first embodiment, the description thereof will be omitted.

[0089]

As described above, in the exposure apparatus of the present invention, firstly, the light flux modulated by the means for collectively modulating the light amount is linearly irradiated from the optical system to expose the medium to be exposed. The line-shaped exposure portions set so as to be aligned in the relative scanning direction can be sequentially exposed.

With this structure, the light flux modulated by the means for collectively modulating the light quantity in the exposure apparatus is linearly irradiated onto the medium to be exposed by the optical system to expose the medium. After the relative scanning of the exposure medium and the exposure device, the operation of exposing the optical system by linearly irradiating the light flux modulated by the means for collectively modulating the light amount in the exposure device again, Since the linear exposure pattern is sequentially exposed, the line-shaped exposure pattern can be appropriately and quickly exposed, and the light flux is modulated by the means that collectively modulates the light amount and then sent to the optical system. Since the linear irradiation is performed, there is an effect that the structure of the means for modulating the light quantity is simplified and an inexpensive exposure apparatus can be provided.

Secondly, the light source controlled by the modulation means, the light guide member into which the light beam emitted by the light source is introduced, and the light beam which is dispersed evenly by the light guide member are received, and this light beam is exposed. And a lens system that performs an exposure operation by irradiating the surface of the medium so as to collect the light in a line shape.

With this structure, the light flux modulated by the light source whose emission is controlled by the modulator is introduced into the light guide member, and the light flux averagely dispersed by the light guide member is guided by the lens system to the exposed medium. The exposure is performed by irradiating the surface so that the light is condensed in a line shape, the medium to be exposed and the exposure device are relatively scanned, and then the operation of irradiating and exposing the line shape again is repeated to expose the line-shaped exposed portion. Because it exposes sequentially,
The line-shaped exposure pattern can be exposed appropriately and quickly, and the light flux is modulated by the light source whose emission is controlled by the modulation means, and then introduced into the light guide member, and irradiated linearly from the lens system. This has the effect of simplifying the structure of the means for modulating the light quantity by omitting the elements, and making it possible to provide an inexpensive exposure apparatus.

Thirdly, the spatial light modulating means for modulating the light flux emitted from the light source and irradiating the light guide member and the light flux dispersed evenly by the light guide member are received, and the light flux is applied to the surface of the medium to be exposed. And a lens system that performs an exposure operation by irradiating the light so that the light is condensed in a line shape upward.

With this structure, the light beam emitted from the light source is modulated by the spatial light modulator and introduced into the light guide member, and the light beam averagely dispersed by the light guide member is covered by the lens system. The operation is performed by irradiating the surface of the exposure medium so that the medium is linearly focused, and the medium to be exposed and the exposure device are relatively scanned, and then the operation of irradiating and exposing the medium again is repeated. Since the exposed parts are exposed sequentially,
A line-shaped exposure pattern can be exposed appropriately and quickly, and the structure in which the light flux emitted from the light source is modulated by the spatial light modulator and applied to the light guide member can be simplified, and an inexpensive exposure apparatus can be provided. There is an effect of doing.

Fourth, by performing the exposure process in the state where the mask is arranged in the vicinity of the medium to be exposed, the shape of the portion which is exposed on the medium to be exposed and which transmits the light formed on the mask is transmitted. It is configured to improve the resolution by limiting to a line shape corresponding to.

With this structure, the portion of the medium to be exposed which is exposed linearly is restricted to the shape of the portion of the mask which transmits the light and has an appropriate shape. There is an effect that the resolution in the line-shaped exposed portion can be improved.

Fifth, the multi-mode semiconductor laser light source arranged in a line and the laser beam emitted by the multi-mode semiconductor laser light source light source are controlled by the means for collectively modulating the light quantity. , And a lens system for linearly irradiating the medium to be exposed.

With such a configuration, the plurality of multi-mode semiconductor laser light sources arranged in a line are collectively controlled to emit light by means for modulating the light quantity, and the plurality of line-shaped semiconductor laser light sources are arranged in a line. The laser beam emitted from the multi-mode semiconductor laser light source of is irradiated by the lens system so as to be focused in a line on the medium to be exposed for exposure, and the medium to be exposed and the exposure device are relatively scanned, and then again. By repeating the operation of irradiating and exposing in a line shape to sequentially expose the line-shaped exposure portion, it is possible to appropriately and quickly expose the line-shaped exposure pattern, and also in a plurality of multi-modes arranged in a line shape. This has the effect of simplifying the structure for controlling the light emission by means for collectively modulating the light amount of the semiconductor laser light sources, thereby making it possible to provide an inexpensive exposure apparatus.

[Brief description of drawings]

FIG. 1 is a schematic configuration explanatory view of a main part of a manufacturing apparatus for forming a line pattern for a color filter in a flat panel display, which is equipped with an exposure apparatus according to a first embodiment of the present invention.

FIG. 2 is a schematic configuration explanatory diagram of a main part showing an exposure device, which is provided in a manufacturing apparatus for forming a line pattern for a color filter in the flat panel display according to the first embodiment of the invention. .

FIG. 3 is a main part showing an exposure apparatus using a variable angle mirror, which is provided in a manufacturing apparatus for forming a line pattern for a color filter in a flat panel display according to a first embodiment of the present invention. It is a schematic structure explanatory view.

FIG. 4 is a diagram showing an exposure device portion provided in a manufacturing apparatus for forming a plurality of divided line-shaped patterns for a color filter in the flat panel display according to the first embodiment of the present invention. FIG.

FIG. 5 shows a state in which a linear pattern is exposed by an exposure device provided in a manufacturing apparatus for forming a linear pattern for a color filter in the flat panel display according to the first embodiment of the present invention. FIG. 3 is a schematic configuration explanatory diagram of a main part taken out and shown.

FIG. 6 is a control operation when exposing a linear pattern by an exposure device provided in a manufacturing apparatus for forming a linear pattern for a color filter in the flat panel display according to the first embodiment of the present invention. 4 is an explanatory diagram for explaining the timing of FIG.

FIG. 7 illustrates an arrangement configuration of exposure patterns formed by a manufacturing apparatus for forming a line-shaped exposure pattern for a color filter in a flat panel display, which includes the exposure apparatus according to the first embodiment of the present invention. FIG.

FIG. 8 is a schematic view of a main part showing a light source and a lens system of an exposure device, which is provided in a manufacturing apparatus for forming a line pattern for a color filter in a flat panel display according to a second embodiment of the present invention. It is a structure explanatory view.

FIG. 9 is a single light source in an exposure apparatus provided in a manufacturing apparatus for forming a line pattern for a color filter in a flat panel display according to a second embodiment of the present invention, and a single light source used in the same. FIG. 4 is a front view of the main parts, showing the condensed state of the lens system of FIG.

FIG. 10 is a single light source in an exposure apparatus provided in a manufacturing apparatus for forming a line pattern for a color filter in a flat panel display according to a second embodiment of the present invention, and a single light source used in the same. FIG. 3 is a side view of a main part of the lens system of FIG.

FIG. 11 is a schematic view of a main part showing another configuration example of a manufacturing apparatus for forming a linear pattern for a color filter in a flat panel display, which is equipped with the exposure apparatus according to the first embodiment of the present invention. It is a structure explanatory view.

FIG. 12 is a schematic configuration diagram illustrating a conventional exposure apparatus.

[Explanation of symbols]

20 Flat plate material 22 K line 24 R line 26 G line 28 B line 30 stages 32 head movement operation device 34 Exposure equipment 36 Light guide member 38 Cylindrical lens 40 light source box 42 Modulation circuit 46 lenses 48 angle variable mirror 50 mask 52 Light transmitting part 70 LD which is a multi-mode semiconductor laser 72 Lens system

Continued front page    (72) Inventor Kazuhiko Nagano             798 Miyadai, Kaisei-cho, Ashigarakami-gun, Kanagawa Prefecture             Shishi Film Co., Ltd. (72) Inventor Hiromi Ishikawa             798 Miyadai, Kaisei-cho, Ashigarakami-gun, Kanagawa Prefecture             Shishi Film Co., Ltd. F-term (reference) 2H097 AA05 BA10 CA06 CA17 LA01                       LA04 LA05 LA20                 5F046 BA02 CA03 CB02 CB12 CB23                       CC15

Claims (5)

[Claims] 1. An optical system linearly irradiates a light flux modulated by a means for collectively modulating a light amount,
An exposure apparatus characterized in that line-shaped exposure portions set to be lined up in a relative scanning direction of a medium to be exposed are sequentially exposed. 2. A light source whose emission is controlled by a modulator, a light guide member into which a light beam emitted by the light source is introduced, a light beam which is dispersed evenly by the light guide member, and the light beam is exposed. An exposure apparatus comprising: a lens system that performs an exposure operation by irradiating the surface of a medium so as to collect the light in a line shape. 3. A spatial light modulator that modulates a light beam emitted from a light source and irradiates the light guide member with the light beam, and receives the light beam that has been uniformly dispersed by the light guide member, and receives the light beam on the surface of the medium to be exposed. An exposure apparatus comprising: a lens system that performs an exposure operation by irradiating the light so that the light is condensed in a line shape. 4. An exposure process is performed with a mask placed in the vicinity of the exposed medium, so that a portion of the exposed medium exposed on the exposed medium is exposed to light. 4. The exposure apparatus according to claim 1, wherein the resolution is improved by limiting to a linear shape corresponding to the shape. 5. A multi-mode semiconductor laser light source arranged in a line and having emission controlled by means for collectively modulating the light quantity, and a laser beam emitted by the multi-mode semiconductor laser light source. An exposure apparatus comprising: a lens system that linearly irradiates an exposed medium.