TW200722936A - Laser light source device, exposure method, and device - Google Patents
Laser light source device, exposure method, and deviceInfo
- Publication number
- TW200722936A TW200722936A TW095145930A TW95145930A TW200722936A TW 200722936 A TW200722936 A TW 200722936A TW 095145930 A TW095145930 A TW 095145930A TW 95145930 A TW95145930 A TW 95145930A TW 200722936 A TW200722936 A TW 200722936A
- Authority
- TW
- Taiwan
- Prior art keywords
- light source
- laser light
- source device
- exposure
- information
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70533—Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1394—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length by using an active reference, e.g. second laser, klystron or other standard frequency source
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005357015 | 2005-12-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200722936A true TW200722936A (en) | 2007-06-16 |
Family
ID=38122846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095145930A TW200722936A (en) | 2005-12-09 | 2006-12-08 | Laser light source device, exposure method, and device |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080315126A1 (zh) |
EP (1) | EP1975720A4 (zh) |
JP (1) | JPWO2007066700A1 (zh) |
KR (1) | KR20080091137A (zh) |
TW (1) | TW200722936A (zh) |
WO (1) | WO2007066700A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI684309B (zh) * | 2018-02-02 | 2020-02-01 | 日商住友重機械工業股份有限公司 | 雷射振盪器 |
TWI774875B (zh) * | 2017-11-17 | 2022-08-21 | 日商濱松赫德尼古斯股份有限公司 | 吸附方法 |
TWI828831B (zh) * | 2019-01-09 | 2024-01-11 | 日商尼康股份有限公司 | 曝光裝置 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014120985A1 (en) | 2013-01-30 | 2014-08-07 | Kla-Tencor Corporation | Euv light source using cryogenic droplet targets in mask inspection |
JP6364476B2 (ja) * | 2014-03-18 | 2018-07-25 | ギガフォトン株式会社 | ガスレーザ装置及びその制御方法 |
JP6428675B2 (ja) * | 2016-02-22 | 2018-11-28 | 株式会社ニコン | パターン描画用の光源装置 |
US10096967B2 (en) | 2016-12-07 | 2018-10-09 | Cymer, Llc | Wavelength control system for pulse-by-pulse wavelength target tracking in DUV light source |
KR102131951B1 (ko) | 2019-04-19 | 2020-07-09 | (주)인터체크 | 일체형 레이저 홀더를 구비한 레이저 어셈블리 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2503495B2 (ja) * | 1987-03-30 | 1996-06-05 | 株式会社ニコン | 露光装置及び露光方法 |
JPH01239923A (ja) * | 1988-03-22 | 1989-09-25 | Nikon Corp | 露光装置 |
US5383217A (en) * | 1989-05-09 | 1995-01-17 | Nikon Corporation | Exposure apparatus with laser source requiring new gas introduction |
JP3235078B2 (ja) * | 1993-02-24 | 2001-12-04 | 株式会社ニコン | 走査露光方法、露光制御装置、走査型露光装置、及びデバイス製造方法 |
JP3391940B2 (ja) * | 1995-06-26 | 2003-03-31 | キヤノン株式会社 | 照明装置及び露光装置 |
US5883701A (en) * | 1995-09-21 | 1999-03-16 | Canon Kabushiki Kaisha | Scanning projection exposure method and apparatus |
JPH0992611A (ja) * | 1995-09-21 | 1997-04-04 | Canon Inc | 走査型露光装置および方法 |
US6621846B1 (en) * | 1997-07-22 | 2003-09-16 | Cymer, Inc. | Electric discharge laser with active wavelength chirp correction |
JP3697036B2 (ja) * | 1997-10-03 | 2005-09-21 | キヤノン株式会社 | 露光装置及びそれを用いた半導体製造方法 |
JP2001326159A (ja) * | 2000-05-16 | 2001-11-22 | Nikon Corp | レーザ装置、露光装置、および該露光装置を用いるデバイス製造方法 |
US7023885B1 (en) * | 1999-07-09 | 2006-04-04 | Nikon Corporation | Laser apparatus and method for controlling the same |
JPWO2002054464A1 (ja) * | 2000-12-28 | 2004-05-13 | 株式会社ニコン | 露光方法及び露光装置 |
JP2002223020A (ja) * | 2001-01-26 | 2002-08-09 | Gigaphoton Inc | フッ素分子レーザ装置、及びフッ素露光装置 |
TW591694B (en) * | 2001-02-13 | 2004-06-11 | Nikon Corp | Specification determining method, making method and adjusting method of projection optical system, exposure apparatus and making method thereof, and computer system |
JP2003037054A (ja) * | 2001-05-18 | 2003-02-07 | Canon Inc | インタロック装置及び露光装置 |
JP4981218B2 (ja) * | 2001-06-15 | 2012-07-18 | キヤノン株式会社 | 露光装置および露光方法 |
JP2003045769A (ja) * | 2001-07-27 | 2003-02-14 | Canon Inc | 露光装置およびデバイス製造方法 |
EP1503243A1 (en) * | 2003-07-31 | 2005-02-02 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
-
2006
- 2006-12-06 WO PCT/JP2006/324387 patent/WO2007066700A1/ja active Application Filing
- 2006-12-06 JP JP2007549160A patent/JPWO2007066700A1/ja not_active Withdrawn
- 2006-12-06 KR KR1020087016664A patent/KR20080091137A/ko not_active Application Discontinuation
- 2006-12-06 EP EP06834142A patent/EP1975720A4/en not_active Withdrawn
- 2006-12-08 TW TW095145930A patent/TW200722936A/zh unknown
-
2008
- 2008-06-06 US US12/155,639 patent/US20080315126A1/en not_active Abandoned
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI774875B (zh) * | 2017-11-17 | 2022-08-21 | 日商濱松赫德尼古斯股份有限公司 | 吸附方法 |
US11947140B2 (en) | 2017-11-17 | 2024-04-02 | Hamamatsu Photonics K.K. | Suctioning method |
TWI684309B (zh) * | 2018-02-02 | 2020-02-01 | 日商住友重機械工業股份有限公司 | 雷射振盪器 |
TWI828831B (zh) * | 2019-01-09 | 2024-01-11 | 日商尼康股份有限公司 | 曝光裝置 |
Also Published As
Publication number | Publication date |
---|---|
EP1975720A4 (en) | 2010-05-05 |
WO2007066700A1 (ja) | 2007-06-14 |
KR20080091137A (ko) | 2008-10-09 |
US20080315126A1 (en) | 2008-12-25 |
EP1975720A1 (en) | 2008-10-01 |
JPWO2007066700A1 (ja) | 2009-05-21 |
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