TW200721288A - Method and apparatus for peeling resist - Google Patents

Method and apparatus for peeling resist

Info

Publication number
TW200721288A
TW200721288A TW094142111A TW94142111A TW200721288A TW 200721288 A TW200721288 A TW 200721288A TW 094142111 A TW094142111 A TW 094142111A TW 94142111 A TW94142111 A TW 94142111A TW 200721288 A TW200721288 A TW 200721288A
Authority
TW
Taiwan
Prior art keywords
resist
substrate
peeling
steam
particle diameter
Prior art date
Application number
TW094142111A
Other languages
English (en)
Chinese (zh)
Inventor
Norio Suzuki
Original Assignee
Realize Advanced Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Realize Advanced Technology Ltd filed Critical Realize Advanced Technology Ltd
Publication of TW200721288A publication Critical patent/TW200721288A/zh

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW094142111A 2004-10-15 2005-11-30 Method and apparatus for peeling resist TW200721288A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004301366A JP2006114738A (ja) 2004-10-15 2004-10-15 レジスト剥離方法およびレジスト剥離装置

Publications (1)

Publication Number Publication Date
TW200721288A true TW200721288A (en) 2007-06-01

Family

ID=36383000

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094142111A TW200721288A (en) 2004-10-15 2005-11-30 Method and apparatus for peeling resist

Country Status (2)

Country Link
JP (1) JP2006114738A (enExample)
TW (1) TW200721288A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4938357B2 (ja) * 2006-05-31 2012-05-23 ナノミストテクノロジーズ株式会社 洗浄方法と洗浄装置
CN113118103A (zh) * 2019-12-31 2021-07-16 苏州阿洛斯环境发生器有限公司 一种共混超声驱动控制微液滴集群清洗系统
CN113118102A (zh) * 2019-12-31 2021-07-16 苏州阿洛斯环境发生器有限公司 一种微液滴集群载气混合清洗系统
CN113118104A (zh) * 2019-12-31 2021-07-16 苏州阿洛斯环境发生器有限公司 一种多通超声驱动控制微液滴集群清洗系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6322003B1 (en) * 1999-06-11 2001-11-27 Spraying Systems Co. Air assisted spray nozzle
JP4942263B2 (ja) * 2001-08-31 2012-05-30 ラムリサーチ株式会社 洗浄装置
JP2003282513A (ja) * 2002-03-26 2003-10-03 Seiko Epson Corp 有機物剥離方法及び有機物剥離装置
JP4702920B2 (ja) * 2002-11-12 2011-06-15 大日本スクリーン製造株式会社 基板処理方法および基板処理装置
JP2004237282A (ja) * 2003-01-16 2004-08-26 Kyoritsu Gokin Co Ltd 二流体ノズル
JP2004273799A (ja) * 2003-03-10 2004-09-30 Dainippon Screen Mfg Co Ltd 基板用リンス液、基板処理方法および基板処理装置

Also Published As

Publication number Publication date
JP2006114738A (ja) 2006-04-27

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