TW200719102A - Laser beam/uv irradiation peripheral exposure apparatus, and method therefor - Google Patents

Laser beam/uv irradiation peripheral exposure apparatus, and method therefor

Info

Publication number
TW200719102A
TW200719102A TW095137694A TW95137694A TW200719102A TW 200719102 A TW200719102 A TW 200719102A TW 095137694 A TW095137694 A TW 095137694A TW 95137694 A TW95137694 A TW 95137694A TW 200719102 A TW200719102 A TW 200719102A
Authority
TW
Taiwan
Prior art keywords
moving
laser beam
irradiation
stage
exposure apparatus
Prior art date
Application number
TW095137694A
Other languages
English (en)
Chinese (zh)
Other versions
TWI324284B (https=
Inventor
Haruyasu Kenmotsu
Hiroaki Sato
Yasuhito Ikeda
Masato Mori
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200719102A publication Critical patent/TW200719102A/zh
Application granted granted Critical
Publication of TWI324284B publication Critical patent/TWI324284B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/7045—Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70458—Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095137694A 2005-11-04 2006-10-13 Laser beam/uv irradiation peripheral exposure apparatus, and method therefor TW200719102A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005321256 2005-11-04
JP2006246265A JP4491444B2 (ja) 2005-11-04 2006-09-12 レーザビーム・紫外線照射周辺露光装置およびその方法

Publications (2)

Publication Number Publication Date
TW200719102A true TW200719102A (en) 2007-05-16
TWI324284B TWI324284B (https=) 2010-05-01

Family

ID=38209772

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137694A TW200719102A (en) 2005-11-04 2006-10-13 Laser beam/uv irradiation peripheral exposure apparatus, and method therefor

Country Status (3)

Country Link
JP (1) JP4491444B2 (https=)
KR (1) KR100947079B1 (https=)
TW (1) TW200719102A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011013512A (ja) * 2009-07-03 2011-01-20 Orc Manufacturing Co Ltd 周辺露光装置
CN110716392A (zh) * 2018-07-12 2020-01-21 东莞市多普光电设备有限公司 一种基于可生产大型基板的半自动曝光机

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000294501A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000294500A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP3091460B1 (ja) * 1999-12-10 2000-09-25 東レエンジニアリング株式会社 露光装置
JP4342663B2 (ja) * 1999-12-20 2009-10-14 株式会社オーク製作所 周辺露光装置
JP2001201862A (ja) * 2000-01-19 2001-07-27 Nikon Corp 周辺露光装置
JP3321733B2 (ja) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 露光装置
JP2002223072A (ja) 2001-01-24 2002-08-09 Matsushita Electric Ind Co Ltd 多層プリント配線板の製造方法およびその製造装置
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
JP3547418B2 (ja) * 2001-10-25 2004-07-28 三菱商事株式会社 レーザビームによる液晶パネルのマーキング方法及び装置
JP4014031B2 (ja) 2002-06-05 2007-11-28 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP4664102B2 (ja) * 2005-03-18 2011-04-06 東レエンジニアリング株式会社 露光装置及び露光方法

Also Published As

Publication number Publication date
JP2007148358A (ja) 2007-06-14
TWI324284B (https=) 2010-05-01
JP4491444B2 (ja) 2010-06-30
KR20070048612A (ko) 2007-05-09
KR100947079B1 (ko) 2010-03-10

Similar Documents

Publication Publication Date Title
AU2003220835A1 (en) Method and system for machining fragile material
GB2402037B (en) Plant treatment method and means therefor
AU2003276569A1 (en) Liquid removal in a method and device for irradiating spots on a layer
CN109476080B (zh) 用于增加组件层与载体对象的粘附性的装置和方法
ATE547234T1 (de) Optische formungsvorrichtung und optisches formungsverfahren
ATE483588T1 (de) Bildverarbeitungsgerät und -verfahren
TW284907B (en) Removal of material by polarized irradiation and back side application for radiation
EP1834796A3 (en) Image processing method and image processing apparatus
ATE476686T1 (de) Bestrahlungsverfahren
NO954027D0 (no) Fjerning av overflateforurensninger ved bestråling
MX2021012880A (es) Aparato de fuente de luz ultravioleta compacto.
ATE469723T1 (de) Vorrichtung zur industriellen verarbeitung eines materials durch optische strahlung
CA2348277A1 (en) Ablated laser feature shape reproduction control
MX2009004286A (es) Dispositivo para cirugia de ojo con laser optico.
AU2003283717A1 (en) Method and device for irradiating spots on a layer
TW200644141A (en) Visual inspection apparatus
CN117908336A (zh) 具有涂覆于圆柱形对称元件上的靶材料的基于等离子体的光源
EP1770443A3 (en) Laser processing apparatus, exposure apparatus and exposure method
WO2008125173A3 (de) Vorrichtung und verfahren zur materialbearbeitung mittels laserstrahlung
SG162690A1 (en) Lithographic apparatus and method of irradiating at least two target portions
TW200719102A (en) Laser beam/uv irradiation peripheral exposure apparatus, and method therefor
WO2007024927A3 (en) Absorbent articles comprising surface cross-linked superabsorbent polymer particles made by a method using ultraviolet radiation
WO2004097844A3 (en) Apparatus for handling minute object
TW200643648A (en) Exposure apparatus and exposure method
TW200719094A (en) Laser beam/uv-irradiation peripheral exposure apparatus and method therefor

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees