TW200708891A - Photoactive compounds - Google Patents

Photoactive compounds

Info

Publication number
TW200708891A
TW200708891A TW095119446A TW95119446A TW200708891A TW 200708891 A TW200708891 A TW 200708891A TW 095119446 A TW095119446 A TW 095119446A TW 95119446 A TW95119446 A TW 95119446A TW 200708891 A TW200708891 A TW 200708891A
Authority
TW
Taiwan
Prior art keywords
photoactive compounds
formula
compound
compounds
ionic compound
Prior art date
Application number
TW095119446A
Other languages
English (en)
Inventor
Dalil M Rahman
Francis M Houlihan
Munirathna Padmanaban
Sang-Ho Lee
Ralph R Dammel
David Rentkiewicz
Clement Anyadiegwu
Original Assignee
Az Electronic Materials Usa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Usa filed Critical Az Electronic Materials Usa
Publication of TW200708891A publication Critical patent/TW200708891A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/02—Monocyclic aromatic halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/18—Polycyclic aromatic halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/05—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing at least two sulfo groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/17—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/46—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings substituted on the ring sulfur atom
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
TW095119446A 2005-07-12 2006-06-01 Photoactive compounds TW200708891A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17988605A 2005-07-12 2005-07-12
US11/355,762 US7521170B2 (en) 2005-07-12 2006-02-16 Photoactive compounds

Publications (1)

Publication Number Publication Date
TW200708891A true TW200708891A (en) 2007-03-01

Family

ID=37193983

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095119446A TW200708891A (en) 2005-07-12 2006-06-01 Photoactive compounds

Country Status (6)

Country Link
US (2) US7521170B2 (zh)
EP (1) EP1915360A2 (zh)
JP (1) JP2009501207A (zh)
KR (1) KR101402519B1 (zh)
TW (1) TW200708891A (zh)
WO (1) WO2007007175A2 (zh)

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US7390613B1 (en) * 2006-12-04 2008-06-24 Az Electronic Materials Usa Corp. Photoactive compounds
US20080171270A1 (en) * 2007-01-16 2008-07-17 Munirathna Padmanaban Polymers Useful in Photoresist Compositions and Compositions Thereof
US20080187868A1 (en) * 2007-02-07 2008-08-07 Munirathna Padmanaban Photoactive Compounds
US7851140B2 (en) * 2007-06-12 2010-12-14 Fujifilm Corporation Resist composition for negative tone development and pattern forming method using the same
US8252503B2 (en) * 2007-08-24 2012-08-28 Az Electronic Materials Usa Corp. Photoresist compositions
US8088548B2 (en) * 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
TWI452419B (zh) * 2008-01-28 2014-09-11 Az Electronic Mat Ip Japan Kk 細微圖案光罩及其製造方法、及使用其之細微圖案形成方法
US20090253081A1 (en) * 2008-04-02 2009-10-08 David Abdallah Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step
US20090253080A1 (en) * 2008-04-02 2009-10-08 Dammel Ralph R Photoresist Image-Forming Process Using Double Patterning
US20100040838A1 (en) * 2008-08-15 2010-02-18 Abdallah David J Hardmask Process for Forming a Reverse Tone Image
US8455176B2 (en) * 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
US8084186B2 (en) * 2009-02-10 2011-12-27 Az Electronic Materials Usa Corp. Hardmask process for forming a reverse tone image using polysilazane
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US8632948B2 (en) * 2009-09-30 2014-01-21 Az Electronic Materials Usa Corp. Positive-working photoimageable bottom antireflective coating
JP5617844B2 (ja) * 2009-10-20 2014-11-05 Jsr株式会社 感放射線性樹脂組成物
KR101229312B1 (ko) 2011-01-03 2013-02-04 금호석유화학 주식회사 술포늄 화합물, 광산발생제 및 이의 제조방법
US8623589B2 (en) * 2011-06-06 2014-01-07 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions and processes thereof
DE102012108826A1 (de) * 2011-09-20 2013-03-21 Beijing Lenovo Software Ltd. Elektronische vorrichtung und verfahren zum anpassen ihres berührungssteuerungsbereichs
US20190056828A1 (en) * 2012-09-06 2019-02-21 Google Inc. User interface transitions
JP6031369B2 (ja) * 2013-01-31 2016-11-24 富士フイルム株式会社 パターン形成方法、及び電子デバイスの製造方法
JP6458361B2 (ja) * 2013-06-17 2019-01-30 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
US10339198B2 (en) 2015-12-18 2019-07-02 Bitly, Inc. Systems and methods for benchmarking online activity via encoded links
WO2021251083A1 (ja) * 2020-06-10 2021-12-16 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
JPWO2022024928A1 (zh) * 2020-07-27 2022-02-03
JPWO2022024929A1 (zh) * 2020-07-27 2022-02-03

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Also Published As

Publication number Publication date
KR20080046625A (ko) 2008-05-27
US20070015084A1 (en) 2007-01-18
US20090087782A1 (en) 2009-04-02
WO2007007175A3 (en) 2007-04-05
US7833693B2 (en) 2010-11-16
WO2007007175A2 (en) 2007-01-18
JP2009501207A (ja) 2009-01-15
US7521170B2 (en) 2009-04-21
KR101402519B1 (ko) 2014-06-03
EP1915360A2 (en) 2008-04-30

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