TW200643847A - Electro-optical device, method of manufacturing electro-optical device, andelectronic appatatus - Google Patents

Electro-optical device, method of manufacturing electro-optical device, andelectronic appatatus

Info

Publication number
TW200643847A
TW200643847A TW095112691A TW95112691A TW200643847A TW 200643847 A TW200643847 A TW 200643847A TW 095112691 A TW095112691 A TW 095112691A TW 95112691 A TW95112691 A TW 95112691A TW 200643847 A TW200643847 A TW 200643847A
Authority
TW
Taiwan
Prior art keywords
optical device
electro
substrate
region
disposed
Prior art date
Application number
TW095112691A
Other languages
English (en)
Other versions
TWI283380B (en
Inventor
Yasuji Yamasaki
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of TW200643847A publication Critical patent/TW200643847A/zh
Application granted granted Critical
Publication of TWI283380B publication Critical patent/TWI283380B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1255Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/126Shielding, e.g. light-blocking means over the TFTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/131Interconnections, e.g. wiring lines or terminals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78633Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with a light shield

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW095112691A 2005-04-11 2006-04-10 Electro-optical device, method of manufacturing electro-optical device TWI283380B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005113146 2005-04-11
JP2006020094A JP4442569B2 (ja) 2005-04-11 2006-01-30 電気光学装置及び電子機器

Publications (2)

Publication Number Publication Date
TW200643847A true TW200643847A (en) 2006-12-16
TWI283380B TWI283380B (en) 2007-07-01

Family

ID=37233585

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112691A TWI283380B (en) 2005-04-11 2006-04-10 Electro-optical device, method of manufacturing electro-optical device

Country Status (4)

Country Link
US (1) US20060243977A1 (zh)
JP (1) JP4442569B2 (zh)
KR (1) KR100769068B1 (zh)
TW (1) TWI283380B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI449088B (zh) * 2010-11-22 2014-08-11 Lg Display Co Ltd 液晶顯示裝置及其製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101252002B1 (ko) * 2006-05-23 2013-04-08 삼성디스플레이 주식회사 액정 표시 장치
JP4349406B2 (ja) * 2006-08-24 2009-10-21 セイコーエプソン株式会社 電気光学装置用基板及び電気光学装置、並びに電子機器
JP5130711B2 (ja) * 2006-12-26 2013-01-30 セイコーエプソン株式会社 電気光学装置及びその製造方法
CN101620347B (zh) * 2008-07-03 2011-08-17 中芯国际集成电路制造(上海)有限公司 硅基液晶器件及其制造方法
KR102408898B1 (ko) 2015-06-19 2022-06-16 엘지디스플레이 주식회사 박막 트랜지스터 기판 및 이를 이용한 표시장치
KR102621005B1 (ko) * 2018-12-26 2024-01-05 삼성디스플레이 주식회사 유기 발광 표시 장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5840821A (en) * 1994-03-11 1998-11-24 Kawasaki Steel Corporation Coating solution and method for preparing the coating solution, method for forming insulating films for semiconductor devices, and method for evaluating the coating solution
KR100654927B1 (ko) * 1999-03-04 2006-12-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그의 제작방법
JP4193339B2 (ja) * 1999-09-29 2008-12-10 セイコーエプソン株式会社 液晶装置及び投射型表示装置並びに液晶装置の製造方法
WO2001082273A1 (fr) * 2000-04-21 2001-11-01 Seiko Epson Corporation Dispositif electro-optique
US6636284B2 (en) * 2000-08-11 2003-10-21 Seiko Epson Corporation System and method for providing an electro-optical device having light shield layers
JP4798907B2 (ja) * 2001-09-26 2011-10-19 株式会社半導体エネルギー研究所 半導体装置
JP3791517B2 (ja) * 2002-10-31 2006-06-28 セイコーエプソン株式会社 電気光学装置及び電子機器
KR100870701B1 (ko) * 2002-12-17 2008-11-27 엘지디스플레이 주식회사 액정표시장치용 어레이기판과 그 제조방법
TWI300508B (en) * 2003-01-13 2008-09-01 Toppoly Optoelectronics Corp Liquid crystal display
KR100961945B1 (ko) * 2003-03-26 2010-06-08 삼성전자주식회사 액정 표시 장치 및 그에 사용되는 표시판
JP4341570B2 (ja) * 2005-03-25 2009-10-07 セイコーエプソン株式会社 電気光学装置及び電子機器
KR101180863B1 (ko) * 2005-05-31 2012-10-11 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
JP4586732B2 (ja) * 2006-01-06 2010-11-24 セイコーエプソン株式会社 電気光学装置及びその製造方法並びに電子機器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI449088B (zh) * 2010-11-22 2014-08-11 Lg Display Co Ltd 液晶顯示裝置及其製造方法

Also Published As

Publication number Publication date
KR100769068B1 (ko) 2007-10-22
JP4442569B2 (ja) 2010-03-31
JP2006317901A (ja) 2006-11-24
TWI283380B (en) 2007-07-01
KR20060107928A (ko) 2006-10-16
US20060243977A1 (en) 2006-11-02

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