TW200639576A - Method of manufacturing gray level mask, gray level mask, and gray level mask blank - Google Patents
Method of manufacturing gray level mask, gray level mask, and gray level mask blankInfo
- Publication number
- TW200639576A TW200639576A TW095106896A TW95106896A TW200639576A TW 200639576 A TW200639576 A TW 200639576A TW 095106896 A TW095106896 A TW 095106896A TW 95106896 A TW95106896 A TW 95106896A TW 200639576 A TW200639576 A TW 200639576A
- Authority
- TW
- Taiwan
- Prior art keywords
- gray level
- level mask
- film
- semi
- transparent
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005054352 | 2005-02-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200639576A true TW200639576A (en) | 2006-11-16 |
Family
ID=37625148
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099103293A TWI395053B (zh) | 2005-02-28 | 2006-02-27 | 灰階罩幕及灰階罩幕毛胚 |
TW095106896A TW200639576A (en) | 2005-02-28 | 2006-02-27 | Method of manufacturing gray level mask, gray level mask, and gray level mask blank |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099103293A TWI395053B (zh) | 2005-02-28 | 2006-02-27 | 灰階罩幕及灰階罩幕毛胚 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5201762B2 (ja) |
KR (3) | KR20060095522A (ja) |
TW (2) | TWI395053B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111367142A (zh) * | 2018-12-26 | 2020-07-03 | 聚灿光电科技(宿迁)有限公司 | 一种包含不同透光性的新型光学掩膜版 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101329525B1 (ko) * | 2006-10-04 | 2013-11-14 | 주식회사 에스앤에스텍 | 그레이톤 블랭크 마스크와 그레이톤 포토마스크 및 그제조방법 |
JP5064116B2 (ja) * | 2007-05-30 | 2012-10-31 | Hoya株式会社 | フォトマスクの検査方法、フォトマスクの製造方法及び電子部品の製造方法 |
TWI422961B (zh) * | 2007-07-19 | 2014-01-11 | Hoya Corp | 光罩及其製造方法、圖案轉印方法、以及顯示裝置之製造方法 |
KR101216242B1 (ko) * | 2010-03-05 | 2013-01-18 | 주식회사 피케이엘 | 슬릿형 하프톤 패턴을 이용한 포토 마스크 제조 방법 및 이를 이용하여 제조된 포토 마스크 |
JP6076593B2 (ja) * | 2011-09-30 | 2017-02-08 | Hoya株式会社 | 表示装置製造用多階調フォトマスク、表示装置製造用多階調フォトマスクの製造方法、パターン転写方法及び薄膜トランジスタの製造方法 |
KR101414335B1 (ko) * | 2012-06-25 | 2014-07-02 | 주식회사 피케이엘 | 해상도 및 초점심도가 우수한 하프톤 위상반전마스크 및 그 제조 방법 |
JP5686216B1 (ja) * | 2013-08-20 | 2015-03-18 | 大日本印刷株式会社 | マスクブランクス、位相シフトマスク及びその製造方法 |
JP6322607B2 (ja) * | 2015-07-30 | 2018-05-09 | Hoya株式会社 | 表示デバイス製造用多階調フォトマスク、表示デバイス製造用多階調フォトマスクの製造方法、及び薄膜トランジスタの製造方法 |
JP6761255B2 (ja) * | 2016-02-15 | 2020-09-23 | 関東化学株式会社 | エッチング液およびエッチング液により加工されたフォトマスク |
JP6322682B2 (ja) * | 2016-10-26 | 2018-05-09 | Hoya株式会社 | パターン転写方法、表示装置の製造方法、及び、多階調フォトマスク |
JP6463536B1 (ja) * | 2018-05-09 | 2019-02-06 | 株式会社エスケーエレクトロニクス | プロキシミティ露光用フォトマスクとその製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100295385B1 (ko) * | 1993-04-09 | 2001-09-17 | 기타지마 요시토시 | 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법 |
JP3262302B2 (ja) * | 1993-04-09 | 2002-03-04 | 大日本印刷株式会社 | 位相シフトフォトマスク、位相シフトフォトマスク用ブランクス及びそれらの製造方法 |
JP3289992B2 (ja) * | 1993-05-11 | 2002-06-10 | 株式会社長谷工コーポレーション | 建物の共用縦管収納部の構築方法とその方法に用いる収納部構成用の区画壁 |
JP3453435B2 (ja) * | 1993-10-08 | 2003-10-06 | 大日本印刷株式会社 | 位相シフトマスクおよびその製造方法 |
JP2878143B2 (ja) * | 1994-02-22 | 1999-04-05 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 減衰位相シフト・マスク作成用の薄膜材料及びその作成方法 |
TW312820B (en) * | 1996-09-26 | 1997-08-11 | Winbond Electronics Corp | Contact defined photomask and method of applying to etching |
JP4290386B2 (ja) * | 2002-04-26 | 2009-07-01 | Hoya株式会社 | ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク |
JP2004177683A (ja) * | 2002-11-27 | 2004-06-24 | Clariant (Japan) Kk | 超高耐熱ポジ型感光性組成物を用いたパターン形成方法 |
JP4393290B2 (ja) * | 2003-06-30 | 2010-01-06 | Hoya株式会社 | グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法 |
TWI286663B (en) * | 2003-06-30 | 2007-09-11 | Hoya Corp | Method for manufacturing gray tone mask, and gray tone mask |
JP4521694B2 (ja) * | 2004-03-09 | 2010-08-11 | Hoya株式会社 | グレートーンマスク及び薄膜トランジスタの製造方法 |
JP5161419B2 (ja) * | 2004-06-22 | 2013-03-13 | Hoya株式会社 | グレートーンマスクブランク及びグレートーンマスクの製造方法 |
-
2006
- 2006-02-27 TW TW099103293A patent/TWI395053B/zh active
- 2006-02-27 TW TW095106896A patent/TW200639576A/zh unknown
- 2006-02-28 KR KR1020060019440A patent/KR20060095522A/ko not_active Application Discontinuation
-
2009
- 2009-10-23 KR KR1020090101062A patent/KR20090128354A/ko not_active Application Discontinuation
-
2011
- 2011-02-06 JP JP2011023432A patent/JP5201762B2/ja active Active
-
2012
- 2012-03-26 KR KR1020120030420A patent/KR101269364B1/ko active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111367142A (zh) * | 2018-12-26 | 2020-07-03 | 聚灿光电科技(宿迁)有限公司 | 一种包含不同透光性的新型光学掩膜版 |
Also Published As
Publication number | Publication date |
---|---|
KR101269364B1 (ko) | 2013-05-29 |
TWI395053B (zh) | 2013-05-01 |
JP5201762B2 (ja) | 2013-06-05 |
KR20120042809A (ko) | 2012-05-03 |
TW201027235A (en) | 2010-07-16 |
KR20090128354A (ko) | 2009-12-15 |
KR20060095522A (ko) | 2006-08-31 |
JP2011090344A (ja) | 2011-05-06 |
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