TW200631978A - Curable resin composition and interlayer insulating film - Google Patents

Curable resin composition and interlayer insulating film

Info

Publication number
TW200631978A
TW200631978A TW095101987A TW95101987A TW200631978A TW 200631978 A TW200631978 A TW 200631978A TW 095101987 A TW095101987 A TW 095101987A TW 95101987 A TW95101987 A TW 95101987A TW 200631978 A TW200631978 A TW 200631978A
Authority
TW
Taiwan
Prior art keywords
polymerization initiator
resin composition
curable resin
cation polymerization
group
Prior art date
Application number
TW095101987A
Other languages
English (en)
Inventor
Atsushi Sato
Original Assignee
Daicel Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chem filed Critical Daicel Chem
Publication of TW200631978A publication Critical patent/TW200631978A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4661—Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Formation Of Insulating Films (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW095101987A 2005-01-19 2006-01-19 Curable resin composition and interlayer insulating film TW200631978A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005011709A JP4683933B2 (ja) 2005-01-19 2005-01-19 硬化性樹脂組成物および層間絶縁膜

Publications (1)

Publication Number Publication Date
TW200631978A true TW200631978A (en) 2006-09-16

Family

ID=36692161

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101987A TW200631978A (en) 2005-01-19 2006-01-19 Curable resin composition and interlayer insulating film

Country Status (6)

Country Link
EP (1) EP1840149A4 (zh)
JP (1) JP4683933B2 (zh)
KR (1) KR20070103458A (zh)
CN (1) CN101103062A (zh)
TW (1) TW200631978A (zh)
WO (1) WO2006077771A1 (zh)

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JP4786200B2 (ja) * 2005-02-28 2011-10-05 ダイセル化学工業株式会社 紫外線硬化型缶用塗料組成物、塗装金属板、および塗装金属缶
JP4854295B2 (ja) * 2005-12-27 2012-01-18 株式会社ダイセル 活性エネルギー線硬化型接着剤およびその接着体
JP5005236B2 (ja) * 2006-03-08 2012-08-22 株式会社ダイセル 熱硬化型接着剤、異方導電性接着剤および電子機器
JP4973876B2 (ja) 2007-08-22 2012-07-11 信越化学工業株式会社 パターン形成方法及びこれに用いるパターン表面コート材
JP5144572B2 (ja) * 2009-03-26 2013-02-13 太陽ホールディングス株式会社 熱硬化性樹脂組成物
EP2466341A1 (en) 2009-08-13 2012-06-20 FUJIFILM Corporation Wafer-level lens, wafer-level lens production method, and imaging unit
JP5352392B2 (ja) 2009-09-14 2013-11-27 富士フイルム株式会社 ウェハレベルレンズアレイの製造方法、ウェハレベルレンズアレイ、レンズモジュール及び撮像ユニット
JP5401227B2 (ja) 2009-09-16 2014-01-29 富士フイルム株式会社 ウェハレベルレンズアレイの製造方法、ウェハレベルレンズアレイ、レンズモジュール及び撮像ユニット
JP2011084060A (ja) 2009-09-17 2011-04-28 Fujifilm Corp レンズアレイのマスターモデル及びその製造方法
JP5572355B2 (ja) 2009-09-30 2014-08-13 富士フイルム株式会社 レンズアレイ及びレンズアレイ積層体
CN102574983B (zh) * 2009-10-09 2015-07-08 日本化药株式会社 可固化树脂组合物及其固化物
JP2011098487A (ja) 2009-11-05 2011-05-19 Fujifilm Corp 素子アレイ成形型、及び該成形型を用いて成形された素子アレイ
JP2011161727A (ja) 2010-02-08 2011-08-25 Fujifilm Corp 光学成形体の成形型、光学成形体の成形方法、及び、レンズアレイ
JP2011180293A (ja) 2010-02-26 2011-09-15 Fujifilm Corp レンズアレイ
JP2011180292A (ja) 2010-02-26 2011-09-15 Fujifilm Corp レンズアレイ
JP2011197479A (ja) 2010-03-19 2011-10-06 Fujifilm Corp レンズ、及びレンズアレイ、並びにそれらの製造方法
JP2011194751A (ja) 2010-03-19 2011-10-06 Fujifilm Corp 成形型、成形方法、及び、レンズアレイ
JP2011197480A (ja) 2010-03-19 2011-10-06 Fujifilm Corp レンズアレイ及びレンズアレイの製造方法、並びに、レンズ及びレンズの製造方法
JP5647808B2 (ja) 2010-03-30 2015-01-07 富士フイルム株式会社 レンズアレイのマスタの製造方法
EP2748224B1 (en) 2011-09-09 2017-07-05 ABB Research Ltd. Method of producing high voltage electrical insulation
CN104169321B (zh) * 2012-03-13 2017-07-07 株式会社大赛璐 感光性树脂组合物及其固化物以及光学部件
JP6285449B2 (ja) * 2013-09-18 2018-02-28 株式会社ダイセル 感光性樹脂組成物及びその硬化物、並びに光学部品
CN109071776B (zh) * 2016-03-23 2021-06-08 Jxtg能源株式会社 固化性组合物以及使其固化而成的固化物
JPWO2020196776A1 (ja) * 2019-03-26 2021-12-02 三井化学株式会社 半導体用保護部材、インクジェット塗布型半導体用保護組成物、およびこれを用いた半導体装置の製造方法、ならびに半導体装置
JP2022029427A (ja) 2020-08-04 2022-02-17 信越化学工業株式会社 ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品
JP2022151614A (ja) 2021-03-23 2022-10-07 信越化学工業株式会社 ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

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DE69103089T2 (de) * 1990-05-30 1995-01-05 Daicel Chem Alicyclische Verbindung enthaltende Komposition, Verfahren für ihre Herstellung, polymerisierbare Komposition und photopolymerisierbare Komposition.
EP0479166A1 (en) * 1990-09-28 1992-04-08 Union Carbide Chemicals And Plastics Company, Inc. Transesterification process for preparation of cycloaliphatic epoxides
US5879859A (en) * 1997-07-16 1999-03-09 International Business Machines Corporation Strippable photoimageable compositions
US6437045B1 (en) * 1999-11-10 2002-08-20 Vantico Inc. Powder coating of carboxyl polyester or (poly)methacrylate and cycloaliphatic polyepoxide
BRPI0415812A (pt) * 2003-11-03 2006-12-26 Union Carbide Chem Plastic método para intensificar a resistência de um revestimento sobre um artigo, composição fotocurável e composição de formulação de encapsulante de led curável termicamente
EP1744719B1 (fr) * 2004-05-13 2009-03-25 Bluestar Silicones France Composition dentaire photopolymerisable
DE602005018344D1 (de) * 2004-05-13 2010-01-28 Bluestar Silicones France Mittels kationenreaktion vernetzbare/polymerisierbare hochpolare stabile dentalzusammensetzung
JP2005330335A (ja) * 2004-05-18 2005-12-02 Nitto Denko Corp 光半導体素子封止用エポキシ樹脂組成物およびそれを用いた光半導体装置
JP4578188B2 (ja) * 2004-09-15 2010-11-10 ダイセル化学工業株式会社 エポキシ樹脂組成物、光半導体封止剤及び光半導体装置
JP4578223B2 (ja) * 2004-12-14 2010-11-10 ダイセル化学工業株式会社 光学的立体造形用光硬化性樹脂組成物

Also Published As

Publication number Publication date
EP1840149A4 (en) 2009-02-18
JP2006199790A (ja) 2006-08-03
KR20070103458A (ko) 2007-10-23
JP4683933B2 (ja) 2011-05-18
CN101103062A (zh) 2008-01-09
EP1840149A1 (en) 2007-10-03
WO2006077771A1 (ja) 2006-07-27

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