TW200609483A - Method of adjusting optical imaging system, imaging device, positional deviation detecting device, mark identifying device and edge position detecting device - Google Patents

Method of adjusting optical imaging system, imaging device, positional deviation detecting device, mark identifying device and edge position detecting device

Info

Publication number
TW200609483A
TW200609483A TW094117746A TW94117746A TW200609483A TW 200609483 A TW200609483 A TW 200609483A TW 094117746 A TW094117746 A TW 094117746A TW 94117746 A TW94117746 A TW 94117746A TW 200609483 A TW200609483 A TW 200609483A
Authority
TW
Taiwan
Prior art keywords
imaging system
optical imaging
positional deviation
detecting device
aperture stop
Prior art date
Application number
TW094117746A
Other languages
English (en)
Other versions
TWI374248B (zh
Inventor
Makoto Takagi
Yuwa Ishii
Tatsuo Fukui
Koichi Kudo
Tooru Yokota
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004158874A external-priority patent/JP4389668B2/ja
Priority claimed from JP2004161611A external-priority patent/JP4599893B2/ja
Priority claimed from JP2004169520A external-priority patent/JP2005352543A/ja
Priority claimed from JP2004206887A external-priority patent/JP4484041B2/ja
Priority claimed from JP2004206888A external-priority patent/JP2006032521A/ja
Priority claimed from JP2004222331A external-priority patent/JP4691922B2/ja
Priority claimed from JP2004232369A external-priority patent/JP2006047922A/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200609483A publication Critical patent/TW200609483A/zh
Application granted granted Critical
Publication of TWI374248B publication Critical patent/TWI374248B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW094117746A 2004-05-28 2005-05-30 Method of adjusting optical imaging system, imaging device, positional deviation detecting device, mark identifying device and edge position detecting device TW200609483A (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2004158874A JP4389668B2 (ja) 2004-05-28 2004-05-28 位置検出方法および位置検出装置
JP2004161611A JP4599893B2 (ja) 2004-05-31 2004-05-31 位置ずれ検出方法
JP2004169520A JP2005352543A (ja) 2004-06-08 2004-06-08 テンプレートマッチング装置
JP2004206887A JP4484041B2 (ja) 2004-07-14 2004-07-14 エッジ位置検出装置
JP2004206888A JP2006032521A (ja) 2004-07-14 2004-07-14 マーク識別装置
JP2004222331A JP4691922B2 (ja) 2004-07-29 2004-07-29 結像光学系の調整方法
JP2004232369A JP2006047922A (ja) 2004-08-09 2004-08-09 結像装置

Publications (2)

Publication Number Publication Date
TW200609483A true TW200609483A (en) 2006-03-16
TWI374248B TWI374248B (zh) 2012-10-11

Family

ID=35450978

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094117746A TW200609483A (en) 2004-05-28 2005-05-30 Method of adjusting optical imaging system, imaging device, positional deviation detecting device, mark identifying device and edge position detecting device

Country Status (2)

Country Link
TW (1) TW200609483A (zh)
WO (1) WO2005116577A1 (zh)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103105127A (zh) * 2011-10-21 2013-05-15 佳能株式会社 检测器、压印装置以及物品制造方法
TWI406316B (zh) * 2006-05-23 2013-08-21 Ibm 用於形成一工件之一區域的高解析度影像之系統
TWI489573B (zh) * 2012-09-12 2015-06-21 Motech Ind Inc 檢測裝置
CN112904682A (zh) * 2021-01-22 2021-06-04 西华大学 一种测量倾角和旋转角的光刻对准标记及对准方法
CN113161252A (zh) * 2020-01-22 2021-07-23 东京毅力科创株式会社 等离子体观测系统和等离子体观测方法
CN114894712A (zh) * 2022-03-25 2022-08-12 业成科技（成都）有限公司 光学量测设备及其校正方法
TWI803684B (zh) * 2018-09-21 2023-06-01 日商東芝照明技術股份有限公司 檢測裝置
TWI820371B (zh) * 2019-12-24 2023-11-01 荷蘭商Ａｓｍｌ荷蘭公司 用於微影裝置製造程序之檢測工具及度量衡方法
TWI846579B (zh) * 2023-08-29 2024-06-21 三和技研股份有限公司 晶圓定位裝置與方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102566337B (zh) * 2010-12-28 2014-05-21 上海微电子装备有限公司 一种标记期望位置确定方法
JP7412872B2 (ja) * 2017-10-31 2024-01-15 株式会社アドテックエンジニアリング 両面露光装置
US10599055B1 (en) * 2018-11-15 2020-03-24 Applied Materials, Inc. Self aligning systems and methods for lithography systems
CN113168110B (zh) * 2018-11-26 2024-04-16 Asml荷兰有限公司 确定整个图案形成装置或衬底上的标记布局
JP7406946B2 (ja) * 2019-09-20 2023-12-28 株式会社オーク製作所 露光装置およびその性能評価方法
US20230197483A1 (en) 2020-04-05 2023-06-22 Kla Corporation Systems and methods for correction of impact of wafer tilt on misregistration measurements
CN116883515B (zh) * 2023-09-06 2024-01-16 菲特（天津）检测技术有限公司 光学环境调整方法及光学标定装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06267818A (ja) * 1993-03-11 1994-09-22 Nikon Corp 投影露光装置
JP2888233B2 (ja) * 1997-09-08 1999-05-10 株式会社ニコン 位置検出装置、露光装置及び方法
JP2002328288A (ja) * 2001-04-26 2002-11-15 Matsushita Electric Ind Co Ltd 組レンズ調整方法とその装置
JP2004134474A (ja) * 2002-10-09 2004-04-30 Nikon Corp 位置検出装置の検査方法、位置検出装置、露光装置、および露光方法
JP2004134473A (ja) * 2002-10-09 2004-04-30 Nikon Corp 位置検出用マーク、位置検出装置、位置検出方法、露光装置、および露光方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI406316B (zh) * 2006-05-23 2013-08-21 Ibm 用於形成一工件之一區域的高解析度影像之系統
CN103105127A (zh) * 2011-10-21 2013-05-15 佳能株式会社 检测器、压印装置以及物品制造方法
TWI489573B (zh) * 2012-09-12 2015-06-21 Motech Ind Inc 檢測裝置
TWI803684B (zh) * 2018-09-21 2023-06-01 日商東芝照明技術股份有限公司 檢測裝置
TWI820371B (zh) * 2019-12-24 2023-11-01 荷蘭商Ａｓｍｌ荷蘭公司 用於微影裝置製造程序之檢測工具及度量衡方法
CN113161252A (zh) * 2020-01-22 2021-07-23 东京毅力科创株式会社 等离子体观测系统和等离子体观测方法
CN113161252B (zh) * 2020-01-22 2024-01-05 东京毅力科创株式会社 等离子体观测系统和等离子体观测方法
CN112904682A (zh) * 2021-01-22 2021-06-04 西华大学 一种测量倾角和旋转角的光刻对准标记及对准方法
CN112904682B (zh) * 2021-01-22 2023-08-01 西华大学 一种测量倾角和旋转角的光刻对准标记及对准方法
CN114894712A (zh) * 2022-03-25 2022-08-12 业成科技（成都）有限公司 光学量测设备及其校正方法
CN114894712B (zh) * 2022-03-25 2023-08-25 业成科技（成都）有限公司 光学量测设备及其校正方法
TWI846579B (zh) * 2023-08-29 2024-06-21 三和技研股份有限公司 晶圓定位裝置與方法

Also Published As

Publication number Publication date
WO2005116577A1 (ja) 2005-12-08
TWI374248B (zh) 2012-10-11

Similar Documents

Publication Publication Date Title
TW200609483A (en) Method of adjusting optical imaging system, imaging device, positional deviation detecting device, mark identifying device and edge position detecting device
CN104765248B (zh) 压印装置、压印方法以及物品的制造方法
EP1708028A3 (en) Optical element, exposure apparatus, and device manufacturing method
TW200626966A (en) Illumination system and method for aligning
TW200639573A (en) Exposure device and exposure method
EP1544681A3 (en) Exposure apparatus
TWI432917B (zh) 曝光裝置
WO2007135465A3 (en) Glazing inspection method
EP1450153A4 (en) INSPECTION DEVICE AND PATTERN PROFILE INSPECTION METHOD, EXPOSURE SYSTEM
EP1675393A3 (en) Projection lens unit and thin projector using the same
TW200720850A (en) Exposure method
US20130141704A1 (en) Microlens exposure system
KR100912132B1 (ko) 레이저 마커를 이용한 거리측정장치
TW200612180A (en) Projector with adjustable image offset
DE60035998D1 (de) Vorrichtung zum on-line prüfen der inneren qualität mittels mehreren seitlichen lampen
TW201608345A (zh) 描繪裝置
KR101573681B1 (ko) 카메라 모듈 초점 조정 장치 및 방법
TW200717172A (en) Photo module capable of adjusting distance between camera module and sensor unit
EP2020620A3 (en) Adjustment method, exposure method, device manufacturing method, and exposure apparatus
TWI512388B (zh) 光罩、使用該光罩之雷射退火裝置及曝光裝置
EP1447718A3 (en) Exposure apparatus and method
TW200638762A (en) Optical projection apparatus
KR101190514B1 (ko) 편광필름을 이용한 머신 비전 시스템
ITVI20130088A1 (it) Apparato oftalmoscopico
JP2008216593A (ja) 露光方法及び露光装置