TW200604643A - Substrate processor - Google Patents

Substrate processor

Info

Publication number
TW200604643A
TW200604643A TW094113925A TW94113925A TW200604643A TW 200604643 A TW200604643 A TW 200604643A TW 094113925 A TW094113925 A TW 094113925A TW 94113925 A TW94113925 A TW 94113925A TW 200604643 A TW200604643 A TW 200604643A
Authority
TW
Taiwan
Prior art keywords
substrate
section
carrying
edge rinse
carrying chamber
Prior art date
Application number
TW094113925A
Other languages
English (en)
Chinese (zh)
Other versions
TWI331686B (enrdf_load_stackoverflow
Inventor
Hitoshi Yoshioka
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200604643A publication Critical patent/TW200604643A/zh
Application granted granted Critical
Publication of TWI331686B publication Critical patent/TWI331686B/zh

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094113925A 2004-07-28 2005-04-29 Substrate processor TW200604643A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004219848A JP4503384B2 (ja) 2004-07-28 2004-07-28 基板処理装置

Publications (2)

Publication Number Publication Date
TW200604643A true TW200604643A (en) 2006-02-01
TWI331686B TWI331686B (enrdf_load_stackoverflow) 2010-10-11

Family

ID=35905904

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094113925A TW200604643A (en) 2004-07-28 2005-04-29 Substrate processor

Country Status (3)

Country Link
JP (1) JP4503384B2 (enrdf_load_stackoverflow)
CN (1) CN100405570C (enrdf_load_stackoverflow)
TW (1) TW200604643A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5173699B2 (ja) * 2008-09-25 2013-04-03 株式会社日立ハイテクノロジーズ 有機ｅｌデバイス製造装置
JP5501193B2 (ja) * 2010-10-26 2014-05-21 東京エレクトロン株式会社 基板処理装置
KR102605917B1 (ko) * 2016-04-07 2023-11-27 주식회사 탑 엔지니어링 스크라이빙 장치
JP7405884B2 (ja) * 2022-02-18 2023-12-26 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN116313958B (zh) * 2023-03-03 2023-12-05 珠海恒格微电子装备有限公司 一种用于晶圆真空去胶的半自动送料机构
CN116364603B (zh) * 2023-03-03 2023-12-22 珠海恒格微电子装备有限公司 一种半自动等离子去胶机

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09148415A (ja) * 1995-11-28 1997-06-06 Dainippon Screen Mfg Co Ltd 基板搬送装置
JPH09275127A (ja) * 1996-04-01 1997-10-21 Dainippon Screen Mfg Co Ltd 基板処理装置
JP4045008B2 (ja) * 1998-03-26 2008-02-13 大日本スクリーン製造株式会社 基板処理装置
JP3484067B2 (ja) * 1998-02-20 2004-01-06 平田機工株式会社 ロボット装置
JP3495292B2 (ja) * 1999-06-09 2004-02-09 東京エレクトロン株式会社 基板処理装置
JP2002313874A (ja) * 2001-04-17 2002-10-25 Dainippon Screen Mfg Co Ltd 基板支持部材、ならびにそれを用いた基板保持機構、基板搬送装置、基板搬送方法、基板処理装置および基板処理方法
JP3963732B2 (ja) * 2001-04-19 2007-08-22 大日本スクリーン製造株式会社 塗布処理装置およびこれを用いた基板処理装置
KR100488376B1 (ko) * 2001-04-27 2005-05-11 가부시키가이샤 고베 세이코쇼 기판 처리 방법 및 기판 처리 설비

Also Published As

Publication number Publication date
CN100405570C (zh) 2008-07-23
TWI331686B (enrdf_load_stackoverflow) 2010-10-11
CN1728356A (zh) 2006-02-01
JP2006041235A (ja) 2006-02-09
JP4503384B2 (ja) 2010-07-14

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees