TW200520036A - Heat treatment apparatus and heat treatment method - Google Patents
Heat treatment apparatus and heat treatment methodInfo
- Publication number
- TW200520036A TW200520036A TW093133010A TW93133010A TW200520036A TW 200520036 A TW200520036 A TW 200520036A TW 093133010 A TW093133010 A TW 093133010A TW 93133010 A TW93133010 A TW 93133010A TW 200520036 A TW200520036 A TW 200520036A
- Authority
- TW
- Taiwan
- Prior art keywords
- temperature
- specified
- treated body
- recipe
- treatment container
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003371291 | 2003-10-30 | ||
JP2004306040A JP4712343B2 (ja) | 2003-10-30 | 2004-10-20 | 熱処理装置、熱処理方法、プログラム及び記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200520036A true TW200520036A (en) | 2005-06-16 |
TWI355014B TWI355014B (zh) | 2011-12-21 |
Family
ID=34554755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093133010A TW200520036A (en) | 2003-10-30 | 2004-10-29 | Heat treatment apparatus and heat treatment method |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070074660A1 (zh) |
EP (1) | EP1684336A4 (zh) |
JP (1) | JP4712343B2 (zh) |
KR (1) | KR100882633B1 (zh) |
TW (1) | TW200520036A (zh) |
WO (1) | WO2005043609A1 (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8211235B2 (en) * | 2005-03-04 | 2012-07-03 | Picosun Oy | Apparatuses and methods for deposition of material on surfaces |
KR100684902B1 (ko) | 2005-05-30 | 2007-02-20 | 삼성전자주식회사 | 온도 조절 장치 및 이를 가지는 기판 처리 장치, 그리고상기 장치의 온도를 제어하는 방법 |
JP4658818B2 (ja) * | 2006-01-19 | 2011-03-23 | 株式会社山武 | 温度推定方法および装置 |
US7869888B2 (en) | 2006-05-31 | 2011-01-11 | Tokyo Electron Limited | Information processing apparatus, semiconductor manufacturing system, information processing method, and storage medium |
JP5040213B2 (ja) * | 2006-08-15 | 2012-10-03 | 東京エレクトロン株式会社 | 熱処理装置、熱処理方法及び記憶媒体 |
JP5005388B2 (ja) * | 2007-03-01 | 2012-08-22 | 東京エレクトロン株式会社 | 熱処理システム、熱処理方法、及び、プログラム |
JP5106932B2 (ja) * | 2007-06-28 | 2012-12-26 | 日本エア・リキード株式会社 | 流体供給システム |
JP5028352B2 (ja) * | 2007-10-19 | 2012-09-19 | 株式会社日立国際電気 | 温度制御方法、温度補正値取得方法、半導体製造方法、基板処理装置 |
JP5101243B2 (ja) * | 2007-10-29 | 2012-12-19 | 東京エレクトロン株式会社 | 基板処理装置,基板処理装置の制御方法,およびプログラム |
US8354135B2 (en) * | 2008-03-17 | 2013-01-15 | Tokyo Electron Limited | Thermal processing apparatus, method for regulating temperature of thermal processing apparatus, and program |
JP5766647B2 (ja) * | 2012-03-28 | 2015-08-19 | 東京エレクトロン株式会社 | 熱処理システム、熱処理方法、及び、プログラム |
JP6280407B2 (ja) * | 2014-03-19 | 2018-02-14 | 東京エレクトロン株式会社 | 基板処理方法、プログラム、制御装置、基板処理装置及び基板処理システム |
US10254179B2 (en) | 2014-12-25 | 2019-04-09 | Fujitsu Limited | Enclosure surface temperature estimation method and electronic apparatus |
KR101830124B1 (ko) * | 2017-04-06 | 2018-02-20 | (주)앤피에스 | 기판 처리 장치 |
CN112530826B (zh) * | 2020-11-27 | 2024-05-17 | 北京北方华创微电子装备有限公司 | 半导体热处理设备的承载装置及半导体热处理设备 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5517594A (en) * | 1994-10-17 | 1996-05-14 | Relman, Inc. | Thermal reactor optimization |
JP3423671B2 (ja) | 2000-06-19 | 2003-07-07 | 上商株式会社 | 縦葺き型金属屋根板同士間の連結構造 |
JP3497450B2 (ja) | 2000-07-06 | 2004-02-16 | 東京エレクトロン株式会社 | バッチ式熱処理装置及びその制御方法 |
JP4468555B2 (ja) * | 2000-07-24 | 2010-05-26 | 東京エレクトロン株式会社 | 熱処理装置および熱処理方法 |
JP4493192B2 (ja) * | 2000-09-13 | 2010-06-30 | 東京エレクトロン株式会社 | バッチ式熱処理装置及びその制御方法 |
US7135659B2 (en) * | 2001-03-05 | 2006-11-14 | Tokyo Electron Limited | Heat treatment method and heat treatment system |
JP2003031647A (ja) * | 2001-07-19 | 2003-01-31 | Hitachi Kokusai Electric Inc | 基板処理装置および半導体装置の製造方法 |
JP3836696B2 (ja) * | 2001-08-31 | 2006-10-25 | 株式会社東芝 | 半導体製造システムおよび半導体装置の製造方法 |
JP2003209063A (ja) * | 2001-11-08 | 2003-07-25 | Tokyo Electron Ltd | 熱処理装置および熱処理方法 |
JP4276813B2 (ja) * | 2002-03-26 | 2009-06-10 | 株式会社日立国際電気 | 熱処理装置および半導体製造方法 |
JP3802889B2 (ja) * | 2003-07-01 | 2006-07-26 | 東京エレクトロン株式会社 | 熱処理装置及びその校正方法 |
-
2004
- 2004-10-20 JP JP2004306040A patent/JP4712343B2/ja active Active
- 2004-10-29 TW TW093133010A patent/TW200520036A/zh not_active IP Right Cessation
- 2004-11-01 EP EP04799419A patent/EP1684336A4/en not_active Withdrawn
- 2004-11-01 US US10/577,145 patent/US20070074660A1/en not_active Abandoned
- 2004-11-01 WO PCT/JP2004/016213 patent/WO2005043609A1/ja active Application Filing
- 2004-11-01 KR KR1020057011807A patent/KR100882633B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP1684336A1 (en) | 2006-07-26 |
TWI355014B (zh) | 2011-12-21 |
US20070074660A1 (en) | 2007-04-05 |
WO2005043609A1 (ja) | 2005-05-12 |
EP1684336A4 (en) | 2008-01-09 |
JP4712343B2 (ja) | 2011-06-29 |
KR20060114284A (ko) | 2006-11-06 |
JP2005159317A (ja) | 2005-06-16 |
KR100882633B1 (ko) | 2009-02-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |