TW200423809A - Vapor deposition source, vapor deposition apparatus, organic EL device, and method of manufacturing organic EL device - Google Patents

Vapor deposition source, vapor deposition apparatus, organic EL device, and method of manufacturing organic EL device Download PDF

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Publication number
TW200423809A
TW200423809A TW093107925A TW93107925A TW200423809A TW 200423809 A TW200423809 A TW 200423809A TW 093107925 A TW093107925 A TW 093107925A TW 93107925 A TW93107925 A TW 93107925A TW 200423809 A TW200423809 A TW 200423809A
Authority
TW
Taiwan
Prior art keywords
container
vapor deposition
source
organic
steaming
Prior art date
Application number
TW093107925A
Other languages
English (en)
Chinese (zh)
Inventor
Shinsuke Tanaka
Toshinao Yuki
Kunihiko Shirahata
Tsuyoshi Naijo
Masato Nakamura
Yusuke Nakajima
Original Assignee
Pioneer Tohoku Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Tohoku Corp filed Critical Pioneer Tohoku Corp
Publication of TW200423809A publication Critical patent/TW200423809A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/14—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW093107925A 2003-03-26 2004-03-24 Vapor deposition source, vapor deposition apparatus, organic EL device, and method of manufacturing organic EL device TW200423809A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003085417A JP2004296201A (ja) 2003-03-26 2003-03-26 蒸着源、蒸着装置、有機ｅｌ素子、有機ｅｌ素子の製造方法

Publications (1)

Publication Number Publication Date
TW200423809A true TW200423809A (en) 2004-11-01

Family

ID=33400347

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093107925A TW200423809A (en) 2003-03-26 2004-03-24 Vapor deposition source, vapor deposition apparatus, organic EL device, and method of manufacturing organic EL device

Country Status (3)

Country Link
JP (1) JP2004296201A (enExample)
KR (1) KR20040085002A (enExample)
TW (1) TW200423809A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103757591A (zh) * 2013-12-31 2014-04-30 深圳市华星光电技术有限公司 一种坩埚设备及其在液晶面板生产中的应用
US9504117B2 (en) 2013-12-17 2016-11-22 Shenzhen China Star Optoelectronics Technology Co., Ltd. Over-voltage and over-current protection circuits and electronic devices
TWI609980B (zh) * 2013-08-30 2018-01-01 三星顯示器有限公司 蒸鍍源

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100689189B1 (ko) * 2004-12-28 2007-03-09 동부일렉트로닉스 주식회사 입자 증착 시스템용 용기 및 이를 채용한 입자 증착 시스템
KR20090041316A (ko) * 2007-10-23 2009-04-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 성막 방법 및 발광 장치의 제작 방법
CN105590869A (zh) * 2014-10-24 2016-05-18 中芯国际集成电路制造(上海)有限公司 一种半导体器件及其制作方法
KR101746956B1 (ko) * 2015-10-29 2017-06-14 주식회사 포스코 미립자 발생장치 및 이를 포함하는 코팅 시스템
GB2586634B (en) * 2019-08-30 2022-04-20 Dyson Technology Ltd Multizone crucible apparatus
WO2021058093A1 (en) * 2019-09-24 2021-04-01 Applied Materials, Inc. Evaporation apparatus for evaporating a material to be evaporated, evaporation source, and evaporation method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI609980B (zh) * 2013-08-30 2018-01-01 三星顯示器有限公司 蒸鍍源
US9504117B2 (en) 2013-12-17 2016-11-22 Shenzhen China Star Optoelectronics Technology Co., Ltd. Over-voltage and over-current protection circuits and electronic devices
CN103757591A (zh) * 2013-12-31 2014-04-30 深圳市华星光电技术有限公司 一种坩埚设备及其在液晶面板生产中的应用
CN103757591B (zh) * 2013-12-31 2016-03-30 深圳市华星光电技术有限公司 一种坩埚设备及其在液晶面板生产中的应用

Also Published As

Publication number Publication date
JP2004296201A (ja) 2004-10-21
KR20040085002A (ko) 2004-10-07

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