200408501 Π) 玖、發明說明 【發明所屬之技術領域】 本發明是關於機械式化學硏磨（C h e m i c a 1 M e c h a n i c.a 1 P o 1 i s h i n g，以下簡稱爲C Μ P )之中進行硏磨布的網目阻 塞或異物的除去之際所使用之硏磨布用修整器及其使用之 硏磨布的修整方法。 【先前技術】 一般在矽晶圓基板上製造半導體矽晶基板或積體電路 寺微細的電子電路的過程中，以除去存在於基板表面的凹 凸或結晶缺陷爲目的而採用CMP加工。此CMP加工係一 面用預定的載重將晶圓基板壓貼在由已粘貼在硏磨裝置的 平台之發-聚胺％旨等所形成的硏磨布，一面供應漿劑的硏 磨液，使晶圓及硏磨布都旋轉而進行硏磨。 上述CMP加工用的漿劑，使用使氧化鐵、碳酸鋇、 氧化鈽、氧化鋁、膠質氧化矽等的硏磨顆粒浮游在氫氧化 鉀、稀鹽酸、稀硝酸、過氧化氫水、硝酸鐵等硏磨液之漿 劑’這些劑材則是依照硏磨速度及晶圓或晶圓基板上的前 述被加工物種類作適度選擇。 此CMP加工由於用多數片的同種硏磨布或反覆多數 次來硏磨晶圓，由而隨著C Μ P加工的次數增多，被除去 之被加工物的粉屑或凝聚在一起的硏磨顆粒進到硏磨布的 微細空孔中而引起網目阻塞，造成晶圓硏磨速度的降低。 因而除去已網目阻塞之硏磨布的表層，再生硏磨布表面的 -4- (2) (2)200408501 粗度而回復硏磨速度之被稱爲修整的作業必須隨時或定期 進行，此作業使用有稱爲硏磨布用修整器的工具。 鑽石磨石顆粒是因爲對硏磨布的修整之優良的材料.， 所以硏討利用鑽石磨石顆粒之硏磨布用修整器，經鎳電鍍 將鑽石磨石粒子電塗膜在不銹鋼上的方法一般已被實用化 。除此之外還提案有用金屬焊材將鑽石磨石顆粒焊接在不 銹鋼上的方法（例如，參考日本專利特開平1 0 — 0 1 2 5 7 9 號公報），經由燒結使鑽石磨石顆粒及保持材反應燒結加 以固著之方法（例如，參考日本專利特開200 1 - 1 7 963 8 號公報）。另外，此獲得穩定的硏磨布的表層除去能力爲 目的，還提案有以等間隔排列磨石顆粒之CMP硏磨布修 整器（例如，參考日本專利特開2000 — 1 4 1 2〇4號公報、 特開2 0 02 — 1 2 7 0 1號公報）。 不過上述過去的硏磨布用修整器，由於其構造上無法 避免因磨石顆粒的前端形狀等造成修整面的狀態發生個體 差，所以即使使用相同硏磨布用修整器仍不易創出均一的 硏磨布表面；另外，硏磨布的表面狀態必須依照被加工物 加以調整，例如對於已在矽晶圓表面形成層間氧化膜之晶 圓，由於硏磨布的表面狀態仍是粗糙的狀態，因而以加強 所硏磨布的機械式除去加工爲主因而提高硏磨速度；另外 ，Cu配線則是以比硏磨布的機械式除去加工更要加強.存 在於硏磨布表面之硏磨液（s 1 u r r y )的化學反應爲主因， 必須使硏磨布維持一定程度的表面粗度，因而對於修整硏 磨布的表面之硏磨布用修整器，必須準備所要數量之修整 -5- (3) (3)200408501 面的狀態適於上述被加工物的硏磨布，而會有成本增高的 問題。 【發明內容】 本發明所欲解決之技術課題，是提供硏磨布用修整器 及其使用之硏磨布的修整方法。硏磨布用修整器由於能調 整修整面的狀態，因而即使磨'石顆粒的前端形狀等造成修 整面的狀態發生個體差，經調整該修整面仍能創出均一的 硏磨布表面、或是能對硏磨布表面賦予對應被加工物之適 切的硏磨性能。" 爲了解決上述課題，本發明的硏磨布用修整器，是在 可旋轉的金屬台的表面形成有修整面之硏磨布用.修整器， 其特徵爲：在上述修整靣朝該周方向並排設置有複數個磨 石顆粒群，在上述金屬台，設置有能調節全部或一部分的 磨石顆粒群中以多數個磨石顆粒的前端所分別形成之基準 靣的上述修整靣上的高低差之調節機構。 依據上述硏磨布用修整器，因藉由上述調節機構就能 任意地調節複數個磨石顆粒群中之上述各基準面的高低差 ，所以即使磨石顆粒的前端形狀等造成修整面的狀態發生 個體差，經由調節上述複數個磨石顆粒群之基準面的高低 差來調整修整面的狀態，仍能創出均一的硏磨布表面，或 是對於硏磨布表面也就是硏磨布的硏磨面能施加對應於被 加工物之適切的硏磨性能。此情況，基準面較高的磨石顆 粒群主要是作爲有助於對硏磨布表面的磨耗，基準面較低 -6- (4) (4)200408501 的磨石顆粒主要是有助於用來調整硏磨布的表面粗度。. 上述硏磨布用修整器，能製作成具有上述調節機構之 磨石顆粒群分別固著在與上述金屬台不同體所形成的上述 調節機構的基台上，沿著上述修整面之金屬台的周緣部而 呈環狀並排設置各磨石顆粒群。 上述磨石顆粒群分別形成爲從與上述修整面的周緣成 平行的圓環片形狀、與上述修整面的周緣成一定角度之螺 旋片形狀、小圓形狀當中所選出之1種或2種的平面形狀 ’則經由修整所除去之硏磨布的切削屑或凝聚在一起的漿 劑易於排出到修整器外部更加理想。 上述磨石顆粒群分別形成爲從上述平面形狀當中所選 出之2種的平面形狀時，這些平面形狀不同的2種磨石顆 粒群朝修整面的周方向交互地並排設置較爲適切。... 另外，並排設置在修整面之各磨石顆粒群也能相互地 利用相同粒度的磨石顆粒來形成之同樣的磨石顆粒群、或 以不同粒度的磨石顆粒所形成之2種磨石顆粒群所構成。 然後’並排設置在上述修整面之磨石顆粒群相互地利 /¾不同粒度的磨石顆粒來形成之第I磨石顆粒群和第2磨 石顆粒群所構成時，朝修整面的周方向交互地並排設置這 些第]磨石顆粒群和第2磨石顆粒群較爲適切。該情況， 能以相同粒度的磨石顆粒或不同2種粒度的磨石顆粒來形 成上述第1磨石顆粒群。 此處，上述各磨石顆粒群，在於前述修整面上以二次 元且有規則地排列有磨石顆粒，且以正三角形成平行四邊 -7- (5) (5)200408501 形來排列相互地相鄰的磨石顆粒彼此間所組成之最小格子 ’則能使修整的穩定性或均〜性更提升而更加理想。 進而，上述課題用藉由上述調節機構，在相鄰之磨石 顆粒群的上述基準面間設置一定的高度差，而將上述硏磨 布錯由修整之硏磨布的修整方法就能解決。 上述硏磨布的修整方法’當複數個磨石顆粒群由上述 第1磨石顆粒群及第2磨石顆粒群所構成時，利用上述調 節機構進行調節來使上述修整面之第1磨石顆粒群的基準 面的局度比弟2磨石顆粒群的基準面局度還禹出一定量的 方式，而將上述硏磨布修整較爲適切。 依據這種本發明的硏磨布用修整器及其使用之硏磨布 的修整方法，因各磨石顆粒群以磨石顆粒的前端將分別形 成的磨石顆粒基準面:之上述修整面上的高低差利用調節機 構來任意地調節，就能將修整面調整成所期望的狀態:，所 以即使在磨石顆粒的前端形狀等修整面的狀態發生_體差 ，仍能創出均一的硏磨布表面，而且即使對於硏磨布表面 也可以施加對應於被加工物之適切的硏磨性能。 .·. · * · , ,，... 【實施方式】 . 第1 A〜1〇圖爲表示本發明的硏磨布用修整益之磨石 顆粒群的不同配置形狀的第1實施形態。硏磨布用修整器 1係由在其表面側的中心具有圓形的凹部2 a，並且在其周 圍的金屬台表面3形成有環狀的修整面4之圓盤狀金屬台 2所構成，在上述修整面4 ,呈環狀並排設置有沿著周方 -8- (6) (6)200408501 向而獨立的第1和第2磨石顆粒群5、6各複數個。換言 之，沿著金屬台表面3即是沿著上述金屬台2的周緣部而 呈環狀I排設置有複數個磨石顆粒群5、6而形成上述修 整面4。 然而，如第3圖所示，各磨石顆粒群5、6將包含粒 度最大的磨石顆粒的前端之平面設爲基準面SI、S2時， 爲了使修整面4可以任意地調節上述複數個磨石粒子群5 、6之各基準面S 1、S2間相互的高低差（5，所以在上述 金屬台2設置有調節機構7。 此處，無必要性一定要在上述金屬台2設置上述凹部 2 a 〇 具體地說明，上述調節機構7係由位在表面固著有磨 石顆粒群5或6，可上下滑動自如地嵌入到上述金屬台2 的表面3所開口之凹部7 e之基台7 a、及設置在該基台7 a 的背面，螺合在從上述金屬台2之凹部7e的底面貫穿到 該金屬台2的背面側之螺絲孔7c之調節用螺絲7b、及利 用該調節用螺絲7b來調節固著在上述基台7a的磨石顆粒 群5 ' 6之基準面的高度位置，而夾持在上/述基台7 a .的‘背 面與上述凹部7 e的底面之間的間隔件7 d所構成。然後， 讓分別固著在上述調節機構7之基台7a的表面之複數個 磨石顆粒5 ·、6沿著上述金屬台2的周緣部而呈環狀並排 設置，而形成上述修整面4。 因此，具有將上述磨石顆粒群5、6的基準面S 1、S 2 調節到所期望的高度位置所必要的厚度之間隔件7d，.設 (7) (7)200408501 定在上述金屬台2的凹部’ 7e內，藉由利用上述調節用螺 絲7 b使之夾持在該凹部7 e的底面與上述基.台7 a的背面 之間，而能調節對於上述各磨石顆粒群5、6之基準面s 1 、S 2的金屬台表面3的高度位置，即是能調節複數個磨 石顆粒群5、.6之各基準面S 1、S2間相互的高低差δ，而 調整修整面4的狀態。然而，在本實施形態之中，利用調 節機構7，製作成能對於上述基準面S 1、S 2的金屬台表 面3的高度以〇〜3 〇 0 /i m的範圍調節上述基準面S 1、S 2 對金屬座台3的高度。 上述磨石顆粒群當中，基準面較高的磨石顆粒群主要 是作爲有助於對硏磨布的磨耗，基準面較低的磨石顆粒群 有助於用來調整硏磨布的表面粗度。即是在基.準面較高的 磨石顆粒群藉由集中性作用加諸在修整器.全體的載重，因 iti]每單位面損的負荷載重增大，所以該負荷載重增大主要 是作爲有助於對硏磨布的磨耗；此外，基準.面較低的磨石 顆粒群，直到一定程度爲止才負擔載重，而利周上述基準 面較高的磨石顆粒群‘使硏磨布的磨耗速度減低。然而，基 準靣間相互的高度差5極端.大畤，因爲基、準面較，低的磨石 顆粒群完全沒有負擔載重，所以不會發揮使硏磨布的磨耗 速度減低的效果。此基準面較低的磨石顆粒群對排出硏磨 布的切削屑也有效地作用。 另外，在硏磨布用修整器Γ中，上述複數個磨石顆粒 群5、6係相互地利用不同粒度的磨石顆粒來形成之第1 磨石顆粒群5及第2磨石顆粒群6所構成。這些2種的磨 -10- (8) (8)200408501 石顆粒群5、6沿著上述金屬台2的周緣部而朝其圓周方 向交互地並排設置而形成修整面4。 具體上，上述第〗磨石顆粒群5如第5、6圖所示， 由大小2種粒度的磨石顆粒5 0、5 1所形成，這些的磨石 顆粒5 0、5 1，如第5圖所示，在於基台7.a的表面上，即 是在於前述修整面4上以2次元且有規則的等地排列，相 互地鄰接的磨石顆粒彼此間所組成的最小格子則是以正三 角形或平行四邊形來加以排列。然而，較大的磨石顆粒 5 〇彼此間的間隔比較:小的磨石顆粒5 1彼此間的間隔更寬 〇 此樣，有規則性均等地排列大小2種粒度的磨石顆粒 ，就能使修整的穩定性或均,一性更提升^ . 此外，關於上述第2磨石顆粒群6，由粒度與上述第 1磨石顆粒群5的磨石顆粒的粒度不同之相周粒度.的.磨石 顆粒或複數種粒度的磨石顆粒的其中一種所形成亦珂，不 過與上述第1磨石顆粒群5同樣地，期望是以二次元且有 規則性均等地排列磨石顆粒。 此處，形成上述.磨石.顆粒'群.5、. 6之磨石顆粒，例如 能採用鑽石磨石顆粒，其磨石顆粒的粒度，一般期望是在 JIS B 4 1 30所規定的粒度# 3 2 5 /#4〇〇〜#6〇/#8()的範握內。 另外’形成上述第】磨石顆粒群5之磨石顆粒無必要 性要用大小2種顆粒度的磨石顆粒5 〇、5 1，即使用相同 粒度的磨石顆粒亦可（參考第2 A〜2D圖的實施形態.)。 另外’上述調節機構7無必要性一定要設置在第1磨石顆 - 11 - (9) (9)200408501 粒群5及第2磨石顆粒群6的兩方，只設置在磨石顆粒群 的一部分，即是只設置在第〗磨石顆粒群5或第2磨石顆 粒群6的一方亦可。此情況，不設置調節機構7之磨石顆 粒群’讓基台7 a直接固定在金屬台2的周緣部。 此樣’採用每個磨石顆粒群之不同粒度的磨石顆粒， 或是在於各磨石顆粒群中使不同粒度的磨石顆粒混入，則 較大粒度的磨石顆粒主要是作爲有助於硏磨布的磨耗，較 小k度的磨石顆粒有助於用來，調整硏磨布的表面粗度，經 由調整這些粒度，就能使硏磨布的表面粗度成爲特定對象 物進行C MP加工的狀態。 進而，如第1A〜1D:圖所示，在硏磨布用修整器1中 將上述第.1磨石顆粒群5及第2磨石，顆粒群6的平面形狀 ’可以從小圓形狀、與上述金屬台2的周緣即是與修整面 4的周緣成平行的圓環片形狀.、與上述金屬台2的周緣即 疋與修整面4的周緣成一定角度之螺旋片形狀當中選擇1 種或2種。第]a圖爲表示兩磨石顆粒群.5、6.都是小圓 形狀的情況。第1B圖爲表示第！磨石顆粒群5爲小圓形 狀而第2磨石顆粒群爲螺旋片形狀的情況，。第1 C圖爲表 示兩磨石顆粒群5、6都是圓環片形狀的情況。第1 D圖 爲表示兩磨石顆粒群5、6都是螺.旋片形狀的情況。沿著 盃屬台表面3即是沿著金屬台2的周緣部而呈環狀排列此 種形成爲平面形狀的磨石顆粒群5、6，而藉由利用形成 修整面4，而修整來除去之硏磨布的切削屑或凝聚在一起 的漿劑，能容易排出到修整器的外部，另外能調整該排出 -12- (10) (10)200408501 性能。 然而，上述磨石顆粒群5、6，如第3、6圖所示，藉 由保持材5 2來讓磨石顆粒保持而形成，藉由例用粘合劑 8等將保持該磨石顆粒之保持材5 2固著在上述調節機構7 之基台7 a的表面，該磨石顆粒群5、6固著在上述基台 7 a上。 另外，作爲上述保持材..5 2的磨石顆粒爲鑽石時，雖 然可以採用與鑽石磨石顆粒反應燒結之矽及/或矽合金， 惟若爲適於保持磨石顆粒之保持材，則沒有特別的限、制 也能利用一般的鎳電塗膜或焊材經結合來保持。 其次，說明有關藉由上述硏磨布用修整器1之硏磨布 的修整方法，藉由上述調節機構7，在交互地鄰接的第1 磨石顆粒群5和第2磨石顆粒群6的各基準面S_1、S2間 ，設置對金屬台表面3之一定的高低差5，而將上述硏磨 布修整。換言之，.藉由利用上述調節機構7來使第1磨石 顆粒群5的基準面S 1比上述第2磨石顆粒群6的基準面 S 2還在上述金屬台表面：3的垂直方向的高度以高出一定 量（5的方式調節献適度調整上述修整面4的朕態，就能 將上述硏磨布表面修整成依照被加工物所期望的狀態。 奶此依據上述硏磨布用修整器1，由於經由調節基準 面S 1、S2的高度差（5，就能將修整面4的狀態調整成能 發揮所期望的硏削性能，所以即使在修整面4的狀態發生 個體差，不僅仍能創出均一的硏磨布表面，而且還能對於 硏磨布表面而施加對應於被加工物之適切的硏磨性能。 -13- (11) (11)200408501 第2A〜2D圖爲表示本發明的硏磨布用修整器之磨石 顆粒群的不同配置形狀之第2實施形態，在本實施形態之 硏磨布用修整器1 0之中，複數個磨石顆粒群只以上述第 1磨石顆粒群5來形成，·沿著金屬台2的周緣部呈環狀並 排設置這些相同的磨石顆粒群5而形成有修整面4。 另外，該磨石顆粒群5的平面形狀，與上述第1實施 形態的情況相同’可以從小圓形狀、與上述修整面4的周 緣成平行的圓環片形狀、與上述修整面4的周緣成一定角 度的螺旋片形狀當中選擇、第2 A圖爲表示磨石顆粒群5 全部都是小圓形狀的情況。第2 B圖爲表示磨石顆粒群5 爲小圓形狀和螺旋片形狀，具有這些2種不同的平面形狀 之磨石顆粒群5朝修整面4的周方向交互地並排設置的情 況。第2 C圖爲表示磨石顆粒群5全部都是圓環片形狀的 情況。第2 D圖爲表示磨石顆粒群5全部都是螺旋片形狀 的情況。 關於包含調節機構7的其他構成，因爲與上述第1實 施形態共通，所以爲了避免重複在此將說明省略。 然後，針對採用上述研曹布用修整器1 〇而修整硏磨 布，如第4圖所示.，藉由調節機構7，在交互地鄰接之上 述磨石顆粒群5的基準面S 1間設置對金屬台表面3的一 定的高度差δ而進行修整。 如此依據上述硏磨布用修整器1 〇，由於與上述硏磨 布用修整器1相同，適度調節上述相鄰之磨石顆粒群5的 基準面S 1間的高低差6就能將修整面4的狀態調整成所 -14 - (12) (12)200408501 期望的狀態，所以即使修整面4的狀態發生個體差，不僅 仍能創出均一的硏磨布表面，還能對於硏磨布表面對應於 被加工物之適切的硏磨性能施加到硏磨布表面。 然而，上述調節機構7本體的構成，並不侷限於參考 圖面已說明過的上述構成，還能採用在微細的範圍內可以 上下調整磨石顆粒群的基準面之各種機構。 ， 以下，具體表示本發明的硏磨布用修整器及其使用的 修整方法之實施例及比較例。只不過本發明並沒有因這些 個實施例而受到任何的限定。 〔實施例1〕 第1磨石顆粒群5的磨石.顆粒，分別採周相當於粒度 爲#120/#140的1 50〜I 70 // m的範圍之鑽石磨石顆粒.50,、 及相當於粒度# 3 2 5 /# 4 0 0的5 5〜6 5 // m的範圍之鑽石磨石 顆粒5 ].，藉由使這些的磨石顆粒50、5 1與保持材52 .反 應燒結，因而'獲得磨石顆粒5〇、51保持在、保持材52的燒 結體。~ 此時，在於磨石顆粒排列面，以包含粒度#120/# 1 40 的磨石顆粒50的前端之平面與包含粒度#3 2 5/#4 0.0的磨石 顆粒5 ]的前端之平面'的高低差爲40〜60 // m的方式來排 列上述2種磨石顆粒5 0、5 1，並且鄰接的磨石顆粒：5:0、 5 1彼此間所組成的最小格子爲正三角形，以粒度 # 1 2 0 /# 1 4 0的磨石顆粒5 0之間隔爲2 · 〇 m m的等間隔，粒 度#3 2 5/#400的磨石顆粒51間隔爲〇.4mm的等間隔的方 -15- (13) (13)200408501 式來排列上述2種磨石顆粒5 0、5 1。 此外作爲弟2磨石顆粒群6的磨石顆粒係採用相 晶於粒度#60/#80之2 5 0〜3 2 0 //m的範圍之鑽石磨石顆粒 ’將這些磨石顆粒以間隔爲Q . 8 m m的等間隔的方式來加 以排列。 然後，經此方式所得到的燒結體經由機械加工來加工 成預定的尺寸/形狀，而形成第1磨石顆粒群5及第2 磨石顆粒群6後，將這些的磨石顆粒群5、6用環氧樹脂 分別接著在調節機構7上之.s u s 3丨6 L不銹鋼製的直徑必 1 〇〇mm的基台7 a。然而，本實施例中，將上述第！磨石 顆粒群5及第2磨石顆粒群6的平面形狀.製作成如第1 D 圖所示的與修整面4的周緣成一定角度的螺旋片形狀。 經此方式所诈成之硏磨布用修整器以1 9.6kPa的壓力 押接到以1 〇 〇rpm旋轉之發泡聚胺酯製硏磨布，與該硏磨. 布朝相同方向以80rpm旋轉，則同時一面以每分25ml供 應含有燻製二氧化砍（f_ed Siiica )的硏磨漿劑(日本 卡伯特〈譯音〉製SS — 25 )，—面進行硏磨布的硏削。： 此時，將前述售'整靣4之對於前述第1磨石:穎粒群…5 的磨石顆粒前端基準面S1與前述第2磨石顆粒群6的磨 石顆粒前端基準面S 2的金屬台表面3之高低差<5 ’利用 上述調節機構7來調節成1 5、3 0、6 0 // m的3程度，測 定修整速度（硏磨布的磨耗速度）及硏磨布的面狀態（硏 磨布的面粗度）後，測定用該硏磨布的晶圓硏磨速度，將 這些測定結果顯示在表I中。 -16 - (14) 200408501 然而，在本實施例之中’ η數即是樣本數爲20，算出 各樣本已被測定之上述各測定値的平均値（A V e )，顯示 在表1中。 然後，表1中π ^ 1表示各測定結果的標準偏差。另 外，晶圓硏磨速度的測定，使用 ADE公司製的晶圓平坦 度測定器（U 11 r a g a u g e 9 8 0 ) ’從硏磨前後的測定結果來 算出平均硏磨速度。 〔.表 1.:〕200408501 Π) 发明. Description of the invention [Technical field to which the invention belongs] The present invention relates to honing cloth in mechanical chemical honing (C hemica 1 Mechani ca 1 P o 1 ishing, hereinafter referred to as C MP) A honing cloth dresser used when the mesh is clogged or foreign matter removed, and a method for dressing the honing cloth used therefor. [Prior technology] In the process of manufacturing semiconductor silicon substrates or integrated circuits on silicon wafer substrates, fine-grained electronic circuits are typically processed by CMP to remove bumps or crystal defects existing on the substrate surface. In this CMP process, a wafer substrate is pressed against a honing cloth formed by a polyamine% and the like attached to a platform of a honing device with a predetermined load, while a slurry honing liquid is supplied, so that Both the wafer and the honing cloth are rotated for honing. The slurry for CMP processing uses honing particles such as iron oxide, barium carbonate, hafnium oxide, alumina, colloidal silica to float on potassium hydroxide, dilute hydrochloric acid, dilute nitric acid, hydrogen peroxide water, iron nitrate, etc. The slurry of the honing liquid 'These materials are appropriately selected according to the honing speed and the type of the object to be processed on the wafer or the wafer substrate. In this CMP process, since the wafers are honed with the same honing cloth of a plurality of pieces or repeatedly, as the number of times of CMP processing increases, the powder of the processed object or the honing that is aggregated together is removed. Particles enter the fine pores of the honing cloth and cause the mesh to be blocked, resulting in a decrease in wafer honing speed. Therefore, the surface layer of the honing cloth that has been blocked by the mesh is removed, and the -4- (2) (2) 200408501 thickness of the honing cloth surface is regenerated and the honing speed is restored. The operation called trimming must be performed at any time or regularly. This operation A tool called a dresser for a honing cloth is used. Diamond millstone particles are an excellent material for dressing honing cloths. Therefore, a method for electrocoating diamond millstone particles on stainless steel by nickel electroplating using a dresser for diamond millstone grinding cloths is discussed. It has generally been put into practical use. In addition, a method of welding diamond grindstone particles to stainless steel with a metal welding material is also proposed (for example, refer to Japanese Patent Laid-Open Publication No. 10 — 0 1 2 5 7 9), and the diamond grindstone particles and A method of holding and sintering a holding material by reaction (for example, refer to Japanese Patent Laid-Open No. 200 1-1 7 963 8). In addition, in order to obtain a stable surface removal ability of the honing cloth, a CMP honing cloth dresser in which grindstone particles are arranged at equal intervals has also been proposed (for example, refer to Japanese Patent Laid-Open No. 2000-1 4 1 2 04 Gazette, Japanese Patent Laid-Open No. 2 02 — 1 2 7 0 1). However, due to the structure of the conventional honing cloth dresser, the condition of the dressing surface due to the shape of the tip of the grindstone particles can not be avoided. Even if the same honing cloth dresser is used, it is not easy to create a uniform dressing The surface of the abrasive cloth; in addition, the surface state of the honing cloth must be adjusted according to the object being processed. For example, for wafers that have formed an interlayer oxide film on the surface of the silicon wafer, the surface state of the honing cloth is still rough, The main purpose is to strengthen the mechanical removal of the honing cloth to increase the honing speed. In addition, the Cu wiring is more strengthened than the mechanical removal of the honing cloth. The honing fluid on the surface of the honing cloth ( The chemical reaction of s 1 urry) is the main cause, and it is necessary to maintain the surface roughness of the honing cloth to a certain degree. Therefore, for a honing cloth dresser for trimming the surface of the honing cloth, it is necessary to prepare the required amount of dressing. ) (3) 200408501 The state of the surface is suitable for the honing cloth of the object to be processed, and there is a problem that the cost increases. SUMMARY OF THE INVENTION The technical problem to be solved by the present invention is to provide a dresser for a honing cloth and a method for dressing the honing cloth used therefor. Since the conditioner of the honing cloth can adjust the state of the finishing surface, even if the shape of the finishing surface of the grinding stone particles is different from each other, the surface of the finishing surface can be adjusted to create a uniform honing cloth surface, or Appropriate honing performance can be given to the surface of the honing cloth corresponding to the workpiece. " In order to solve the above-mentioned problems, the dresser for a honing cloth of the present invention is a honing cloth in which a dressing surface is formed on the surface of a rotatable metal table. A plurality of grinding stone particle groups are arranged side by side in the direction, and the metal table is provided with a height adjustment on the above-mentioned trimming 靣 of the reference 形成 formed by the front ends of a plurality of grinding stone particles in the whole or part of the grinding stone particle groups. Poor adjustment mechanism. According to the dresser for honing cloth, the height difference of the reference surfaces in the plurality of grindstone particle groups can be arbitrarily adjusted by the adjustment mechanism, so even if the shape of the tip of the grindstone particles causes the state of the dressing surface Individual differences occur, and the state of the trimmed surface can be adjusted by adjusting the height difference of the reference surfaces of the plurality of grindstone particle groups, which can still create a uniform honing cloth surface, or the honing cloth surface, which is the honing cloth. The abrasive surface can apply appropriate honing performance corresponding to the object to be processed. In this case, the grindstone particles with a higher reference surface are mainly used to help the wear of the honing cloth surface, and the grindstone particles with a lower reference surface are mainly used to facilitate the use of -6- (4) (4) 200408501. To adjust the surface roughness of the honing cloth. The dresser for honing cloth can be made into a group of grindstone particles having the above-mentioned adjustment mechanism, which are respectively fixed on a base of the above-mentioned adjustment mechanism formed by a body different from the above-mentioned metal table, and the metal table along the above-mentioned dressing surface. Each grinding stone particle group is arranged side by side in a ring shape. The grindstone particle group is respectively formed from one or two selected from the shape of a ring plate parallel to the peripheral edge of the trimming surface, a spiral piece shape that forms an angle with the peripheral edge of the trimming surface, and a small circle shape. The “planar shape” is more ideal because the cuttings of the honing cloth removed by the dressing or the aggregated slurry are easily discharged to the outside of the dresser. When the grindstone particle groups are respectively formed into two kinds of planar shapes selected from the above-mentioned planar shapes, it is appropriate that the two kinds of grindstone particles with different planar shapes are alternately arranged side by side in the circumferential direction of the dressing surface. ... In addition, each grindstone particle group arranged side by side on the finishing surface can also use the same grindstone particle group with the same size of grindstone particles to form each other, or two types of grindstone particles with different particle sizes. Consists of millstone particles. Then, when the grinding stone particle groups arranged side by side on the above-mentioned dressing surface are mutually beneficial / the first grinding stone particle group and the second grinding stone particle group formed by the grinding stone particles of different particle sizes are interacted in the circumferential direction of the dressing surface It is more appropriate to arrange these first millstone particle groups and second millstone particle groups side by side. In this case, the first grindstone particle group can be formed with the grindstone particles of the same particle size or the grindstone particles of two different particle sizes. Here, the above-mentioned grinding stone particles are arranged in a quadratic and regularly arranged grinding stone particles on the aforementioned trimming surface, and are formed in a regular triangle to form parallel four sides -7- (5) (5) 200408501 to arrange each other. The smallest lattice formed by adjacent millstone particles can improve the stability or uniformity of the dressing and is more ideal. Furthermore, the above-mentioned problem can be solved by a method of adjusting the honing cloth by adjusting the honing cloth by setting a certain height difference between the reference planes of the adjacent grindstone particle groups. Method for dressing said honing cloth 'When a plurality of grindstone particle groups are composed of the first grindstone particle group and the second grindstone particle group, the first grindstone on the dressing surface is adjusted by the adjustment mechanism. The locality of the datum surface of the particle group is a certain amount of way than that of the second millstone particle group, and the honing cloth is more suitable for trimming. According to the dresser for a honing cloth of the present invention and the dressing method of the honing cloth used by the same, since each grindstone particle group uses the tip of the grindstone particle to form a grindstone particle reference plane: the above-mentioned dressing surface The height difference of the height can be adjusted arbitrarily to adjust the dressing surface to the desired state: so even if the condition of the dressing surface such as the shape of the tip of the grindstone particles occurs _body difference, it can still create a uniform honing It is possible to apply a suitable honing performance to a workpiece even on a cloth surface and a honing cloth surface. [Embodiment]. Figs. 1A to 10 are the first embodiment showing the different arrangement shapes of the grindstone grain group for the finishing of the honing cloth of the present invention. The dresser 1 for honing cloth is constituted by a disc-shaped metal table 2 having a circular recess 2 a at the center of its surface side, and a ring-shaped dressing surface 4 formed on the metal table surface 3 around it, A plurality of first and second millstone particle groups 5 and 6 are formed side by side in a circular shape on the trimming surface 4 in a ring-like manner. In other words, a plurality of grinding stone particle groups 5 and 6 are arranged in a ring-shaped I row along the metal table surface 3, that is, along the peripheral edge portion of the metal table 2, to form the modified surface 4. However, as shown in FIG. 3, when each of the grinding stone particle groups 5 and 6 uses the plane including the tip of the grinding stone particle with the largest particle size as the reference planes SI and S2, the above-mentioned plurality can be arbitrarily adjusted for the trimming surface 4. The height difference between the reference surfaces S1, S2 of the grindstone particle groups 5 and 6 (5, so the adjustment mechanism 7 is provided on the metal table 2. Here, it is not necessary to install the above on the metal table 2 The recess 2 a 〇 Specifically, the adjusting mechanism 7 is a base of a recess 7 e which is fixed on the surface with a grindstone particle group 5 or 6 and can be slid up and down into the opening 7 e of the surface 3 of the metal table 2. The stage 7a and the adjustment screw 7b provided on the back surface of the base 7a and screwed into the screw hole 7c penetrating from the bottom surface of the recessed portion 7e of the metal table 2 to the back side of the metal table 2 and using the The adjusting screw 7b adjusts the height position of the reference surface of the grindstone particle group 5'6 fixed on the abutment 7a, and is clamped between the 'back' of the above / mentioned abutment 7a and the bottom surface of the recess 7e. It is constituted by the spacer 7 d. Then, it is fixed to each of the above-mentioned adjustment mechanisms 7 A plurality of grindstone particles 5 ·, 6 on the surface of the base 7a are arranged side by side along the peripheral edge of the metal table 2 to form the dressing surface 4. Therefore, the grindstone particles 5 and 6 are provided. The spacers 7d of the thickness necessary for adjusting the reference planes S1, S2 to the desired height position are set to (7) (7) 20040501 in the recessed portion '7e of the metal table 2 by using the above adjustment It is clamped between the bottom surface of the recess 7e and the back surface of the abutment 7a with a screw 7b, and the metal of the reference surfaces s 1 and S 2 of each of the grinding stone particle groups 5 and 6 can be adjusted. The height position of the table surface 3 is a state where the height difference δ between the reference surfaces S 1 and S 2 of the plurality of grinding stone particle groups 5 and. 6 can be adjusted to adjust the state of the trimming surface 4. However, in this embodiment, Among them, the adjustment mechanism 7 is used to make the height of the metal table surface 3 of the reference surfaces S 1 and S 2 to adjust the reference surface S 1 and S 2 to the metal base in a range of 0 to 3 0 / im. The height of 3. Among the above-mentioned grindstone particle groups, the grindstone particle group with a higher reference level is mainly used to help confront The abrasion of the cloth, the group of grinding stone particles with a lower reference plane helps to adjust the surface roughness of the honing cloth. That is to say, the group of grinding stones with a higher quasi plane is added to the dressing by concentration. The overall load is increased because the load load per unit area loss is increased, so this increase in load load is mainly used to contribute to the wear of the honing cloth; in addition, the ground stone particle group with a lower reference surface area Until a certain degree, the load is not burdened, and the high grinding stone particle group of the above reference surface of Lizhou reduces the wear rate of the honing cloth. However, the height difference between the reference ridges is 5 extremes. The standard surface is relatively low, and the low grinding stone particle group has no load at all, so it will not exert the effect of reducing the wear rate of the honing cloth. The lower group of grindstone particles at this reference level also effectively affects the cutting chips discharged from the honing cloth. In addition, in the dresser Γ for honing cloth, the plurality of grindstone particle groups 5 and 6 are the first grindstone particle group 5 and the second grindstone particle group 6 which are formed by using grindstone particles having different particle sizes. Made up. These two kinds of grinding -10- (8) (8) 200408501 stone particle groups 5, 6 are alternately arranged side by side in the circumferential direction along the peripheral edge portion of the metal table 2 to form a dressing surface 4. Specifically, as shown in FIG. 5 and FIG. 6, the above-mentioned grinding stone particle group 5 is formed by grinding stone particles 50 and 51 having two kinds of particle sizes. These grinding stone particles 50 and 51 are as shown in FIG. As shown in Figure 5, on the surface of the abutment 7.a, that is, on the aforementioned trimming surface 4, arranged in a two-dimensional and regular equal arrangement, the smallest grid composed of adjacent grinding stone particles is Arrange in regular triangles or parallelograms. However, the larger grindstone particles 50 are compared with each other: the smaller grindstone particles 51 are more widely spaced with each other. In this way, it is possible to arrange the grindstone particles of two sizes in size regularly and uniformly. To improve the stability or uniformity and uniformity of the trimming. In addition, regarding the second millstone particle group 6, the particle size of the second millstone particle group 6 is different from the grain size of the millstone particles of the first millstone particle group 5. It is also possible to form one of the grindstone particles or grindstone particles having a plurality of particle sizes, but it is desirable to arrange the grindstone particles in a two-dimensional and regular manner, similarly to the first grindstone particle group 5 described above. Here, the grindstone particles of the above-mentioned “millstone. Particles” group 5, 5 can be formed, for example, diamond millstone particles, and the particle size of the millstone particles is generally expected to be a particle size specified in JIS B 4 1 30 # 3 2 5 / # 4〇〇 ~ # 6〇 / # 8 () 's fan grip. In addition, it is not necessary to form the grinding stone particles of the above-mentioned] grinding stone particle group 5. It is necessary to use the grinding stone particles 2 and 5 of two kinds of granularity, even if the grinding stone particles of the same particle size are used (refer to 2 A ~ 2D figure embodiment.). In addition, the above-mentioned adjustment mechanism 7 is not necessarily installed on the first grinding stone particle-11-(9) (9) 200408501 grain group 5 and the second grinding stone particle group 6 and is only provided on the grinding stone particle group It is also possible to provide only a part of the first grindstone particle group 5 or the second grindstone particle group 6 as a part. In this case, the grindstone grain group 'of the adjusting mechanism 7 is not provided, and the base table 7a is directly fixed to the peripheral edge portion of the metal table 2. In this way, if different size grindstone particles of each grindstone particle group are used, or different size grindstone particles are mixed in each grindstone particle group, the larger size grindstone particles are mainly used to help The abrasiveness of the honing cloth. The smaller k-degree grindstone particles help to adjust the surface roughness of the honing cloth. By adjusting these particle sizes, the surface roughness of the honing cloth can be made a specific object. C MP processing status. Further, as shown in FIGS. 1A to 1D, the planar shape of the first grinding stone particle group 5 and the second grinding stone and the particle group 6 in the dresser 1 for honing cloth can be changed from a small circular shape and The peripheral edge of the metal table 2 is a circular ring shape that is parallel to the peripheral edge of the dressing surface 4. The spiral plate shape that is at an angle to the peripheral edge of the metal table 2 that is 疋 and the peripheral edge of the dressing surface 4 is selected from one or 2 kinds. Fig. A) shows the case where both of the millstone particle groups .5 and 6. are small circles. Figure 1B shows the first! In the case where the grindstone particle group 5 has a small circular shape and the second grindstone particle group has a spiral plate shape. Fig. 1C shows a case where the two grindstone particle groups 5, 6 are in the shape of a ring plate. Fig. 1D shows a case where both of the millstone particle groups 5, 6 are helical. The grinding stone particles 5 and 6 formed in a flat shape are arranged in a ring shape along the peripheral surface 3 of the metal table 2 and are removed by trimming the trimming surface 4 The cuttings or agglomerated slurry of the honing cloth can be easily discharged to the outside of the dresser, and the discharge performance can be adjusted -12- (10) (10) 200408501. However, as shown in Figs. 3 and 6, the grindstone particle groups 5 and 6 are formed by holding the grindstone particles by the holding material 52, and the grindstone particles are held by the binder 8 or the like as an example. The holding material 5 2 is fixed on the surface of the base 7 a of the adjustment mechanism 7, and the grindstone particle groups 5 and 6 are fixed on the base 7 a. In addition, when the grinding stone particles used as the above-mentioned holding material 5 are diamonds, although silicon and / or silicon alloys which are sintered by reacting with the diamond grinding stone particles can be used, if the holding material is suitable for holding the grinding stone particles, There is no particular limitation, and the system can also be retained by using a common nickel electrocoating film or welding material. Next, a description will be given of a method for dressing a honing cloth by the honing cloth dresser 1 described above, and by the above-mentioned adjusting mechanism 7, the first grindstone particle group 5 and the second grindstone particle group 6 which are adjacent to each other. Between each of the reference planes S_1 and S2, a certain height difference 5 with respect to the metal table surface 3 is set, and the honing cloth is trimmed. In other words, by using the adjustment mechanism 7, the reference surface S 1 of the first grindstone particle group 5 is further than the reference surface S 2 of the second grindstone particle group 6 on the surface of the metal table: 3 in the vertical direction. The height is adjusted by a certain amount (5), and the state of the dressing surface 4 is adjusted by moderate adjustment, so that the surface of the honing cloth can be trimmed to a desired state of the object to be processed. The device 1 can adjust the state of the trimming surface 4 to adjust the height of the reference surface S1, S2 (5, so that the desired cutting performance can be achieved. Therefore, even if the individual difference occurs in the state of the trimming surface 4, not only It is still possible to create a uniform honing cloth surface, and it is also possible to apply a suitable honing performance corresponding to the object to be processed on the honing cloth surface. -13- (11) (11) 200408501 The 2A to 2D pictures show In the second embodiment of the different arrangement shapes of the grindstone particles of the honing cloth dresser of the invention, in the honing cloth dresser 10 of this embodiment, the plurality of grindstone particle groups are based only on the first Grindstone particle group 5 is formed along the periphery of the metal table 2 The same grinding stone particle group 5 is arranged side by side in a ring shape to form a trimming surface 4. The planar shape of the grinding stone particle group 5 is the same as in the case of the first embodiment described above. The peripheral edge of the trimming surface 4 is formed into a circular ring shape parallel to the peripheral edge of the trimming surface 4 and is selected from a spiral piece shape at an angle to the peripheral edge of the trimming surface 4. FIG. FIG. 2B shows a case where the grindstone particle group 5 is a small circle shape and a spiral plate shape, and the grindstone particle groups 5 having these two different planar shapes are alternately arranged side by side in the circumferential direction of the dressing surface 4. Part 2 Figure C shows the case where all of the grindstone particle group 5 is in the shape of a circular plate. Figure 2D shows the case where all of the grindstone particle group 5 is in the shape of a spiral plate. Regarding other structures including the adjustment mechanism 7, because The above-mentioned first embodiment is common, so the description will be omitted in order to avoid repetition. Then, the honing cloth is trimmed by using the trimmer 10 for polishing cloths, as shown in FIG. 4. With the adjustment mechanism 7, In interaction A certain height difference δ of the metal table surface 3 is provided between the reference surfaces S 1 of the adjacent grindstone particle groups 5 to perform the dressing. According to the dressing device 10 for the honing cloth, the dressing is performed with the honing cloth. The device 1 is the same, and the height difference 6 between the reference surfaces S 1 of the adjacent grindstone particle groups 5 can be adjusted appropriately to adjust the state of the trimming surface 4 to the desired state. (14) (12) (12) 200408501 Therefore, even if there is an individual difference in the condition of the trimming surface 4, not only can a uniform honing cloth surface be created, but also the honing cloth surface with appropriate honing performance corresponding to the workpiece can be applied to the honing cloth surface. However, the above The structure of the main body of the adjustment mechanism 7 is not limited to the above-mentioned structure described with reference to the drawings, and various mechanisms that can adjust the reference surface of the grindstone particle group up and down within a fine range can also be adopted. Hereinafter, examples and comparative examples of the dresser for a honing cloth of the present invention and the dressing method used therefor will be specifically shown. It is only that the present invention is not limited in any way by these embodiments. [Example 1] The grinding stones and granules of the first grinding stone particle group 5 were respectively collected from diamond grinding stone particles having a particle size range of # 120 / # 140 in the range of 1 50 to I 70 // m. 50 ,, And diamond grinding stone particles 5 in the range of 5 5 to 6 5 // m corresponding to the particle size # 3 2 5 / # 4 0 0], by making these grinding stone particles 50, 51 and the holding material 52. By reaction sintering, a sintered body in which the grindstone particles 50 and 51 are held and the holding material 52 is obtained. ~ At this time, on the grinding stone particle alignment surface, the plane including the front end of the grinding stone particles 50 with a particle size of # 120 / # 1 40 and the front surface of the grinding stone particles 5 with a particle size of # 3 2 5 / # 4 0.0 'The height difference is 40 ~ 60 // m to arrange the above two kinds of grinding stone particles 50, 51, and the adjacent grinding stone particles: 5: 0, 5 1 The smallest grid formed by each other is a regular triangle , The interval between the grindstone particles 50 with a particle size of # 1 2 0 / # 1 4 0 is an equal interval of 2.0 mm, and the interval between the grindstone particles 51 with a particle size of # 3 2 5 / # 400 is an equal interval of 0.4 mm -15- (13) (13) 200408501 to arrange the two kinds of grinding stone particles 50, 51. In addition, as the grinding stone particles of the second grinding stone particle group 6, the diamond grinding stone particles with a grain size of # 60 / # 80 in the range of 2 5 0 ~ 3 2 0 // m are used to separate these grinding stone particles. They are arranged at regular intervals of Q. 8 mm. Then, the sintered body obtained in this way is processed into a predetermined size / shape by machining to form the first grindstone particle group 5 and the second grindstone particle group 6, and then these grindstone particle groups 5, 6 The epoxy resin is then attached to the adjustment mechanism 7 respectively. The sus 3, 6 L stainless steel abutment 7 a must have a diameter of 100 mm. However, in this embodiment, the first! The planar shapes of the grindstone particle group 5 and the second grindstone particle group 6 are formed into a spiral sheet shape at a certain angle to the peripheral edge of the trimming surface 4 as shown in FIG. 1D. The honing cloth formed in this way is pressed by a dresser at a pressure of 19.6kPa to a honing cloth made of foamed polyurethane rotating at 1000 rpm, and the honing cloth is rotated in the same direction at 80 rpm, At the same time, at the same time, the honing slurry containing f_ed Siiica (SS-25 produced by Cabot, Japan) was supplied at 25ml per minute, and the honing of the honing cloth was performed. : At this time, the aforementioned reference point S1 of the grindstone particle front end S1 for the aforementioned first grindstone: glume group ... 5 and the reference surface S2 of the grindstone particle front end of the second grindstone group 6 The difference in height of the metal table surface 3 < 5 'is adjusted to 3 of 1, 5, 3 0, 6 0 // m using the above-mentioned adjustment mechanism 7 to measure the dressing speed (abrasion rate of the honing cloth) and the honing cloth After measuring the surface state (surface roughness of the honing cloth), the wafer honing speed of the honing cloth was measured, and the results of these measurements are shown in Table 1. -16-(14) 200408501 However, in this example, the number of 'η' is the number of samples of 20, and the average value (A V e) of each of the above-mentioned measurement values for which each sample has been measured is calculated and shown in Table 1. Then, π ^ 1 in Table 1 shows the standard deviation of each measurement result. In addition, the wafer honing speed was measured using a wafer flatness measuring device (U 11 r a g a u g e 9 8 0) manufactured by ADE 'from the measurement results before and after honing to calculate the average honing speed. 〔.Table 1.:〕
實施例 磨石顆 第1磨石 #120/#140 2.0m m 粒間隔 顆粒群· #3 2Ό/#4 0 0 0.4mm , 第2磨石: #60/#80 0 · 8 m.m 顆粒群 顆粒基準面之·高低差（5 15 3 0- 60 硏磨布磨耗速度 Α ν e · 69.2 108 . 12 (μ, m / Η ο υ r ) α η-1 1.33 1.2 5 1.78 硏磨布面粗癀 Ave. 4.12 4.05 4.19 R a ( β m ) 〇 n - 1 0.12 0.15 0.14 晶圓硏磨速度 ' Ave. 126 1 2 9 1 2 1 ； (n m / m i n ) (7卜】 6.7 7.2 5.6 傷痕發生率（°/o) ___----- 0.00 0.00 (LOO 如這個表1所示，依據本發明的硏磨布用修整器，調 -17- (15) 200408501 節複數個磨石顆粒群之磨石顆粒的粒度或各磨石 準面間的高低差ό，就能將修整面調節成所期望 特別是利用上述磨石顆粒群的基準面間高低差5 速度有很大的差。因而，利用1片硏磨布用修整 在種種的條件下穩定地進行硏磨布的修整。 另外，依據上述實施例的測量値，得知比以 比較例的測定側還提升全體性地性能，而且各種 標準偏差非常小，所以得知所取得的硏磨布極小 於硏磨布周修整器賦予穩定的硏磨性能。 〔比較例1〕 採闱過去的CMP硏磨布修整器，該CMP 整器是在磨石顆粒間隔排列成〇.25mm的等閭隔 5利周鎳電塗膜來固定相當於粒度#80/# 1 0.0之 ⑺的範圍之鑽石磨石顆粒所構成，在與實施例1 伶下，硏削發泡聚胺酯製硏磨布。其硏削結果顯 中。 〔比較例2〕 採周硏磨布用修整器，該硏磨布修整器是在 的磨石顆粒排列面，相鄰的第1磨石顆粒彼此間 最小格子爲正三角形，以其一邊的磨石顆粒間隔 的等間隔的方式來排列相當於粒度# 120〜# 140之 // m的範圍之鑽石磨石顆粒，由該磨石顆粒所形 顆粒群基 的狀態， 得知磨耗 器，就能 下說明之 測定値的 偏差，對 硏磨布修 的狀態下 1 0-2 5 0 /i 相同的條 :示在表 2 於燒結體 所組成的 爲 2 · 1 m m 1 5 0〜17 0 成之磨石 -18- (16) 200408501 顆粒群的平面形狀，如第2C圖所示，形成爲與修 周緣成平行之圓環片形狀，在與實施例1相同的_ 硏削發泡聚胺酯製硏磨布。其硏削結果與比較例i 示在表2中。 〔比較例3〕 與實施例1的第1磨石顆粒群同樣地，分別 當於粒度#120/# 140之150〜170 // m的範圍之鑽石 粒、及相當於粒度# 3 2 5 /# 4 0 0.之5 5〜6 5 /z m的範圍 磨石顆粒。然後，在於燒結體的磨石顆粒排列面， 度爲#120/#140的磨石顆粒的前端之平面與包含 #3 2 5 /#4 0 0'的磨石顆粒的前端之.平面的高、低差爲..40. ’並且鄰接的磨石顆粒彼此間所組成的最小格子爲 形，粒度#120/# 140的磨石顆粒的間隔爲2.0mm的 來排列上述這些磨石顆粒。然後，用硏磨布用修整 硏磨布用修整器是具有如此的磨石顆粒排列之磨石 ，形成爲如第 2 C圖所示的與修整面的周緣咸平行 片形狀，沿著修整面之金屬台的周緣部而呈環狀並 所構成，在與實施例1相同的條件下，硏削發泡聚 硏磨布。其硏削結果與比較例；[、2 一起顯示在表2 整面的 件下， 一起顯 採用相 磨石顆 之鑽石 包含粒 粒度爲 -6 0 β m 正三角 等間隔 器，該 顆粒群 之圓環 排設置 胺酯製 .中：。 -19- (17) 200408501 〔表2〕 比較例1 比較例2 比較例3 鑽石粒度 #80/#100 #120/#140 Φ #120/#140 © #325/#400 磨石顆粒間隔 0.25mm 2.1mm ① 2.1mm ② 0.4 m m 磨石顆粒保持方法 電塗膜 燒結· 硏磨布的磨耗速度 A v e . 6 1.6 1 89 138 (U m / Η ο υ r ) J n - 1 7.8 4 14.6 2.4 3 硏磨布的面粗度 A v e . 3.01 3.32 3.45 R a ( // m ) 〇 n - 1 0.3 6 0.36 0.13 晶圓硏磨速度 A v e . 1 0 5 9 8.3 ' 12 0： (n m / m i n ) 〇 n -] 3 5.2 25.3 9.6 傷痕發生率（％) 0.52 0.00 0.0 0 【圖式簡單說明】 _ 第1 A〜1 D圖爲表示本發明的硏磨布用修整器之磨石-顆粒群的不同配置形狀的第1實施形態之立體圖。 第2A〜2D圖爲表示本發明的硏磨布用修整器之磨石 顆粒群的不同配置形狀的第2實施形態之立體圖。、 第3圖爲第1圖中的in — III線之剖面圖。 第4圖爲第2圖中的IV — IV線之剖面圖。 第5圖爲表示第1磨石顆粒群5之磨石顆粒的排列狀 態之槪略圖。 -20- (18) (18)200408501 第6圖爲第3圖的部分擴大圖 元件對照表 1 :硏磨布用修整器 2 ·金屬台 3 :金屬台表面 4:修整面 5，6 :磨石顆粒群 7 :調節機構 7 a :基台 7b :調節用螺絲 :螺絲孔 7d :間隔件 7e:凹部 8 :粘合劑 1 0 :硏磨布用修整器 50，51 :磨石顆粒 52 :保持材 S 1、S2 :基準面 0 :.商低差 -21 -Example Grinding Stones 1st Grinding Stone # 120 / # 140 2.0mm Granular Interval Particle Groups # 3 2Ό / # 4 0 0 0.4mm, 2nd Grinding Stone: # 60 / # 80 0 · 8 mm Surface height difference (5 15 3 0- 60 Honing cloth wear rate Α ν e · 69.2 108. 12 (μ, m / Η ο υ r) α η-1 1.33 1.2 5 1.78 . 4.12 4.05 4.19 R a (β m) 〇n-1 0.12 0.15 0.14 Wafer honing speed 'Ave. 126 1 2 9 1 2 1; (nm / min) (7b) 6.7 7.2 5.6 Damage rate (° / o) ___----- 0.00 0.00 (LOO As shown in this Table 1, the dresser for honing cloth according to the present invention, adjust -17- (15) 200408501 section of the grindstone particles of a plurality of grindstone particles The grain size or the height difference between the quasi-planes of each grinding stone can adjust the trimming surface to the desired speed, especially the difference in height between the reference planes using the above-mentioned grinding stone particle group. 5 There is a large difference in speed. Therefore, one piece is used. Honing cloth dressing is performed stably under various conditions. In addition, according to the measurement of the above-mentioned embodiment, it is found that the overall performance is improved compared with the measurement side of the comparative example. Yes, and the various standard deviations are very small, so it is known that the honing cloth obtained is extremely smaller than the honing cloth peripheral dresser to give stable honing performance. [Comparative Example 1] The conventional CMP honing cloth dresser was used. The CMP regulator is composed of nickel electrocoating films with an interval of 0.25 mm and an interval of 5 mm around the grindstone particles to fix diamond grindstone particles corresponding to the range of particle size # 80 / # 1 0.0. Example 1 The honing cloth made of foamed polyurethane was hobbed. The honing results were apparent. [Comparative Example 2] A dresser for honing cloths was collected around the honing cloth. Surface, the smallest lattice between adjacent first millstone particles is a regular triangle, and the diamond mills corresponding to the grain size # 120 ~ # 140 in a range of // m are arranged at an equal interval with the millstone particles on one side being spaced at equal intervals. Stone particles, based on the state of the group of particles formed by the grinding stone particles, knowing the abrasion device, the deviation of the radon can be measured as described below, and the same condition of 1 0-2 5 0 / i in the state of the honing cloth repair : Shown in Table 2 The composition of the sintered body is 2.1 mm 1 50 0 to 17 0 -18- (16) 200408501 As shown in Figure 2C, the planar shape of the particle group is formed into a circular plate shape parallel to the peripheral edge, and is the same as in Example 1 . The cutting results and Comparative Example i are shown in Table 2. [Comparative Example 3] Similar to the first millstone particle group in Example 1, the diamond grains in the range of 150 to 170 // m in the particle size # 120 / # 140 and the particle size # 3 2 5 / # 4 0 0. 之 5 grindstone particles in the range of 5 to 6 5 / zm. Then, in the arranging surface of the grinding stone particles of the sintered body, the plane of the front end of the grinding stone particles with a degree of # 120 / # 140 and the front end of the grinding stone particles including # 3 2 5 / # 4 0 0 ' , The low difference is .. 40. 'and the smallest grid composed of adjacent grindstone particles is shaped, and the grindstone particles with a size of # 120 / # 140 are arranged at an interval of 2.0mm to arrange these grindstone particles. Then, the dresser for dressing with a honing cloth is a grindstone having such a grindstone particle arrangement, and is formed into a shape of a parallel sheet with the periphery of the dressing surface as shown in FIG. 2C, along the dressing surface. The peripheral edge portion of the metal table was formed in a ring shape, and under the same conditions as in Example 1, the foamed poly-honed abrasive cloth was cut out. The cutting results and comparative examples are shown together with [, 2 under the entire surface of Table 2. The diamonds with phase grind stones are shown together, including regular spacers with a grain size of -6 0 β m. The ring row is made of amine ester. -19- (17) 200408501 [Table 2] Comparative Example 1 Comparative Example 2 Comparative Example 3 Diamond grain size # 80 / # 100 # 120 / # 140 Φ # 120 / # 140 © # 325 / # 400 Millstone particle interval 0.25mm 2.1mm ① 2.1mm ② 0.4 mm Grinding stone particles holding method Electrodeposition film sintering and abrasion rate of honing cloth Ave. 6 1.6 1 89 138 (U m / Η ο υ r) J n-1 7.8 4 14.6 2.4 3 Surface roughness of honing cloth Ave. 3.01 3.32 3.45 R a (// m) 〇n-1 0.3 6 0.36 0.13 Wafer honing speed Ave. 1 0 5 9 8.3 '12 0: (nm / min) 〇n-] 3 5.2 25.3 9.6 Damage rate (%) 0.52 0.00 0.0 0 [Brief description of the figure] _ Figures 1 A to 1 D show the grindstone-particle group of the dresser for the honing cloth of the present invention. A perspective view of the first embodiment with different arrangement shapes. Figures 2A to 2D are perspective views of a second embodiment showing different arrangement shapes of the grindstone particles of the dresser for a honing cloth according to the present invention. Figure 3 is a cross-sectional view taken along the line in-III in Figure 1. Fig. 4 is a cross-sectional view taken along the line IV-IV in Fig. 2. Fig. 5 is a schematic view showing the arrangement state of the grindstone particles of the first grindstone particle group 5. -20- (18) (18) 200408501 Figure 6 is a partially enlarged view of Figure 3. Component comparison table 1: Dresser for honing cloth 2 Metal table 3: Metal table surface 4: Dressing surface 5, 6: Grinding Stone particle group 7: Adjustment mechanism 7a: Abutment 7b: Adjustment screw: Screw hole 7d: Spacer 7e: Recess 8: Adhesive 1 0: Dresser for honing cloth 50, 51: Grinding stone particle 52: Retaining material S 1, S2: Reference surface 0: Quotient difference -21-