SU890997A3 - Способ нанесени фоторезиста на подложку печатной схемы с отверсти ми - Google Patents

Способ нанесени фоторезиста на подложку печатной схемы с отверсти ми Download PDF

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Publication number
SU890997A3
SU890997A3 SU782687105A SU2687105A SU890997A3 SU 890997 A3 SU890997 A3 SU 890997A3 SU 782687105 A SU782687105 A SU 782687105A SU 2687105 A SU2687105 A SU 2687105A SU 890997 A3 SU890997 A3 SU 890997A3
Authority
SU
USSR - Soviet Union
Prior art keywords
photoresist
substrate
solution
holes
substrates
Prior art date
Application number
SU782687105A
Other languages
English (en)
Russian (ru)
Inventor
Лозерт Эвальд
Рембольд Хайнц
Original Assignee
Циба-Гейги Аг (Фирма)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4398641&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SU890997(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Циба-Гейги Аг (Фирма) filed Critical Циба-Гейги Аг (Фирма)
Application granted granted Critical
Publication of SU890997A3 publication Critical patent/SU890997A3/ru

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/224—Anti-weld compositions; Braze stop-off compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/002—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the work consisting of separate articles
    • B05C5/004—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the work consisting of separate articles the work consisting of separate rectangular flat articles, e.g. flat sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/005—Curtain coaters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0091—Apparatus for coating printed circuits using liquid non-metallic coating compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1509—Horizontally held PCB
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/159—Using gravitational force; Processing against the gravity direction; Using centrifugal force
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
SU782687105A 1977-11-21 1978-11-20 Способ нанесени фоторезиста на подложку печатной схемы с отверсти ми SU890997A3 (ru)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1418277 1977-11-21

Publications (1)

Publication Number Publication Date
SU890997A3 true SU890997A3 (ru) 1981-12-15

Family

ID=4398641

Family Applications (1)

Application Number Title Priority Date Filing Date
SU782687105A SU890997A3 (ru) 1977-11-21 1978-11-20 Способ нанесени фоторезиста на подложку печатной схемы с отверсти ми

Country Status (10)

Country Link
US (1) US4230793B1 (enExample)
EP (1) EP0002040B1 (enExample)
JP (1) JPS5482073A (enExample)
AT (1) AT367943B (enExample)
CA (1) CA1118530A (enExample)
DE (1) DE2861486D1 (enExample)
ES (1) ES475242A1 (enExample)
IL (1) IL56000A (enExample)
IT (1) IT1105948B (enExample)
SU (1) SU890997A3 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2320104C1 (ru) * 2007-01-09 2008-03-20 Владимир Николаевич Себежко Способ получения скрытого изображения на пленочном фоторезисте и устройство для его осуществления
RU2715221C2 (ru) * 2018-06-21 2020-02-26 Федеральный научно-производственный центр акционерное общество "Научно-производственное объединение "Марс" Способ стабилизации слоя паяльной маски, наносимой методом полива

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DE3329443A1 (de) * 1983-08-16 1985-03-07 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes kopiermaterial
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US4834821A (en) * 1988-01-11 1989-05-30 Morton Thiokol, Inc. Process for preparing polymeric materials for application to printed circuits
JPH01232791A (ja) * 1988-03-11 1989-09-18 Mitsubishi Cable Ind Ltd 回路基板の製造方法
JPH01281793A (ja) * 1988-05-09 1989-11-13 Airetsukusu:Kk プリント回路基板及びその製造方法
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske
US5136970A (en) * 1989-10-06 1992-08-11 Fuji Photo Film Co., Ltd. Coating apparatus with vertically movable solution receiver
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DE9201546U1 (de) * 1992-02-08 1992-05-21 Schäfer, Hans-Jürgen, Dipl.-Ing., 4060 Viersen Vorrichtung zur Beschichtung von Leiterplatten mit lösungsmittelfreien Lackschichten
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US5402314A (en) * 1992-02-10 1995-03-28 Sony Corporation Printed circuit board having through-hole stopped with photo-curable solder resist
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US7579134B2 (en) * 2005-03-15 2009-08-25 E. I. Dupont De Nemours And Company Polyimide composite coverlays and methods and compositions relating thereto
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto
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CN104784970B (zh) * 2015-04-23 2016-08-31 南京隆特森化学科技有限公司 手性色谱填料涂敷装置及方法

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2320104C1 (ru) * 2007-01-09 2008-03-20 Владимир Николаевич Себежко Способ получения скрытого изображения на пленочном фоторезисте и устройство для его осуществления
RU2715221C2 (ru) * 2018-06-21 2020-02-26 Федеральный научно-производственный центр акционерное общество "Научно-производственное объединение "Марс" Способ стабилизации слоя паяльной маски, наносимой методом полива

Also Published As

Publication number Publication date
CA1118530A (en) 1982-02-16
EP0002040B1 (de) 1981-12-30
ES475242A1 (es) 1979-04-16
AT367943B (de) 1982-08-10
IL56000A0 (en) 1979-01-31
IT7851961A0 (it) 1978-11-20
JPS5482073A (en) 1979-06-29
US4230793A (en) 1980-10-28
ATA826878A (de) 1981-12-15
EP0002040A1 (de) 1979-05-30
IL56000A (en) 1980-12-31
JPH0157516B2 (enExample) 1989-12-06
DE2861486D1 (en) 1982-02-18
US4230793B1 (en) 1994-06-14
IT1105948B (it) 1985-11-11

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