DE3482501D1 - Verfahren zur herstellung von grossflaechigen integrierten schaltungen. - Google Patents

Verfahren zur herstellung von grossflaechigen integrierten schaltungen.

Info

Publication number
DE3482501D1
DE3482501D1 DE8484110227T DE3482501T DE3482501D1 DE 3482501 D1 DE3482501 D1 DE 3482501D1 DE 8484110227 T DE8484110227 T DE 8484110227T DE 3482501 T DE3482501 T DE 3482501T DE 3482501 D1 DE3482501 D1 DE 3482501D1
Authority
DE
Germany
Prior art keywords
large area
integrated circuits
area integrated
producing large
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8484110227T
Other languages
English (en)
Inventor
Meera Vijan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Application granted granted Critical
Publication of DE3482501D1 publication Critical patent/DE3482501D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0393—Flexible materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0091—Apparatus for coating printed circuits using liquid non-metallic coating compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0097—Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Bipolar Transistors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Thin Film Transistor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE8484110227T 1983-09-06 1984-08-28 Verfahren zur herstellung von grossflaechigen integrierten schaltungen. Expired - Lifetime DE3482501D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52943683A 1983-09-06 1983-09-06

Publications (1)

Publication Number Publication Date
DE3482501D1 true DE3482501D1 (de) 1990-07-19

Family

ID=24109905

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484110227T Expired - Lifetime DE3482501D1 (de) 1983-09-06 1984-08-28 Verfahren zur herstellung von grossflaechigen integrierten schaltungen.

Country Status (5)

Country Link
EP (1) EP0136534B1 (de)
JP (1) JPS6089925A (de)
AT (1) ATE53682T1 (de)
CA (1) CA1222834A (de)
DE (1) DE3482501D1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109618723A (zh) * 2018-12-03 2019-04-16 中国辐射防护研究院 一种用于研究植物体湿沉积易位因子的装置和方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06338449A (ja) * 1993-05-28 1994-12-06 Chuo Riken:Kk 方形の基板の表面に液状物を盛る方法及び方形基板用流出ノズル
JP2023078747A (ja) 2021-11-26 2023-06-07 株式会社オーク製作所 露光装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE572753A (de) * 1957-11-08 1900-01-01
US3712735A (en) * 1970-09-25 1973-01-23 Amp Inc Apparatus for photo etching
US4018940A (en) * 1973-02-08 1977-04-19 W. R. Grace & Co. Process for forming solder resistant photoresist coatings
US3876465A (en) * 1973-03-12 1975-04-08 Zenith Radio Corp Method and apparatus for coating skirtless cathode ray tube panels
JPS5337577U (de) * 1976-09-06 1978-04-01
JPS5376748A (en) * 1976-12-20 1978-07-07 Fujitsu Ltd Forming method of insulation fulm
EP0002040B1 (de) * 1977-11-21 1981-12-30 Ciba-Geigy Ag Verfahren zur Herstellung von Lötstoppmasken auf gedruckten Schaltungen mit Druckkontaktierungsbohrungen
JPS5599740A (en) * 1979-01-25 1980-07-30 Toko Inc Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109618723A (zh) * 2018-12-03 2019-04-16 中国辐射防护研究院 一种用于研究植物体湿沉积易位因子的装置和方法

Also Published As

Publication number Publication date
ATE53682T1 (de) 1990-06-15
JPS6089925A (ja) 1985-05-20
EP0136534B1 (de) 1990-06-13
EP0136534A2 (de) 1985-04-10
CA1222834A (en) 1987-06-09
JPH0510817B2 (de) 1993-02-10
EP0136534A3 (en) 1987-01-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition