SG97127A1 - A scalable multi-pad design for improved cmp process - Google Patents
A scalable multi-pad design for improved cmp processInfo
- Publication number
- SG97127A1 SG97127A1 SG9901589A SG1999001589A SG97127A1 SG 97127 A1 SG97127 A1 SG 97127A1 SG 9901589 A SG9901589 A SG 9901589A SG 1999001589 A SG1999001589 A SG 1999001589A SG 97127 A1 SG97127 A1 SG 97127A1
- Authority
- SG
- Singapore
- Prior art keywords
- pad
- polishing
- slurry
- cmp process
- pad design
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
- B24B41/047—Grinding heads for working on plane surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/192,522 US6296550B1 (en) | 1998-11-16 | 1998-11-16 | Scalable multi-pad design for improved CMP process |
Publications (1)
Publication Number | Publication Date |
---|---|
SG97127A1 true SG97127A1 (en) | 2003-07-18 |
Family
ID=22710022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG9901589A SG97127A1 (en) | 1998-11-16 | 1999-03-31 | A scalable multi-pad design for improved cmp process |
Country Status (5)
Country | Link |
---|---|
US (1) | US6296550B1 (de) |
EP (1) | EP1000705B1 (de) |
AT (1) | ATE350194T1 (de) |
DE (1) | DE69934652T2 (de) |
SG (1) | SG97127A1 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6719615B1 (en) | 2000-10-10 | 2004-04-13 | Beaver Creek Concepts Inc | Versatile wafer refining |
US6435948B1 (en) | 2000-10-10 | 2002-08-20 | Beaver Creek Concepts Inc | Magnetic finishing apparatus |
US6413153B1 (en) * | 1999-04-26 | 2002-07-02 | Beaver Creek Concepts Inc | Finishing element including discrete finishing members |
US6435941B1 (en) * | 2000-05-12 | 2002-08-20 | Appllied Materials, Inc. | Apparatus and method for chemical mechanical planarization |
US7377836B1 (en) | 2000-10-10 | 2008-05-27 | Beaver Creek Concepts Inc | Versatile wafer refining |
US6561881B2 (en) * | 2001-03-15 | 2003-05-13 | Oriol Inc. | System and method for chemical mechanical polishing using multiple small polishing pads |
US20030045208A1 (en) * | 2001-09-06 | 2003-03-06 | Neidrich Jason M. | System and method for chemical mechanical polishing using retractable polishing pads |
US8357286B1 (en) * | 2007-10-29 | 2013-01-22 | Semcon Tech, Llc | Versatile workpiece refining |
GB2477557A (en) * | 2010-02-08 | 2011-08-10 | Qioptiq Ltd | Aspheric optical surface polishing tool with individually movable polishing pads |
DE102012201516A1 (de) * | 2012-02-02 | 2013-08-08 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
KR20140144959A (ko) * | 2013-06-12 | 2014-12-22 | 삼성전자주식회사 | 연마 패드 제조 장치 및 이를 제조하는 방법 |
US20150111478A1 (en) * | 2013-10-23 | 2015-04-23 | Applied Materials, Inc. | Polishing system with local area rate control |
KR102333209B1 (ko) | 2015-04-28 | 2021-12-01 | 삼성디스플레이 주식회사 | 기판 연마 장치 |
CN109155249B (zh) * | 2016-03-25 | 2023-06-23 | 应用材料公司 | 局部区域研磨系统以及用于研磨系统的研磨垫组件 |
CN109075054B (zh) * | 2016-03-25 | 2023-06-09 | 应用材料公司 | 具有局部区域速率控制及振荡模式的研磨系统 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2264177A (en) * | 1939-07-26 | 1941-11-25 | Pittsburgh Plate Glass Co | Control mechanism for surfacing apparatus |
US2399924A (en) * | 1945-02-17 | 1946-05-07 | Hayward Roger | Device for grinding and polishing surfaces |
JPH06252113A (ja) * | 1993-02-26 | 1994-09-09 | Matsushita Electric Ind Co Ltd | 半導体基板の平坦化方法 |
US5836807A (en) * | 1994-08-08 | 1998-11-17 | Leach; Michael A. | Method and structure for polishing a wafer during manufacture of integrated circuits |
US5934979A (en) * | 1993-11-16 | 1999-08-10 | Applied Materials, Inc. | Chemical mechanical polishing apparatus using multiple polishing pads |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5230184A (en) | 1991-07-05 | 1993-07-27 | Motorola, Inc. | Distributed polishing head |
US5329734A (en) | 1993-04-30 | 1994-07-19 | Motorola, Inc. | Polishing pads used to chemical-mechanical polish a semiconductor substrate |
US5575707A (en) | 1994-10-11 | 1996-11-19 | Ontrak Systems, Inc. | Polishing pad cluster for polishing a semiconductor wafer |
JP3329644B2 (ja) | 1995-07-21 | 2002-09-30 | 株式会社東芝 | 研磨パッド、研磨装置及び研磨方法 |
-
1998
- 1998-11-16 US US09/192,522 patent/US6296550B1/en not_active Expired - Fee Related
-
1999
- 1999-03-31 SG SG9901589A patent/SG97127A1/en unknown
- 1999-09-30 DE DE69934652T patent/DE69934652T2/de not_active Expired - Fee Related
- 1999-09-30 EP EP99480092A patent/EP1000705B1/de not_active Expired - Lifetime
- 1999-09-30 AT AT99480092T patent/ATE350194T1/de not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2264177A (en) * | 1939-07-26 | 1941-11-25 | Pittsburgh Plate Glass Co | Control mechanism for surfacing apparatus |
US2399924A (en) * | 1945-02-17 | 1946-05-07 | Hayward Roger | Device for grinding and polishing surfaces |
JPH06252113A (ja) * | 1993-02-26 | 1994-09-09 | Matsushita Electric Ind Co Ltd | 半導体基板の平坦化方法 |
US5934979A (en) * | 1993-11-16 | 1999-08-10 | Applied Materials, Inc. | Chemical mechanical polishing apparatus using multiple polishing pads |
US5836807A (en) * | 1994-08-08 | 1998-11-17 | Leach; Michael A. | Method and structure for polishing a wafer during manufacture of integrated circuits |
Also Published As
Publication number | Publication date |
---|---|
EP1000705A3 (de) | 2003-02-05 |
EP1000705A2 (de) | 2000-05-17 |
EP1000705B1 (de) | 2007-01-03 |
DE69934652T2 (de) | 2007-05-03 |
ATE350194T1 (de) | 2007-01-15 |
US6296550B1 (en) | 2001-10-02 |
DE69934652D1 (de) | 2007-02-15 |
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