SG91938A1 - Fluid control apparatus and gas treatment system comprising same - Google Patents

Fluid control apparatus and gas treatment system comprising same

Info

Publication number
SG91938A1
SG91938A1 SG200105420A SG200105420A SG91938A1 SG 91938 A1 SG91938 A1 SG 91938A1 SG 200105420 A SG200105420 A SG 200105420A SG 200105420 A SG200105420 A SG 200105420A SG 91938 A1 SG91938 A1 SG 91938A1
Authority
SG
Singapore
Prior art keywords
same
control apparatus
treatment system
gas treatment
fluid control
Prior art date
Application number
SG200105420A
Other languages
English (en)
Inventor
Fujimoto Hideki
Uzawa Noboru
Sato Naoyuki
Yamaji Michio
Tanaka Shigeaki
Kawano Yuji
Omata Yasuyuki
Fukui Masakazu
Original Assignee
Fujikin Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikin Kk filed Critical Fujikin Kk
Publication of SG91938A1 publication Critical patent/SG91938A1/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
    • F15B1/00—Installations or systems with accumulators; Supply reservoir or sump assemblies
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/6851—With casing, support, protector or static constructional installations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Valve Housings (AREA)
  • Drying Of Semiconductors (AREA)
  • Pipeline Systems (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SG200105420A 2000-09-11 2001-09-06 Fluid control apparatus and gas treatment system comprising same SG91938A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000274546A JP2002089798A (ja) 2000-09-11 2000-09-11 流体制御装置およびこれを用いたガス処理装置

Publications (1)

Publication Number Publication Date
SG91938A1 true SG91938A1 (en) 2002-10-15

Family

ID=18760292

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200105420A SG91938A1 (en) 2000-09-11 2001-09-06 Fluid control apparatus and gas treatment system comprising same

Country Status (9)

Country Link
US (1) US6648020B2 (ko)
EP (1) EP1191265B1 (ko)
JP (1) JP2002089798A (ko)
KR (1) KR20020020854A (ko)
CA (1) CA2357177A1 (ko)
DE (1) DE60118674T2 (ko)
IL (1) IL145332A (ko)
SG (1) SG91938A1 (ko)
TW (1) TW522443B (ko)

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US7039999B2 (en) * 2002-04-25 2006-05-09 Tarr Adam L Method for installation of semiconductor fabrication tools
JP2004183771A (ja) * 2002-12-03 2004-07-02 Fujikin Inc 流体制御装置
JP4677805B2 (ja) * 2005-03-22 2011-04-27 株式会社フジキン 流体制御装置
US7320339B2 (en) * 2005-06-02 2008-01-22 Ultra Clean Holdings, Inc. Gas-panel assembly
JP2007034667A (ja) * 2005-07-27 2007-02-08 Surpass Kogyo Kk 流量コントローラ、これに用いるレギュレータユニット、バルブユニット
JPWO2007017937A1 (ja) * 2005-08-10 2009-02-19 株式会社フジキン 流体制御装置
JP4780555B2 (ja) * 2005-09-12 2011-09-28 株式会社フジキン 流体制御装置
TWI391804B (zh) * 2005-09-29 2013-04-01 3M Innovative Properties Co 流體控制裝置及其方法
US7575616B2 (en) * 2006-02-10 2009-08-18 Entegris, Inc. Low-profile surface mount filter
US20070282262A1 (en) * 2006-05-19 2007-12-06 Alcon, Inc. Surgical system having integral pneumatic manifolds
US20070270746A1 (en) * 2006-05-19 2007-11-22 Alcon, Inc. Surgical system having pneumatic manifolds with integral air cylinders
US9180232B2 (en) * 2006-05-19 2015-11-10 Novartis Ag Surgical system having manifolds with integral pneumatic accumulators
US20080009977A1 (en) * 2006-07-10 2008-01-10 Ultra Clean Holdings Apparatus and Method for Monitoring a Chemical-Supply System
CN101506561B (zh) * 2006-08-23 2012-04-18 株式会社堀场Stec 组合式气体分配盘装置
US20100112814A1 (en) * 2006-09-06 2010-05-06 Sowmya Krishnan Pre-certified process chamber and method
US20090078324A1 (en) * 2007-09-21 2009-03-26 Ultra Clean Technology, Inc. Gas-panel system
US20090114295A1 (en) * 2007-11-06 2009-05-07 Ultra Clean Holdings, Inc. Gas-panel assembly
SG174218A1 (en) * 2009-03-04 2011-10-28 Horiba Stec Co Ltd Gas supply device
JP5254948B2 (ja) * 2009-12-25 2013-08-07 株式会社堀場エステック 流体機器固定装置
DE102010043865A1 (de) 2009-11-30 2011-07-14 Horiba Stec Co., Ltd. Fluid device
JP5775696B2 (ja) * 2011-01-31 2015-09-09 株式会社フジキン 流体制御装置
US8851113B2 (en) * 2012-03-27 2014-10-07 Lam Research Coporation Shared gas panels in plasma processing systems
JP5616416B2 (ja) * 2012-11-02 2014-10-29 株式会社フジキン 集積型ガス供給装置
TWI651486B (zh) * 2013-12-05 2019-02-21 Ｃｋｄ股份有限公司 流體供給控制裝置
JP2015201646A (ja) 2014-04-07 2015-11-12 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ 構成独立型のガス供給システム
US10557197B2 (en) 2014-10-17 2020-02-11 Lam Research Corporation Monolithic gas distribution manifold and various construction techniques and use cases therefor
JP6468801B2 (ja) 2014-10-29 2019-02-13 株式会社フジキン 継手
CN105714271B (zh) * 2014-12-22 2020-07-31 株式会社堀场Stec 汽化系统
JP6471938B2 (ja) * 2015-03-30 2019-02-20 株式会社フジキン 流体供給装置、ライン保持具及び流体供給装置の製造方法
US10022689B2 (en) 2015-07-24 2018-07-17 Lam Research Corporation Fluid mixing hub for semiconductor processing tool
US10118263B2 (en) 2015-09-02 2018-11-06 Lam Researech Corporation Monolithic manifold mask and substrate concepts
US9879795B2 (en) 2016-01-15 2018-01-30 Lam Research Corporation Additively manufactured gas distribution manifold
US10215317B2 (en) 2016-01-15 2019-02-26 Lam Research Corporation Additively manufactured gas distribution manifold
WO2018079288A1 (ja) * 2016-10-24 2018-05-03 株式会社フジキン 流体制御装置およびこの流体制御装置を用いた製品製造方法
JP6735688B2 (ja) * 2017-01-25 2020-08-05 東京エレクトロン株式会社 ガス導入部材
JP7446618B2 (ja) * 2018-10-26 2024-03-11 株式会社フジキン 流体供給システム、流体制御装置、及び半導体製造装置
US11346460B2 (en) * 2019-02-05 2022-05-31 Swagelok Company Integrated actuator manifold for multiple valve assembly
JP7333944B2 (ja) * 2019-06-27 2023-08-28 株式会社フジキン 流体制御装置
CN113892005A (zh) * 2019-06-28 2022-01-04 株式会社富士金 流体控制装置
US20230167931A1 (en) 2020-02-20 2023-06-01 Ihara Science Corporation Connection method and axial alignment mechanism
CN111945136B (zh) * 2020-08-13 2022-10-21 北京北方华创微电子装备有限公司 半导体工艺设备及其集成供气系统

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0859155A2 (en) * 1997-02-14 1998-08-19 Tadahiro Ohmi Fluid control apparatus

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JPH07122500A (ja) * 1993-10-28 1995-05-12 Fujitsu Ltd ガス機器及びこれを利用したガス供給装置
JPH0929996A (ja) 1995-07-18 1997-02-04 Seiko Epson Corp インクジェット記録方法
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Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0859155A2 (en) * 1997-02-14 1998-08-19 Tadahiro Ohmi Fluid control apparatus

Also Published As

Publication number Publication date
EP1191265A2 (en) 2002-03-27
IL145332A0 (en) 2002-06-30
KR20020020854A (ko) 2002-03-16
JP2002089798A (ja) 2002-03-27
DE60118674D1 (de) 2006-05-24
DE60118674T2 (de) 2006-09-21
TW522443B (en) 2003-03-01
US20020033195A1 (en) 2002-03-21
US6648020B2 (en) 2003-11-18
IL145332A (en) 2004-08-31
CA2357177A1 (en) 2002-03-11
EP1191265A3 (en) 2003-04-09
EP1191265B1 (en) 2006-04-12

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