SG47177A1 - Base resistance controlled thyristor structure with high-density layout for increased current capacity - Google Patents

Base resistance controlled thyristor structure with high-density layout for increased current capacity

Info

Publication number
SG47177A1
SG47177A1 SG1996010650A SG1996010650A SG47177A1 SG 47177 A1 SG47177 A1 SG 47177A1 SG 1996010650 A SG1996010650 A SG 1996010650A SG 1996010650 A SG1996010650 A SG 1996010650A SG 47177 A1 SG47177 A1 SG 47177A1
Authority
SG
Singapore
Prior art keywords
current capacity
increased current
base resistance
thyristor structure
controlled thyristor
Prior art date
Application number
SG1996010650A
Other languages
English (en)
Inventor
Janardhanan S Ajit
Original Assignee
Int Rectifier Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Rectifier Corp filed Critical Int Rectifier Corp
Publication of SG47177A1 publication Critical patent/SG47177A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/749—Thyristor-type devices, e.g. having four-zone regenerative action with turn-on by field effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1012—Base regions of thyristors
    • H01L29/102—Cathode base regions of thyristors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/744—Gate-turn-off devices
    • H01L29/745—Gate-turn-off devices with turn-off by field effect
    • H01L29/7455—Gate-turn-off devices with turn-off by field effect produced by an insulated gate structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)
  • Electronic Switches (AREA)
SG1996010650A 1995-09-26 1996-09-20 Base resistance controlled thyristor structure with high-density layout for increased current capacity SG47177A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/533,768 US5793066A (en) 1995-09-26 1995-09-26 Base resistance controlled thyristor structure with high-density layout for increased current capacity

Publications (1)

Publication Number Publication Date
SG47177A1 true SG47177A1 (en) 1998-03-20

Family

ID=24127372

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996010650A SG47177A1 (en) 1995-09-26 1996-09-20 Base resistance controlled thyristor structure with high-density layout for increased current capacity

Country Status (8)

Country Link
US (1) US5793066A (ja)
JP (1) JPH09116134A (ja)
DE (1) DE19638381A1 (ja)
FR (1) FR2739224A1 (ja)
GB (1) GB2305777A (ja)
IT (1) IT1285221B1 (ja)
SG (1) SG47177A1 (ja)
TW (1) TW318964B (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271061B1 (en) 1997-12-03 2001-08-07 Stmicroelectronics S.R.L. Fabrication of insulated gate bipolar devices
US6365924B1 (en) * 1998-06-19 2002-04-02 National Semiconductor Corporation Dual direction over-voltage and over-current IC protection device and its cell structure
US7327541B1 (en) 1998-06-19 2008-02-05 National Semiconductor Corporation Operation of dual-directional electrostatic discharge protection device
US6859074B2 (en) * 2001-01-09 2005-02-22 Broadcom Corporation I/O circuit using low voltage transistors which can tolerate high voltages even when power supplies are powered off
US7138836B2 (en) * 2001-12-03 2006-11-21 Broadcom Corporation Hot carrier injection suppression circuit
JP4176564B2 (ja) * 2003-06-23 2008-11-05 株式会社東芝 ウェハ移載装置及びこれを用いた半導体装置の製造方法
KR100709396B1 (ko) * 2005-02-14 2007-04-18 주식회사 케이이씨 전력용 반도체 소자
US8693148B2 (en) 2009-01-08 2014-04-08 Micron Technology, Inc. Over-limit electrical condition protection circuits for integrated circuits
FR2974685A1 (fr) * 2011-04-27 2012-11-02 St Microelectronics Sa Dispositif semi-conducteur de protection contres des décharges électrostatiques, en particulier du type modèle composant charge (cdm)
US8611058B2 (en) 2011-08-23 2013-12-17 Micron Technology, Inc. Combination ESD protection circuits and methods
US8724268B2 (en) 2011-08-30 2014-05-13 Micron Technology, Inc. Over-limit electrical condition protection circuits and methods
EP2761661B1 (en) * 2011-09-29 2021-04-28 Pakal Technologies, Inc. Mct device with base-width-determined latching and non-latching states
CN107564959B (zh) * 2017-08-30 2020-10-27 电子科技大学 一种mos栅控晶闸管及其制作方法
CN108054207A (zh) * 2017-12-11 2018-05-18 电子科技大学 一种双沟道mos栅控晶闸管及其制造方法
CN113437135B (zh) * 2021-06-25 2022-04-08 电子科技大学 一种压控型发射极关断晶闸管器件及其制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5936832B2 (ja) * 1978-03-14 1984-09-06 株式会社日立製作所 半導体スイッチング素子
ATE74466T1 (de) * 1988-03-10 1992-04-15 Asea Brown Boveri Mos-gesteuerter thyristor (mct).
JPH04284669A (ja) * 1991-03-14 1992-10-09 Fuji Electric Co Ltd 絶縁ゲート制御サイリスタ
US5198687A (en) * 1992-07-23 1993-03-30 Baliga Bantval J Base resistance controlled thyristor with single-polarity turn-on and turn-off control
JPH06204463A (ja) * 1993-01-04 1994-07-22 Toyota Autom Loom Works Ltd 半導体装置
US5444272A (en) * 1994-07-28 1995-08-22 International Rectifier Corporation Three-terminal thyristor with single MOS-gate controlled characteristics

Also Published As

Publication number Publication date
ITMI961965A1 (it) 1998-03-25
DE19638381A1 (de) 1997-06-12
JPH09116134A (ja) 1997-05-02
FR2739224A1 (fr) 1997-03-28
GB9619451D0 (en) 1996-10-30
US5793066A (en) 1998-08-11
TW318964B (ja) 1997-11-01
IT1285221B1 (it) 1998-06-03
GB2305777A (en) 1997-04-16

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