SG188785A1 - Illuminating apparatus and method for controlling energy of a laser source - Google Patents

Illuminating apparatus and method for controlling energy of a laser source Download PDF

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Publication number
SG188785A1
SG188785A1 SG2013010152A SG2013010152A SG188785A1 SG 188785 A1 SG188785 A1 SG 188785A1 SG 2013010152 A SG2013010152 A SG 2013010152A SG 2013010152 A SG2013010152 A SG 2013010152A SG 188785 A1 SG188785 A1 SG 188785A1
Authority
SG
Singapore
Prior art keywords
energy
illuminating
line
dimension
laser
Prior art date
Application number
SG2013010152A
Other languages
English (en)
Inventor
Bernhard Weigl
Richard Sandstrom
Original Assignee
Zeiss Carl Laser Optics Gmbh
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Laser Optics Gmbh, Cymer Inc filed Critical Zeiss Carl Laser Optics Gmbh
Publication of SG188785A1 publication Critical patent/SG188785A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0626—Energy control of the laser beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B23K26/0738—Shaping the laser spot into a linear shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment
    • B23K26/705—Beam measuring devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Automation & Control Theory (AREA)
  • Recrystallisation Techniques (AREA)
  • Laser Beam Processing (AREA)
SG2013010152A 2008-02-07 2009-01-22 Illuminating apparatus and method for controlling energy of a laser source SG188785A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/027,442 US8723073B2 (en) 2008-02-07 2008-02-07 Illumination apparatus and method for controlling energy of a laser source

Publications (1)

Publication Number Publication Date
SG188785A1 true SG188785A1 (en) 2013-04-30

Family

ID=40583220

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2013010152A SG188785A1 (en) 2008-02-07 2009-01-22 Illuminating apparatus and method for controlling energy of a laser source

Country Status (7)

Country Link
US (1) US8723073B2 (https=)
EP (1) EP2245497B1 (https=)
JP (1) JP5425813B2 (https=)
KR (1) KR101606105B1 (https=)
SG (1) SG188785A1 (https=)
TW (1) TWI481136B (https=)
WO (1) WO2009097967A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006131924A2 (en) 2005-06-07 2006-12-14 Oree, Advanced Illumination Solutions Inc. Illumination apparatus
US8272758B2 (en) 2005-06-07 2012-09-25 Oree, Inc. Illumination apparatus and methods of forming the same
US8215815B2 (en) 2005-06-07 2012-07-10 Oree, Inc. Illumination apparatus and methods of forming the same
US7929816B2 (en) * 2007-12-19 2011-04-19 Oree, Inc. Waveguide sheet containing in-coupling, propagation, and out-coupling regions
US7907804B2 (en) 2007-12-19 2011-03-15 Oree, Inc. Elimination of stitch artifacts in a planar illumination area
EP2260341A2 (en) 2008-03-05 2010-12-15 Oree, Advanced Illumination Solutions INC. Illumination apparatus and methods of forming the same
US8297786B2 (en) 2008-07-10 2012-10-30 Oree, Inc. Slim waveguide coupling apparatus and method
US8301002B2 (en) 2008-07-10 2012-10-30 Oree, Inc. Slim waveguide coupling apparatus and method
JP4618360B2 (ja) * 2008-10-10 2011-01-26 ソニー株式会社 レーザアニール方法およびレーザアニール装置
US8624527B1 (en) 2009-03-27 2014-01-07 Oree, Inc. Independently controllable illumination device
US8328406B2 (en) 2009-05-13 2012-12-11 Oree, Inc. Low-profile illumination device
WO2010150202A2 (en) 2009-06-24 2010-12-29 Oree, Advanced Illumination Solutions Inc. Illumination apparatus with high conversion efficiency and methods of forming the same
US20120325784A1 (en) * 2011-06-24 2012-12-27 Applied Materials, Inc. Novel thermal processing apparatus
US8591072B2 (en) 2011-11-16 2013-11-26 Oree, Inc. Illumination apparatus confining light by total internal reflection and methods of forming the same
WO2014006501A1 (en) 2012-07-03 2014-01-09 Yosi Shani Planar remote phosphor illumination apparatus
KR102285121B1 (ko) * 2019-04-10 2021-08-03 고려대학교 세종산학협력단 레이저를 이용한 비정질 반도체 결정화 장치 및 그의 제어방법
KR20210131510A (ko) 2020-04-23 2021-11-03 삼성디스플레이 주식회사 라인 빔 형성 장치
DE102020130651B3 (de) * 2020-11-19 2022-05-05 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserbeleuchtung auf einer Arbeitsebene

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US5331466A (en) * 1991-04-23 1994-07-19 Lions Eye Institute Of Western Australia Inc. Method and apparatus for homogenizing a collimated light beam
DE4220705C2 (de) * 1992-06-24 2003-03-13 Lambda Physik Ag Vorrichtung zum Aufteilen eines Lichtstrahles in homogene Teilstrahlen
US5609780A (en) * 1994-11-14 1997-03-11 International Business Machines, Corporation Laser system
JPH08247790A (ja) * 1995-03-10 1996-09-27 Sefuto Kenkyusho:Kk 位置検出装置
DE19520187C1 (de) 1995-06-01 1996-09-12 Microlas Lasersystem Gmbh Optik zum Herstellen einer scharfen Beleuchtungslinie aus einem Laserstrahl
US5880461A (en) * 1996-06-12 1999-03-09 The Regents Of The University Of California Low noise optical position sensor
JPH11283933A (ja) * 1998-01-29 1999-10-15 Toshiba Corp レ―ザ照射装置，非単結晶半導体膜の製造方法及び液晶表示装置の製造方法
JP2000202673A (ja) * 2000-01-01 2000-07-25 Semiconductor Energy Lab Co Ltd レ―ザ―照射装置
AU2002230592A1 (en) * 2000-10-27 2002-05-06 Molecular Devices Corporation Light detection device
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
JP2003053578A (ja) * 2001-08-15 2003-02-26 Sumitomo Heavy Ind Ltd レーザビームのプロファイル調整方法及び装置
JP2003258349A (ja) * 2002-03-04 2003-09-12 Toshiba Corp レーザ加工方法、その装置および薄膜加工方法
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TWI361123B (en) 2004-12-22 2012-04-01 Zeiss Carl Laser Optics Gmbh Optical illumination system for creating a line beam

Also Published As

Publication number Publication date
US20090201955A1 (en) 2009-08-13
EP2245497B1 (en) 2016-12-14
KR20100114920A (ko) 2010-10-26
US8723073B2 (en) 2014-05-13
JP2011510820A (ja) 2011-04-07
TW201008061A (en) 2010-02-16
KR101606105B1 (ko) 2016-03-24
JP5425813B2 (ja) 2014-02-26
TWI481136B (zh) 2015-04-11
EP2245497A1 (en) 2010-11-03
WO2009097967A1 (en) 2009-08-13

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