SG162690A1 - Lithographic apparatus and method of irradiating at least two target portions - Google Patents

Lithographic apparatus and method of irradiating at least two target portions

Info

Publication number
SG162690A1
SG162690A1 SG200908384-1A SG2009083841A SG162690A1 SG 162690 A1 SG162690 A1 SG 162690A1 SG 2009083841 A SG2009083841 A SG 2009083841A SG 162690 A1 SG162690 A1 SG 162690A1
Authority
SG
Singapore
Prior art keywords
target portions
lithographic apparatus
irradiating
radiation
cross
Prior art date
Application number
SG200908384-1A
Other languages
English (en)
Inventor
Weert Cornelis Lambertus Maria Van
De Kerkhof Marcus Adrianus Van
Bearrach Moest
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG162690A1 publication Critical patent/SG162690A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200908384-1A 2008-12-18 2009-12-15 Lithographic apparatus and method of irradiating at least two target portions SG162690A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US19372108P 2008-12-18 2008-12-18
US23441909P 2009-08-17 2009-08-17

Publications (1)

Publication Number Publication Date
SG162690A1 true SG162690A1 (en) 2010-07-29

Family

ID=41786054

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200908384-1A SG162690A1 (en) 2008-12-18 2009-12-15 Lithographic apparatus and method of irradiating at least two target portions

Country Status (7)

Country Link
US (1) US8436984B2 (zh)
EP (1) EP2199858A1 (zh)
JP (1) JP2010147471A (zh)
KR (1) KR101129334B1 (zh)
CN (1) CN101750907A (zh)
SG (1) SG162690A1 (zh)
TW (1) TW201030477A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4922359B2 (ja) 2008-07-25 2012-04-25 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造、リソグラフィ装置及びデバイス製造方法
KR101689226B1 (ko) * 2012-05-22 2016-12-23 에이에스엠엘 네델란즈 비.브이. 센서, 리소그래피 장치 및 디바이스 제조 방법
JP6060796B2 (ja) * 2013-04-22 2017-01-18 大日本印刷株式会社 インプリントモールド及びダミーパターン設計方法
JP6488073B2 (ja) * 2014-02-28 2019-03-20 株式会社日立ハイテクノロジーズ ステージ装置およびそれを用いた荷電粒子線装置
NL2019659A (en) 2016-11-15 2018-05-24 Asml Netherlands Bv Radiation Analysis System
CN113767335A (zh) * 2019-04-09 2021-12-07 库力&索法利特克有限公司 平版印刷系统及操作该系统的方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
JPH03241727A (ja) * 1990-02-20 1991-10-28 Canon Inc ダミーウエハ
JPH04155913A (ja) * 1990-10-19 1992-05-28 Hitachi Ltd 縮小投影露光装置の焦点位置検出機構
US5883704A (en) * 1995-08-07 1999-03-16 Nikon Corporation Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JPH11317355A (ja) * 1999-02-18 1999-11-16 Nikon Corp 走査型露光装置と該装置を用いるデバイス製造方法、及び走査露光方法と該方法を用いるデバイス製造方法
TWI232357B (en) 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420299B1 (en) * 2002-11-12 2011-01-05 ASML Netherlands B.V. Immersion lithographic apparatus and device manufacturing method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7563748B2 (en) 2003-06-23 2009-07-21 Cognis Ip Management Gmbh Alcohol alkoxylate carriers for pesticide active ingredients
US7528929B2 (en) * 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101227211B1 (ko) * 2004-02-03 2013-01-28 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8698998B2 (en) * 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
EP1783822A4 (en) 2004-06-21 2009-07-15 Nikon Corp EXPOSURE DEVICE, EXPOSURE DEVICE ELEMENT CLEANING METHOD, EXPOSURE DEVICE MAINTENANCE METHOD, MAINTENANCE DEVICE, AND DEVICE MANUFACTURING METHOD
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006324619A (ja) * 2005-04-19 2006-11-30 Nikon Corp 露光装置、マスク及びデバイスの製造方法
KR100695895B1 (ko) * 2005-06-24 2007-03-19 삼성전자주식회사 주사형 노광장치 및 그 노광방법
WO2007004552A1 (ja) * 2005-06-30 2007-01-11 Nikon Corporation 露光装置及び方法、露光装置のメンテナンス方法、並びにデバイス製造方法
JP2008046210A (ja) 2006-08-11 2008-02-28 Elpida Memory Inc レチクル及びこれを用いた露光方法及び装置、並びにレチクルのパターン作成方法、パターン形成方法及び半導体装置
EP2062098B1 (en) * 2006-09-12 2014-11-19 Carl Zeiss SMT GmbH Optical arrangement for immersion lithography
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008258381A (ja) * 2007-04-04 2008-10-23 Canon Inc 露光装置及びデバイスの製造方法
US7561250B2 (en) * 2007-06-19 2009-07-14 Asml Netherlands B.V. Lithographic apparatus having parts with a coated film adhered thereto
JP2009054858A (ja) * 2007-08-28 2009-03-12 Canon Inc 液浸露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
TW201030477A (en) 2010-08-16
KR20100071019A (ko) 2010-06-28
CN101750907A (zh) 2010-06-23
JP2010147471A (ja) 2010-07-01
US8436984B2 (en) 2013-05-07
US20100157271A1 (en) 2010-06-24
KR101129334B1 (ko) 2012-03-27
EP2199858A1 (en) 2010-06-23

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